ES2127210T3 - Memoria con celula de memoria eeprom de efecto capacitivo y procedimiento de lectura de una celda de memoria de este tipo. - Google Patents

Memoria con celula de memoria eeprom de efecto capacitivo y procedimiento de lectura de una celda de memoria de este tipo.

Info

Publication number
ES2127210T3
ES2127210T3 ES92401408T ES92401408T ES2127210T3 ES 2127210 T3 ES2127210 T3 ES 2127210T3 ES 92401408 T ES92401408 T ES 92401408T ES 92401408 T ES92401408 T ES 92401408T ES 2127210 T3 ES2127210 T3 ES 2127210T3
Authority
ES
Spain
Prior art keywords
memory cell
memory
eeprom
type
capacitive effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92401408T
Other languages
English (en)
Inventor
Jacek Kowalski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gemplus SA
Original Assignee
Gemplus Card International SA
Gemplus SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gemplus Card International SA, Gemplus SA filed Critical Gemplus Card International SA
Application granted granted Critical
Publication of ES2127210T3 publication Critical patent/ES2127210T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors with potential-jump barrier or surface barrier
    • H01L29/94Metal-insulator-semiconductors, e.g. MOS
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B69/00Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices

Abstract

EN UNA CELULA DE MEMORIA DE UNA MEMORIA EEPROM O FLASH-EEPROM, SE CONECTAN JUNTOS LA FUENTE Y EL DRENAJE DE UN TRANSISTOR DE REJILLA FLOTANTE FORMANDO EL DISPOSITIVO DE MEMORIZACION NO VOLATIL. SE MUESTRA QUE ENTONCES EL COMPORTAMIENTO CAPACITIVO DE LA CELULA SE DIFERENCIA EN EL MOMENTO DE LA LECTURA SEGUN ESTE EN UN ESTADO PROGRAMADO O BORRADO. ESTA DIFERENCIA DE COMPORTAMIENTO SIRVE PARA DIFERENCIAR LOS ESTADOS LOGICOS.
ES92401408T 1991-05-29 1992-05-22 Memoria con celula de memoria eeprom de efecto capacitivo y procedimiento de lectura de una celda de memoria de este tipo. Expired - Lifetime ES2127210T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR919106466A FR2690008B1 (fr) 1991-05-29 1991-05-29 Memoire avec cellule memoire eeprom a effet capacitif et procede de lecture d'une telle cellule memoire.

Publications (1)

Publication Number Publication Date
ES2127210T3 true ES2127210T3 (es) 1999-04-16

Family

ID=9413241

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92401408T Expired - Lifetime ES2127210T3 (es) 1991-05-29 1992-05-22 Memoria con celula de memoria eeprom de efecto capacitivo y procedimiento de lectura de una celda de memoria de este tipo.

Country Status (6)

Country Link
US (2) US5552621A (es)
EP (1) EP0516516B1 (es)
JP (1) JPH05206478A (es)
DE (1) DE69227542T2 (es)
ES (1) ES2127210T3 (es)
FR (1) FR2690008B1 (es)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100350819B1 (ko) * 1994-10-28 2003-01-15 코닌클리케 필립스 일렉트로닉스 엔.브이. 전계효과장치
FR2739737B1 (fr) * 1995-10-09 1997-11-21 Inside Technologies Perfectionnements aux cartes a memoire
FR2739706B1 (fr) * 1995-10-09 1997-11-21 Inside Technologies Perfectionnements aux cartes a memoire
US5925904A (en) * 1996-04-03 1999-07-20 Altera Corporation Two-terminal electrically-reprogrammable programmable logic element
US5777361A (en) * 1996-06-03 1998-07-07 Motorola, Inc. Single gate nonvolatile memory cell and method for accessing the same
IT1289540B1 (it) * 1996-07-10 1998-10-15 Sgs Thomson Microelectronics Metodo per trasformare automaticamente la fabbricazione di una cella di memoria eprom nella fabbricazione di una cella di memoria
US5838616A (en) * 1996-09-30 1998-11-17 Symbios, Inc. Gate edge aligned EEPROM transistor
US6667506B1 (en) * 1999-04-06 2003-12-23 Peregrine Semiconductor Corporation Variable capacitor with programmability
US6690056B1 (en) 1999-04-06 2004-02-10 Peregrine Semiconductor Corporation EEPROM cell on SOI
US6169302B1 (en) * 1999-07-27 2001-01-02 Advanced Micro Devices, Inc. Determination of parasitic capacitance between the gate and drain/source local interconnect of a field effect transistor
ITMI20041802A1 (it) * 2004-09-21 2004-12-21 Atmel Corp "nuovo metodo compensato per attuare una fase di scarica ad alta tensione dopo un impulso di cancellazione in un dispositivo di memoria flash"
WO2006033832A2 (en) * 2004-09-21 2006-03-30 Atmel Corporation New compensated method to implement a high voltage discharge phase after erase pulse in a flash memory device
US7923767B2 (en) * 2007-12-26 2011-04-12 Sandisk Corporation Non-volatile storage with substrate cut-out and process of fabricating
US11659709B2 (en) * 2020-08-21 2023-05-23 Globalfoundries Singapore Pte. Ltd. Single well one transistor and one capacitor nonvolatile memory device and integration schemes

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4037243A (en) * 1974-07-01 1977-07-19 Motorola, Inc. Semi conductor memory cell utilizing sensing of variations in PN junction current conrolled by stored data
US4242736A (en) * 1976-10-29 1980-12-30 Massachusetts Institute Of Technology Capacitor memory and methods for reading, writing, and fabricating capacitor memories
US4363109A (en) * 1980-11-28 1982-12-07 General Motors Corporation Capacitance coupled eeprom
US4663645A (en) * 1984-05-23 1987-05-05 Hitachi, Ltd. Semiconductor device of an LDD structure having a floating gate
JPS6180851A (ja) * 1984-09-28 1986-04-24 Toshiba Corp 不揮発性半導体記憶装置
JPS635558A (ja) * 1986-06-25 1988-01-11 Seiko Instr & Electronics Ltd 不揮発性ram
FR2609831B1 (fr) * 1987-01-16 1989-03-31 Thomson Semiconducteurs Circuit de lecture pour memoire
FR2610134B1 (fr) * 1987-01-27 1989-03-31 Thomson Semiconducteurs Circuit de lecture pour memoire
US5243210A (en) * 1987-02-21 1993-09-07 Kabushiki Kaisha Toshiba Semiconductor memory device and manufacturing method thereof
FR2613491B1 (fr) * 1987-04-03 1989-07-21 Thomson Csf Dispositif de detection du niveau haut d'une tension en technologie mos
FR2617979B1 (fr) * 1987-07-10 1989-11-10 Thomson Semiconducteurs Dispositif de detection de la depassivation d'un circuit integre
FR2617976B1 (fr) * 1987-07-10 1989-11-10 Thomson Semiconducteurs Detecteur electrique de niveau logique binaire
FR2618579B1 (fr) * 1987-07-21 1989-11-10 Thomson Semiconducteurs Circuit integre a memoire comportant un dispositif anti-fraude
FR2622019B1 (fr) * 1987-10-19 1990-02-09 Thomson Semiconducteurs Dispositif de test structurel d'un circuit integre
FR2622038B1 (fr) * 1987-10-19 1990-01-19 Thomson Semiconducteurs Procede de programmation des cellules memoire d'une memoire et circuit pour la mise en oeuvre de ce procede
FR2623018B1 (fr) * 1987-11-06 1990-02-09 Thomson Semiconducteurs Circuit integre protege contre les decharges electrostatiques avec seuil de protection variable
FR2623016B1 (fr) * 1987-11-06 1991-06-14 Thomson Semiconducteurs Dispositif de fusion d'un fusible dans un circuit integre de type cmos
US5017980A (en) * 1988-07-15 1991-05-21 Texas Instruments Incorporated Electrically-erasable, electrically-programmable read-only memory cell
US4989053A (en) * 1989-03-27 1991-01-29 Shelton Everett K Nonvolatile process compatible with a digital and analog double level metal MOS process
US5017979A (en) * 1989-04-28 1991-05-21 Nippondenso Co., Ltd. EEPROM semiconductor memory device
FR2649817B1 (fr) * 1989-07-13 1993-12-24 Gemplus Card International Carte a microcircuit protegee contre l'intrusion
FR2667714A1 (fr) * 1990-10-09 1992-04-10 Gemplus Card Int Procede pour repartir la memoire d'un circuit integre entre plusieurs applications.
US5291439A (en) * 1991-09-12 1994-03-01 International Business Machines Corporation Semiconductor memory cell and memory array with inversion layer

Also Published As

Publication number Publication date
DE69227542D1 (de) 1998-12-17
DE69227542T2 (de) 2000-10-05
US5552621A (en) 1996-09-03
EP0516516A1 (fr) 1992-12-02
FR2690008B1 (fr) 1994-06-10
JPH05206478A (ja) 1993-08-13
EP0516516B1 (fr) 1998-11-11
FR2690008A1 (fr) 1993-10-15
US5721440A (en) 1998-02-24

Similar Documents

Publication Publication Date Title
ES2127210T3 (es) Memoria con celula de memoria eeprom de efecto capacitivo y procedimiento de lectura de una celda de memoria de este tipo.
EP0326883B1 (en) Zero power, electrically alterable, nonvolatile latch
DE69418522D1 (de) Nichtflüchtige Halbleiterspeicheranordnung mit Nachprüfungsfunktion
IT8322984A0 (it) Memoria non volatile in cui puo'essere attuata scrittura e cancellatura con basse tensioni.
DE69430668D1 (de) Flash-speicher mit verringerter löschung und überschreibung
KR890002890A (ko) 부정방지장치로 이루어진 메모리를 가진 집적회로
DE3882898T2 (de) Nichtflüchtiger Halbleiterspeicher mit Belastungsprüfschaltung.
DE69227011T2 (de) Löschbare Halbleiterspeicheranordnung mit verbesserter Zuverlässigkeit
ES540446A0 (es) Una unidad de memoria semiconductora no volatil,de aplica- cion a circuitos electronicos
DE69028483D1 (de) Mikrokontroller mit Reparatur von Fehlern des nichtflüchtigen Speichers
ATE403220T1 (de) Nichtflüchtige, statische speicherzelle
ES2040295T3 (es) Disposicion de circuito para verificar las lineas de alimentacion de un interruptor o sensor.
KR870011693A (ko) 반도체 메모리장치의 리던던시회로
DE69228399D1 (de) Speicherzellenmatrix der Multiporthalbleiterspeicheranordnungstype
ATE87753T1 (de) Redundanzdekoder eines integrierten halbleiterspeichers.
SG38084G (en) Semi-conductor floating gate memory cell with write and erase electrodes
DE69025561D1 (de) Speicherzelle mit schwebendem Gatter und ihre Anwendung für einen Halbleiterspeicher
ES2175024T3 (es) Componente electronico con una memoria no volatil borrable electricamente.
DE69025516D1 (de) Halbleiter-Speichergerät mit redundanten Speicherzellen
JPS5538624A (en) Nonvolatile semiconductor memory device
KR900000915A (ko) 불휘발성 반도체 메모리
JPS5517869A (en) Semiconductor memory device
DE69132402T2 (de) Zellmatrix für nichtflüchtige Halbleiter-Speichervorrichtungen
JPS6443897A (en) Non-volatile semiconductor memory device capable of being erased and written electrically
DE69807007D1 (de) Nichtflüchtige Speicherzellenanordnung mit einer Schreibschaltung mit Verriegelungschaltung und Übertragungstransistor

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 516516

Country of ref document: ES