ES525658A0 - Un metodo para producir un dispositivo semiconductor de pelicula delgada - Google Patents

Un metodo para producir un dispositivo semiconductor de pelicula delgada

Info

Publication number
ES525658A0
ES525658A0 ES525658A ES525658A ES525658A0 ES 525658 A0 ES525658 A0 ES 525658A0 ES 525658 A ES525658 A ES 525658A ES 525658 A ES525658 A ES 525658A ES 525658 A0 ES525658 A0 ES 525658A0
Authority
ES
Spain
Prior art keywords
producing
thin film
semiconductive device
film semiconductive
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES525658A
Other languages
English (en)
Other versions
ES8407247A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ExxonMobil Technology and Engineering Co
Original Assignee
Exxon Research and Engineering Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Exxon Research and Engineering Co filed Critical Exxon Research and Engineering Co
Publication of ES525658A0 publication Critical patent/ES525658A0/es
Publication of ES8407247A1 publication Critical patent/ES8407247A1/es
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03921Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including only elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • H01L31/02363Special surface textures of the semiconductor body itself, e.g. textured active layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • H01L31/02366Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Light Receiving Elements (AREA)
ES525658A 1982-09-17 1983-09-16 Un metodo para producir un dispositivo semiconductor de pelicula delgada Expired ES8407247A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US41915882A 1982-09-17 1982-09-17

Publications (2)

Publication Number Publication Date
ES525658A0 true ES525658A0 (es) 1984-08-16
ES8407247A1 ES8407247A1 (es) 1984-08-16

Family

ID=23661028

Family Applications (1)

Application Number Title Priority Date Filing Date
ES525658A Expired ES8407247A1 (es) 1982-09-17 1983-09-16 Un metodo para producir un dispositivo semiconductor de pelicula delgada

Country Status (5)

Country Link
EP (1) EP0106540A3 (es)
JP (1) JPS5972779A (es)
AU (1) AU1920483A (es)
CA (1) CA1225139A (es)
ES (1) ES8407247A1 (es)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4720443A (en) * 1984-04-05 1988-01-19 Canon Kabushiki Kaisha Member having light receiving layer with nonparallel interfaces
EP0165743B1 (en) * 1984-06-05 1990-12-19 Canon Kabushiki Kaisha Light-receiving member
US4678733A (en) * 1984-10-15 1987-07-07 Canon Kabushiki Kaisha Member having light receiving layer of A-Si: Ge (C,N,O) A-Si/surface antireflection layer with non-parallel interfaces
DE3446807A1 (de) * 1984-12-21 1986-07-03 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Duennschichtsolarzelle mit n-i-p-struktur
US4956685A (en) * 1984-12-21 1990-09-11 Licentia Patent-Verwaltungs Gmbh Thin film solar cell having a concave n-i-p structure
US4683160A (en) * 1985-05-09 1987-07-28 Exxon Research And Engineering Company Solar cells with correlated roughness substrate
JPS6236676A (ja) * 1985-08-10 1987-02-17 Canon Inc 光導電部材用の支持体及び該支持体を有する光導電部材
JPS6289064A (ja) * 1985-10-16 1987-04-23 Canon Inc 光受容部材
JPS6290663A (ja) * 1985-10-17 1987-04-25 Canon Inc 光受容部材
JPS62106468A (ja) * 1985-11-01 1987-05-16 Canon Inc 光受容部材
JPS62106470A (ja) * 1985-11-02 1987-05-16 Canon Inc 光受容部材
US4929524A (en) * 1986-09-12 1990-05-29 Canon Kabushiki Kaisha Organic photo conductive medium
KR100741933B1 (ko) 2004-09-21 2007-07-23 동부일렉트로닉스 주식회사 씨모스 이미지 센서의 제조 방법
US7736750B2 (en) * 2006-12-14 2010-06-15 Ppg Industries Ohio, Inc. Coated non-metallic sheet having a brushed metal appearance, and coatings for and method of making same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1046795B (de) * 1954-11-10 1958-12-18 Freiberger Praez Smechanik Veb Halbleiter-Photoelement, bei dem die Oberflaeche der Halbleiterschicht mit der Lichteinfallsrichtung einen von 90íÒ abweichenden Winkel bildet
CA751084A (en) * 1963-02-06 1967-01-17 John W. Faust, Jr. Photovoltaic devices with reduced reflection losses
US3487223A (en) * 1968-07-10 1969-12-30 Us Air Force Multiple internal reflection structure in a silicon detector which is obtained by sandblasting
US3973994A (en) * 1974-03-11 1976-08-10 Rca Corporation Solar cell with grooved surface
US4328390A (en) * 1979-09-17 1982-05-04 The University Of Delaware Thin film photovoltaic cell

Also Published As

Publication number Publication date
EP0106540A2 (en) 1984-04-25
ES8407247A1 (es) 1984-08-16
EP0106540A3 (en) 1985-06-05
AU1920483A (en) 1984-03-22
JPS5972779A (ja) 1984-04-24
CA1225139A (en) 1987-08-04

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