FR2122578A1 - - Google Patents

Info

Publication number
FR2122578A1
FR2122578A1 FR7202044A FR7202044A FR2122578A1 FR 2122578 A1 FR2122578 A1 FR 2122578A1 FR 7202044 A FR7202044 A FR 7202044A FR 7202044 A FR7202044 A FR 7202044A FR 2122578 A1 FR2122578 A1 FR 2122578A1
Authority
FR
France
Prior art keywords
layer
photo
ethanol
actinic radiation
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7202044A
Other languages
English (en)
French (fr)
Other versions
FR2122578B1 (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2122578A1 publication Critical patent/FR2122578A1/fr
Application granted granted Critical
Publication of FR2122578B1 publication Critical patent/FR2122578B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/10—Organic substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7202044A 1971-01-21 1972-01-21 Expired FR2122578B1 (en))

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10857771A 1971-01-21 1971-01-21
US20061171A 1971-11-19 1971-11-19

Publications (2)

Publication Number Publication Date
FR2122578A1 true FR2122578A1 (en)) 1972-09-01
FR2122578B1 FR2122578B1 (en)) 1977-09-02

Family

ID=26806041

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7202044A Expired FR2122578B1 (en)) 1971-01-21 1972-01-21

Country Status (6)

Country Link
BE (1) BE778333A (en))
CA (1) CA993709A (en))
DE (1) DE2202360C3 (en))
FR (1) FR2122578B1 (en))
GB (1) GB1385241A (en))
NL (1) NL173790C (en))

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2390755A1 (fr) * 1977-05-13 1978-12-08 Hoechst Ag Procede de masquage de documents originaux a reproduire a l'aide de caches
EP0036221B1 (en) * 1980-02-20 1984-03-14 Agfa-Gevaert N.V. Photosensitive material and a process for reproducing photo-information
EP0266069A3 (en) * 1986-10-01 1988-09-21 Napp Systems (Usa) Inc. Photopolymerizable composition useful for printing plates
EP0225676A3 (en) * 1985-12-09 1989-03-15 Nippon Paint Co., Ltd. Photosensitive resin base printing material
EP0354475A3 (de) * 1988-08-11 1991-03-20 Hoechst Aktiengesellschaft Photopolymerisierbares Aufzeichnungsmaterial

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2660951C2 (de) * 1975-06-03 1986-08-07 E.I. Du Pont De Nemours And Co., Wilmington, Del. Lichtempfindliches Mehrschichtmaterial
DE2660103C3 (de) * 1975-11-17 1987-10-22 E.I. Du Pont De Nemours And Co., Wilmington, Del. Farbkorrektursystem für die Mehrfarbenbildreproduktion
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
JPS5420719A (en) 1977-07-15 1979-02-16 Fuji Photo Film Co Ltd Photosensitive material for image formation and image formation method
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
JPS5962859A (ja) * 1982-10-04 1984-04-10 Fuji Photo Film Co Ltd 感光性平版印刷版の製版方法
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
GB8414867D0 (en) * 1984-06-11 1984-07-18 Minnesota Mining & Mfg Pre-press proofing system
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP2003502449A (ja) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
EP1152294B1 (en) * 2000-04-18 2012-06-13 FUJIFILM Corporation Photosensitive image-recording material
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1090663A (en) * 1964-06-16 1967-11-15 Du Pont Improvements relating to image reproduction
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1090663A (en) * 1964-06-16 1967-11-15 Du Pont Improvements relating to image reproduction
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
(REVUE US"IBM TECHNICAL DISCLOSURE BULLETIN",VOLUME 13,NO 2,JULY 1970,PAGE 535) *
REVUE US"IBM TECHNICAL DISCLOSURE BULLETIN",VOLUME 13,NO 2,JULY 1970,PAGE 535) *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2390755A1 (fr) * 1977-05-13 1978-12-08 Hoechst Ag Procede de masquage de documents originaux a reproduire a l'aide de caches
EP0036221B1 (en) * 1980-02-20 1984-03-14 Agfa-Gevaert N.V. Photosensitive material and a process for reproducing photo-information
EP0225676A3 (en) * 1985-12-09 1989-03-15 Nippon Paint Co., Ltd. Photosensitive resin base printing material
EP0266069A3 (en) * 1986-10-01 1988-09-21 Napp Systems (Usa) Inc. Photopolymerizable composition useful for printing plates
EP0354475A3 (de) * 1988-08-11 1991-03-20 Hoechst Aktiengesellschaft Photopolymerisierbares Aufzeichnungsmaterial

Also Published As

Publication number Publication date
DE2202360C3 (de) 1980-04-10
FR2122578B1 (en)) 1977-09-02
NL7200858A (nl) 1972-07-25
BE778333A (fr) 1972-07-24
CA993709A (en) 1976-07-27
DE2202360B2 (de) 1979-08-02
NL173790B (nl) 1983-10-03
NL173790C (nl) 1984-03-01
DE2202360A1 (de) 1973-05-17
GB1385241A (en) 1975-02-26

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Legal Events

Date Code Title Description
ST Notification of lapse
DA Annulment of decision of lapse