ES8601565A1 - Perfeccionamientos introducidos en un dispositivo semiconductor - Google Patents

Perfeccionamientos introducidos en un dispositivo semiconductor

Info

Publication number
ES8601565A1
ES8601565A1 ES532821A ES532821A ES8601565A1 ES 8601565 A1 ES8601565 A1 ES 8601565A1 ES 532821 A ES532821 A ES 532821A ES 532821 A ES532821 A ES 532821A ES 8601565 A1 ES8601565 A1 ES 8601565A1
Authority
ES
Spain
Prior art keywords
barrier layer
electrode
electrical current
semiconductor body
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES532821A
Other languages
English (en)
Spanish (es)
Other versions
ES532821A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/518,184 external-priority patent/US4598306A/en
Priority claimed from US06/564,862 external-priority patent/US4532372A/en
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of ES532821A0 publication Critical patent/ES532821A0/es
Publication of ES8601565A1 publication Critical patent/ES8601565A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/17—Photovoltaic cells having only PIN junction potential barriers
    • H10F10/172—Photovoltaic cells having only PIN junction potential barriers comprising multiple PIN junctions, e.g. tandem cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/17—Photovoltaic cells having only PIN junction potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/548—Amorphous silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
ES532821A 1983-07-28 1984-05-25 Perfeccionamientos introducidos en un dispositivo semiconductor Expired ES8601565A1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/518,184 US4598306A (en) 1983-07-28 1983-07-28 Barrier layer for photovoltaic devices
US06/564,862 US4532372A (en) 1983-12-23 1983-12-23 Barrier layer for photovoltaic devices

Publications (2)

Publication Number Publication Date
ES532821A0 ES532821A0 (es) 1985-10-16
ES8601565A1 true ES8601565A1 (es) 1985-10-16

Family

ID=27059374

Family Applications (1)

Application Number Title Priority Date Filing Date
ES532821A Expired ES8601565A1 (es) 1983-07-28 1984-05-25 Perfeccionamientos introducidos en un dispositivo semiconductor

Country Status (8)

Country Link
EP (1) EP0132924A3 (enExample)
JP (1) JPH065767B2 (enExample)
KR (1) KR850000801A (enExample)
AU (1) AU560950B2 (enExample)
BR (1) BR8402521A (enExample)
ES (1) ES8601565A1 (enExample)
IN (1) IN165761B (enExample)
MX (1) MX154938A (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0190855A3 (en) * 1985-02-08 1986-12-30 Energy Conversion Devices, Inc. Improved photovoltaic device tolerant of low resistance defects
EP0236938A3 (de) * 1986-03-11 1989-11-15 Siemens Aktiengesellschaft Verfahren zur Vermeidung von Kurzschlüssen bei der Herstellung von Dünnschichtsolarzellen aus amorphem Silizium
JP2784841B2 (ja) * 1990-08-09 1998-08-06 キヤノン株式会社 太陽電池用基板
US5181968A (en) * 1991-06-24 1993-01-26 United Solar Systems Corporation Photovoltaic device having an improved collector grid
US5324365A (en) * 1991-09-24 1994-06-28 Canon Kabushiki Kaisha Solar cell
JP2994812B2 (ja) * 1991-09-26 1999-12-27 キヤノン株式会社 太陽電池
DE69218102T2 (de) * 1991-10-22 1997-10-09 Canon Kk Photovoltaisches Bauelement
EP0793277B1 (en) * 1996-02-27 2001-08-22 Canon Kabushiki Kaisha Photovoltaic device provided with an opaque substrate having a specific irregular surface structure
JP2984595B2 (ja) 1996-03-01 1999-11-29 キヤノン株式会社 光起電力素子
US5981934A (en) * 1996-09-12 1999-11-09 Canon Kabushiki Kaisha Photovoltaic element having a transparent conductive layer with specified fractal dimension and fractal property
US6184456B1 (en) 1996-12-06 2001-02-06 Canon Kabushiki Kaisha Photovoltaic device
JP3327811B2 (ja) 1997-05-13 2002-09-24 キヤノン株式会社 酸化亜鉛薄膜の製造方法、それを用いた光起電力素子及び半導体素子基板の製造方法
JPH1146006A (ja) 1997-07-25 1999-02-16 Canon Inc 光起電力素子およびその製造方法
US6951689B1 (en) 1998-01-21 2005-10-04 Canon Kabushiki Kaisha Substrate with transparent conductive layer, and photovoltaic element
CN115863455A (zh) * 2022-12-20 2023-03-28 谢信韦 一种太阳能电池片金属栅线制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4318938A (en) * 1979-05-29 1982-03-09 The University Of Delaware Method for the continuous manufacture of thin film solar cells
US4251286A (en) * 1979-09-18 1981-02-17 The University Of Delaware Thin film photovoltaic cells having blocking layers
JPS56160080A (en) * 1980-05-15 1981-12-09 Shunpei Yamazaki Photoelectric conversion unit
JPS5814582A (ja) * 1981-07-17 1983-01-27 Kanegafuchi Chem Ind Co Ltd 高効率のアモルフアスシリコン系太陽電池
JPS5878474A (ja) * 1981-11-05 1983-05-12 Seiko Epson Corp 薄膜太陽電池
US4571448A (en) * 1981-11-16 1986-02-18 University Of Delaware Thin film photovoltaic solar cell and method of making the same

Also Published As

Publication number Publication date
BR8402521A (pt) 1985-04-02
EP0132924A2 (en) 1985-02-13
JPH065767B2 (ja) 1994-01-19
KR850000801A (ko) 1985-03-09
JPS6084888A (ja) 1985-05-14
ES532821A0 (es) 1985-10-16
AU560950B2 (en) 1987-04-30
MX154938A (es) 1988-01-08
AU2858684A (en) 1985-01-31
EP0132924A3 (en) 1986-06-18
IN165761B (enExample) 1990-01-06

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