ES2055588T3 - Captador capacitivo integrable de presion y su procedimiento de produccion. - Google Patents
Captador capacitivo integrable de presion y su procedimiento de produccion.Info
- Publication number
- ES2055588T3 ES2055588T3 ES91903344T ES91903344T ES2055588T3 ES 2055588 T3 ES2055588 T3 ES 2055588T3 ES 91903344 T ES91903344 T ES 91903344T ES 91903344 T ES91903344 T ES 91903344T ES 2055588 T3 ES2055588 T3 ES 2055588T3
- Authority
- ES
- Spain
- Prior art keywords
- semiconductor
- film
- pressure sensor
- integrable
- capacitive pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/12—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in capacitance, i.e. electric circuits therefor
- G01L9/125—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in capacitance, i.e. electric circuits therefor with temperature compensating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
Abstract
SE PROPONE UN PROCESO PARA LA FABRICACION DE UN SENSOR DE PRESION CAPACITIVA INTEGRABLE QUE INCLUYE LAS SIGUIENTES ETAPAS, EMPEZANDO A PARTIR DE UN SUBSTRATO SEMICONDUCTOR: APLICACION DE UNA PELICULA (2) SOPORTE, PRECIPITACION DE UNA PELICULA (4) DE SEMICONDUCTOR POLICRISTALINO, DOPADO DE LA PELICULA (4) DE SEMICONDUCTOR POLICRISTALINO, Y ELIMINADO DE LA PELICULA (2) DE SOPORTE. PARA DISEÑAR EL SENSOR DE PRESION QUE PUEDA SER COMPATIBLE CON CIRCUITOS CMOS, Y PARA INCREMENTAR LA EXACTITUD DEL SENSOR, LA INVENCION PROPONE QUE SEA AISLADA UNA ZONA (7) SEMICONDUCTORA DEL SUBSTRATO (1) SEMICONDUCTOR Y SE APLIQUE UNA PELICULA (8) AISLADORA EN LA ZONA (7) DEL SEMICONDUCTOR AISLADO, ESTANDO LOCALIZADA LA PELICULA (4) SEMICONDUCTORA POLICRISTALINA EN LA PELICULA (2) AISLADORA POR ENCIMA DE LA ZONA (7) DEL SEMICONDUCTOR AISLADO.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4004179A DE4004179A1 (de) | 1990-02-12 | 1990-02-12 | Integrierbarer, kapazitiver drucksensor und verfahren zum herstellen desselben |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2055588T3 true ES2055588T3 (es) | 1994-08-16 |
Family
ID=6399921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES91903344T Expired - Lifetime ES2055588T3 (es) | 1990-02-12 | 1991-02-09 | Captador capacitivo integrable de presion y su procedimiento de produccion. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5321989A (es) |
EP (1) | EP0515416B1 (es) |
JP (1) | JPH0726886B2 (es) |
DE (4) | DE4004179A1 (es) |
ES (1) | ES2055588T3 (es) |
WO (1) | WO1991012507A1 (es) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4208272A1 (de) * | 1992-03-13 | 1993-09-16 | Leybold Ag | Verfahren zur messung der kapazitaet eines kondensators nach der reflektometermethode und schalteinrichtung dazu |
DE4222930A1 (de) * | 1992-07-11 | 1994-01-13 | Vdo Schindling | Schaltungsanordnung zur Messung von Kapazitäten |
FR2700003B1 (fr) * | 1992-12-28 | 1995-02-10 | Commissariat Energie Atomique | Procédé de fabrication d'un capteur de pression utilisant la technologie silicium sur isolant et capteur obtenu. |
EP0681691B1 (de) * | 1993-01-19 | 1996-07-31 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Drucksensor |
US5316619A (en) * | 1993-02-05 | 1994-05-31 | Ford Motor Company | Capacitive surface micromachine absolute pressure sensor and method for processing |
EP0618435A3 (de) * | 1993-03-30 | 1995-02-01 | Siemens Ag | Kapazitiver Drucksensor. |
US5369544A (en) * | 1993-04-05 | 1994-11-29 | Ford Motor Company | Silicon-on-insulator capacitive surface micromachined absolute pressure sensor |
US5471723A (en) * | 1993-08-20 | 1995-12-05 | Endress + Hauser Gmbh + Co. | Methods of manufacturing thin-film absolute pressure sensors |
US5634999A (en) * | 1994-09-06 | 1997-06-03 | Ngk Insulators, Ltd. | Method of producing ceramic diaphragm structure having convex diaphragm portion |
JP2561040B2 (ja) * | 1994-11-28 | 1996-12-04 | 日本電気株式会社 | 容量型センサの容量変化検出回路およびその検出方法 |
US6141243A (en) * | 1996-11-12 | 2000-10-31 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Sensor element |
KR100319057B1 (ko) * | 1996-11-12 | 2001-12-29 | 슈베르트 헬무트 | 센서 소자 |
EP0943078A1 (de) * | 1996-12-04 | 1999-09-22 | Siemens Aktiengesellschaft | Mikromechanisches bauelement zur erfassung von fingerabdrücken |
DE19753874A1 (de) * | 1997-12-05 | 1999-06-17 | Bosch Gmbh Robert | Kraftsensor |
US6244121B1 (en) | 1998-03-06 | 2001-06-12 | Applied Materials, Inc. | Sensor device for non-intrusive diagnosis of a semiconductor processing system |
DE19831600C1 (de) * | 1998-07-14 | 1999-08-19 | Siemens Ag | Anordnung mit einer Vielzahl von Sensorgruppen und Verfahren zur Bestimmung ihrer Intaktheit |
DE19839606C1 (de) | 1998-08-31 | 2000-04-27 | Siemens Ag | Mikromechanisches Bauelement und Verfahren zu dessen Herstellung |
JP3567089B2 (ja) * | 1998-10-12 | 2004-09-15 | 株式会社日立製作所 | 静電容量式圧力センサ |
JP3445536B2 (ja) * | 1999-10-04 | 2003-09-08 | 三洋電機株式会社 | 半導体装置 |
EP1259976A2 (en) | 2000-02-23 | 2002-11-27 | National Center for Scientific Research Demokritos Institute of Microelectronics | Capacitive pressure-responsive devices and their fabrication |
US6472243B2 (en) | 2000-12-11 | 2002-10-29 | Motorola, Inc. | Method of forming an integrated CMOS capacitive pressure sensor |
JP4773630B2 (ja) | 2001-05-15 | 2011-09-14 | 株式会社デンソー | ダイアフラム型半導体装置とその製造方法 |
JP4342122B2 (ja) | 2001-06-01 | 2009-10-14 | 株式会社豊田中央研究所 | 静電容量型物理量センサと検出装置 |
DE10130372B4 (de) * | 2001-06-23 | 2006-09-14 | Abb Patent Gmbh | Differenzdrucksensor |
DE10130373B4 (de) * | 2001-06-23 | 2006-09-21 | Abb Patent Gmbh | Kapazitiver Differenzdrucksensor |
JP4296731B2 (ja) | 2001-07-18 | 2009-07-15 | 株式会社デンソー | 静電容量型圧力センサの製造方法 |
US20050224899A1 (en) * | 2002-02-06 | 2005-10-13 | Ramsey Craig C | Wireless substrate-like sensor |
US7289230B2 (en) * | 2002-02-06 | 2007-10-30 | Cyberoptics Semiconductors, Inc. | Wireless substrate-like sensor |
US20050224902A1 (en) * | 2002-02-06 | 2005-10-13 | Ramsey Craig C | Wireless substrate-like sensor |
US20050233770A1 (en) * | 2002-02-06 | 2005-10-20 | Ramsey Craig C | Wireless substrate-like sensor |
DE10324960B4 (de) * | 2003-06-03 | 2011-08-11 | Robert Bosch GmbH, 70469 | Kapazitiver Drucksensor |
JP2006170893A (ja) * | 2004-12-17 | 2006-06-29 | Alps Electric Co Ltd | 静電容量型圧力センサ |
US7585280B2 (en) | 2004-12-29 | 2009-09-08 | Codman & Shurtleff, Inc. | System and method for measuring the pressure of a fluid system within a patient |
US20060211945A1 (en) * | 2005-03-15 | 2006-09-21 | Codman & Shurtleff, Inc. | Pressure sensing methods |
US7510533B2 (en) * | 2005-03-15 | 2009-03-31 | Codman & Shurtleff, Inc. | Pressure sensing valve |
US10362947B2 (en) * | 2005-03-15 | 2019-07-30 | Integra LifeSciences Switzerland Sarl | Pressure sensing devices |
US20070106200A1 (en) * | 2005-11-08 | 2007-05-10 | Brian Levy | Intraocular shunt device and method |
US7682313B2 (en) * | 2005-11-23 | 2010-03-23 | Vital Sensors Holding Company, Inc. | Implantable pressure monitor |
US7686768B2 (en) * | 2005-11-23 | 2010-03-30 | Vital Sensors Holding Company, Inc. | Implantable pressure monitor |
US7893697B2 (en) * | 2006-02-21 | 2011-02-22 | Cyberoptics Semiconductor, Inc. | Capacitive distance sensing in semiconductor processing tools |
JP2009527764A (ja) * | 2006-02-21 | 2009-07-30 | サイバーオプティクス セミコンダクタ インコーポレイテッド | 半導体加工ツールにおける静電容量距離検出 |
FR2897937B1 (fr) * | 2006-02-24 | 2008-05-23 | Commissariat Energie Atomique | Capteur de pression a jauges resistives |
JP4325638B2 (ja) * | 2006-04-26 | 2009-09-02 | オムロンヘルスケア株式会社 | 脈波測定装置 |
US7813105B2 (en) | 2006-06-06 | 2010-10-12 | Adc Tech International Ltd. | Multi-layer capacitor |
US8823933B2 (en) * | 2006-09-29 | 2014-09-02 | Cyberoptics Corporation | Substrate-like particle sensor |
US7778793B2 (en) * | 2007-03-12 | 2010-08-17 | Cyberoptics Semiconductor, Inc. | Wireless sensor for semiconductor processing systems |
US20080246493A1 (en) * | 2007-04-05 | 2008-10-09 | Gardner Delrae H | Semiconductor Processing System With Integrated Showerhead Distance Measuring Device |
US7827845B2 (en) | 2007-06-18 | 2010-11-09 | Codman & Shurtleff, Inc. | Method and kit for maintaining a sterile environment during calibration of a medical device |
US20090005701A1 (en) * | 2007-06-29 | 2009-01-01 | Codman & Shurtleff, Inc. | Cradled Sensor Assembly |
US20090015268A1 (en) * | 2007-07-13 | 2009-01-15 | Gardner Delrae H | Device and method for compensating a capacitive sensor measurement for variations caused by environmental conditions in a semiconductor processing environment |
US9204812B2 (en) | 2007-10-31 | 2015-12-08 | DePuy Synthes Products, LLC | Wireless pressure sensing shunts |
US7842004B2 (en) | 2007-10-31 | 2010-11-30 | Codman & Shurtleff, Inc. | Wireless pressure setting indicator |
US8480612B2 (en) | 2007-10-31 | 2013-07-09 | DePuy Synthes Products, LLC | Wireless shunts with storage |
US8454524B2 (en) | 2007-10-31 | 2013-06-04 | DePuy Synthes Products, LLC | Wireless flow sensor |
US8749000B2 (en) * | 2012-02-15 | 2014-06-10 | Robert Bosch Gmbh | Pressure sensor with doped electrode |
DE102015224936A1 (de) | 2015-12-11 | 2017-06-14 | Robert Bosch Gmbh | Herstellungsverfahren für eine mikromechanische Drucksensorvorrichtung und entsprechende mikromechanische Drucksensorvorrichtung |
DE102015225184A1 (de) | 2015-12-15 | 2017-06-22 | Robert Bosch Gmbh | Herstellungsverfahren für eine mikromechanische Sensorvorrichtung und entsprechende mikromechanische Sensorvorrichtung |
JP6696552B2 (ja) * | 2017-11-13 | 2020-05-20 | 株式会社村田製作所 | 配線容量キャンセル方法および配線容量キャンセル装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4426673A (en) * | 1976-03-12 | 1984-01-17 | Kavlico Corporation | Capacitive pressure transducer and method of making same |
US4262399A (en) * | 1978-11-08 | 1981-04-21 | General Electric Co. | Ultrasonic transducer fabricated as an integral park of a monolithic integrated circuit |
US4420790A (en) * | 1982-04-02 | 1983-12-13 | Honeywell Inc. | High sensitivity variable capacitance transducer |
DE3404262A1 (de) * | 1983-03-09 | 1984-09-13 | Fuji Electric Co., Ltd., Kawasaki | Kapazitiver messfuehler |
FI74350C (fi) * | 1984-02-21 | 1988-01-11 | Vaisala Oy | Kapacitiv absoluttryckgivare. |
NL8503574A (nl) * | 1985-12-24 | 1987-07-16 | Sentron V O F | Druksensor. |
JPH0750789B2 (ja) * | 1986-07-18 | 1995-05-31 | 日産自動車株式会社 | 半導体圧力変換装置の製造方法 |
-
1990
- 1990-02-12 DE DE4004179A patent/DE4004179A1/de not_active Withdrawn
- 1990-02-12 DE DE4042336A patent/DE4042336A1/de not_active Withdrawn
- 1990-02-12 DE DE4042335A patent/DE4042335A1/de active Granted
-
1991
- 1991-02-09 US US07/917,007 patent/US5321989A/en not_active Expired - Lifetime
- 1991-02-09 ES ES91903344T patent/ES2055588T3/es not_active Expired - Lifetime
- 1991-02-09 WO PCT/DE1991/000107 patent/WO1991012507A1/de active IP Right Grant
- 1991-02-09 JP JP3503660A patent/JPH0726886B2/ja not_active Expired - Lifetime
- 1991-02-09 EP EP91903344A patent/EP0515416B1/de not_active Expired - Lifetime
- 1991-02-09 DE DE59101391T patent/DE59101391D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0515416A1 (de) | 1992-12-02 |
DE4042335A1 (de) | 1991-08-14 |
JPH0726886B2 (ja) | 1995-03-29 |
DE59101391D1 (de) | 1994-05-19 |
US5321989A (en) | 1994-06-21 |
EP0515416B1 (de) | 1994-04-13 |
DE4042336A1 (de) | 1991-08-14 |
WO1991012507A1 (de) | 1991-08-22 |
DE4004179A1 (de) | 1991-08-14 |
JPH05501159A (ja) | 1993-03-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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