DK0392630T3 - Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil - Google Patents

Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil

Info

Publication number
DK0392630T3
DK0392630T3 DK90200882.0T DK90200882T DK0392630T3 DK 0392630 T3 DK0392630 T3 DK 0392630T3 DK 90200882 T DK90200882 T DK 90200882T DK 0392630 T3 DK0392630 T3 DK 0392630T3
Authority
DK
Denmark
Prior art keywords
layer
plasma
applying
oxygen
apparatus suitable
Prior art date
Application number
DK90200882.0T
Other languages
English (en)
Inventor
Kristin Deneffe
Gustaaf Regina Borghs
Original Assignee
Imec Inter Uni Micro Electr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from NL9000214A external-priority patent/NL9000214A/nl
Application filed by Imec Inter Uni Micro Electr filed Critical Imec Inter Uni Micro Electr
Application granted granted Critical
Publication of DK0392630T3 publication Critical patent/DK0392630T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming superconductor layers
    • H10N60/0521—Processes for depositing or forming superconductor layers by pulsed laser deposition, e.g. laser sputtering; laser ablation
DK90200882.0T 1989-04-10 1990-04-10 Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil DK0392630T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP89200904 1989-04-10
NL9000214A NL9000214A (nl) 1989-04-10 1990-01-29 Werkwijze voor het aanbrengen van een laag supergeleidend materiaal en een daarvoor geschikte inrichting.

Publications (1)

Publication Number Publication Date
DK0392630T3 true DK0392630T3 (da) 1995-08-28

Family

ID=26121046

Family Applications (1)

Application Number Title Priority Date Filing Date
DK90200882.0T DK0392630T3 (da) 1989-04-10 1990-04-10 Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil

Country Status (8)

Country Link
EP (1) EP0392630B1 (da)
JP (1) JPH04501102A (da)
AT (1) ATE124574T1 (da)
DE (1) DE69020409T2 (da)
DK (1) DK0392630T3 (da)
ES (1) ES2073508T3 (da)
GR (1) GR3017236T3 (da)
WO (1) WO1990012425A1 (da)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6274073A (ja) * 1985-09-26 1987-04-04 Hitachi Ltd スパツタ装置
EP0431160B1 (en) * 1988-03-16 1995-05-17 Kabushiki Kaisha Toshiba Process for producing thin-film oxide superconductor

Also Published As

Publication number Publication date
JPH04501102A (ja) 1992-02-27
DE69020409D1 (de) 1995-08-03
WO1990012425A1 (en) 1990-10-18
DE69020409T2 (de) 1995-11-16
ES2073508T3 (es) 1995-08-16
GR3017236T3 (en) 1995-11-30
ATE124574T1 (de) 1995-07-15
EP0392630B1 (en) 1995-06-28
EP0392630A1 (en) 1990-10-17

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