ES337928A1 - Metodo para la formacion por electrocorrosion de contactos de aluminio en semiconductores. - Google Patents

Metodo para la formacion por electrocorrosion de contactos de aluminio en semiconductores.

Info

Publication number
ES337928A1
ES337928A1 ES337928A ES337928A ES337928A1 ES 337928 A1 ES337928 A1 ES 337928A1 ES 337928 A ES337928 A ES 337928A ES 337928 A ES337928 A ES 337928A ES 337928 A1 ES337928 A1 ES 337928A1
Authority
ES
Spain
Prior art keywords
layer
tetraalkylammonium hydroxide
electroetching
semi
aluminum plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES337928A
Other languages
English (en)
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of ES337928A1 publication Critical patent/ES337928A1/es
Expired legal-status Critical Current

Links

Classifications

    • H10W20/40—
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H10P50/613—
    • H10P95/00—
    • H10W74/43—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
ES337928A 1966-03-10 1967-02-24 Metodo para la formacion por electrocorrosion de contactos de aluminio en semiconductores. Expired ES337928A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US533288A US3409523A (en) 1966-03-10 1966-03-10 Electroetching an aluminum plated semiconductor in a tetraalkylammonium hydroxide electrolyte

Publications (1)

Publication Number Publication Date
ES337928A1 true ES337928A1 (es) 1968-03-16

Family

ID=24125298

Family Applications (1)

Application Number Title Priority Date Filing Date
ES337928A Expired ES337928A1 (es) 1966-03-10 1967-02-24 Metodo para la formacion por electrocorrosion de contactos de aluminio en semiconductores.

Country Status (9)

Country Link
US (1) US3409523A (enExample)
BE (1) BE693904A (enExample)
DE (1) DE1614995B1 (enExample)
ES (1) ES337928A1 (enExample)
FR (1) FR1514460A (enExample)
GB (1) GB1175272A (enExample)
IL (1) IL27294A (enExample)
NL (1) NL136512C (enExample)
SE (1) SE308847B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7002117A (enExample) * 1970-02-14 1971-08-17
US3775274A (en) * 1970-06-30 1973-11-27 Hughes Aircraft Co Electrolytic anticompromise process
US3678348A (en) * 1970-11-23 1972-07-18 Communications Transistor Corp Method and apparatus for etching fine line patterns in metal on semiconductive devices
JPS5232234B2 (enExample) * 1971-10-11 1977-08-19
US4339340A (en) 1975-11-26 1982-07-13 Tokyo Shibaura Electric Co., Ltd. Surface-treating agent adapted for intermediate products of a semiconductor device
JPS6047725B2 (ja) * 1977-06-14 1985-10-23 ソニー株式会社 フエライトの加工法
FR2407746A1 (fr) * 1977-11-07 1979-06-01 Commissariat Energie Atomique Electrode pour cellule d'electrolyse, notamment pour cellule d'affichage electrolytique et son procede de fabrication
US4215497A (en) * 1978-08-04 1980-08-05 Levy John C Tag
DE3406542A1 (de) * 1984-02-23 1985-08-29 Telefunken electronic GmbH, 7100 Heilbronn Verfahren zum herstellen eines halbleiterbauelementes
US4821096A (en) * 1985-12-23 1989-04-11 Intel Corporation Excess energy protection device
CN103849923A (zh) * 2014-03-07 2014-06-11 王夔 一种铝合金型材表面图案处理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE540052A (enExample) * 1955-06-13
DE1015541B (de) * 1956-02-09 1957-09-12 Licentia Gmbh Verfahren zum AEtzen elektrisch unsymmetrisch leitender Halbleiteranordnungen
US3160539A (en) * 1958-09-08 1964-12-08 Trw Semiconductors Inc Surface treatment of silicon
FR1380991A (fr) * 1963-01-29 1964-12-04 Rca Corp Procédé de fabrication de dispositifs semi-conducteurs

Also Published As

Publication number Publication date
SE308847B (enExample) 1969-02-24
IL27294A (en) 1970-08-19
FR1514460A (fr) 1968-02-23
GB1175272A (en) 1969-12-23
NL136512C (enExample) 1972-09-15
BE693904A (enExample) 1967-07-17
DE1614995B1 (de) 1971-03-11
NL6701708A (enExample) 1967-09-11
US3409523A (en) 1968-11-05

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