ES2142645T3 - Sistema de capas de interferencia. - Google Patents
Sistema de capas de interferencia.Info
- Publication number
- ES2142645T3 ES2142645T3 ES97112245T ES97112245T ES2142645T3 ES 2142645 T3 ES2142645 T3 ES 2142645T3 ES 97112245 T ES97112245 T ES 97112245T ES 97112245 T ES97112245 T ES 97112245T ES 2142645 T3 ES2142645 T3 ES 2142645T3
- Authority
- ES
- Spain
- Prior art keywords
- sub
- layers
- bombing
- khz
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
UNAS CAPAS DIELECTRICAS QUE ACTUAN OPTICAMENTE, POR EJEMPLO DE SIO SUB,2}, AL SUB,2}O SUB,3}, ZRO SUB,2}, TIO SUB,2}, ZNO SUB,2}, SON SEPARADAS MEDIANTE UN PROCEDIMIENTO DE DESALOJO POR BOMBARDEO IONICO CON UN TIPO DE CRECIMIENTO DE LA CAPA 4 NM/S EN LOS SUBSTRATOS. ESTAS CAPAS DE OXIDO METALICO DESALOJADAS POR BOMBARDEO MUESTRAN UN INDICE DE ROTURA DE ENTRE 2,55 Y 2,60. LAS CAPAS DE TIO SUB,2} (4, 6) APLICADAS CON UN PLASMA DE BOMBARDEO ALIMENTADO CON TENSION ALTERNA, SE CRISTALIZAN COMO ESTRUCTURA DE RUTILO SOBRE LOS SUBSTRATOS, COMO POR EJEMPLO UN SI-WAVER 2, Y MUESTRAN UNA ELEVADA CONSISTENCIA FRENTE A LA ACCION DE SUSTANCIAS QUIMICAS REACTIVAS. LAS CAPAS DE OXIDO METALICO SON IDONEAS PARA LA FABRICACION DE SISTEMAS DE CAPAS LOW-E, ASI COMO PARA LA FABRICACION DE CAPAS DE CONTROL SOLAR. LA FRECUENCIA ALTERNA DE LA CORRIENTE ELECTRICA QUE ABASTECE EL PLASMA DE BOMBARDEO ES PREFERENTEMENTE DE ENTRE 10 KHZ Y 80 KHZ.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19644752A DE19644752A1 (de) | 1996-10-28 | 1996-10-28 | Interferenzschichtensystem |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2142645T3 true ES2142645T3 (es) | 2000-04-16 |
Family
ID=7810208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES97112245T Expired - Lifetime ES2142645T3 (es) | 1996-10-28 | 1997-07-17 | Sistema de capas de interferencia. |
Country Status (7)
Country | Link |
---|---|
US (2) | US6451178B2 (es) |
EP (1) | EP0838535B1 (es) |
JP (1) | JP4099252B2 (es) |
KR (1) | KR100279110B1 (es) |
DE (2) | DE19644752A1 (es) |
ES (1) | ES2142645T3 (es) |
TW (1) | TW479076B (es) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10140514A1 (de) | 2001-08-17 | 2003-02-27 | Heraeus Gmbh W C | Sputtertarget auf Basis von Titandioxid |
TWI372140B (en) * | 2003-01-28 | 2012-09-11 | Koninkl Philips Electronics Nv | Method of producing transparent titanium oxide coatings having a rutile structure |
WO2005035822A1 (en) * | 2003-10-07 | 2005-04-21 | Deposition Sciences, Inc. | Apparatus and process for high rate deposition of rutile titanium dioxide |
JP2008505842A (ja) | 2004-07-12 | 2008-02-28 | 日本板硝子株式会社 | 低保守コーティング |
US7737459B2 (en) * | 2004-09-22 | 2010-06-15 | Cree, Inc. | High output group III nitride light emitting diodes |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
WO2007124291A2 (en) | 2006-04-19 | 2007-11-01 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
JP2008216587A (ja) * | 2007-03-02 | 2008-09-18 | Canon Inc | Si酸化膜の形成方法、配向膜および液晶光学装置 |
JP2009007636A (ja) * | 2007-06-28 | 2009-01-15 | Sony Corp | 低屈折率膜及びその成膜方法、並びに反射防止膜 |
WO2009036263A2 (en) | 2007-09-14 | 2009-03-19 | Cardinal Cg Company | Low-maintenance coating technology |
KR101579778B1 (ko) * | 2008-09-05 | 2015-12-24 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 흑색 피복막과 그 제조 방법, 흑색 차광판 및 그것을 이용한 조리개, 광량 조정용 조리개 장치, 셔터, 및 내열 차광 테이프 |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE157808C (es) | 1903-12-21 | |||
US3650815A (en) * | 1969-10-06 | 1972-03-21 | Westinghouse Electric Corp | Chemical vapor deposition of dielectric thin films of rutile |
US4002545A (en) * | 1976-02-09 | 1977-01-11 | Corning Glass Works | Method of forming a thin film capacitor |
JPS577129A (en) * | 1980-06-17 | 1982-01-14 | Fujitsu Ltd | Treating method and device for sputtering |
DD157808A1 (de) * | 1981-04-01 | 1982-12-08 | Klaus Steenbeck | Verfahren zur steuerung der schichtzusammensetzung von verbindungsschichten |
JPS58137809A (ja) * | 1982-02-10 | 1983-08-16 | Fujitsu Ltd | 高安定誘電体多層膜光学フイルタ |
US4851095A (en) * | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
DE3925536A1 (de) * | 1989-08-02 | 1991-02-07 | Leybold Ag | Anordnung zur dickenmessung von duennschichten |
DE4106770C2 (de) * | 1991-03-04 | 1996-10-17 | Leybold Ag | Verrichtung zum reaktiven Beschichten eines Substrats |
JPH05132770A (ja) * | 1991-11-11 | 1993-05-28 | Canon Inc | スパツタ装置 |
US5415757A (en) * | 1991-11-26 | 1995-05-16 | Leybold Aktiengesellschaft | Apparatus for coating a substrate with electrically nonconductive coatings |
JPH08511830A (ja) * | 1993-06-17 | 1996-12-10 | デポジション・サイエンシス,インコーポレイテッド | スパッタリング装置 |
JPH07326783A (ja) * | 1994-05-30 | 1995-12-12 | Canon Inc | 光起電力素子の形成方法及びそれに用いる薄膜製造装置 |
DE4441206C2 (de) * | 1994-11-19 | 1996-09-26 | Leybold Ag | Einrichtung für die Unterdrückung von Überschlägen in Kathoden-Zerstäubungseinrichtungen |
US5698314A (en) * | 1995-05-22 | 1997-12-16 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Compound body of vacuum-coated sintered material and process for its production |
DE19540794A1 (de) * | 1995-11-02 | 1997-05-07 | Leybold Ag | Vorrichtung zum Beschichten eines Substrats von einem elektrisch leitfähigen Target |
-
1996
- 1996-10-28 DE DE19644752A patent/DE19644752A1/de not_active Withdrawn
-
1997
- 1997-07-17 DE DE59701086T patent/DE59701086D1/de not_active Expired - Lifetime
- 1997-07-17 ES ES97112245T patent/ES2142645T3/es not_active Expired - Lifetime
- 1997-07-17 EP EP97112245A patent/EP0838535B1/de not_active Expired - Lifetime
- 1997-07-28 TW TW086110716A patent/TW479076B/zh not_active IP Right Cessation
- 1997-08-29 KR KR1019970042524A patent/KR100279110B1/ko active IP Right Grant
- 1997-10-27 JP JP30943997A patent/JP4099252B2/ja not_active Expired - Lifetime
- 1997-10-28 US US08/959,633 patent/US6451178B2/en not_active Expired - Lifetime
-
2002
- 2002-02-05 US US10/067,711 patent/US6814839B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE19644752A1 (de) | 1998-04-30 |
US20020070106A1 (en) | 2002-06-13 |
US20010006148A1 (en) | 2001-07-05 |
KR19980032329A (ko) | 1998-07-25 |
US6451178B2 (en) | 2002-09-17 |
JPH10130830A (ja) | 1998-05-19 |
JP4099252B2 (ja) | 2008-06-11 |
EP0838535B1 (de) | 2000-02-02 |
EP0838535A1 (de) | 1998-04-29 |
TW479076B (en) | 2002-03-11 |
DE59701086D1 (de) | 2000-03-09 |
US6814839B2 (en) | 2004-11-09 |
KR100279110B1 (ko) | 2001-01-15 |
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