ES2720855T3 - Laminado de resina fotosensible y procesado térmico del mismo - Google Patents
Laminado de resina fotosensible y procesado térmico del mismo Download PDFInfo
- Publication number
- ES2720855T3 ES2720855T3 ES12774409T ES12774409T ES2720855T3 ES 2720855 T3 ES2720855 T3 ES 2720855T3 ES 12774409 T ES12774409 T ES 12774409T ES 12774409 T ES12774409 T ES 12774409T ES 2720855 T3 ES2720855 T3 ES 2720855T3
- Authority
- ES
- Spain
- Prior art keywords
- layer
- curing
- light
- barrier layer
- mask layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
- B41M2205/14—Production or use of a mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optics & Photonics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Abstract
Un método de desarrollo de un blanco de impresión apto para fotocurado para producir un patrón en relieve que comprende una pluralidad de puntos en relieve, en el que el blanco de impresión apto para fotocurado comprende una capa de forro que tiene al menos una capa apta para fotocurado dispuesta sobre la misma, una capa de barrera dispuesta sobre la parte superior de la capa apta para fotocurado, y una capa de máscara apta para ablación con láser dispuesta sobre la parte superior de la capa de barrera, comprendiendo el método la etapa de: a) formar imágenes de al menos una capa apta para fotocurado por medio de ablación selectiva de la capa de máscara apta para ablación con láser con el fin de crear una imagen; b) exponer el blanco de impresión a radiación actínica a través de la capa de barrera y la capa de máscara a una o más fuentes de radiación actínica para reticular de forma selectiva y curar las partes de al menos una capa apta para fotocurado, en el que al menos una capa apta para fotocurado se reticula y se cura en las partes no cubiertas por la capa de máscara, creando de este modo un patrón en relieve; y c) desarrollar el elemento de impresión para retirar la capa de barrera, la capa de máscara sometida a ablación por láser las partes no curadas de la capa apta para fotocurado y revelar el patrón en relieve; en el que la capa de barrera tiene un coeficiente de difusión de oxígeno menor de 6,9 x10-9 m2/s y una transparencia óptica de al menos un 50 %.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/091,466 US8551688B2 (en) | 2011-04-21 | 2011-04-21 | Photosensitive resin laminate and thermal processing of the same |
PCT/US2012/029766 WO2012145111A1 (en) | 2011-04-21 | 2012-03-20 | Photosensitive resin laminate and thermal processing of the same |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2720855T3 true ES2720855T3 (es) | 2019-07-25 |
Family
ID=47021597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES12774409T Active ES2720855T3 (es) | 2011-04-21 | 2012-03-20 | Laminado de resina fotosensible y procesado térmico del mismo |
Country Status (9)
Country | Link |
---|---|
US (2) | US8551688B2 (es) |
EP (1) | EP2699964B1 (es) |
JP (2) | JP5913567B2 (es) |
CN (1) | CN103477281B (es) |
BR (1) | BR112013022951B1 (es) |
CA (1) | CA2830267C (es) |
ES (1) | ES2720855T3 (es) |
RU (1) | RU2554935C2 (es) |
WO (1) | WO2012145111A1 (es) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6111521B2 (ja) * | 2012-02-29 | 2017-04-12 | 東洋紡株式会社 | 感光性凸版用シール印刷原版 |
CN105452960B (zh) | 2013-06-14 | 2019-11-01 | 富林特集团德国有限公司 | 可数字成像且具有极性超薄屏障层的柔版印刷元件 |
CN105745578B (zh) * | 2013-09-18 | 2018-04-06 | 富林特集团德国有限公司 | 可数字曝光的柔版印刷元件和制造柔版印刷版的方法 |
US9256129B2 (en) | 2014-02-19 | 2016-02-09 | Macdermid Printing Solutions, Llc | Method for creating surface texture on flexographic printing elements |
WO2015185523A1 (de) | 2014-06-03 | 2015-12-10 | Flint Group Germany Gmbh | Schnell trockenbare flexodruckelemente |
EP3186680B1 (de) | 2014-08-28 | 2020-06-10 | Flint Group Germany GmbH | Vorrichtung und verfahren zur herstellung von flexodruckplatten |
MX2017015163A (es) | 2015-05-28 | 2018-03-28 | Flint Group Germany Gmbh | Placa de impresion flexografica, con formacion de imagen digital, con capa de barrera integrada. |
US9678429B2 (en) | 2015-08-18 | 2017-06-13 | Macdermid Printing Solutions, Llc | Method of creating hybrid printing dots in a flexographic printing plate |
US9757919B2 (en) | 2015-08-20 | 2017-09-12 | Macdermid Printing Solutions, Llc | Carrier sheet and method of using the same |
EP3147709B1 (en) * | 2015-09-22 | 2018-06-13 | Tetra Laval Holdings & Finance S.A. | Method for producing a printing plate for flexographic printing, and a raw printing plate |
JP6550475B2 (ja) | 2016-01-04 | 2019-07-24 | 富士フイルム株式会社 | フレキソ印刷版、フレキソ印刷版原版、および、これらの製造方法 |
US9925757B2 (en) | 2016-02-10 | 2018-03-27 | Macdermid Graphics Solutions, Llc | Customizable printing plates and method of making the same |
RU2722902C1 (ru) * | 2016-09-01 | 2020-06-04 | Олег Юрьевич Халип | Способ формирования трехмерного изделия из жидкого фотополимера с применением преобразования волнового фронта актиничного излучения и устройство для его осуществления |
US11007767B2 (en) | 2016-11-28 | 2021-05-18 | Flint Group Germany Gmbh | Light exposure device and method for exposing plate-shaped materials to light |
CN108227377A (zh) * | 2016-12-14 | 2018-06-29 | 乐凯华光印刷科技有限公司 | 一种阳图热敏感光组合物及其应用 |
US10457082B2 (en) * | 2017-05-09 | 2019-10-29 | Macdermid Graphics Solutions, Llc | Flexographic printing plate with improved storage stability |
DE102019119535A1 (de) * | 2019-07-18 | 2021-01-21 | Leonhard Kurz Stiftung & Co. Kg | Verfahren und Vorrichtung zum Übertragen einer Transferlage einer Transferfolie auf ein Substrat |
Family Cites Families (48)
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NL288289A (es) | 1962-01-29 | |||
US3264103A (en) | 1962-06-27 | 1966-08-02 | Du Pont | Photopolymerizable relief printing plates developed by dry thermal transfer |
CA1099435A (en) | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
US4323636A (en) | 1971-04-01 | 1982-04-06 | E. I. Du Pont De Nemours And Company | Photosensitive block copolymer composition and elements |
US3867153A (en) | 1972-09-11 | 1975-02-18 | Du Pont | Photohardenable element |
SU1443818A3 (ru) * | 1976-06-11 | 1988-12-07 | Топпан Принтинг Ко,Лтд (Фирма) | Способ получени печатных форм |
DE2942183A1 (de) | 1979-10-18 | 1981-05-07 | Basf Ag, 6700 Ludwigshafen | Fotopolymerisierbare gemische und elemente daraus |
US4264705A (en) | 1979-12-26 | 1981-04-28 | Uniroyal, Inc. | Multilayered elastomeric printing plate |
US4423135A (en) | 1981-01-28 | 1983-12-27 | E. I. Du Pont De Nemours & Co. | Preparation of photosensitive block copolymer elements |
US4427759A (en) | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
US4540649A (en) | 1984-09-12 | 1985-09-10 | Napp Systems (Usa) Inc. | Water developable photopolymerizable composition and printing plate element containing same |
US4622088A (en) | 1984-12-18 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Process for preparing photopolymer flexographic element with melt extrusion coated elastomeric surface layer |
DE4004512A1 (de) | 1990-02-14 | 1991-08-22 | Hoechst Ag | Verfahren zur herstellung von photopolymerplatten |
CA2041023C (en) | 1990-04-26 | 2002-03-12 | William K. Goss | Photocurable elements and flexographic printing plates prepared therefrom |
US5330882A (en) | 1990-06-05 | 1994-07-19 | Nippon Paint Co., Ltd. | Process for exposing a photosensitive resin composition to light |
US5175072A (en) | 1990-07-26 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Flexographic printing plate process |
EP0469735B1 (en) | 1990-07-31 | 1998-06-10 | Minnesota Mining And Manufacturing Company | Device for forming flexographic printing plate |
US5223375A (en) | 1991-07-15 | 1993-06-29 | W. R. Grace & Co.-Conn. | Flexographic printing plate comprising photosensitive elastomer polymer composition |
US5262275A (en) * | 1992-08-07 | 1993-11-16 | E. I. Du Pont De Nemours And Company | Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate |
US5719009A (en) * | 1992-08-07 | 1998-02-17 | E. I. Du Pont De Nemours And Company | Laser ablatable photosensitive elements utilized to make flexographic printing plates |
DE4339010C2 (de) | 1993-06-25 | 2000-05-18 | Pt Sub Inc | Photohärtbares Erzeugnis für Druckplatten |
JP3423077B2 (ja) | 1993-08-25 | 2003-07-07 | ダブリュ・アール・グレイス・アンド・カンパニー・コネテイカット | 版面の製造方法 |
US6238837B1 (en) * | 1995-05-01 | 2001-05-29 | E.I. Du Pont De Nemours And Company | Flexographic element having an infrared ablatable layer |
US5506086A (en) | 1995-05-01 | 1996-04-09 | E. I. Du Pont De Nemours And Company | Process for making a flexographic printing plate |
DE19536808A1 (de) * | 1995-10-02 | 1997-04-03 | Basf Lacke & Farben | Verfahren zur Herstellung von photopolymeren Hochdruckplatten |
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ES2578680T3 (es) * | 2007-09-07 | 2016-07-29 | Precision Rubber Plate Co., Inc | Sistema y método para exponer un placa de polímero digital |
JP2009063873A (ja) * | 2007-09-07 | 2009-03-26 | Toray Ind Inc | 感光性印刷版原版 |
JP2009204857A (ja) * | 2008-02-27 | 2009-09-10 | Asahi Kasei E-Materials Corp | フレキソ印刷版の製造方法 |
ES2483998T3 (es) * | 2008-05-23 | 2014-08-08 | Toyobo Co., Ltd | Una plancha original de impresión flexográfica |
PL2461215T3 (pl) * | 2009-07-30 | 2018-02-28 | Toyobo Co., Ltd. | Fleksograficzna pierwotna płyta drukowa |
JP2011033690A (ja) * | 2009-07-30 | 2011-02-17 | Toyobo Co Ltd | フレキソ印刷版及びフレキソ印刷版作成方法 |
US8158331B2 (en) * | 2009-10-01 | 2012-04-17 | Recchia David A | Method of improving print performance in flexographic printing plates |
US9720326B2 (en) | 2009-10-01 | 2017-08-01 | David A. Recchia | Method of improving print performance in flexographic printing plates |
JP2011107654A (ja) * | 2009-11-20 | 2011-06-02 | Nippon Denshi Seiki Kk | 高解像度フレキソ印刷版の製造方法及びこの方法で得られたフレキソ印刷版 |
US8492074B2 (en) * | 2011-01-05 | 2013-07-23 | Laurie A. Bryant | Method of improving print performance in flexographic printing plates |
US8652761B2 (en) * | 2011-02-18 | 2014-02-18 | David A. Recchia | Photosensitive resin laminate and thermal processing of the same |
-
2011
- 2011-04-21 US US13/091,466 patent/US8551688B2/en active Active
-
2012
- 2012-03-20 ES ES12774409T patent/ES2720855T3/es active Active
- 2012-03-20 CN CN201280019071.5A patent/CN103477281B/zh active Active
- 2012-03-20 BR BR112013022951-9A patent/BR112013022951B1/pt active IP Right Grant
- 2012-03-20 EP EP12774409.2A patent/EP2699964B1/en active Active
- 2012-03-20 WO PCT/US2012/029766 patent/WO2012145111A1/en active Application Filing
- 2012-03-20 CA CA2830267A patent/CA2830267C/en active Active
- 2012-03-20 JP JP2014506415A patent/JP5913567B2/ja active Active
- 2012-03-20 RU RU2013151128/04A patent/RU2554935C2/ru active
-
2013
- 2013-09-03 US US14/016,443 patent/US9223218B2/en active Active
-
2015
- 2015-05-29 JP JP2015109346A patent/JP6181704B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US20120270156A1 (en) | 2012-10-25 |
US20140004466A1 (en) | 2014-01-02 |
BR112013022951B1 (pt) | 2020-10-27 |
CN103477281B (zh) | 2016-08-17 |
WO2012145111A1 (en) | 2012-10-26 |
JP6181704B2 (ja) | 2017-08-16 |
RU2013151128A (ru) | 2015-05-27 |
JP2014512576A (ja) | 2014-05-22 |
EP2699964A4 (en) | 2014-11-05 |
JP2015179284A (ja) | 2015-10-08 |
CA2830267A1 (en) | 2012-10-26 |
BR112013022951A2 (pt) | 2016-12-06 |
EP2699964B1 (en) | 2019-03-06 |
RU2554935C2 (ru) | 2015-07-10 |
JP5913567B2 (ja) | 2016-04-27 |
US8551688B2 (en) | 2013-10-08 |
CN103477281A (zh) | 2013-12-25 |
CA2830267C (en) | 2016-05-17 |
US9223218B2 (en) | 2015-12-29 |
EP2699964A1 (en) | 2014-02-26 |
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