FR1134857A - Plaque diazotype positive pour impression offset et procédé pour sa préparation - Google Patents

Plaque diazotype positive pour impression offset et procédé pour sa préparation

Info

Publication number
FR1134857A
FR1134857A FR1134857DA FR1134857A FR 1134857 A FR1134857 A FR 1134857A FR 1134857D A FR1134857D A FR 1134857DA FR 1134857 A FR1134857 A FR 1134857A
Authority
FR
France
Prior art keywords
preparation
plate
offset printing
diazotype
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Chemicals Corp
Original Assignee
General Aniline and Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Aniline and Film Corp filed Critical General Aniline and Film Corp
Application granted granted Critical
Publication of FR1134857A publication Critical patent/FR1134857A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR1134857D 1954-08-20 1955-07-20 Plaque diazotype positive pour impression offset et procédé pour sa préparation Expired FR1134857A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451271A US2772972A (en) 1954-08-20 1954-08-20 Positive diazotype printing plates

Publications (1)

Publication Number Publication Date
FR1134857A true FR1134857A (fr) 1957-04-18

Family

ID=23791529

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1134857D Expired FR1134857A (fr) 1954-08-20 1955-07-20 Plaque diazotype positive pour impression offset et procédé pour sa préparation

Country Status (7)

Country Link
US (1) US2772972A (de)
BE (1) BE540225A (de)
CH (1) CH347712A (de)
DE (1) DE1108079B (de)
FR (1) FR1134857A (de)
GB (1) GB784001A (de)
NL (2) NL199728A (de)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE507657A (de) * 1950-12-06
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
DE1095665B (de) * 1959-01-12 1960-12-22 Hans Hoerner Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
US3095301A (en) * 1959-04-06 1963-06-25 Gen Aniline & Film Corp Electrophotographic element
US3173788A (en) * 1960-02-10 1965-03-16 Gen Aniline & Film Corp Developing positive working photolitho-graphic printing plates containing diazo oxides
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE612386A (de) * 1961-01-09
BE620660A (de) * 1961-07-28
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3486450A (en) * 1964-02-27 1969-12-30 Eastman Kodak Co Color proofing system
DE1472771A1 (de) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Verfahren zur Herstellung von masshaltigen photographischen Filmen
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
NL136645C (de) * 1966-12-12
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS521663B2 (de) * 1973-02-10 1977-01-17
JPS5421089B2 (de) * 1973-05-29 1979-07-27
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
GB2036993B (en) * 1978-02-06 1983-03-09 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
EP0288533A4 (de) * 1986-10-20 1989-02-06 Macdermid Inc Bildumkehrsystem und -verfahren.
EP0280197A3 (de) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Verfahren zur Herstellung einer Photolackstruktur
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3522923B2 (ja) 1995-10-23 2004-04-26 富士写真フイルム株式会社 ハロゲン化銀感光材料
ATE183136T1 (de) 1996-04-23 1999-08-15 Kodak Polychrome Graphics Co Vorläufer einer lithographischen druckform und ihre verwendung bei der bebilderung durch wärme
TW502135B (en) * 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
EP0852341B1 (de) 1997-01-03 2001-08-29 Sumitomo Bakelite Company Limited Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
BR9810668A (pt) 1997-07-05 2001-09-04 Kodak Polychrome Graphics Co Processos para formação de moldes e materiais sensìveis a radiação
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
DE60142844D1 (de) * 2000-10-31 2010-09-30 Intel Corp Positive lichtempfindliche harzzusammensetzung, prozess zu ihrer herstellung und halbleiterbauelemente
KR100770822B1 (ko) * 2004-01-20 2007-10-26 아사히 가세이 일렉트로닉스 가부시끼가이샤 수지 및 수지 조성물
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
US7687208B2 (en) 2006-08-15 2010-03-30 Asahi Kasei Emd Corporation Positive photosensitive resin composition
JP6271105B1 (ja) 2016-03-31 2018-01-31 旭化成株式会社 感光性樹脂組成物、硬化レリーフパターンの製造方法及び半導体装置
CN112142613B (zh) * 2020-09-22 2021-06-25 江南大学 一种松香基小分子有机凝胶剂及其形成的环己烷凝胶

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE525534C (de) * 1930-07-09 1931-05-26 Klimsch & Co Verfahren zum Entwickeln von Chromat-Schellackkopien
BE416158A (de) * 1935-01-12
DE699462C (de) * 1936-02-15 1940-11-29 Kodak Akt Ges Photographischer Film mit Haftschicht fuer die lichtempfindliche Emulsion
DE754015C (de) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Lichtempfindliche Schicht zur Herstellung von Druckformen
DE862956C (de) * 1941-10-30 1953-01-15 Basf Ag Verfahren zur Herstellung von Mischpolymerisaten
BE476486A (de) * 1947-05-09
NL70798C (de) * 1948-10-15
DE907739C (de) * 1949-07-23 1954-02-18 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares lichtempfindliches Material
DE960335C (de) * 1951-06-07 1957-03-21 Kalle & Co Ag Lichtempfindliches Material
DE904733C (de) * 1951-09-29 1954-02-22 Johannes Herzog & Co Photochem Lichtempfindliches Material fuer die Herstellung von Quellreliefs fuer Druckzwecke und Verfahren zum Drucken mit den Reliefs
BE523231A (de) * 1953-05-22

Also Published As

Publication number Publication date
GB784001A (en) 1957-10-02
CH347712A (de) 1960-07-15
US2772972A (en) 1956-12-04
DE1108079B (de) 1961-05-31
BE540225A (de)
NL95407C (de)
NL199728A (de)

Similar Documents

Publication Publication Date Title
FR1134857A (fr) Plaque diazotype positive pour impression offset et procédé pour sa préparation
FR1269595A (fr) Plaque d'impression présensibilisée et procédé pour sa préparation
FR1213747A (fr) Procédé pour la production de clichés d'impression
FR1119726A (fr) Procédé d'impression xérographique
FR1204734A (fr) Procédé d'impression électrostatique
FR1329398A (fr) Plaque lithographique photosensible et procédé pour sa préparation
FR1125519A (fr) Procédé pour la production de formes d'impression
FR71021E (fr) Procédé et composition de développement pour plaques d'impression
FR1515292A (fr) Cliché pour impressions offset, procédé et composition pour sa préparation
FR1175156A (fr) Procédé et appareillage pour impression sur toutes sortes de surfaces
FR1119536A (fr) Procédé pour la préparation de formes d'impression et matériel photosensible approprié
FR1121458A (fr) Procédé pour la production photomécanique de formes d'impression
FR1139624A (fr) Procédé d'impression offset et dispositif pour sa mise en oeuvre
FR1203842A (fr) Cliché photolithographique, et procédé pour sa préparation
FR1122275A (fr) Procédé d'impression électrostatique
FR1113933A (fr) Procédé d'impression électrostatique
CH334346A (fr) Procédé de fabrication de plaques d'impression et notamment de plaques pour l'impression offset
FR1107873A (fr) Chlorhydrate de phényl-éthyl-acétyl-choline et procédé pour sa préparation
FR1401186A (fr) Plaque pour impression lithographique et procédé pour sa fabrication
FR1141400A (fr) Mécanisme d'impression commandé par enregistrement
FR1375093A (fr) Procédé d'impression typographique
FR77556E (fr) Procédé pour la production de clichées d'impression
FR1292434A (fr) Clichés d'impression et procédé pour leur production
FR1185300A (fr) Margeur pour machines d'impression et de reproduction
FR84042E (fr) Procédé pour la production de clichés d'impression