ES455588A1 - Un metodo de preparar un material fotosensible que incluye un compuesto de cumarina 3-sustituida. - Google Patents
Un metodo de preparar un material fotosensible que incluye un compuesto de cumarina 3-sustituida.Info
- Publication number
- ES455588A1 ES455588A1 ES455588A ES455588A ES455588A1 ES 455588 A1 ES455588 A1 ES 455588A1 ES 455588 A ES455588 A ES 455588A ES 455588 A ES455588 A ES 455588A ES 455588 A1 ES455588 A1 ES 455588A1
- Authority
- ES
- Spain
- Prior art keywords
- carbon atoms
- group
- formula
- compound
- substituted coumarin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 125000004432 carbon atom Chemical group C* 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 3
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 abstract 2
- 229960000956 coumarin Drugs 0.000 abstract 2
- 235000001671 coumarin Nutrition 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000004104 aryloxy group Chemical group 0.000 abstract 1
- 150000001540 azides Chemical class 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- -1 coumarin compound Chemical class 0.000 abstract 1
- 125000000332 coumarinyl group Chemical class O1C(=O)C(=CC2=CC=CC=C12)* 0.000 abstract 1
- 125000005842 heteroatom Chemical group 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/0085—Azides characterised by the non-macromolecular additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
- C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
- C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
- C07D311/16—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted in position 7
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/60—Processes for obtaining vesicular images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Plural Heterocyclic Compounds (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US65448576A | 1976-02-02 | 1976-02-02 | |
| US68866476A | 1976-05-21 | 1976-05-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES455588A1 true ES455588A1 (es) | 1978-07-16 |
Family
ID=27096757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES455588A Expired ES455588A1 (es) | 1976-02-02 | 1977-02-02 | Un metodo de preparar un material fotosensible que incluye un compuesto de cumarina 3-sustituida. |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS5942684B2 (uk) |
| AU (1) | AU513012B2 (uk) |
| BR (1) | BR7700555A (uk) |
| DE (1) | DE2704368A1 (uk) |
| ES (1) | ES455588A1 (uk) |
| FI (1) | FI770367A (uk) |
| FR (1) | FR2339881A1 (uk) |
| GB (1) | GB1578662A (uk) |
| IT (1) | IT1076960B (uk) |
| NL (1) | NL185872C (uk) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6026122B2 (ja) * | 1977-01-20 | 1985-06-21 | 富士写真フイルム株式会社 | 光重合性組成物 |
| JPS5815503A (ja) * | 1981-07-20 | 1983-01-28 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| JPS6088005A (ja) * | 1983-10-21 | 1985-05-17 | Agency Of Ind Science & Technol | 光硬化樹脂組成物 |
| JPH0676444B2 (ja) * | 1986-05-08 | 1994-09-28 | ユニチカ株式会社 | 光重合性組成物 |
| EP0277915B1 (de) * | 1987-02-02 | 1991-09-04 | Ciba-Geigy Ag | Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin |
| JP2640470B2 (ja) * | 1987-08-19 | 1997-08-13 | 旭化成工業株式会社 | 新しい感光性組成物 |
| DE3832032A1 (de) * | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| JPH02144539A (ja) * | 1988-11-28 | 1990-06-04 | Sumitomo Bakelite Co Ltd | 感光性樹脂組成物 |
| JPH02281895A (ja) * | 1989-04-24 | 1990-11-19 | Nissin Electric Co Ltd | ビル管理システム |
| DE59007720D1 (de) * | 1989-10-27 | 1994-12-22 | Ciba Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen. |
| JP3141517B2 (ja) | 1992-05-14 | 2001-03-05 | ブラザー工業株式会社 | 光硬化型組成物 |
| US5738974A (en) | 1994-09-05 | 1998-04-14 | Mitsubishi Chemical Corporation | Photopolymerizable composition and photosensitive lithographic printing plate |
| EP0780731B1 (en) | 1995-12-22 | 2002-04-17 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a color filter, color filter and liquid crystal display device |
| DE19620747A1 (de) * | 1996-05-23 | 1997-11-27 | Hoechst Ag | Verfahren zur Herstellung von 3-(7-Diethylamino-2-oxo-2H-chromen-3-yl)-3- oxopropionsäure-(1-methoxy-2-propylester) |
| DE59802875D1 (de) * | 1997-06-30 | 2002-03-14 | Siemens Ag | Initiatoren für die kationische Polymerisation |
| US7830472B2 (en) | 2004-04-26 | 2010-11-09 | Mitsubishi Chemical Corporation | Blue color composition for color filter, color filter, and color image display device |
| JP2006065074A (ja) | 2004-08-27 | 2006-03-09 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP5089866B2 (ja) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
| EP1826250B1 (en) | 2005-06-13 | 2010-01-20 | Toshiba Tec Kabushiki Kaisha | Inkjet ink, method of inkjet recording, method of evaluating inkjet ink, and process for producing inkjet ink |
| JP4701042B2 (ja) | 2005-08-22 | 2011-06-15 | 富士フイルム株式会社 | 感光性平版印刷版 |
| ES2322908T3 (es) * | 2005-11-18 | 2009-07-01 | Agfa Graphics N.V. | Metodo de fabricacion de una plancha de impresion litografica. |
| DE602005013399D1 (de) * | 2005-11-18 | 2009-04-30 | Agfa Graphics Nv | Verfahren zur Herstellung einer lithographischen Druckplatte |
| WO2007057347A1 (en) * | 2005-11-18 | 2007-05-24 | Agfa Graphics Nv | Method of making a lithographic printing plate |
| WO2007057346A2 (en) * | 2005-11-18 | 2007-05-24 | Agfa Graphics Nv | Method of making a lithographic printing plate |
| EP2009486A4 (en) | 2006-04-19 | 2009-12-09 | Mitsubishi Chem Corp | COLOR IMAGE DISPLAY DEVICE |
| JP4890408B2 (ja) | 2007-09-28 | 2012-03-07 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法 |
| KR101592836B1 (ko) | 2008-02-07 | 2016-02-05 | 미쓰비시 가가꾸 가부시키가이샤 | 반도체 발광 장치, 백라이트, 컬러 화상 표시 장치, 및 그들에 사용하는 형광체 |
| JP5264427B2 (ja) | 2008-03-25 | 2013-08-14 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5228631B2 (ja) | 2008-05-29 | 2013-07-03 | 富士フイルム株式会社 | 平版印刷版現像用処理液及び平版印刷版の作製方法 |
| JP5248203B2 (ja) | 2008-05-29 | 2013-07-31 | 富士フイルム株式会社 | 平版印刷版現像用処理液及び平版印刷版の作製方法 |
| US20110146516A1 (en) | 2008-08-22 | 2011-06-23 | Fujifilm Corporation | Method of preparing lithographic printing plate |
| JP5405141B2 (ja) | 2008-08-22 | 2014-02-05 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5171483B2 (ja) | 2008-08-29 | 2013-03-27 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| WO2013039235A1 (ja) | 2011-09-15 | 2013-03-21 | 富士フイルム株式会社 | 製版処理廃液のリサイクル方法 |
| IN2014CN03280A (uk) | 2011-11-04 | 2015-07-03 | Fujifilm Corp | |
| ITVA20120041A1 (it) * | 2012-10-22 | 2014-04-23 | Lamberti Spa | 3-chetocumarine per fotopolimerizzazioni tramite led |
| EP3147335A1 (en) | 2015-09-23 | 2017-03-29 | BYK-Chemie GmbH | Colorant compositions containing wettting and/or dispersing agents with low amine number |
| EP3710505B1 (en) | 2017-11-15 | 2022-01-05 | BYK-Chemie GmbH | Block co-polymer |
| KR102407380B1 (ko) | 2017-11-15 | 2022-06-13 | 비와이케이-케미 게엠베하 | 블록 공중합체 |
| CN118271269A (zh) * | 2022-12-30 | 2024-07-02 | 常州强力先端电子材料有限公司 | 香豆素类增感剂、其制备方法、包含其的感光性树脂组合物和应用 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2732301A (en) * | 1952-10-15 | 1956-01-24 | Chxcxch | |
| US3615452A (en) * | 1968-09-09 | 1971-10-26 | Gaf Corp | Dye-sensitized photopolymerization process |
| DE1949010C3 (de) * | 1969-09-27 | 1979-11-29 | Bayer Ag, 5090 Leverkusen | Verwendung von halogenmethylierten Benzophenonen als Photopolymerisationsinitiatoren |
| GB1310936A (en) * | 1970-03-17 | 1973-03-21 | Minnesota Mining & Mfg | Light-sensitive imaging sheet and method of using |
-
1977
- 1977-01-28 BR BR7700555A patent/BR7700555A/pt unknown
- 1977-02-02 AU AU21871/77A patent/AU513012B2/en not_active Expired
- 1977-02-02 GB GB424177A patent/GB1578662A/en not_active Expired
- 1977-02-02 IT IT1989077A patent/IT1076960B/it active
- 1977-02-02 ES ES455588A patent/ES455588A1/es not_active Expired
- 1977-02-02 FR FR7702845A patent/FR2339881A1/fr active Granted
- 1977-02-02 FI FI770367A patent/FI770367A/fi not_active Application Discontinuation
- 1977-02-02 DE DE19772704368 patent/DE2704368A1/de active Granted
- 1977-02-02 NL NL7701089A patent/NL185872C/xx not_active IP Right Cessation
- 1977-02-02 JP JP1060177A patent/JPS5942684B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2339881B1 (uk) | 1979-03-02 |
| BR7700555A (pt) | 1977-10-04 |
| NL185872B (nl) | 1990-03-01 |
| FR2339881A1 (fr) | 1977-08-26 |
| JPS52112681A (en) | 1977-09-21 |
| JPS5942684B2 (ja) | 1984-10-17 |
| NL7701089A (nl) | 1977-08-04 |
| AU513012B2 (en) | 1980-11-06 |
| FI770367A (uk) | 1977-08-03 |
| DE2704368C2 (uk) | 1988-05-11 |
| IT1076960B (it) | 1985-04-27 |
| AU2187177A (en) | 1978-08-10 |
| DE2704368A1 (de) | 1977-08-11 |
| GB1578662A (en) | 1980-11-05 |
| NL185872C (nl) | 1990-08-01 |
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