ES2087571T3 - Evaporacion termica en dos planos. - Google Patents

Evaporacion termica en dos planos.

Info

Publication number
ES2087571T3
ES2087571T3 ES93100690T ES93100690T ES2087571T3 ES 2087571 T3 ES2087571 T3 ES 2087571T3 ES 93100690 T ES93100690 T ES 93100690T ES 93100690 T ES93100690 T ES 93100690T ES 2087571 T3 ES2087571 T3 ES 2087571T3
Authority
ES
Spain
Prior art keywords
thermal evaporation
planes
source
vertical
deposit metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93100690T
Other languages
English (en)
Inventor
Richard C Eisfeller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Davidson Textron Inc
Original Assignee
Davidson Textron Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Davidson Textron Inc filed Critical Davidson Textron Inc
Application granted granted Critical
Publication of ES2087571T3 publication Critical patent/ES2087571T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

LA METALIZACION AL VACIO DE SUSTRATOS CON SUPERFICIES TANTO VERTICALES COMO HORIZONTALES TIENE LUGAR DIRIGIENDO METAL DE DOS FUENTES REMOTAS POR EVAPORACION TERMICA. SE CONECTA UNA FUENTE HORIZONTALMENTE POR DEBAJO DEL OBJETO PARA DEPOSITAR METAL HACIA EL OBJETO VERTICALMENTE A SU SUPERFICIE HORIZONTAL. LA FUENTE SEGUNDA SE CONECTA VERTICALMENTE EL OBJETO PARA DEPOSITAR METAL HACIA EL OBJETO HORIZONTALMENTE A SU SUPERFICIE VERTICAL. UNA CAMARA DE VACIO CONTIENE UN CARRUSEL ROTATIVO QUE SUJETA LOS OBJETOS CON LAS FUENTES LOCALIZADAS FIJAS DENTRO DE LA CAMARA PARA EJECUTAR LA EVAPORACION TERMICA.
ES93100690T 1992-03-24 1993-01-19 Evaporacion termica en dos planos. Expired - Lifetime ES2087571T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/856,713 US5198272A (en) 1992-03-24 1992-03-24 Thermal evaporation in two planes

Publications (1)

Publication Number Publication Date
ES2087571T3 true ES2087571T3 (es) 1996-07-16

Family

ID=25324324

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93100690T Expired - Lifetime ES2087571T3 (es) 1992-03-24 1993-01-19 Evaporacion termica en dos planos.

Country Status (12)

Country Link
US (1) US5198272A (es)
EP (1) EP0558898B1 (es)
JP (1) JP3434846B2 (es)
KR (1) KR960002634B1 (es)
AU (1) AU3203793A (es)
CA (1) CA2087151C (es)
CZ (1) CZ39593A3 (es)
DE (1) DE69302507T2 (es)
ES (1) ES2087571T3 (es)
HU (1) HU9300833D0 (es)
MX (1) MX9301562A (es)
PL (1) PL298216A1 (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4201584C1 (es) * 1992-01-22 1993-04-15 Leybold Ag, 6450 Hanau, De
CH685348A5 (de) * 1992-05-08 1995-06-15 Balzers Hochvakuum Vakuumbeschichtungsanlage mit drehgetriebenem Substratträger.
US5284679A (en) * 1992-11-16 1994-02-08 Davidson Textron Inc. Method for making bright trim articles
JP2590438B2 (ja) * 1994-06-30 1997-03-12 工業技術院長 薄膜形成方法および薄膜形成装置
JPH09202963A (ja) 1995-08-25 1997-08-05 Abcor Inc エッチングを行わずに金属化アイランド被覆製品を製造する方法
US5558909A (en) * 1996-01-17 1996-09-24 Textron Automotive Interiors, Inc. Apparatus and method for vacuum-metallizing articles with significant deposition onto three-dimensional surfaces
KR20010033813A (ko) * 1997-12-31 2001-04-25 스코트 에이. 맥닐 금속화된 시이트와 복합물 및 이들의 제조방법
US20070028842A1 (en) * 2005-08-02 2007-02-08 Makoto Inagawa Vacuum chamber bottom
JP4725589B2 (ja) * 2008-03-25 2011-07-13 ソニー株式会社 複合微粒子の製造装置及び製造方法
JP2011058071A (ja) * 2009-09-11 2011-03-24 Sony Corp 複合微粒子の製造装置、及び、複合微粒子の製造方法
JP2013040357A (ja) * 2011-08-11 2013-02-28 Optorun Co Ltd 成膜装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4116161A (en) * 1976-11-12 1978-09-26 Mcdonnell Douglas Corporation Dual tumbling barrel plating apparatus
US4431711A (en) * 1980-03-25 1984-02-14 Ex-Cell-O Corporation Vacuum metallizing a dielectric substrate with indium and products thereof
CH650028A5 (de) * 1980-09-26 1985-06-28 Balzers Hochvakuum Anordnung zum gleichfoermigen beschichten von rotationsflaechen durch bedampfen im hochvakuum.
JPS60129158A (ja) * 1983-12-15 1985-07-10 Toyoda Gosei Co Ltd プラズマ処理装置
CA1249926A (en) * 1984-06-12 1989-02-14 Katsuhide Manabe Plasma processing apparatus
GB8718916D0 (en) * 1987-08-10 1987-09-16 Ion Tech Ltd Thin film alloying apparatus
DD265175A1 (de) * 1987-09-24 1989-02-22 Hochvakuum Dresden Veb Verfahren und einrichtung zur homogenen schichtabscheidung in vakuumanlagen
US5090350A (en) * 1989-12-27 1992-02-25 Xerox Corporation Method and apparatus for cleaning, coating and curing receptor substrates in an enclosed planetary array
US5133604A (en) * 1991-07-30 1992-07-28 Davidson Textron Inc. Method and apparatus for evaluating evaporating boats based on evaporation rate characteristics

Also Published As

Publication number Publication date
DE69302507T2 (de) 1996-11-28
PL298216A1 (en) 1993-10-04
JP3434846B2 (ja) 2003-08-11
CA2087151C (en) 2002-08-20
MX9301562A (es) 1993-09-01
JPH062111A (ja) 1994-01-11
KR930019860A (ko) 1993-10-19
CA2087151A1 (en) 1993-09-25
HU9300833D0 (en) 1993-06-28
AU3203793A (en) 1993-09-30
EP0558898A1 (en) 1993-09-08
KR960002634B1 (ko) 1996-02-24
US5198272A (en) 1993-03-30
CZ39593A3 (en) 1994-04-13
EP0558898B1 (en) 1996-05-08
DE69302507D1 (de) 1996-06-13

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