GB710375A - Improvements in or relating to electroplating - Google Patents
Improvements in or relating to electroplatingInfo
- Publication number
- GB710375A GB710375A GB25078/51A GB2507851A GB710375A GB 710375 A GB710375 A GB 710375A GB 25078/51 A GB25078/51 A GB 25078/51A GB 2507851 A GB2507851 A GB 2507851A GB 710375 A GB710375 A GB 710375A
- Authority
- GB
- United Kingdom
- Prior art keywords
- plating
- copper
- current
- metal
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Abstract
710,375. Electro-plating. WESTING- HOUSE ELECTRIC INTERNATIONAL CO. Oct. 26, 1951, No. 25078/51. Drawings to Specification. Class 41. A process of electro-plating on a base member a metal from the group consisting of copper, silver, zinc, cadmium, tin, gold and alloys in which these metals predominate, utilizes a plurality of cycles of periodically-reversed current, each cycle comprising a plating electrical current for at least 45 seconds to plate metal on the base members, and a de-plating electrical current for a period of time at least 30 per cent of the plating period, the average de-plating current density on the member being less than the average plating current density, and the coulombs delivered by the deplating current being between 30 per cent and 95 per cent of the coulombs delivered during the plating portion of the cycle, whereby a substantial portion of the previously-plated metal is de-plated, the plurality of cycles producing a smooth level deposit of plated metal. In the plating of copper an alkaline cyanide electrolyte containing from .0038 to .57 ozs. per gallon of zinc and from i to 10 ozs. per gallon of thiocyanate as addition agents may be used. The electrolyte and base member may have a relative movement of at least one foot a minute. Examples are given of aqueous cyanide baths for the plating of copper, brass, cadmium, silver and gold, and an acid bath for the plating of copper. Electrotypes and electroforming base members consisting of wax or resinous patterns plated or coated with powdered graphite or precipitated silver may be electroplated by the process claimed, and the electrodeposited metal stripped off. Plating in accordance with the invention may be followed by plating of nickel and chromium by direct current, without need for buffing. Specification 630,165 is referred to.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB25078/51A GB710375A (en) | 1951-10-26 | 1951-10-26 | Improvements in or relating to electroplating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB25078/51A GB710375A (en) | 1951-10-26 | 1951-10-26 | Improvements in or relating to electroplating |
Publications (1)
Publication Number | Publication Date |
---|---|
GB710375A true GB710375A (en) | 1954-06-09 |
Family
ID=10221847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB25078/51A Expired GB710375A (en) | 1951-10-26 | 1951-10-26 | Improvements in or relating to electroplating |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB710375A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1598449A3 (en) * | 2004-04-26 | 2007-01-31 | Rohm and Haas Electronic Materials, L.L.C. | Improved plating method |
-
1951
- 1951-10-26 GB GB25078/51A patent/GB710375A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1598449A3 (en) * | 2004-04-26 | 2007-01-31 | Rohm and Haas Electronic Materials, L.L.C. | Improved plating method |
US7582199B2 (en) | 2004-04-26 | 2009-09-01 | Rohm And Haas Electronic Materials Llc | Plating method |
US8945362B2 (en) | 2004-04-26 | 2015-02-03 | Rohm And Haas Electronic Materials Llc | Plating method |
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