NL173790C - COMPOSITE PHOTOSARDISABLE ELEMENT. - Google Patents
COMPOSITE PHOTOSARDISABLE ELEMENT.Info
- Publication number
- NL173790C NL173790C NL7200858A NL7200858A NL173790C NL 173790 C NL173790 C NL 173790C NL 7200858 A NL7200858 A NL 7200858A NL 7200858 A NL7200858 A NL 7200858A NL 173790 C NL173790 C NL 173790C
- Authority
- NL
- Netherlands
- Prior art keywords
- layer
- photo
- ethanol
- actinic radiation
- cross
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/10—Organic substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Abstract
1385241 Photographic material: photomasks E I DU PONT DE NEMOURS & CO 21 Jan 1972 [21 Jan 1971 19 Nov 1971] 3084/72 Headings G2C and G2Y A light sensitive element comprises (a) a layer which is photo-hardenable by actinic radiation or which comprises a cross-linkable composition which undergoes decomposition upon exposure to actinic radiation to leave material in the unexposed areas which cross-links and hardens upon treatment with a basic cross-linking agent; and, in intimate surface contact therewith, (b) a macromolecular organic polymer layer which contains at least one dye or pigment and is essentially opaque to ultraviolet radiation and essentially transparent to visible actinic radiation. The layer (a) may be adherent to a cover sheet and the layer (b) adherent to a support film. The layer (b) which is soluble in the solvent used to develop layer (a) may comprise polystyrene, copolymers of vinylidene chloride and acrylonitrile, polyacrylates and polymethacrylates, polyamides and polyvinyl esters. Numerous examples of dyes and pigments suitable for incorporation into the layer (b) are given. Suitable photo-hardenable compositions are given in the Examples. The element may be used to produce a coloured mask by removing the support film laminating the element to a rigid support with the layer (b) nearest the support, exposing the layer (a) image-wise for actinic radiation, removing the cover sheet and removing the unexposed or exposed areas of the layer (a) and the portion of the layer (b) underlying the unexposed or exposed areas of layer (a). The photo-hardenable layer may comprise an azide (polyisoprene composition (Example 9), a gelatine (dichromate composition (Example 10), a diallyl isophthalate prepolymer (Example 12) or an acrylic monomer with an acrylic resin. The cross-linkable composition is a diazonium salt and an acrylic binder (Example 11) which is hardened after exposure and before development by treatment with ammonia fumes (see U.K. Specification 1324548). Layer (a) may contain a dye and layer (b) may contain a V.V. absorber. As developers there are used an aqueous solution of 2-(2-Butoxy) ethanol, actylphenoxyethoxy ethanol and sodium silicate (Example 1), an aqueous solution of isopropyl alcohol and sodium hydroxide (Example 8) and an aqueous solution of sodium borate decahydrate, octylphenoxy ethanol and 2-(2-butoxy ethanol) (Example 10). In example 6 photo-masks prepared from the above described light sensitive elements are used to expose photo-polymers and silver halide films.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10857771A | 1971-01-21 | 1971-01-21 | |
US20061171A | 1971-11-19 | 1971-11-19 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7200858A NL7200858A (en) | 1972-07-25 |
NL173790B NL173790B (en) | 1983-10-03 |
NL173790C true NL173790C (en) | 1984-03-01 |
Family
ID=26806041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7200858A NL173790C (en) | 1971-01-21 | 1972-01-21 | COMPOSITE PHOTOSARDISABLE ELEMENT. |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE778333A (en) |
CA (1) | CA993709A (en) |
DE (1) | DE2202360C3 (en) |
FR (1) | FR2122578B1 (en) |
GB (1) | GB1385241A (en) |
NL (1) | NL173790C (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2623925C2 (en) * | 1975-06-03 | 1985-02-14 | E.I. Du Pont De Nemours And Co., Wilmington, Del. | Image reproduction process |
DE2660921C3 (en) * | 1975-11-17 | 1987-07-30 | E.I. Du Pont De Nemours And Co., Wilmington, Del., Us | |
DE2658422C2 (en) * | 1976-12-23 | 1986-05-22 | Hoechst Ag, 6230 Frankfurt | Method for producing a negative dry resist film |
DE2721687C2 (en) * | 1977-05-13 | 1986-11-20 | Hoechst Ag, 6230 Frankfurt | Process for covering master copies with masks |
US4123272A (en) * | 1977-05-17 | 1978-10-31 | E. I. Du Pont De Nemours And Company | Double-negative positive-working photohardenable elements |
JPS5420719A (en) | 1977-07-15 | 1979-02-16 | Fuji Photo Film Co Ltd | Photosensitive material for image formation and image formation method |
US4311784A (en) | 1978-05-09 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive solvent-processable litho element |
EP0036221B1 (en) * | 1980-02-20 | 1984-03-14 | Agfa-Gevaert N.V. | Photosensitive material and a process for reproducing photo-information |
JPS5962859A (en) * | 1982-10-04 | 1984-04-10 | Fuji Photo Film Co Ltd | Photoengraving method of photosensitive lithographic printing plate |
US4515877A (en) * | 1982-11-27 | 1985-05-07 | Basf Aktiengesellschaft | Image-recording materials and image-recording carried out using these to produce an optical mask |
GB8414867D0 (en) * | 1984-06-11 | 1984-07-18 | Minnesota Mining & Mfg | Pre-press proofing system |
ES2060579T3 (en) * | 1985-12-09 | 1994-12-01 | Nippon Paint Co Ltd | PRINTING MATERIAL BASED ON PHOTOSENSITIVE RESIN. |
DE3618373A1 (en) * | 1986-05-31 | 1987-12-03 | Basf Ag | LIGHT SENSITIVE RECORDING ELEMENT |
EP0266069A3 (en) * | 1986-10-01 | 1988-09-21 | Napp Systems (Usa) Inc. | Photopolymerizable composition useful for printing plates |
DE3827245A1 (en) * | 1988-08-11 | 1990-02-15 | Hoechst Ag | PHOTOPOLYMERIZABLE RECORDING MATERIAL |
US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
KR100804873B1 (en) | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | Spin-on-glass anti-reflective coatings for photolithography |
CN1318774A (en) | 2000-04-18 | 2001-10-24 | 富士胶片株式会社 | Photosensitive image recording material |
CN1606713B (en) | 2001-11-15 | 2011-07-06 | 霍尼韦尔国际公司 | Spincoating antireflection paint for photolithography |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3353955A (en) * | 1964-06-16 | 1967-11-21 | Du Pont | Stratum transfer process based on adhesive properties of photopolymerizable layer |
US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
-
1972
- 1972-01-10 CA CA132,089A patent/CA993709A/en not_active Expired
- 1972-01-19 DE DE19722202360 patent/DE2202360C3/en not_active Expired
- 1972-01-21 NL NL7200858A patent/NL173790C/en not_active IP Right Cessation
- 1972-01-21 BE BE778333A patent/BE778333A/en not_active IP Right Cessation
- 1972-01-21 GB GB308472A patent/GB1385241A/en not_active Expired
- 1972-01-21 FR FR7202044A patent/FR2122578B1/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2202360A1 (en) | 1973-05-17 |
NL173790B (en) | 1983-10-03 |
DE2202360B2 (en) | 1979-08-02 |
FR2122578B1 (en) | 1977-09-02 |
CA993709A (en) | 1976-07-27 |
FR2122578A1 (en) | 1972-09-01 |
GB1385241A (en) | 1975-02-26 |
BE778333A (en) | 1972-07-24 |
DE2202360C3 (en) | 1980-04-10 |
NL7200858A (en) | 1972-07-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2122578B1 (en) | ||
US4410621A (en) | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan | |
US3729313A (en) | Novel photosensitive systems comprising diaryliodonium compounds and their use | |
US3595658A (en) | Non-silver direct positive dye bleachout system using polymethine dyes and colored activators | |
US3152904A (en) | Print-out process and image reproduction sheet therefor | |
US3536489A (en) | Heterocyclic iminoaromatic-halogen containing photoinitiator light sensitive compositions | |
US3215529A (en) | Color photographic material | |
US4234673A (en) | Manufacture of signs using photoimaging and heat transfer | |
USRE27922E (en) | Image-forming elements containing cross- linkable polymer compositions and processes for their use | |
US3282692A (en) | Photocrosslinkable material and method of copying | |
US3228768A (en) | Process of diffusion printing and a structure for use therein | |
US4310615A (en) | Image transfer element having release layer | |
GB1297171A (en) | ||
US3615565A (en) | Photosensitive article and method of using same incorporating leuco dye precursors and quinone activators | |
GB637857A (en) | Improvements in or relating to photographic processes | |
US2687949A (en) | Method and material for making overlay mask | |
US3730734A (en) | Light-sensitive photopolymerizable material containing photochromic material | |
US3328167A (en) | Copy-paper | |
GB1413583A (en) | Presensitised light-sensitive material | |
UST867012I4 (en) | Printing plates and method of preparing same | |
US3615566A (en) | Photosensitive article and method of using same incorporating leuco dye precursors and fluorescein activators | |
GB1191659A (en) | Photographic Process of making Colored Reproductions | |
US3669667A (en) | Preventing speed loss in oxygen sensitive photo-resist layers | |
US3699025A (en) | Process for radiation cross-linking utilizing n-heterocyclic compounds with cleavable oxy substituents | |
GB1160694A (en) | Photographic Recording Methods and Materials |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
V1 | Lapsed because of non-payment of the annual fee |