ES2093133T3 - Procedimiento e instalacion para el recubrimiento de al menos un objeto. - Google Patents

Procedimiento e instalacion para el recubrimiento de al menos un objeto.

Info

Publication number
ES2093133T3
ES2093133T3 ES92105963T ES92105963T ES2093133T3 ES 2093133 T3 ES2093133 T3 ES 2093133T3 ES 92105963 T ES92105963 T ES 92105963T ES 92105963 T ES92105963 T ES 92105963T ES 2093133 T3 ES2093133 T3 ES 2093133T3
Authority
ES
Spain
Prior art keywords
direct current
procedure
coating
installation
fed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92105963T
Other languages
English (en)
Inventor
Eduard Dr Dipl-Ing Kuegler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Application granted granted Critical
Publication of ES2093133T3 publication Critical patent/ES2093133T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0094—Reactive sputtering in transition mode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Physical Vapour Deposition (AREA)
  • Insulating Bodies (AREA)
  • Fertilizers (AREA)

Abstract

PROCEDIMIENTO E INSTALACION PARA EL RECUBRIMIENTO DE CAPAS DE AL MENOS UN OBJETO. PARA LA PRODUCCION DE CAPAS DIELECTRICAS SE PULVERIZA CON REACTIVO UN OBJETO CONDUCTOR. LA MANTENIDA DESCARGA DE EFLUVIOS SE ALIMENTA CON CORRIENTE CONTINUA Y CORRIENTE ALTERNA, SUPERPUESTA A LA CORRIENTE CONTINUA. POR MEDIO DE UN CIRCUITO DE REGULACION SE ESTABILIZA EL PUNTO DE TRABAJO DEL PROCESO EN EL POR SI INESTABLE MODO DE TRANSFERENCIA. SE CONSIGUE UN ALTO RENDIMIENTO EN EL RECUBRIMIENTO DE CAPAS CON UN ALTO GRADO DE REACCION DE LA CAPA APLICADA.
ES92105963T 1991-04-12 1992-04-07 Procedimiento e instalacion para el recubrimiento de al menos un objeto. Expired - Lifetime ES2093133T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH109591 1991-04-12

Publications (1)

Publication Number Publication Date
ES2093133T3 true ES2093133T3 (es) 1996-12-16

Family

ID=4202358

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92105963T Expired - Lifetime ES2093133T3 (es) 1991-04-12 1992-04-07 Procedimiento e instalacion para el recubrimiento de al menos un objeto.

Country Status (6)

Country Link
US (2) US5292417A (es)
EP (1) EP0508359B1 (es)
JP (1) JP3417575B2 (es)
AT (1) ATE144004T1 (es)
DE (1) DE59207306D1 (es)
ES (1) ES2093133T3 (es)

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US5693197A (en) * 1994-10-06 1997-12-02 Hmt Technology Corporation DC magnetron sputtering method and apparatus
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Also Published As

Publication number Publication date
US5423970A (en) 1995-06-13
US5292417A (en) 1994-03-08
DE59207306D1 (de) 1996-11-14
JP3417575B2 (ja) 2003-06-16
EP0508359A1 (de) 1992-10-14
EP0508359B1 (de) 1996-10-09
ATE144004T1 (de) 1996-10-15
JPH06128742A (ja) 1994-05-10

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