FR2121405A1 - Integrated circuit with resistor(s) - applied without attacking silicon substrate with resistor-trimming etchant - Google Patents
Integrated circuit with resistor(s) - applied without attacking silicon substrate with resistor-trimming etchantInfo
- Publication number
- FR2121405A1 FR2121405A1 FR7100650A FR7100650A FR2121405A1 FR 2121405 A1 FR2121405 A1 FR 2121405A1 FR 7100650 A FR7100650 A FR 7100650A FR 7100650 A FR7100650 A FR 7100650A FR 2121405 A1 FR2121405 A1 FR 2121405A1
- Authority
- FR
- France
- Prior art keywords
- resistor
- layer
- sio2
- integrated circuit
- resistive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P10/00—Bonding of wafers, substrates or parts of devices
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7100650A FR2121405A1 (en) | 1971-01-11 | 1971-01-11 | Integrated circuit with resistor(s) - applied without attacking silicon substrate with resistor-trimming etchant |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7100650A FR2121405A1 (en) | 1971-01-11 | 1971-01-11 | Integrated circuit with resistor(s) - applied without attacking silicon substrate with resistor-trimming etchant |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2121405A1 true FR2121405A1 (en) | 1972-08-25 |
| FR2121405B1 FR2121405B1 (https=) | 1973-11-30 |
Family
ID=9070057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7100650A Granted FR2121405A1 (en) | 1971-01-11 | 1971-01-11 | Integrated circuit with resistor(s) - applied without attacking silicon substrate with resistor-trimming etchant |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2121405A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3067485A (en) * | 1958-08-13 | 1962-12-11 | Bell Telephone Labor Inc | Semiconductor diode |
| FR1507098A (fr) * | 1966-01-03 | 1967-12-22 | Texas Instruments Inc | Procédé de stabilisation de dispositifs semi-conducteurs et dispositifs semiconducteurs obtenus |
| FR1561857A (https=) * | 1966-11-07 | 1969-03-28 |
-
1971
- 1971-01-11 FR FR7100650A patent/FR2121405A1/fr active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3067485A (en) * | 1958-08-13 | 1962-12-11 | Bell Telephone Labor Inc | Semiconductor diode |
| FR1507098A (fr) * | 1966-01-03 | 1967-12-22 | Texas Instruments Inc | Procédé de stabilisation de dispositifs semi-conducteurs et dispositifs semiconducteurs obtenus |
| FR1561857A (https=) * | 1966-11-07 | 1969-03-28 |
Non-Patent Citations (3)
| Title |
|---|
| (REVUE AMERICAINE SCP AND SOLID STATE TECHNOLOGY VOL.9,JANVIER 1966"THERMAL GROWTH AND CHEMICAL ETCHING OF SILICON DIOXIDE FILMS"CHAO CHENMAI ET AL PAGES 19-24) * |
| ETCHING OF SILICON DIOXIDE FILMS"CHAO CHENMAI ET AL PAGES 19-24) * |
| REVUE AMERICAINE SCP AND SOLID STATE TECHNOLOGY VOL.9,JANVIER 1966"THERMAL GROWTH AND CHEMICAL * |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2121405B1 (https=) | 1973-11-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS56114319A (en) | Method for forming contact hole | |
| GB1418278A (en) | Integrated circuit devices | |
| US4075367A (en) | Semiconductor processing of silicon nitride | |
| US3692574A (en) | Method of forming seeding sites on a semiconductor substrate | |
| US3537921A (en) | Selective hydrofluoric acid etching and subsequent processing | |
| FR2121405A1 (en) | Integrated circuit with resistor(s) - applied without attacking silicon substrate with resistor-trimming etchant | |
| US3649503A (en) | Sputter etch mask | |
| US3832230A (en) | Method for improving glass adherence to gold film | |
| US3592707A (en) | Precision masking using silicon nitride and silicon oxide | |
| JPS5664453A (en) | Manufacture of semiconductor device | |
| JPS57204165A (en) | Manufacture of charge coupling element | |
| GB1092740A (en) | A method of masking the surface of a substrate | |
| US3658610A (en) | Manufacturing method of semiconductor device | |
| JPS5763842A (en) | Preparation of semiconductor integrated circuit | |
| JPS6359531B2 (https=) | ||
| JPS5715423A (en) | Manufacture of semiconductor device | |
| KR910006544B1 (ko) | 접속창 형성방법 | |
| JPS56125856A (en) | Manufacture of semiconductor device | |
| JPS57206071A (en) | Semiconductor device and manufacture thereof | |
| FR2149384A1 (en) | Semiconductor component prodn - with automatic precision mask location esp for fets | |
| JPS551157A (en) | Method of fabricating semiconductor device | |
| GB1512029A (en) | Formation of thin layer patterns on a substrate | |
| JPS57202754A (en) | Manufacture of semiconductor device | |
| JPS5533084A (en) | Method of fabricating semiconductor device | |
| JPS5478668A (en) | Manufacture of semiconductor device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |