ES8301036A1 - Un metodo para la produccion de copias en reviele. - Google Patents

Un metodo para la produccion de copias en reviele.

Info

Publication number
ES8301036A1
ES8301036A1 ES507538A ES507538A ES8301036A1 ES 8301036 A1 ES8301036 A1 ES 8301036A1 ES 507538 A ES507538 A ES 507538A ES 507538 A ES507538 A ES 507538A ES 8301036 A1 ES8301036 A1 ES 8301036A1
Authority
ES
Spain
Prior art keywords
layer
production
exposure
relief copies
copies
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES507538A
Other languages
English (en)
Other versions
ES507538A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of ES8301036A1 publication Critical patent/ES8301036A1/es
Publication of ES507538A0 publication Critical patent/ES507538A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Steroid Compounds (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Bakery Products And Manufacturing Methods Therefor (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Amplifiers (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Materials For Photolithography (AREA)
  • Secondary Cells (AREA)

Abstract

METODO PARA LA PRODUCCION DE COPIAS EN RELIEVE. UNA CAPA ENDURECIBLE POR LA LUZ DE UN MATERIAL COPIADOR ENDURECIBLE POR LA LUZ, CAPA QUE CONTIENE UNA MEZCLA FOTOPOLIMERIZABLE, UN COMPUESTO POLIMERICO FOTOFIMERIZABLE O UN PRODUCTO DE POLICONDENSACION DE UNA SAL DE DIAZONIO, SE EXPONE EN IMAGENES, TRAS DE LO CUAL, LAS AREAS NO EXPUESTAS DE LA CAPA SE SEPARAN POR LAVADO POR MEDIO DE UN REVELADOR, CALENTANDOSE LA CAPA DURANTE DE 5 SEGUNDOS A 10 MINUTOS A UNA TEMPERATURA COMPRENDIDA ENTRE 50 Y 180<025>C.
ES507538A 1980-11-29 1981-11-27 Un metodo para la produccion de copias en reviele. Granted ES507538A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803045149 DE3045149A1 (de) 1980-11-29 1980-11-29 Verfahren zur herstellung von reliefkopien

Publications (2)

Publication Number Publication Date
ES8301036A1 true ES8301036A1 (es) 1982-11-01
ES507538A0 ES507538A0 (es) 1982-11-01

Family

ID=6117970

Family Applications (1)

Application Number Title Priority Date Filing Date
ES507538A Granted ES507538A0 (es) 1980-11-29 1981-11-27 Un metodo para la produccion de copias en reviele.

Country Status (12)

Country Link
EP (1) EP0053708B1 (es)
JP (1) JPS57119343A (es)
AT (1) ATE15951T1 (es)
AU (1) AU7768081A (es)
BR (1) BR8107750A (es)
DE (2) DE3045149A1 (es)
DK (1) DK526781A (es)
ES (1) ES507538A0 (es)
FI (1) FI813800L (es)
IL (1) IL64395A0 (es)
NO (1) NO814046L (es)
ZA (1) ZA818106B (es)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0103052B1 (en) * 1982-08-25 1989-07-26 Fujitsu Limited Method for forming patterned resist layer on semiconductor body
DE3534414A1 (de) * 1985-09-27 1987-04-02 Standard Elektrik Lorenz Ag Verfahren und vorrichtung zur erzeugung einer schwarzmatrixschicht
JPS6291938A (ja) * 1985-10-18 1987-04-27 Fuji Photo Film Co Ltd 製版方法
EP0226741B1 (de) * 1985-10-25 1989-08-02 Hoechst Celanese Corporation Verfahren zur Herstellung eines positiv arbeitenden Photoresists
JP2551425B2 (ja) * 1987-02-17 1996-11-06 三洋電機株式会社 透過型液晶表示装置の製造方法
JP2886254B2 (ja) * 1990-04-25 1999-04-26 旭化成工業株式会社 感光性樹脂版の製造方法及びそれに用いる製版装置
DE4033294A1 (de) * 1990-10-19 1992-04-23 Siemens Ag Verfahren zur fotolithographischen herstellung von strukturen auf einem traeger
WO1997033206A1 (en) * 1996-03-07 1997-09-12 Clariant International, Ltd. Thermal treatment process of positive photoresist composition
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447913C3 (de) * 1964-10-15 1979-08-09 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Druckformen
DE1522503C3 (de) * 1967-01-24 1978-11-09 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Druckformen
US3623869A (en) * 1969-10-27 1971-11-30 Plastic Coating Corp Method for imaging diazosulfonate photoreproduction materials
DD103740A1 (es) * 1973-04-24 1974-02-05

Also Published As

Publication number Publication date
DE3172541D1 (en) 1985-11-07
EP0053708A2 (de) 1982-06-16
EP0053708A3 (en) 1982-08-04
DK526781A (da) 1982-05-30
NO814046L (no) 1982-06-01
ATE15951T1 (de) 1985-10-15
FI813800L (fi) 1982-05-30
ZA818106B (en) 1982-10-27
ES507538A0 (es) 1982-11-01
DE3045149A1 (de) 1982-07-01
AU7768081A (en) 1982-06-10
JPS57119343A (en) 1982-07-24
EP0053708B1 (de) 1985-10-02
BR8107750A (pt) 1982-08-31
IL64395A0 (en) 1982-02-28

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