ES2146884T3 - Pasta fotosensible, visualizador a base de plasma y procedimientos para su fabricacion. - Google Patents

Pasta fotosensible, visualizador a base de plasma y procedimientos para su fabricacion.

Info

Publication number
ES2146884T3
ES2146884T3 ES96917656T ES96917656T ES2146884T3 ES 2146884 T3 ES2146884 T3 ES 2146884T3 ES 96917656 T ES96917656 T ES 96917656T ES 96917656 T ES96917656 T ES 96917656T ES 2146884 T3 ES2146884 T3 ES 2146884T3
Authority
ES
Spain
Prior art keywords
photosensitive paste
procedures
manufacture
based display
plasma based
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96917656T
Other languages
English (en)
Other versions
ES2146884T5 (es
Inventor
Yuichiro Iguchi
Takaki Masaki
Keiji Iwanaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27572531&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2146884(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP26452995A external-priority patent/JPH09110466A/ja
Priority claimed from JP32179495A external-priority patent/JP3716469B2/ja
Priority claimed from JP6104796A external-priority patent/JP3567591B2/ja
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of ES2146884T3 publication Critical patent/ES2146884T3/es
Application granted granted Critical
Publication of ES2146884T5 publication Critical patent/ES2146884T5/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H01J9/2271—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines by photographic processes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/046—Polymers of unsaturated carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Materials For Photolithography (AREA)

Abstract

SE SUMINISTRA UNA PASTA FOTOSENSIBLE QUE PERMITE LA FORMACION DE IMAGENES CON UNA ALTA RELACION DE ASPECTO Y UNA ALTA EXACTITUD ASI COMO UNA PANTALLA DE PLASMA QUE COMPRENDE LA PASTA FOTOSENSIBLE, LA PASTA FOTOSENSIBLE COMPRENDE, COMO COMPONENTES ESENCIALES, PARTICULAS INORGANICAS Y UN COMPONENTE ORGANICO QUE CONTIENE UN COMPUESTO FOTOSENSIBLE SIENDO LA DIFERENCIA ENTRE EL INDICE REFRACTIVO MEDIO DEL COMPONENTE ORGANICO Y EL INDICE REFRACTIVO MEDIO DE LAS PARTICULAS INORGANICAS DE 0.1 O INFERIOR.
ES96917656T 1995-06-12 1996-06-12 Pasta fotosensible, visualizador a base de plasma y procedimientos para su fabricacion. Expired - Lifetime ES2146884T5 (es)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP14477195 1995-06-12
JP14477195 1995-06-12
JP26452995A JPH09110466A (ja) 1995-10-12 1995-10-12 感光性絶縁ガラスペースト
JP32179495A JP3716469B2 (ja) 1995-06-12 1995-12-11 パターン加工用感光性ペースト
JP32179395 1995-12-11
JP32179595 1995-12-11
JP32179595 1995-12-11
JP6104696 1996-03-18
JP6104896 1996-03-18
JP6104796A JP3567591B2 (ja) 1995-06-12 1996-03-18 プラズマディスプレイの製造方法
JP6104696 1996-03-18
PCT/JP1996/001596 WO1996042035A1 (fr) 1995-06-12 1996-06-12 Pate photosensible, afficheur a plasma et leurs procedes de fabrication

Publications (2)

Publication Number Publication Date
ES2146884T3 true ES2146884T3 (es) 2000-08-16
ES2146884T5 ES2146884T5 (es) 2004-09-01

Family

ID=27572531

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96917656T Expired - Lifetime ES2146884T5 (es) 1995-06-12 1996-06-12 Pasta fotosensible, visualizador a base de plasma y procedimientos para su fabricacion.

Country Status (6)

Country Link
EP (1) EP0775940B2 (es)
CN (3) CN1119701C (es)
CA (1) CA2197331C (es)
DE (1) DE69607569T3 (es)
ES (1) ES2146884T5 (es)
WO (1) WO1996042035A1 (es)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000284472A (ja) * 1999-01-27 2000-10-13 Murata Mfg Co Ltd 感光性絶縁体ペースト及び厚膜多層回路基板
JP3651298B2 (ja) * 1999-02-17 2005-05-25 株式会社村田製作所 感光性絶縁体ペースト及び厚膜多層回路基板
TW522435B (en) * 2000-05-23 2003-03-01 Toray Industries Slurry, display component and process for producing the display component
JP4043782B2 (ja) * 2001-12-27 2008-02-06 東京応化工業株式会社 プラズマディスプレイパネルの誘電体用組成物、誘電体用積層体、及び誘電体の形成方法
CN1448792A (zh) * 2002-03-29 2003-10-15 住友化学工业株式会社 光敏膏
JP4211782B2 (ja) 2003-11-25 2009-01-21 株式会社村田製作所 厚膜パターンの形成方法、電子部品の製造方法
JP4271048B2 (ja) * 2004-01-28 2009-06-03 東京応化工業株式会社 感光性無機ペースト組成物、これを用いたプラズマディスプレイ前面板製造用シート状未焼成体、および、プラズマディスプレイ前面板の製造方法
JP3938919B2 (ja) 2004-02-27 2007-06-27 東京応化工業株式会社 無機ペースト組成物、無機ペースト組成物の製造方法、および、ディスプレイパネル製造用シート状未焼成体
KR100845657B1 (ko) 2004-07-07 2008-07-10 다이요 잉키 세이조 가부시키가이샤 광 경화성·열 경화성 수지 조성물과 그것을 사용한 건식필름, 및 그의 경화물
JP4215700B2 (ja) * 2004-10-06 2009-01-28 東京応化工業株式会社 プラズマディスプレイパネル用の前面板及び背面板
CN101246315B (zh) * 2007-02-16 2011-05-11 明德国际仓储贸易(上海)有限公司 光阻剂清洗液组成物及其应用
CN101641749B (zh) * 2007-03-26 2011-05-04 株式会社村田制作所 感光性电介质糊剂及使用其的电子部件
CN101226332B (zh) * 2007-12-26 2011-02-16 彩虹集团公司 一种障壁浆料的制备方法
US9625706B2 (en) * 2014-07-31 2017-04-18 Jsr Corporation Display element, photosensitive composition and electrowetting display
CN104614939A (zh) * 2015-01-09 2015-05-13 苏州瑞红电子化学品有限公司 一种用于gpp工艺中混合玻璃粉用负性光刻胶组合物
CN116514402A (zh) * 2023-05-06 2023-08-01 乾宇微纳技术(深圳)有限公司 一种应用于负型厚膜光刻浆料的玻璃粉及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4192795A (en) * 1977-09-29 1980-03-11 Sybron Corporation Barium aluminum silicate filler for U.V. curable composites
JPS609124A (ja) * 1983-06-29 1985-01-18 Hitachi Ltd パタ−ン形成方法
US4503169A (en) * 1984-04-19 1985-03-05 Minnesota Mining And Manufacturing Company Radiopaque, low visual opacity dental composites containing non-vitreous microparticles
US4613560A (en) † 1984-12-28 1986-09-23 E. I. Du Pont De Nemours And Company Photosensitive ceramic coating composition
MX166545B (es) * 1986-02-21 1993-01-18 Zenith Electronics Corp Conjunto delantero para un tubo de rayos catodicos
JP2775109B2 (ja) * 1989-02-22 1998-07-16 株式会社住友金属エレクトロデバイス プラズマディスプレイパネルとそのパネル用障壁の形成方法
JPH04240854A (ja) * 1991-01-25 1992-08-28 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
US5260163A (en) * 1992-05-07 1993-11-09 E. I. Du Pont De Nemours And Company Photoenhanced diffusion patterning for organic polymer films
JP3668978B2 (ja) * 1993-07-29 2005-07-06 東レ株式会社 感光性絶縁ペースト

Also Published As

Publication number Publication date
CA2197331A1 (en) 1996-12-27
EP0775940A4 (en) 1998-03-04
CN1157042A (zh) 1997-08-13
CN1238765C (zh) 2006-01-25
DE69607569T3 (de) 2004-11-04
EP0775940A1 (en) 1997-05-28
CN1119701C (zh) 2003-08-27
ES2146884T5 (es) 2004-09-01
EP0775940B1 (en) 2000-04-05
DE69607569T2 (de) 2000-11-02
WO1996042035A1 (fr) 1996-12-27
CN1707735A (zh) 2005-12-14
CN100474491C (zh) 2009-04-01
CA2197331C (en) 2007-02-27
EP0775940B2 (en) 2004-01-02
DE69607569D1 (de) 2000-05-11
CN1515962A (zh) 2004-07-28

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