GB1385241A - Composite photo-sensitive elements - Google Patents
Composite photo-sensitive elementsInfo
- Publication number
- GB1385241A GB1385241A GB308472A GB308472A GB1385241A GB 1385241 A GB1385241 A GB 1385241A GB 308472 A GB308472 A GB 308472A GB 308472 A GB308472 A GB 308472A GB 1385241 A GB1385241 A GB 1385241A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- photo
- ethanol
- actinic radiation
- cross
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/10—Organic substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
1385241 Photographic material: photomasks E I DU PONT DE NEMOURS & CO 21 Jan 1972 [21 Jan 1971 19 Nov 1971] 3084/72 Headings G2C and G2Y A light sensitive element comprises (a) a layer which is photo-hardenable by actinic radiation or which comprises a cross-linkable composition which undergoes decomposition upon exposure to actinic radiation to leave material in the unexposed areas which cross-links and hardens upon treatment with a basic cross-linking agent; and, in intimate surface contact therewith, (b) a macromolecular organic polymer layer which contains at least one dye or pigment and is essentially opaque to ultraviolet radiation and essentially transparent to visible actinic radiation. The layer (a) may be adherent to a cover sheet and the layer (b) adherent to a support film. The layer (b) which is soluble in the solvent used to develop layer (a) may comprise polystyrene, copolymers of vinylidene chloride and acrylonitrile, polyacrylates and polymethacrylates, polyamides and polyvinyl esters. Numerous examples of dyes and pigments suitable for incorporation into the layer (b) are given. Suitable photo-hardenable compositions are given in the Examples. The element may be used to produce a coloured mask by removing the support film laminating the element to a rigid support with the layer (b) nearest the support, exposing the layer (a) image-wise for actinic radiation, removing the cover sheet and removing the unexposed or exposed areas of the layer (a) and the portion of the layer (b) underlying the unexposed or exposed areas of layer (a). The photo-hardenable layer may comprise an azide (polyisoprene composition (Example 9), a gelatine (dichromate composition (Example 10), a diallyl isophthalate prepolymer (Example 12) or an acrylic monomer with an acrylic resin. The cross-linkable composition is a diazonium salt and an acrylic binder (Example 11) which is hardened after exposure and before development by treatment with ammonia fumes (see U.K. Specification 1324548). Layer (a) may contain a dye and layer (b) may contain a V.V. absorber. As developers there are used an aqueous solution of 2-(2-Butoxy) ethanol, actylphenoxyethoxy ethanol and sodium silicate (Example 1), an aqueous solution of isopropyl alcohol and sodium hydroxide (Example 8) and an aqueous solution of sodium borate decahydrate, octylphenoxy ethanol and 2-(2-butoxy ethanol) (Example 10). In example 6 photo-masks prepared from the above described light sensitive elements are used to expose photo-polymers and silver halide films.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10857771A | 1971-01-21 | 1971-01-21 | |
US20061171A | 1971-11-19 | 1971-11-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1385241A true GB1385241A (en) | 1975-02-26 |
Family
ID=26806041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB308472A Expired GB1385241A (en) | 1971-01-21 | 1972-01-21 | Composite photo-sensitive elements |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE778333A (en) |
CA (1) | CA993709A (en) |
DE (1) | DE2202360C3 (en) |
FR (1) | FR2122578B1 (en) |
GB (1) | GB1385241A (en) |
NL (1) | NL173790C (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4268601A (en) | 1977-07-15 | 1981-05-19 | Fuji Photo Film Co., Ltd. | Photosensitive image forming material and an image forming method using same |
GB2130745A (en) * | 1982-10-04 | 1984-06-06 | Fuji Photo Film Co Ltd | Plate making process for light- sensitive planographic plates |
US4515877A (en) * | 1982-11-27 | 1985-05-07 | Basf Aktiengesellschaft | Image-recording materials and image-recording carried out using these to produce an optical mask |
US4950577A (en) * | 1984-06-11 | 1990-08-21 | Minnesota Mining And Manufacturing Company | Pre-press light-sensitive color proofing article incorporating antihalation layer |
US5922508A (en) * | 1988-08-11 | 1999-07-13 | Agfa-Gevaert Ag | Photopolymerizable recording material |
EP1152294A3 (en) * | 2000-04-18 | 2003-09-17 | Fuji Photo Film Co., Ltd. | Photosensitive image-recording material |
US7678462B2 (en) | 1999-06-10 | 2010-03-16 | Honeywell International, Inc. | Spin-on-glass anti-reflective coatings for photolithography |
US8344088B2 (en) | 2001-11-15 | 2013-01-01 | Honeywell International Inc. | Spin-on anti-reflective coatings for photolithography |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
US9069133B2 (en) | 1999-06-10 | 2015-06-30 | Honeywell International Inc. | Anti-reflective coating for photolithography and methods of preparation thereof |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2660951C2 (en) * | 1975-06-03 | 1986-08-07 | E.I. Du Pont De Nemours And Co., Wilmington, Del. | Multi-layer photosensitive material |
DE2660103B1 (en) * | 1975-11-17 | 1981-02-12 | Du Pont | Color correction system for multi-color image reproduction |
DE2658422C2 (en) * | 1976-12-23 | 1986-05-22 | Hoechst Ag, 6230 Frankfurt | Method for producing a negative dry resist film |
DE2721687C2 (en) * | 1977-05-13 | 1986-11-20 | Hoechst Ag, 6230 Frankfurt | Process for covering master copies with masks |
US4123272A (en) * | 1977-05-17 | 1978-10-31 | E. I. Du Pont De Nemours And Company | Double-negative positive-working photohardenable elements |
US4311784A (en) | 1978-05-09 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive solvent-processable litho element |
EP0036221B1 (en) * | 1980-02-20 | 1984-03-14 | Agfa-Gevaert N.V. | Photosensitive material and a process for reproducing photo-information |
DE3689949T2 (en) * | 1985-12-09 | 1995-03-16 | Nippon Paint Co Ltd | Printing material based on a photosensitive resin. |
DE3618373A1 (en) * | 1986-05-31 | 1987-12-03 | Basf Ag | LIGHT SENSITIVE RECORDING ELEMENT |
EP0266069A3 (en) * | 1986-10-01 | 1988-09-21 | Napp Systems (Usa) Inc. | Photopolymerizable composition useful for printing plates |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3353955A (en) * | 1964-06-16 | 1967-11-21 | Du Pont | Stratum transfer process based on adhesive properties of photopolymerizable layer |
US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
-
1972
- 1972-01-10 CA CA132,089A patent/CA993709A/en not_active Expired
- 1972-01-19 DE DE19722202360 patent/DE2202360C3/en not_active Expired
- 1972-01-21 NL NL7200858A patent/NL173790C/en not_active IP Right Cessation
- 1972-01-21 GB GB308472A patent/GB1385241A/en not_active Expired
- 1972-01-21 BE BE778333A patent/BE778333A/en not_active IP Right Cessation
- 1972-01-21 FR FR7202044A patent/FR2122578B1/fr not_active Expired
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4268601A (en) | 1977-07-15 | 1981-05-19 | Fuji Photo Film Co., Ltd. | Photosensitive image forming material and an image forming method using same |
GB2130745A (en) * | 1982-10-04 | 1984-06-06 | Fuji Photo Film Co Ltd | Plate making process for light- sensitive planographic plates |
US4515877A (en) * | 1982-11-27 | 1985-05-07 | Basf Aktiengesellschaft | Image-recording materials and image-recording carried out using these to produce an optical mask |
US4950577A (en) * | 1984-06-11 | 1990-08-21 | Minnesota Mining And Manufacturing Company | Pre-press light-sensitive color proofing article incorporating antihalation layer |
US5922508A (en) * | 1988-08-11 | 1999-07-13 | Agfa-Gevaert Ag | Photopolymerizable recording material |
US7678462B2 (en) | 1999-06-10 | 2010-03-16 | Honeywell International, Inc. | Spin-on-glass anti-reflective coatings for photolithography |
US9069133B2 (en) | 1999-06-10 | 2015-06-30 | Honeywell International Inc. | Anti-reflective coating for photolithography and methods of preparation thereof |
US6706462B2 (en) | 2000-04-18 | 2004-03-16 | Fuji Photo Film Co., Ltd. | Photosensitive image-recording material |
EP1152294A3 (en) * | 2000-04-18 | 2003-09-17 | Fuji Photo Film Co., Ltd. | Photosensitive image-recording material |
US8344088B2 (en) | 2001-11-15 | 2013-01-01 | Honeywell International Inc. | Spin-on anti-reflective coatings for photolithography |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8784985B2 (en) | 2009-06-10 | 2014-07-22 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
Also Published As
Publication number | Publication date |
---|---|
DE2202360A1 (en) | 1973-05-17 |
NL173790C (en) | 1984-03-01 |
FR2122578A1 (en) | 1972-09-01 |
NL7200858A (en) | 1972-07-25 |
BE778333A (en) | 1972-07-24 |
NL173790B (en) | 1983-10-03 |
DE2202360B2 (en) | 1979-08-02 |
DE2202360C3 (en) | 1980-04-10 |
FR2122578B1 (en) | 1977-09-02 |
CA993709A (en) | 1976-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PE20 | Patent expired after termination of 20 years |