DK0392630T3 - Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil - Google Patents

Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil

Info

Publication number
DK0392630T3
DK0392630T3 DK90200882.0T DK90200882T DK0392630T3 DK 0392630 T3 DK0392630 T3 DK 0392630T3 DK 90200882 T DK90200882 T DK 90200882T DK 0392630 T3 DK0392630 T3 DK 0392630T3
Authority
DK
Denmark
Prior art keywords
layer
plasma
applying
oxygen
apparatus suitable
Prior art date
Application number
DK90200882.0T
Other languages
Danish (da)
English (en)
Inventor
Kristin Deneffe
Gustaaf Regina Borghs
Original Assignee
Imec Inter Uni Micro Electr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from NL9000214A external-priority patent/NL9000214A/nl
Application filed by Imec Inter Uni Micro Electr filed Critical Imec Inter Uni Micro Electr
Application granted granted Critical
Publication of DK0392630T3 publication Critical patent/DK0392630T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
DK90200882.0T 1989-04-10 1990-04-10 Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil DK0392630T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP89200904 1989-04-10
NL9000214A NL9000214A (nl) 1989-04-10 1990-01-29 Werkwijze voor het aanbrengen van een laag supergeleidend materiaal en een daarvoor geschikte inrichting.

Publications (1)

Publication Number Publication Date
DK0392630T3 true DK0392630T3 (da) 1995-08-28

Family

ID=26121046

Family Applications (1)

Application Number Title Priority Date Filing Date
DK90200882.0T DK0392630T3 (da) 1989-04-10 1990-04-10 Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil

Country Status (8)

Country Link
EP (1) EP0392630B1 (es)
JP (1) JPH04501102A (es)
AT (1) ATE124574T1 (es)
DE (1) DE69020409T2 (es)
DK (1) DK0392630T3 (es)
ES (1) ES2073508T3 (es)
GR (1) GR3017236T3 (es)
WO (1) WO1990012425A1 (es)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6274073A (ja) * 1985-09-26 1987-04-04 Hitachi Ltd スパツタ装置
US5158931A (en) * 1988-03-16 1992-10-27 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film

Also Published As

Publication number Publication date
EP0392630B1 (en) 1995-06-28
ATE124574T1 (de) 1995-07-15
DE69020409D1 (de) 1995-08-03
DE69020409T2 (de) 1995-11-16
ES2073508T3 (es) 1995-08-16
GR3017236T3 (en) 1995-11-30
WO1990012425A1 (en) 1990-10-18
JPH04501102A (ja) 1992-02-27
EP0392630A1 (en) 1990-10-17

Similar Documents

Publication Publication Date Title
DK0941072T3 (da) Fremgangsmåde og apparat til coating af substrater til farmaceutisk anvendelse
DK430885D0 (da) Fremgangsmaade og apparat til overtraekning af et substrat med ptfe
DK84680A (da) Fremgangsmaade til dannelse af en tynd film og apparat til dannelse af en tynd film
JPS55128583A (en) Method and apparatus for pretreating substrate and coating membrane
IN159155B (es)
JPS55118639A (en) Method of and device for oxidizing with plasma semiconductor substrate
ES2043826T3 (es) Metodo para deposicion de oxido de silicio aumentada en plasma.
DK380483A (da) Fremgangsmaade og apparat til belaegning af et substrat med et findelt pulver
EP0039406A3 (en) Process and apparatus for plasma oxidizing substrates
JPS5298038A (en) Method and apparatus for depositing monomolecular layer of bimediophilic molecular on substrate
TW342515B (en) Process for making a field emitter cathode using a particulate field emitter material
EP0376333A3 (en) Method for manufacturing polyimide thin film and apparatus
DK496587D0 (da) Vandig belaegningsblanding og fremgangsmaade til belaegning af et substrat med en saadan belaegningsblanding
DK371085D0 (da) Fremgangsmaade og apparat til impraegnering af et substrat
DK0506552T3 (da) Fremgangsmåde til behandling af eksempelvis overfladen af et substrat ved plasmafluxspraying samt anordning til udøvelse af fremgangsmåden
NO173818C (no) Fremgangsmaate og apparat for paafoering av belegg paa plateglass ved kjemisk dampavsetning
AU7151587A (en) Process for forming deposited film
NO931993D0 (no) Et impregnert underlag, apparat og fremgangsmaate til bestemmelse av konsentrasjoner av lett oksiderbare organiske damper i gassproever
DK0392630T3 (da) Fremgangsmåde til påføring af et lag af superledende materiale og et apparat der er egnet dertil
DK535283D0 (da) Fremgangsmade og apparat til af fastholde et substrat i en holder
JPS56103418A (en) Method and apparatus for growing silicon layer on substrate from molten silicon source
DE3472974D1 (en) Method and apparatus for the deposition of a thin layer on a substrate by a reactive plasma
JPS5367684A (en) Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering
DE3069815D1 (en) Method and apparatus for pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon
DK0685571T3 (da) Fremgangsmåde og indretning til ved katodeforstøvning at coate et substrat