ES2034897A1 - Electrodepositing nickel using sacrificial anode and insoluble iron anode inhibits nickel ion build-up - Google Patents

Electrodepositing nickel using sacrificial anode and insoluble iron anode inhibits nickel ion build-up

Info

Publication number
ES2034897A1
ES2034897A1 ES919102320A ES9102320A ES2034897A1 ES 2034897 A1 ES2034897 A1 ES 2034897A1 ES 919102320 A ES919102320 A ES 919102320A ES 9102320 A ES9102320 A ES 9102320A ES 2034897 A1 ES2034897 A1 ES 2034897A1
Authority
ES
Spain
Prior art keywords
nickel
anode
insoluble iron
electrodepositing
inhibits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES919102320A
Other languages
Spanish (es)
Other versions
ES2034897B1 (en
Inventor
Robert A Tremmel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Enthone Inc
Original Assignee
Enthone OMI Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone OMI Inc filed Critical Enthone OMI Inc
Publication of ES2034897A1 publication Critical patent/ES2034897A1/en
Application granted granted Critical
Publication of ES2034897B1 publication Critical patent/ES2034897B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

A sacrificial anode and insoluble iron anode are immersed in a nickel electroplating bath, the anodes being connected to separate rectifiers. The current provided to the iron anode is controlled during plating to reduce the amount of nickel buildup on solution.
ES9102320A 1990-10-22 1991-10-18 NICKEL GALVANOPLASTY PROCEDURE WITH REDUCED NICKEL DEION ACCUMULATION. Expired - Lifetime ES2034897B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60886990A 1990-10-22 1990-10-22

Publications (2)

Publication Number Publication Date
ES2034897A1 true ES2034897A1 (en) 1993-04-01
ES2034897B1 ES2034897B1 (en) 1994-04-16

Family

ID=24438391

Family Applications (1)

Application Number Title Priority Date Filing Date
ES9102320A Expired - Lifetime ES2034897B1 (en) 1990-10-22 1991-10-18 NICKEL GALVANOPLASTY PROCEDURE WITH REDUCED NICKEL DEION ACCUMULATION.

Country Status (8)

Country Link
JP (1) JPH04333600A (en)
CA (1) CA2053342A1 (en)
DE (1) DE4134656C2 (en)
ES (1) ES2034897B1 (en)
FR (1) FR2668173A1 (en)
GB (1) GB2249107A (en)
IT (1) IT1249854B (en)
SE (1) SE9103061L (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4229917C1 (en) * 1992-09-08 1993-07-15 Lpw-Anlagen Gmbh, 4040 Neuss, De Electrolytic bath for meter coating - has sec. anode contg. alkaline or ammonium soln. with acid added to electrolyte to compensate for pH rise

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1081308A (en) * 1965-07-12 1967-08-31 Int Nickel Ltd Electrodeposition of nickel
GB1101093A (en) * 1963-05-22 1968-01-31 Int Nickel Ltd Electrodeposition of nickel
GB1226658A (en) * 1967-08-03 1971-03-31
GB2167447A (en) * 1983-01-03 1986-05-29 Omi Int Corp Cyanide free copper plating process
US4778572A (en) * 1987-09-08 1988-10-18 Eco-Tec Limited Process for electroplating metals
GB2234260A (en) * 1989-07-24 1991-01-30 Omi Int Corp Cyanide-free copper electroplating process

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2393516A (en) * 1943-08-19 1946-01-22 Indiana Steel & Wire Company Process for electroplating
US2504238A (en) * 1945-07-13 1950-04-18 Int Nickel Co Anode assembly
BE564995A (en) * 1957-02-20
JPS5135394B2 (en) * 1972-09-01 1976-10-01
JPS558493A (en) * 1978-07-05 1980-01-22 Mazda Motor Corp Nickel recovery system of nickel plating apparatus
JPS56112500A (en) * 1980-02-09 1981-09-04 Ebara Yuujiraito Kk Method for electroplating
US4466865A (en) * 1982-01-11 1984-08-21 Omi International Corporation Trivalent chromium electroplating process
US4469569A (en) * 1983-01-03 1984-09-04 Omi International Corporation Cyanide-free copper plating process
JPS63317698A (en) * 1987-06-20 1988-12-26 Toyota Motor Corp Controlling device for concentration of metallic ion and concentration of hydrogen ion in electroplating liquid

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1101093A (en) * 1963-05-22 1968-01-31 Int Nickel Ltd Electrodeposition of nickel
GB1081308A (en) * 1965-07-12 1967-08-31 Int Nickel Ltd Electrodeposition of nickel
GB1226658A (en) * 1967-08-03 1971-03-31
GB2167447A (en) * 1983-01-03 1986-05-29 Omi Int Corp Cyanide free copper plating process
US4778572A (en) * 1987-09-08 1988-10-18 Eco-Tec Limited Process for electroplating metals
GB2234260A (en) * 1989-07-24 1991-01-30 Omi Int Corp Cyanide-free copper electroplating process

Also Published As

Publication number Publication date
SE9103061L (en) 1992-04-23
JPH04333600A (en) 1992-11-20
DE4134656A1 (en) 1992-04-23
SE9103061D0 (en) 1991-10-21
ITTO910789A0 (en) 1991-10-18
ES2034897B1 (en) 1994-04-16
DE4134656C2 (en) 1994-02-03
ITTO910789A1 (en) 1992-04-23
IT1249854B (en) 1995-03-28
GB2249107A (en) 1992-04-29
CA2053342A1 (en) 1992-04-23
GB9122383D0 (en) 1991-12-04
FR2668173A1 (en) 1992-04-24

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Legal Events

Date Code Title Description
FA2A Application withdrawn

Effective date: 19941013