FR2122578A1 - - Google Patents

Info

Publication number
FR2122578A1
FR2122578A1 FR7202044A FR7202044A FR2122578A1 FR 2122578 A1 FR2122578 A1 FR 2122578A1 FR 7202044 A FR7202044 A FR 7202044A FR 7202044 A FR7202044 A FR 7202044A FR 2122578 A1 FR2122578 A1 FR 2122578A1
Authority
FR
France
Prior art keywords
layer
photo
ethanol
actinic radiation
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7202044A
Other languages
French (fr)
Other versions
FR2122578B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2122578A1 publication Critical patent/FR2122578A1/fr
Application granted granted Critical
Publication of FR2122578B1 publication Critical patent/FR2122578B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/10—Organic substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Abstract

1385241 Photographic material: photomasks E I DU PONT DE NEMOURS & CO 21 Jan 1972 [21 Jan 1971 19 Nov 1971] 3084/72 Headings G2C and G2Y A light sensitive element comprises (a) a layer which is photo-hardenable by actinic radiation or which comprises a cross-linkable composition which undergoes decomposition upon exposure to actinic radiation to leave material in the unexposed areas which cross-links and hardens upon treatment with a basic cross-linking agent; and, in intimate surface contact therewith, (b) a macromolecular organic polymer layer which contains at least one dye or pigment and is essentially opaque to ultraviolet radiation and essentially transparent to visible actinic radiation. The layer (a) may be adherent to a cover sheet and the layer (b) adherent to a support film. The layer (b) which is soluble in the solvent used to develop layer (a) may comprise polystyrene, copolymers of vinylidene chloride and acrylonitrile, polyacrylates and polymethacrylates, polyamides and polyvinyl esters. Numerous examples of dyes and pigments suitable for incorporation into the layer (b) are given. Suitable photo-hardenable compositions are given in the Examples. The element may be used to produce a coloured mask by removing the support film laminating the element to a rigid support with the layer (b) nearest the support, exposing the layer (a) image-wise for actinic radiation, removing the cover sheet and removing the unexposed or exposed areas of the layer (a) and the portion of the layer (b) underlying the unexposed or exposed areas of layer (a). The photo-hardenable layer may comprise an azide (polyisoprene composition (Example 9), a gelatine (dichromate composition (Example 10), a diallyl isophthalate prepolymer (Example 12) or an acrylic monomer with an acrylic resin. The cross-linkable composition is a diazonium salt and an acrylic binder (Example 11) which is hardened after exposure and before development by treatment with ammonia fumes (see U.K. Specification 1324548). Layer (a) may contain a dye and layer (b) may contain a V.V. absorber. As developers there are used an aqueous solution of 2-(2-Butoxy) ethanol, actylphenoxyethoxy ethanol and sodium silicate (Example 1), an aqueous solution of isopropyl alcohol and sodium hydroxide (Example 8) and an aqueous solution of sodium borate decahydrate, octylphenoxy ethanol and 2-(2-butoxy ethanol) (Example 10). In example 6 photo-masks prepared from the above described light sensitive elements are used to expose photo-polymers and silver halide films.
FR7202044A 1971-01-21 1972-01-21 Expired FR2122578B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10857771A 1971-01-21 1971-01-21
US20061171A 1971-11-19 1971-11-19

Publications (2)

Publication Number Publication Date
FR2122578A1 true FR2122578A1 (en) 1972-09-01
FR2122578B1 FR2122578B1 (en) 1977-09-02

Family

ID=26806041

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7202044A Expired FR2122578B1 (en) 1971-01-21 1972-01-21

Country Status (6)

Country Link
BE (1) BE778333A (en)
CA (1) CA993709A (en)
DE (1) DE2202360C3 (en)
FR (1) FR2122578B1 (en)
GB (1) GB1385241A (en)
NL (1) NL173790C (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2390755A1 (en) * 1977-05-13 1978-12-08 Hoechst Ag PROCEDURE FOR MASKING ORIGINAL DOCUMENTS TO BE REPRODUCED USING CACES
EP0036221B1 (en) * 1980-02-20 1984-03-14 Agfa-Gevaert N.V. Photosensitive material and a process for reproducing photo-information
EP0225676A2 (en) * 1985-12-09 1987-06-16 Nippon Paint Co., Ltd. Photosensitive resin base printing material
EP0266069A2 (en) * 1986-10-01 1988-05-04 Napp Systems (Usa) Inc. Photopolymerizable composition useful for printing plates
EP0354475A2 (en) * 1988-08-11 1990-02-14 Hoechst Aktiengesellschaft Photopolymerisable image registration material

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623925C2 (en) * 1975-06-03 1985-02-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. Image reproduction process
DE2660103B1 (en) * 1975-11-17 1981-02-12 Du Pont Color correction system for multi-color image reproduction
DE2658422C2 (en) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Method for producing a negative dry resist film
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
JPS5420719A (en) 1977-07-15 1979-02-16 Fuji Photo Film Co Ltd Photosensitive material for image formation and image formation method
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
JPS5962859A (en) * 1982-10-04 1984-04-10 Fuji Photo Film Co Ltd Photoengraving method of photosensitive lithographic printing plate
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
GB8414867D0 (en) * 1984-06-11 1984-07-18 Minnesota Mining & Mfg Pre-press proofing system
DE3618373A1 (en) * 1986-05-31 1987-12-03 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
US6706462B2 (en) 2000-04-18 2004-03-16 Fuji Photo Film Co., Ltd. Photosensitive image-recording material
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1090663A (en) * 1964-06-16 1967-11-15 Du Pont Improvements relating to image reproduction
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1090663A (en) * 1964-06-16 1967-11-15 Du Pont Improvements relating to image reproduction
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
(REVUE US"IBM TECHNICAL DISCLOSURE BULLETIN",VOLUME 13,NO 2,JULY 1970,PAGE 535) *
REVUE US"IBM TECHNICAL DISCLOSURE BULLETIN",VOLUME 13,NO 2,JULY 1970,PAGE 535) *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2390755A1 (en) * 1977-05-13 1978-12-08 Hoechst Ag PROCEDURE FOR MASKING ORIGINAL DOCUMENTS TO BE REPRODUCED USING CACES
EP0036221B1 (en) * 1980-02-20 1984-03-14 Agfa-Gevaert N.V. Photosensitive material and a process for reproducing photo-information
EP0225676A2 (en) * 1985-12-09 1987-06-16 Nippon Paint Co., Ltd. Photosensitive resin base printing material
EP0225676A3 (en) * 1985-12-09 1989-03-15 Nippon Paint Co., Ltd. Photosensitive resin base printing material
EP0266069A2 (en) * 1986-10-01 1988-05-04 Napp Systems (Usa) Inc. Photopolymerizable composition useful for printing plates
EP0266069A3 (en) * 1986-10-01 1988-09-21 Napp Systems (Usa) Inc. Photopolymerizable composition useful for printing plates
EP0354475A2 (en) * 1988-08-11 1990-02-14 Hoechst Aktiengesellschaft Photopolymerisable image registration material
EP0354475A3 (en) * 1988-08-11 1991-03-20 Hoechst Aktiengesellschaft Photopolymerisable image registration material

Also Published As

Publication number Publication date
FR2122578B1 (en) 1977-09-02
DE2202360C3 (en) 1980-04-10
DE2202360B2 (en) 1979-08-02
BE778333A (en) 1972-07-24
NL173790B (en) 1983-10-03
NL173790C (en) 1984-03-01
DE2202360A1 (en) 1973-05-17
CA993709A (en) 1976-07-27
GB1385241A (en) 1975-02-26
NL7200858A (en) 1972-07-25

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Legal Events

Date Code Title Description
ST Notification of lapse
DA Annulment of decision of lapse