FI72961C - Icke iriserande glasstrukturer. - Google Patents
Icke iriserande glasstrukturer. Download PDFInfo
- Publication number
- FI72961C FI72961C FI823162A FI823162A FI72961C FI 72961 C FI72961 C FI 72961C FI 823162 A FI823162 A FI 823162A FI 823162 A FI823162 A FI 823162A FI 72961 C FI72961 C FI 72961C
- Authority
- FI
- Finland
- Prior art keywords
- refractive index
- intermediate layer
- substrate
- interlayer
- coating
- Prior art date
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- 239000010410 layer Substances 0.000 claims description 105
- 238000000576 coating method Methods 0.000 claims description 89
- 239000011248 coating agent Substances 0.000 claims description 66
- 239000011229 interlayer Substances 0.000 claims description 37
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 27
- 229910001887 tin oxide Inorganic materials 0.000 claims description 27
- 230000003287 optical effect Effects 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 21
- 239000004065 semiconductor Substances 0.000 claims description 20
- 239000007789 gas Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 230000000694 effects Effects 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 2
- -1 bromofluoromethane compound Chemical class 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 239000012799 electrically-conductive coating Substances 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000011521 glass Substances 0.000 description 45
- 239000010408 film Substances 0.000 description 29
- 239000003086 colorant Substances 0.000 description 13
- 238000005229 chemical vapour deposition Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 229910003437 indium oxide Inorganic materials 0.000 description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910016569 AlF 3 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 241000282887 Suidae Species 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- JPUHCPXFQIXLMW-UHFFFAOYSA-N aluminium triethoxide Chemical compound CCO[Al](OCC)OCC JPUHCPXFQIXLMW-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- RJCQBQGAPKAMLL-UHFFFAOYSA-N bromotrifluoromethane Chemical compound FC(F)(F)Br RJCQBQGAPKAMLL-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910001610 cryolite Inorganic materials 0.000 description 1
- 238000004042 decolorization Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- UTUAUBOPWUPBCH-UHFFFAOYSA-N dimethylsilylidene(dimethyl)silane Chemical compound C[Si](C)=[Si](C)C UTUAUBOPWUPBCH-UHFFFAOYSA-N 0.000 description 1
- AXAZMDOAUQTMOW-UHFFFAOYSA-N dimethylzinc Chemical compound C[Zn]C AXAZMDOAUQTMOW-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 125000001590 germanediyl group Chemical group [H][Ge]([H])(*)* 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 239000004447 silicone coating Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- VIPCDVWYAADTGR-UHFFFAOYSA-N trimethyl(methylsilyl)silane Chemical compound C[SiH2][Si](C)(C)C VIPCDVWYAADTGR-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- XDWXRAYGALQIFG-UHFFFAOYSA-L zinc;propanoate Chemical compound [Zn+2].CCC([O-])=O.CCC([O-])=O XDWXRAYGALQIFG-UHFFFAOYSA-L 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/261—In terms of molecular thickness or light wave length
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Claims (17)
1. Förfarande för framställning av en icke irise-rande, transparent struktur av en typ som omfattar 5 a) ett transparent underlag, b) en infrarött ljus reflekterande beläggning pä underla-get, och c) ett irisering undertryckande mellanskikt mellan under-laget och den infrarött ljus reflekterande beläggningen, 10 kännetecknat därav, att mellan den infrarött ljus reflekterande beläggningen och det transparenta un-derlaget utformas ett mellanskikt genom att man 1. närmast underlaget anbringar en första mellanskiktkom-ponent av ett material med relativt hög brytningsindex; 15 2) över materialet med relativt hög brytningsindex an bringar en andra mellanskiktkomponent av ett material med relativt lag brytningsindex, och 3. avslutar anbringandet av de nämnda tvä mellanskiktkom-ponenterna vid en sadan tjocklek, att de kombinerade mel- 20 lanskiktkomponenterna bildar det nämnda iriseringen undertryckande skiktet, och att totala optiska tjockleken av mellanskiktkomponenterna är ca 1/6 av väglängden 500 nm.
2. Förfarande enligt patentkravet 1, kännetecknat därav, att den infrafött ljus reflekteran- 25 de beläggningen och den första mellanskiktkomponenten har ungefär samma brytningsindex och att bade den infrarött ljus reflekterande beläggningen och den första mellanskiktkomponenten bestär företrädesvis av tennoxidbaserade be-läggningar. 30
3. Förfarande enligt patentkravet 1, känne tecknat därav, att den första mellanskiktkomponenten har en brytningsindex som är väsentligen högre än bryt-ningsindexen hos den infrarött ljus reflekterande beläggningen, eller har en brytningsindex som är väsentligen läg- 35 re än brytningsindexen hos den infrarött ljus reflekteran- 27 729 61 de beläggningen.
4. Förfarande enligt patentkravet 1, kanne- t e c k n a t därav, att brytningsindexen hos näinnda mel-lanskiktkomponenter ligger mellan brytningsindexen hos un-5 derlaget och den infrarött ljus reflekterande beläggningen.
5. Förfarande enligt patentkravet 1, kanne- t e c k n a t därav, att optiska tjockleken d^ hos mellan-skiktkomponenten som ligger närmare underlaget är ca 1Q (1 /720) cos V(r-|2 + ~ r32) /2r-|r 2 7 f och att optiska tjockleken d2 hos mellanskiktkomponenten som ligger närmare den infrarött ljus reflekterande beläggningen är ca 15 (1 /720) cos 1/(r22 + r32 - r^2) / 2r2r för en väglängd av 500 nm, varvid r1 = K - ng) / (n.| + ng) r2 = (n1 - n2)/(n1 + n2) r3 = (nc " n2)/(nc + V 20 och väri ng = underlagets brytningsindex n^ = brytningsindexet hos mellanskiktkomponenten som ligger närmare underlaget n2 = brytningsindexen hos mellanskiktkomponenten som lig-25 ger närmare den funktionella halvledarbeläggningen, och nc = brytningsindexet hos den infrarött ljus reflekterande beläggningen.
6. Förfarande enligt patentkravet 1, 2, 3, 4 eller 5, kännetecknat därav, att de nämnda bryt- 30 ningsindexen och de optiska tjocklekarna pä underlaget, mellanskiktkomponenterna och den infrarött ljus reflekte-randa beläggningen väljs sä, att det bildas ett färgmätt.-ningsvärde under ca 12, företrädesvis under ca 8.
7. Förfarande enligt patentkravet 1, k ä n n e -35 tecknat därav, att den första mellanskiktkomponenten är ett tennoxidskikt med en maximitjocklek av ca 1/6 28 72961 av en väglängd, och att förfarandet omfattar ett steg, väri en kvantitet av en fluorhaltig gas tillsätts i en belägg-ningsblandning, vilken innehäller en organotennförening och syre, för ökande av utfällningshastigheten hos tenn-5 oxiden.
8. Förfarandet enligt patentkravet 7, kanne-t e c k n a t därav, att den fluorhaltiga gasen är en bromfluormetanförening.
9. Förfarande för framställning av en icke irise-10 rande, transparent struktur av en typ som omfattar a) ett transparent underlag, b) en elektriskt ledande beläggning pä underlaget, och c) ett irisering undertryckande mellanskikt mellan underlaget och den ledande beläggningen, 15 kännetecknat därav, att mellan den ledande beläggningen och det transparenta underlaget bildas ett mellanskikt, som bestär bara av tvä komponenter, genom att man 1. närmast underlaget anbringar en första mellanskiktkom-ponent av ett material med relativt hög brytningsindex; 20 2) över materialet med relativt hög brytningsindex an bringar en andra mellanskiktkomponent av ett material med relativt lag brytningsindex, och 3. avslutar anbringandet av vardera mellanskiktkomponen-ten vid en sadan tjocklek, att de kombinerade mellanskikt-25 komponenterna bildar det nämnda iriseringen undertryckande skiktet, varvid totala optiska tjockleken av mellan-skiktkomponenterna är ca 1/6 av väglängden 500 nm.
10. Icke iriserande, transparent plattastruktur av en typ som omfattar 30 a) ett transparent underlag, b) en infrarött ljus reflekterande beläggning och c) ett irisering undertryckande mellanskikt mellan underlaget och den infrarött ljus reflekterande beläggningen, kännetecknad därav, att nämnda struktur om- 35 fattar mellan den infrarött ljus reflekterande belägg ningen och det transparenta underlaget ett mellanskikt 29 72961 som bestar av 1. en första mellanskiktkomponent, vilken ligger närmast underlaget och bestär av ett material med relativt hog brytningsindex; 5 2) en andra mellanskiktkomponent, vilken ligger over ma- terialet med relativt hög brytningsindex och bestär av ett material med relativt lag brytningsindex, varvid 3) de kombinerade mellanskiktkomponenterna, vilka bildar det iriseringen undertryckande skiktet, har en total optisk 10 tjocklek av ca 1/6 av väglängden 500 nm.
11. Struktur enligt patentkravet 10, känne-t e c k n a d därav, att den infrarött ljus reflekteran-de beläggningen och den första mellanskiktkomponenten har ungefär samma brytningsindex och att bade den infrarött 15 ljus reflekterande beläggningen och den första mellanskiktkomponenten bestär företrädesvis av pä tennoxid baserade beläggningar.
12. Struktur enligt patentkravet 10, känne-t e c k n a d därav, att den första mellanskiktkomponen- 20 ten har .en brytningsindex som är väsentligen högre än brytningsindexen hos den infrarött ljus reflekterande beläggningen, eller har en brytningsindex som är väsentligen lägre än brytningsindexen hos den infrarött ljus reflekte-rande beläggningen.
13. Struktur enligt patentkravet 10, känne- t e c k n a d därav, att brytningsindexen hos nämnda mel-lanskiktkomponenter ligger mellan brytningsindexen hos un-derlaget och den infrarött ljus reflekterande beläggningen.
14. Struktur enligt patentkravet 10, känne-30 tecknad därav, att optiska tjockleken d1 hos mellanskiktkomponenten som ligger närmare underlaget är ca (1/720) cos"1/(r^2 + r * - r/) /2r^2J, och att optiska tjockleken d2 hos mellanskiktkomponenten 35 som ligger närmare den infrarött ljus reflekterande be- 72961 läggningen är ca (1/720) cos_1/(r22 + r32 - r^) / , för en väglängd av 500 nm, varvid 5 r1 = (n1 " ng)/(n1 + V r2 = (n^ - n2)/(n1 + n2) r, = (n„ - n„)/(n + n~) ooh väri n^ = underlagets brytingsindex 10 ni = brytningsindexen hos mellanskiktkomponenten som lig-ger närmare underlaget n2 = brytningsindexen hos mellanskiktkomponenten som lig-ger närmare den funktionella halvledarbeläggningen, och nc = brytningsindexen hos den infrarött ljus reflekteran-15 de beläggningen.
15. Struktur enligt patentkravet 10, 11, 12, 13 el-ler 14, kännetecknad därav, att de nämnda brytningsindexen och de optiska tjocklekarna hos underlaget, mellanskiktkomponenterna och den infrarött ljus ref- 20 lekterande beläggningen väljs sä, att det bildas ett färg-mättningsvärde under ca 12, företrädesvis under ca 8.
16. Sturktur enligt patentkravet 10, 11, 12, 13 el-ler 14, kännetecknad därav, att den är fri frän eventuella metalliska eller färgade komponenter, vil- 25 ka primärt fungerar för absorbering av synligt ljus.
17. Icke iriserande, transparent plattastruktur av en typ som omfattar a) ett transparent underlag, b) en elektriskt ledande beläggning, och 30 c) ett irisering undetryckande mellanskikt mellan den elektriskt ledande beläggningen och det transparenta underlaget, kännetecknad därav, att nämnda struktur omfattar mellan den elektriskt ledande beläggningen och det transparenta underlaget ett mellanskikt, 35 som bestär bara av tvä komponenter
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/302,216 US4377613A (en) | 1981-09-14 | 1981-09-14 | Non-iridescent glass structures |
| US30221681 | 1981-09-14 |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| FI823162A0 FI823162A0 (fi) | 1982-09-13 |
| FI823162L FI823162L (fi) | 1983-03-15 |
| FI72961B FI72961B (fi) | 1987-04-30 |
| FI72961C true FI72961C (sv) | 1987-08-10 |
Family
ID=23166797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI823162A FI72961C (sv) | 1981-09-14 | 1982-09-13 | Icke iriserande glasstrukturer. |
Country Status (20)
| Country | Link |
|---|---|
| US (1) | US4377613A (sv) |
| JP (1) | JPS58501466A (sv) |
| AR (1) | AR228680A1 (sv) |
| AU (1) | AU560433B2 (sv) |
| BE (1) | BE894383A (sv) |
| BR (1) | BR8207855A (sv) |
| CA (1) | CA1192773A (sv) |
| CH (1) | CH656116A5 (sv) |
| DE (1) | DE3249017T1 (sv) |
| DK (1) | DK159876C (sv) |
| ES (1) | ES515680A0 (sv) |
| FI (1) | FI72961C (sv) |
| FR (1) | FR2512967B1 (sv) |
| GB (1) | GB2115315B (sv) |
| IE (1) | IE53556B1 (sv) |
| IT (1) | IT1201923B (sv) |
| MX (1) | MX159622A (sv) |
| NL (1) | NL193404C (sv) |
| NO (1) | NO153766C (sv) |
| WO (1) | WO1983001018A1 (sv) |
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| KR101805211B1 (ko) | 2009-09-02 | 2017-12-05 | 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 게르마늄 함유 막 침착을 위한 디할라이드 게르마늄(ⅱ) 전구체 |
| KR20120123126A (ko) | 2010-02-03 | 2012-11-07 | 레르 리키드 쏘시에떼 아노님 뿌르 레？드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 박막 증착용 칼코게나이드-함유 전구체, 그의 제조 방법 및 사용 방법 |
| WO2012051294A2 (en) | 2010-10-12 | 2012-04-19 | Gentex Corporation | Clear bezel |
| US9957194B2 (en) | 2011-03-30 | 2018-05-01 | Pilkington Group Limited | Coated tinted glass article and method of making same |
| BE1019988A3 (fr) | 2011-05-24 | 2013-03-05 | Agc Glass Europe | Substrat verrier transparent portant un revetement de couches successives. |
| US20150122319A1 (en) * | 2011-07-28 | 2015-05-07 | David A. Strickler | Apcvd of doped titanium oxide and the coated article made thereby |
| US8885240B2 (en) | 2011-08-04 | 2014-11-11 | Gentex Corporation | Rearview assembly for a vehicle |
| KR20140085461A (ko) | 2011-09-27 | 2014-07-07 | 레르 리키드 쏘시에떼 아노님 뿌르 레？드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 니켈 비스 디아자부타디엔 전구체, 그들의 합성, 및 니켈 함유 필름 침착을 위한 그들의 용도 |
| PL3008025T3 (pl) | 2013-06-10 | 2021-12-06 | Agc Glass Europe | Podłoże szklane o niskiej emisyjności |
| US10273573B2 (en) | 2015-12-11 | 2019-04-30 | Cardinal Cg Company | Method of coating both sides of a substrate using a sacrificial coating |
| US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
| US11892771B2 (en) * | 2020-04-20 | 2024-02-06 | Applied Materials, Inc. | Methods for increasing the density of high-index nanoimprint lithography films |
| CN117957342A (zh) | 2021-08-26 | 2024-04-30 | 皮尔金顿集团有限公司 | 制造涂覆玻璃制品的方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3710074A (en) * | 1970-10-08 | 1973-01-09 | Ppg Industries Inc | Electrically heated multiple glazed window having an iridescence masking film |
| US3677814A (en) * | 1970-10-26 | 1972-07-18 | Ppg Industries Inc | Process for forming electroconductive tin oxide films by pyrolyzation of alkyl and aryl tin fluorides |
| US4069630A (en) * | 1976-03-31 | 1978-01-24 | Ppg Industries, Inc. | Heat reflecting window |
| DE2646513C2 (de) * | 1976-10-15 | 1984-10-04 | Bfg Glassgroup, Paris | Verfahren zur Herstellung einer wärmereflektierenden Natron-Kalk-Silikatglasscheibe |
| US4146657A (en) * | 1976-11-01 | 1979-03-27 | Gordon Roy G | Method of depositing electrically conductive, infra-red reflective, transparent coatings of stannic oxide |
| US4206252A (en) * | 1977-04-04 | 1980-06-03 | Gordon Roy G | Deposition method for coating glass and the like |
| US4308316A (en) * | 1977-04-04 | 1981-12-29 | Gordon Roy G | Non-iridescent glass structures |
| US4187336A (en) * | 1977-04-04 | 1980-02-05 | Gordon Roy G | Non-iridescent glass structures |
| FR2439167A1 (fr) * | 1978-10-20 | 1980-05-16 | Gordon Roy Gerald | Verres couches non irises |
| FR2439240A1 (fr) * | 1978-10-20 | 1980-05-16 | Gordon Roy Gerald | Procede pour produire des pellicules transparentes d'oxyde stannique sur un substrat chauffe, leur utilisation pour fabriquer des produits comportant une telle pellicule et appareil pour la mise en oeuvre de ce procede |
| US4216259A (en) * | 1979-01-02 | 1980-08-05 | Bfg Glassgroup | Heat reflecting pane and a method of producing it |
-
1981
- 1981-09-14 US US06/302,216 patent/US4377613A/en not_active Expired - Lifetime
-
1982
- 1982-09-03 AU AU88010/82A patent/AU560433B2/en not_active Ceased
- 1982-09-09 CH CH2717/83A patent/CH656116A5/fr not_active IP Right Cessation
- 1982-09-09 NL NL8220335A patent/NL193404C/nl not_active IP Right Cessation
- 1982-09-09 GB GB08311441A patent/GB2115315B/en not_active Expired
- 1982-09-09 BR BR8207855A patent/BR8207855A/pt not_active IP Right Cessation
- 1982-09-09 JP JP57502868A patent/JPS58501466A/ja active Granted
- 1982-09-09 DE DE823249017T patent/DE3249017T1/de active Granted
- 1982-09-09 WO PCT/US1982/001219 patent/WO1983001018A1/en active Application Filing
- 1982-09-10 FR FR8215371A patent/FR2512967B1/fr not_active Expired
- 1982-09-13 MX MX194370A patent/MX159622A/es unknown
- 1982-09-13 AR AR290635A patent/AR228680A1/es active
- 1982-09-13 FI FI823162A patent/FI72961C/sv not_active IP Right Cessation
- 1982-09-13 ES ES515680A patent/ES515680A0/es active Granted
- 1982-09-13 CA CA000411270A patent/CA1192773A/en not_active Expired
- 1982-09-13 DK DK407782A patent/DK159876C/da active
- 1982-09-13 BE BE0/209002A patent/BE894383A/fr not_active IP Right Cessation
- 1982-09-13 NO NO823104A patent/NO153766C/no unknown
- 1982-09-13 IE IE2235/82A patent/IE53556B1/en not_active IP Right Cessation
- 1982-09-13 IT IT68090/82A patent/IT1201923B/it active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM | Patent lapsed |
Owner name: GORDON, ROY GERALD |