ES2073508T3 - Metodo para aplicar una capa de material superconductor y un dispositivo adecuado para dicho metodo. - Google Patents
Metodo para aplicar una capa de material superconductor y un dispositivo adecuado para dicho metodo.Info
- Publication number
- ES2073508T3 ES2073508T3 ES90200882T ES90200882T ES2073508T3 ES 2073508 T3 ES2073508 T3 ES 2073508T3 ES 90200882 T ES90200882 T ES 90200882T ES 90200882 T ES90200882 T ES 90200882T ES 2073508 T3 ES2073508 T3 ES 2073508T3
- Authority
- ES
- Spain
- Prior art keywords
- layer
- plasma
- oxygen
- magnetic field
- applying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 3
- 229910052760 oxygen Inorganic materials 0.000 abstract 3
- 239000001301 oxygen Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 230000003993 interaction Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/087—Oxides of copper or solid solutions thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
SE DESCRIBE UN METODO EN EL QUE SE PUEDEN APLICAR DIFERENTES CAPAS A SUBSTRATOS A UNA BAJA TEMPERATURA (ALREDEDOR DE 400 TO ES, LA DIFUSION O LAS REACCIONES, ENTRE EL SUBSTRATO Y LAS CAPAS QUE SE LE APLICAN. ADEMAS, SE REALIZA UN TRANSPORTE EFICAZ DE OXIGENO QUE CONTIENE PLASMA SOBRE EL SUBSTRATO A LO LARGO DE LINEAS DE CAMPO MAGNETICO, GENERADAS POR DOS SOLENOIDES, A CAUSA DEL ACOTAMIENTO DE ESE CAMPO MAGNETICO. INCLUSO A UNA PRESION DE SOLO ( ) TORR, EL PLASMA SE INFLAMARA. LA PASIVIZACION OPCIONAL DE UNA CAPA SUPERCONDUCTORA USANDO UNA CAPA DE OXIDO PUEDE REALIZARSE SIN EXTRAER OXIGENO DE LA CAPA SUPERCONDUCTORA CUANDO SE PUEDE INTRODUCIR SUFICIENTE OXIGENO EN EL PLASMA.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP89200904 | 1989-04-10 | ||
| NL9000214A NL9000214A (nl) | 1989-04-10 | 1990-01-29 | Werkwijze voor het aanbrengen van een laag supergeleidend materiaal en een daarvoor geschikte inrichting. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2073508T3 true ES2073508T3 (es) | 1995-08-16 |
Family
ID=26121046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES90200882T Expired - Lifetime ES2073508T3 (es) | 1989-04-10 | 1990-04-10 | Metodo para aplicar una capa de material superconductor y un dispositivo adecuado para dicho metodo. |
Country Status (8)
| Country | Link |
|---|---|
| EP (1) | EP0392630B1 (es) |
| JP (1) | JPH04501102A (es) |
| AT (1) | ATE124574T1 (es) |
| DE (1) | DE69020409T2 (es) |
| DK (1) | DK0392630T3 (es) |
| ES (1) | ES2073508T3 (es) |
| GR (1) | GR3017236T3 (es) |
| WO (1) | WO1990012425A1 (es) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6274073A (ja) * | 1985-09-26 | 1987-04-04 | Hitachi Ltd | スパツタ装置 |
| US5158931A (en) * | 1988-03-16 | 1992-10-27 | Kabushiki Kaisha Toshiba | Method for manufacturing an oxide superconductor thin film |
-
1990
- 1990-04-10 WO PCT/EP1990/000602 patent/WO1990012425A1/en unknown
- 1990-04-10 AT AT90200882T patent/ATE124574T1/de active
- 1990-04-10 ES ES90200882T patent/ES2073508T3/es not_active Expired - Lifetime
- 1990-04-10 DE DE69020409T patent/DE69020409T2/de not_active Expired - Fee Related
- 1990-04-10 DK DK90200882.0T patent/DK0392630T3/da active
- 1990-04-10 JP JP2505627A patent/JPH04501102A/ja active Pending
- 1990-04-10 EP EP90200882A patent/EP0392630B1/en not_active Expired - Lifetime
-
1995
- 1995-08-30 GR GR950402345T patent/GR3017236T3/el unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE69020409D1 (de) | 1995-08-03 |
| GR3017236T3 (en) | 1995-11-30 |
| DK0392630T3 (da) | 1995-08-28 |
| ATE124574T1 (de) | 1995-07-15 |
| WO1990012425A1 (en) | 1990-10-18 |
| EP0392630B1 (en) | 1995-06-28 |
| EP0392630A1 (en) | 1990-10-17 |
| DE69020409T2 (de) | 1995-11-16 |
| JPH04501102A (ja) | 1992-02-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG2A | Definitive protection |
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