NL173790C - Samengesteld fotohardbaar element. - Google Patents

Samengesteld fotohardbaar element.

Info

Publication number
NL173790C
NL173790C NL7200858A NL7200858A NL173790C NL 173790 C NL173790 C NL 173790C NL 7200858 A NL7200858 A NL 7200858A NL 7200858 A NL7200858 A NL 7200858A NL 173790 C NL173790 C NL 173790C
Authority
NL
Netherlands
Prior art keywords
layer
photo
ethanol
actinic radiation
cross
Prior art date
Application number
NL7200858A
Other languages
English (en)
Dutch (nl)
Other versions
NL173790B (nl
NL7200858A (nl
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of NL7200858A publication Critical patent/NL7200858A/xx
Publication of NL173790B publication Critical patent/NL173790B/xx
Application granted granted Critical
Publication of NL173790C publication Critical patent/NL173790C/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/10—Organic substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
NL7200858A 1971-01-21 1972-01-21 Samengesteld fotohardbaar element. NL173790C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10857771A 1971-01-21 1971-01-21
US20061171A 1971-11-19 1971-11-19

Publications (3)

Publication Number Publication Date
NL7200858A NL7200858A (nl) 1972-07-25
NL173790B NL173790B (nl) 1983-10-03
NL173790C true NL173790C (nl) 1984-03-01

Family

ID=26806041

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7200858A NL173790C (nl) 1971-01-21 1972-01-21 Samengesteld fotohardbaar element.

Country Status (6)

Country Link
BE (1) BE778333A (xx)
CA (1) CA993709A (xx)
DE (1) DE2202360C3 (xx)
FR (1) FR2122578B1 (xx)
GB (1) GB1385241A (xx)
NL (1) NL173790C (xx)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623925C2 (de) * 1975-06-03 1985-02-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. Bildreproduktionsverfahren
DE2660103B1 (de) * 1975-11-17 1981-02-12 Du Pont Farbkorrektursystem fuer die Mehrfarbenbildreproduktion
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
DE2721687C2 (de) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Verfahren zum Abdecken von Kopiervorlagen mit Masken
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
JPS5420719A (en) 1977-07-15 1979-02-16 Fuji Photo Film Co Ltd Photosensitive material for image formation and image formation method
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
DE3162554D1 (en) * 1980-02-20 1984-04-19 Agfa Gevaert Nv Photosensitive material and a process for reproducing photo-information
JPS5962859A (ja) * 1982-10-04 1984-04-10 Fuji Photo Film Co Ltd 感光性平版印刷版の製版方法
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
GB8414867D0 (en) * 1984-06-11 1984-07-18 Minnesota Mining & Mfg Pre-press proofing system
EP0225676B1 (en) * 1985-12-09 1994-07-06 Nippon Paint Co., Ltd. Photosensitive resin base printing material
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
EP0266069A3 (en) * 1986-10-01 1988-09-21 Napp Systems (Usa) Inc. Photopolymerizable composition useful for printing plates
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
EP1190277B1 (en) 1999-06-10 2009-10-07 AlliedSignal Inc. Semiconductor having spin-on-glass anti-reflective coatings for photolithography
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
EP1152294B1 (en) * 2000-04-18 2012-06-13 FUJIFILM Corporation Photosensitive image-recording material
KR20040066124A (ko) 2001-11-15 2004-07-23 허니웰 인터내셔널 인코포레이티드 포토리소그라피용 스핀온 반사 방지 피막
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
NL173790B (nl) 1983-10-03
FR2122578B1 (xx) 1977-09-02
DE2202360B2 (de) 1979-08-02
BE778333A (fr) 1972-07-24
DE2202360C3 (de) 1980-04-10
FR2122578A1 (xx) 1972-09-01
NL7200858A (nl) 1972-07-25
DE2202360A1 (de) 1973-05-17
GB1385241A (en) 1975-02-26
CA993709A (en) 1976-07-27

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Legal Events

Date Code Title Description
BB A search report has been drawn up
BC A request for examination has been filed
V1 Lapsed because of non-payment of the annual fee