ES8601730A1 - Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luz - Google Patents
Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luzInfo
- Publication number
- ES8601730A1 ES8601730A1 ES531247A ES531247A ES8601730A1 ES 8601730 A1 ES8601730 A1 ES 8601730A1 ES 531247 A ES531247 A ES 531247A ES 531247 A ES531247 A ES 531247A ES 8601730 A1 ES8601730 A1 ES 8601730A1
- Authority
- ES
- Spain
- Prior art keywords
- area
- thin
- metallic material
- electrically conductive
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000151 deposition Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000007769 metal material Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- VJYFKVYYMZPMAB-UHFFFAOYSA-N ethoprophos Chemical compound CCCSP(=O)(OCC)SCCC VJYFKVYYMZPMAB-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Electric Cables (AREA)
- Photovoltaic Devices (AREA)
- Non-Insulated Conductors (AREA)
- Liquid Crystal (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48161983A | 1983-04-04 | 1983-04-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
ES531247A0 ES531247A0 (es) | 1985-11-01 |
ES8601730A1 true ES8601730A1 (es) | 1985-11-01 |
Family
ID=23912695
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES531247A Expired ES8601730A1 (es) | 1983-04-04 | 1984-04-03 | Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luz |
ES540884A Expired ES8606028A1 (es) | 1983-04-04 | 1985-03-01 | Perfeccionamientos introducidos en un aparato para depositarcontinuamente sobre un sustrato una pelicula transmisora de la luz y electricamente conductora |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES540884A Expired ES8606028A1 (es) | 1983-04-04 | 1985-03-01 | Perfeccionamientos introducidos en un aparato para depositarcontinuamente sobre un sustrato una pelicula transmisora de la luz y electricamente conductora |
Country Status (9)
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2612602B2 (ja) * | 1987-12-17 | 1997-05-21 | 東洋インキ製造 株式会社 | 連続蒸着フィルムの製造方法および装置 |
DE102005025935B4 (de) * | 2005-06-06 | 2007-06-28 | Createc Fischer & Co. Gmbh | Hochtemperatur-Verdampferzelle und Verfahren zur Verdampfung hochschmelzender Materialien |
US7700166B2 (en) | 2005-06-06 | 2010-04-20 | Createc Fischer & Co. Gmbh | Process for evaporating high-melting materials |
SE536952C2 (sv) * | 2012-06-25 | 2014-11-11 | Impact Coatings Ab | Kontinuerlig rulle-till-rulle-anordning |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US448139A (en) * | 1891-03-10 | Bag-frame | ||
DE1621387A1 (de) * | 1967-10-09 | 1971-06-24 | Hochvakuum Dresden Veb | Verfahren und Einrichtung zum Bedampfen grosser bewegter Flaechen |
US3563202A (en) * | 1969-06-25 | 1971-02-16 | Pennwalt Corp | Mobile vbaporative firing source |
US3772174A (en) * | 1971-04-21 | 1973-11-13 | Nasa | Deposition of alloy films |
US4170662A (en) * | 1974-11-05 | 1979-10-09 | Eastman Kodak Company | Plasma plating |
JPS5399497A (en) * | 1977-02-12 | 1978-08-30 | Citizen Watch Co Ltd | Transparent conductive film for display apparatus |
JPS55133703A (en) * | 1979-04-06 | 1980-10-17 | Nippon Electric Co | Method of producing transparent conductive film |
JPS56136410A (en) * | 1980-03-28 | 1981-10-24 | Teijin Ltd | Method of producing transparent conductive laminate |
US4417092A (en) * | 1981-03-16 | 1983-11-22 | Exxon Research And Engineering Co. | Sputtered pin amorphous silicon semi-conductor device and method therefor |
JPS5897204A (ja) * | 1981-12-05 | 1983-06-09 | コニカ株式会社 | 透明導電膜の製造方法 |
-
1984
- 1984-03-28 CA CA000450772A patent/CA1219547A/en not_active Expired
- 1984-03-30 AU AU26269/84A patent/AU2626984A/en not_active Abandoned
- 1984-03-30 ZA ZA842404A patent/ZA842404B/xx unknown
- 1984-03-30 IN IN282/DEL/84A patent/IN160768B/en unknown
- 1984-04-03 BR BR8401540A patent/BR8401540A/pt unknown
- 1984-04-03 KR KR1019840001749A patent/KR910009044B1/ko not_active Expired
- 1984-04-03 ES ES531247A patent/ES8601730A1/es not_active Expired
- 1984-04-03 JP JP59066606A patent/JPS59217904A/ja active Granted
- 1984-04-04 EP EP84302308A patent/EP0121443A3/en not_active Withdrawn
-
1985
- 1985-03-01 ES ES540884A patent/ES8606028A1/es not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0121443A2 (en) | 1984-10-10 |
ES8606028A1 (es) | 1986-04-16 |
ES531247A0 (es) | 1985-11-01 |
JPH053689B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-01-18 |
JPS59217904A (ja) | 1984-12-08 |
KR910009044B1 (ko) | 1991-10-28 |
BR8401540A (pt) | 1984-11-13 |
ES540884A0 (es) | 1986-04-16 |
CA1219547A (en) | 1987-03-24 |
IN160768B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-08-01 |
AU2626984A (en) | 1984-10-11 |
KR840008534A (ko) | 1984-12-15 |
ZA842404B (en) | 1984-11-28 |
EP0121443A3 (en) | 1985-01-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8602974A1 (es) | Un procedimiento de depositar una pelicula de aleacion semi-conductora amorfa sobre un sustrato | |
ES8505838A1 (es) | Un metodo perfeccionado de depositar una pelicula electricamente conductora, delgada y transmisora de la luz | |
ES8503453A1 (es) | Un procedimiento para depositar peliculas de aleacion semiconductora amorfa sobre un sustrato | |
AU5022496A (en) | An electron jet vapor deposition system | |
AR025066A2 (es) | Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica | |
ES2127999T3 (es) | Generador de iones activado por microondas para la implantacion ionica. | |
MY104370A (en) | Method for pure ion plating using magnetic fields. | |
MY102271A (en) | Electrodeless fluorescent lighting system | |
JPS56152973A (en) | Sputter etching device | |
ES8601730A1 (es) | Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luz | |
IT1252811B (it) | Generatore di ioni con camera di ionizzazione costruita o rivestita con materiale ad alto coefficiente di emissione secondaria | |
ES2030376T3 (es) | Fuente de plasma con acoplamiento capacitivo de radiofrecuencia. | |
ES502262A0 (es) | Una instalacion de alumbrado perfeccionada | |
JPS5477073A (en) | High temperature metal ion source device | |
JPS5697962A (en) | Lighting device for fluorescent lamp | |
JPS5390677A (en) | Fluorescent lamp | |
AU3564799A (en) | Device to optimize the generation of visible light produced by the influence of an electric field (e) on the ultraviolet radiation. the device is applicable to mercury arc vapor lamps and/or fluorescent tubes | |
JPS53107178A (en) | Low-pressure vapor discharge lamp | |
JPS57106114A (en) | Ion beam sputtering apparatus | |
JPS56103859A (en) | Cold cathode discharge tube | |
JPS53107179A (en) | Low-pressure vapor discharge lamp | |
JPS54154999A (en) | Illumination device for traffic signal | |
AR241384A1 (es) | Dispositivo de iluminacion fluorescente sin electrodos. | |
TW275697B (en) | Fluorescent lamp device | |
ES455864A1 (es) | Metodo perfeccionado para producir luz a partir de una des- carga luminosa sin electrodos y lampara segun dicho metodo. |