ES2025681T3 - Procedimiento de pulido de objetos de vidrios organicos. - Google Patents
Procedimiento de pulido de objetos de vidrios organicos.Info
- Publication number
- ES2025681T3 ES2025681T3 ES198787402083T ES87402083T ES2025681T3 ES 2025681 T3 ES2025681 T3 ES 2025681T3 ES 198787402083 T ES198787402083 T ES 198787402083T ES 87402083 T ES87402083 T ES 87402083T ES 2025681 T3 ES2025681 T3 ES 2025681T3
- Authority
- ES
- Spain
- Prior art keywords
- polishing
- organic glass
- glass objects
- polishing procedure
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title abstract 5
- 239000011521 glass Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000000203 mixture Substances 0.000 abstract 3
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 abstract 1
- 229940044927 ceric oxide Drugs 0.000 abstract 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical class [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 abstract 1
- 239000011368 organic material Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Catalysts (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
EL PRESENTE INVENTO TIENEN POR OBJETO UNA COMPOSICION DE PULIMENTO A BASE DE CIRIO DESTINADO AL PULIMENTO DE VIDRIOS ORGANICOS. LA COMPOSICION DE LA INVENCION SE CARACTERIZA POR EL HECHO DE COMPRENDER OXIDO CERICO Y UNA SAL DE CERIO SOLUBLE EN LAS CONDICIONES DE PULIMENTO. EN PARTICULAR ESTA COMPOSICION SE ADAPTA MUY BIEN AL PULIMENTO DE LAS LENTILLAS OFTALMOLOGICAS EN MATERIALES ORGANICOS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8613443A FR2604443A1 (fr) | 1986-09-26 | 1986-09-26 | Composition de polissage a base de cerium destinee au polissage des verres organiques |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2025681T3 true ES2025681T3 (es) | 1992-04-01 |
Family
ID=9339291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES198787402083T Expired - Lifetime ES2025681T3 (es) | 1986-09-26 | 1987-09-18 | Procedimiento de pulido de objetos de vidrios organicos. |
Country Status (10)
Country | Link |
---|---|
US (1) | US4769073A (es) |
EP (1) | EP0266233B1 (es) |
JP (1) | JPS63169262A (es) |
AT (1) | ATE66241T1 (es) |
AU (1) | AU601495B2 (es) |
BR (1) | BR8704936A (es) |
DE (1) | DE3772151D1 (es) |
ES (1) | ES2025681T3 (es) |
FR (1) | FR2604443A1 (es) |
PT (1) | PT85796B (es) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4470726A (en) * | 1982-10-04 | 1984-09-11 | Halliburton Company | Leg closure |
FR2624519A1 (fr) * | 1987-12-09 | 1989-06-16 | Rhone Poulenc Chimie | Composition de polissage perfectionnee a base de cerium et son procede de preparation |
JPH01257563A (ja) * | 1988-04-08 | 1989-10-13 | Showa Denko Kk | アルミニウム磁気ディスク研磨用組成物 |
JPH0284485A (ja) * | 1988-09-20 | 1990-03-26 | Showa Denko Kk | アルミニウム磁気ディスク研磨用組成物 |
US5106394A (en) * | 1990-10-01 | 1992-04-21 | The United States Of America As Represented By The Secretary Of The Navy | Fiber optic polishing system |
US5136818A (en) * | 1990-10-01 | 1992-08-11 | The United States Of America As Represented By The Secretary Of The Navy | Method of polishing optical fiber |
US5264010A (en) * | 1992-04-27 | 1993-11-23 | Rodel, Inc. | Compositions and methods for polishing and planarizing surfaces |
WO1996028385A1 (fr) * | 1995-03-15 | 1996-09-19 | Hoya Corporation | Procede pour l'elaboration d'un precipite d'oxyde metallique |
JP3359479B2 (ja) * | 1995-11-07 | 2002-12-24 | 三井金属鉱業株式会社 | 研磨材、その製造方法及び研磨方法 |
KR100336598B1 (ko) * | 1996-02-07 | 2002-05-16 | 이사오 우치가사키 | 산화 세륨 연마제 제조용 산화 세륨 입자 |
US5897675A (en) * | 1996-04-26 | 1999-04-27 | Degussa Aktiengesellschaft | Cerium oxide-metal/metalloid oxide mixture |
US5962343A (en) * | 1996-07-30 | 1999-10-05 | Nissan Chemical Industries, Ltd. | Process for producing crystalline ceric oxide particles and abrasive |
US5759917A (en) * | 1996-12-30 | 1998-06-02 | Cabot Corporation | Composition for oxide CMP |
TW365563B (en) * | 1997-04-28 | 1999-08-01 | Seimi Chem Kk | Polishing agent for semiconductor and method for its production |
JP2002500431A (ja) * | 1997-09-26 | 2002-01-08 | インフィネオン テクノロジース アクチエンゲゼルシャフト | 研磨剤および半導体基板の平坦化のための該研磨剤の使用 |
US6177026B1 (en) | 1998-05-26 | 2001-01-23 | Cabot Microelectronics Corporation | CMP slurry containing a solid catalyst |
US6435947B2 (en) | 1998-05-26 | 2002-08-20 | Cabot Microelectronics Corporation | CMP polishing pad including a solid catalyst |
EP0969057A1 (en) * | 1998-07-03 | 2000-01-05 | International Business Machines Corporation | Dual-valent rare earth additives to polishing slurries |
JP3983949B2 (ja) * | 1998-12-21 | 2007-09-26 | 昭和電工株式会社 | 研磨用酸化セリウムスラリー、その製造法及び研磨方法 |
KR20010077710A (ko) * | 2000-02-08 | 2001-08-20 | 구자홍 | 디스플레이 패널의 면세정용 연마제 |
EP1285956A4 (en) * | 2000-05-16 | 2004-09-29 | Mitsui Mining & Smelting Co | CERIUM BASED ABRASIVE, RAW MATERIAL AND MANUFACTURING PROCESS |
US6454821B1 (en) | 2000-06-21 | 2002-09-24 | Praxair S. T. Technology, Inc. | Polishing composition and method |
US6437336B1 (en) | 2000-08-15 | 2002-08-20 | Crismatec | Scintillator crystals and their applications and manufacturing process |
US7887714B2 (en) * | 2000-12-25 | 2011-02-15 | Nissan Chemical Industries, Ltd. | Cerium oxide sol and abrasive |
JPWO2002067309A1 (ja) * | 2001-02-20 | 2004-06-24 | 日立化成工業株式会社 | 研磨剤及び基板の研磨方法 |
US7077880B2 (en) * | 2004-01-16 | 2006-07-18 | Dupont Air Products Nanomaterials Llc | Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization |
US20030162398A1 (en) * | 2002-02-11 | 2003-08-28 | Small Robert J. | Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same |
US7513920B2 (en) * | 2002-02-11 | 2009-04-07 | Dupont Air Products Nanomaterials Llc | Free radical-forming activator attached to solid and used to enhance CMP formulations |
WO2004023539A1 (ja) * | 2002-09-06 | 2004-03-18 | Asahi Glass Company, Limited | 半導体集積回路用絶縁膜研磨剤組成物および半導体集積回路の製造方法 |
US20040217006A1 (en) * | 2003-03-18 | 2004-11-04 | Small Robert J. | Residue removers for electrohydrodynamic cleaning of semiconductors |
WO2006105020A1 (en) | 2005-03-25 | 2006-10-05 | Dupont Air Products Nanomaterials Llc | Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers |
US7294044B2 (en) * | 2005-04-08 | 2007-11-13 | Ferro Corporation | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
US7467988B2 (en) * | 2005-04-08 | 2008-12-23 | Ferro Corporation | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
WO2011054193A1 (zh) * | 2009-11-06 | 2011-05-12 | Wang Chen | 一种化学机械抛光液 |
JP6654696B2 (ja) * | 2015-07-10 | 2020-02-26 | フエロ コーポレーション | 有機ポリマー系眼用基材を研磨するためのスラリー組成物及び方法、並びに眼用レンズ |
KR101900543B1 (ko) * | 2015-10-02 | 2018-09-20 | 삼성에스디아이 주식회사 | 유기막 cmp 슬러리 조성물 및 이를 이용한 연마방법 |
WO2018179062A1 (ja) * | 2017-03-27 | 2018-10-04 | 日立化成株式会社 | 研磨液、研磨液セット、添加液及び研磨方法 |
CN116891596B (zh) * | 2023-07-25 | 2024-04-05 | 铨盛聚碳科技股份有限公司 | 一种含有稀土磺酸盐插层无机物的阻燃剂以及制备方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3097083A (en) * | 1959-07-02 | 1963-07-09 | American Potash & Chem Corp | Polishing composition and process of forming same |
DE1263955B (de) * | 1962-04-11 | 1968-03-21 | Libbey Owens Ford Glass Co | Verfahren zum Polieren einer Glasoberflaeche |
US3262766A (en) * | 1963-11-21 | 1966-07-26 | Grace W R & Co | Rare-earth oxides for polishing glass |
US3768989A (en) * | 1968-08-19 | 1973-10-30 | N Goetzinger | Process for the preparation of a rare earth oxide polishing composition |
EP0031204B1 (en) * | 1979-11-29 | 1984-06-06 | Rhone-Poulenc Industries | Polishing process for mineral and organic materials |
FR2472601A1 (fr) * | 1979-12-27 | 1981-07-03 | Rhone Poulenc Ind | Procede de fabrication de compositions de polissage a base de cerium |
FR2545830B1 (fr) * | 1983-05-13 | 1986-01-03 | Rhone Poulenc Spec Chim | Nouvelle composition de polissage a base de cerium et son procede de fabrication |
FR2549846B1 (fr) * | 1983-07-29 | 1986-12-26 | Rhone Poulenc Spec Chim | Nouvelle composition de polissage a base de cerium et son procede de fabrication |
-
1986
- 1986-09-26 FR FR8613443A patent/FR2604443A1/fr not_active Withdrawn
-
1987
- 1987-09-18 AT AT87402083T patent/ATE66241T1/de not_active IP Right Cessation
- 1987-09-18 ES ES198787402083T patent/ES2025681T3/es not_active Expired - Lifetime
- 1987-09-18 EP EP87402083A patent/EP0266233B1/fr not_active Expired - Lifetime
- 1987-09-18 DE DE8787402083T patent/DE3772151D1/de not_active Expired - Fee Related
- 1987-09-25 PT PT85796A patent/PT85796B/pt not_active IP Right Cessation
- 1987-09-25 JP JP62239127A patent/JPS63169262A/ja active Pending
- 1987-09-25 BR BR8704936A patent/BR8704936A/pt unknown
- 1987-09-28 AU AU79044/87A patent/AU601495B2/en not_active Ceased
- 1987-09-28 US US07/101,409 patent/US4769073A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
ATE66241T1 (de) | 1991-08-15 |
DE3772151D1 (de) | 1991-09-19 |
AU601495B2 (en) | 1990-09-13 |
EP0266233A1 (fr) | 1988-05-04 |
PT85796A (fr) | 1987-10-01 |
JPS63169262A (ja) | 1988-07-13 |
PT85796B (pt) | 1990-08-31 |
EP0266233B1 (fr) | 1991-08-14 |
BR8704936A (pt) | 1988-05-17 |
US4769073A (en) | 1988-09-06 |
FR2604443A1 (fr) | 1988-04-01 |
AU7904487A (en) | 1988-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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