FR1514460A - Formation électrolytique des contacts de semiconducteurs - Google Patents

Formation électrolytique des contacts de semiconducteurs

Info

Publication number
FR1514460A
FR1514460A FR95208A FR95208A FR1514460A FR 1514460 A FR1514460 A FR 1514460A FR 95208 A FR95208 A FR 95208A FR 95208 A FR95208 A FR 95208A FR 1514460 A FR1514460 A FR 1514460A
Authority
FR
France
Prior art keywords
semiconductor contacts
electrolytic formation
electrolytic
formation
contacts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR95208A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of FR1514460A publication Critical patent/FR1514460A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063—Electrolytic etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
FR95208A 1966-03-10 1967-02-16 Formation électrolytique des contacts de semiconducteurs Expired FR1514460A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US533288A US3409523A (en) 1966-03-10 1966-03-10 Electroetching an aluminum plated semiconductor in a tetraalkylammonium hydroxide electrolyte

Publications (1)

Publication Number Publication Date
FR1514460A true FR1514460A (fr) 1968-02-23

Family

ID=24125298

Family Applications (1)

Application Number Title Priority Date Filing Date
FR95208A Expired FR1514460A (fr) 1966-03-10 1967-02-16 Formation électrolytique des contacts de semiconducteurs

Country Status (9)

Country Link
US (1) US3409523A (fr)
BE (1) BE693904A (fr)
DE (1) DE1614995B1 (fr)
ES (1) ES337928A1 (fr)
FR (1) FR1514460A (fr)
GB (1) GB1175272A (fr)
IL (1) IL27294A (fr)
NL (1) NL136512C (fr)
SE (1) SE308847B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2079433A1 (fr) * 1970-02-14 1971-11-12 Philips Nv

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3775274A (en) * 1970-06-30 1973-11-27 Hughes Aircraft Co Electrolytic anticompromise process
US3678348A (en) * 1970-11-23 1972-07-18 Communications Transistor Corp Method and apparatus for etching fine line patterns in metal on semiconductive devices
JPS5232234B2 (fr) * 1971-10-11 1977-08-19
US4339340A (en) 1975-11-26 1982-07-13 Tokyo Shibaura Electric Co., Ltd. Surface-treating agent adapted for intermediate products of a semiconductor device
JPS6047725B2 (ja) * 1977-06-14 1985-10-23 ソニー株式会社 フエライトの加工法
FR2407746A1 (fr) * 1977-11-07 1979-06-01 Commissariat Energie Atomique Electrode pour cellule d'electrolyse, notamment pour cellule d'affichage electrolytique et son procede de fabrication
US4215497A (en) * 1978-08-04 1980-08-05 Levy John C Tag
DE3406542A1 (de) * 1984-02-23 1985-08-29 Telefunken electronic GmbH, 7100 Heilbronn Verfahren zum herstellen eines halbleiterbauelementes
US4821096A (en) * 1985-12-23 1989-04-11 Intel Corporation Excess energy protection device
CN103849923A (zh) * 2014-03-07 2014-06-11 王夔 一种铝合金型材表面图案处理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE540052A (fr) * 1955-06-13
DE1015541B (de) * 1956-02-09 1957-09-12 Licentia Gmbh Verfahren zum AEtzen elektrisch unsymmetrisch leitender Halbleiteranordnungen
US3160539A (en) * 1958-09-08 1964-12-08 Trw Semiconductors Inc Surface treatment of silicon
FR1380991A (fr) * 1963-01-29 1964-12-04 Rca Corp Procédé de fabrication de dispositifs semi-conducteurs

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2079433A1 (fr) * 1970-02-14 1971-11-12 Philips Nv

Also Published As

Publication number Publication date
IL27294A (en) 1970-08-19
SE308847B (fr) 1969-02-24
NL6701708A (fr) 1967-09-11
GB1175272A (en) 1969-12-23
US3409523A (en) 1968-11-05
BE693904A (fr) 1967-07-17
ES337928A1 (es) 1968-03-16
NL136512C (fr) 1972-09-15
DE1614995B1 (de) 1971-03-11

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