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Hitachi Ltd
Original Assignee
Hitachi Ltd
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Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP7317076ApriorityCriticalpatent/JPS52156566A/en
Publication of JPS52156566ApublicationCriticalpatent/JPS52156566A/en
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Abstract
PURPOSE: To make an LSI finer in size and higher in the scale of integration by interposing the film of polyacrylamide-diacetone acrylamide between photo resist and a shield mask for exposure then performing exposure.