WO2011054193A1 - 一种化学机械抛光液 - Google Patents
一种化学机械抛光液 Download PDFInfo
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- WO2011054193A1 WO2011054193A1 PCT/CN2010/001793 CN2010001793W WO2011054193A1 WO 2011054193 A1 WO2011054193 A1 WO 2011054193A1 CN 2010001793 W CN2010001793 W CN 2010001793W WO 2011054193 A1 WO2011054193 A1 WO 2011054193A1
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- WO
- WIPO (PCT)
- Prior art keywords
- polishing liquid
- liquid according
- polishing
- mechanical polishing
- silver
- Prior art date
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- 238000005498 polishing Methods 0.000 title claims abstract description 85
- 239000007788 liquid Substances 0.000 title claims abstract description 43
- -1 abrasive Substances 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 21
- 239000002184 metal Substances 0.000 claims abstract description 21
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- 239000007800 oxidant agent Substances 0.000 claims abstract description 13
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 34
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical group OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 32
- 229910052709 silver Inorganic materials 0.000 claims description 24
- 239000000126 substance Substances 0.000 claims description 22
- 239000011572 manganese Substances 0.000 claims description 20
- 229910052748 manganese Inorganic materials 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 12
- 230000007704 transition Effects 0.000 claims description 10
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 8
- 229910052723 transition metal Inorganic materials 0.000 claims description 8
- 150000002978 peroxides Chemical class 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 5
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 4
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 3
- 229940099596 manganese sulfate Drugs 0.000 claims description 3
- 239000011702 manganese sulphate Substances 0.000 claims description 3
- 235000007079 manganese sulphate Nutrition 0.000 claims description 3
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 claims description 3
- 150000002823 nitrates Chemical class 0.000 claims description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 3
- 239000003002 pH adjusting agent Substances 0.000 claims description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical group OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910021485 fumed silica Inorganic materials 0.000 claims description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 2
- 239000011707 mineral Substances 0.000 claims description 2
- 235000010755 mineral Nutrition 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052706 scandium Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 125000002081 peroxide group Chemical group 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052721 tungsten Inorganic materials 0.000 abstract description 18
- 239000010937 tungsten Substances 0.000 abstract description 18
- 230000001590 oxidative effect Effects 0.000 abstract description 4
- 239000004332 silver Substances 0.000 description 21
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 16
- 239000000377 silicon dioxide Substances 0.000 description 16
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 15
- 229910002651 NO3 Inorganic materials 0.000 description 14
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 14
- 239000007789 gas Substances 0.000 description 14
- 229910052739 hydrogen Inorganic materials 0.000 description 14
- 239000001257 hydrogen Substances 0.000 description 13
- 150000002431 hydrogen Chemical class 0.000 description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 7
- 229910001437 manganese ion Inorganic materials 0.000 description 7
- UUZZMWZGAZGXSF-UHFFFAOYSA-N peroxynitric acid Chemical compound OON(=O)=O UUZZMWZGAZGXSF-UHFFFAOYSA-N 0.000 description 7
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 6
- 229910017604 nitric acid Inorganic materials 0.000 description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- 239000011591 potassium Substances 0.000 description 5
- 230000002195 synergetic effect Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical class [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000005984 hydrogenation reaction Methods 0.000 description 3
- 238000010979 pH adjustment Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000008092 positive effect Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 244000248349 Citrus limon Species 0.000 description 1
- 235000005979 Citrus limon Nutrition 0.000 description 1
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 1
- 239000012425 OXONE® Substances 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- CKYRSWFHFMUEKV-UHFFFAOYSA-N [N+](=O)(O)[O-].N(=O)O.N(=O)O Chemical compound [N+](=O)(O)[O-].N(=O)O.N(=O)O CKYRSWFHFMUEKV-UHFFFAOYSA-N 0.000 description 1
- MHSGVEMBXALVGC-UHFFFAOYSA-N [N+](=O)(O)[O-].S(=O)(=O)(O)OS(=O)(=O)O Chemical compound [N+](=O)(O)[O-].S(=O)(=O)(O)OS(=O)(=O)O MHSGVEMBXALVGC-UHFFFAOYSA-N 0.000 description 1
- ASXADLHKFNIBAC-UHFFFAOYSA-N [N+](=O)(O)[O-].[N+](=O)(O)[O-].S(=O)(=O)(O)OS(=O)(=O)O Chemical compound [N+](=O)(O)[O-].[N+](=O)(O)[O-].S(=O)(=O)(O)OS(=O)(=O)O ASXADLHKFNIBAC-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000000887 hydrating effect Effects 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-N iodic acid Chemical class OI(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-N 0.000 description 1
- 235000014413 iron hydroxide Nutrition 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- BDRTVPCFKSUHCJ-UHFFFAOYSA-N molecular hydrogen;potassium Chemical compound [K].[H][H] BDRTVPCFKSUHCJ-UHFFFAOYSA-N 0.000 description 1
- 239000006174 pH buffer Substances 0.000 description 1
- HJKYXKSLRZKNSI-UHFFFAOYSA-I pentapotassium;hydrogen sulfate;oxido sulfate;sulfuric acid Chemical compound [K+].[K+].[K+].[K+].[K+].OS([O-])(=O)=O.[O-]S([O-])(=O)=O.OS(=O)(=O)O[O-].OS(=O)(=O)O[O-] HJKYXKSLRZKNSI-UHFFFAOYSA-I 0.000 description 1
- 238000005502 peroxidation Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229940071575 silver citrate Drugs 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- QUTYHQJYVDNJJA-UHFFFAOYSA-K trisilver;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Ag+].[Ag+].[Ag+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QUTYHQJYVDNJJA-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
Definitions
- the present invention relates to a chemical mechanical polishing liquid, and more particularly to a polishing liquid containing two or more kinds of non-ferrous transition metal salts. Background technique
- CMP chemical mechanical polishing
- CMP Chemical mechanical polishing
- It usually consists of a polishing table with a polishing pad and a grinding machine for carrying the chip.
- the polishing head holds the chip and then presses the front side of the chip against the polishing pad.
- the polishing head moves linearly on the polishing pad or in the same direction of motion as the polishing table.
- the slurry containing the abrasive is dropped onto the polishing pad and laid flat on the polishing pad by centrifugation.
- the surface of the chip achieves global planarization under both mechanical and chemical effects.
- the main mechanism for mechanical polishing (CMP) of metal layers is considered as follows:
- the oxidant first oxidizes the surface of the metal into a film, and the abrasive film represented by silica and alumina mechanically removes the oxide film to produce a new metal surface. Being oxidized, these two effects work synergistically.
- Metal tungsten one of the mechanical polishing (CMP) targets, has high electron current resistance at high current density and can form a good ohmic contact with silicon, so it can be used as a filler metal and diffusion for contact and via holes. Barrier layer.
- CMP tungsten mechanical polishing
- commonly used oxidants mainly include iron metal salts, iodates and hydrogen peroxide.
- U.S. Patent 5,340,370 discloses a formulation for tungsten mechanical polishing (CMP) comprising 0.1 M potassium ferricyanide, 5% silica, and acetate as a pH buffer.
- U.S. Patent No. 5,527,423, U.S. Patent No. 6,008,119, U.S. Patent No. 6,284,151, et al. discloses the use of the Fe (N0 3 ) 3 , alumina system for tungsten mechanical polishing (CMP).
- the polishing system has advantages in terms of static etch rate, but there are significant deficiencies in product defects.
- a polishing method using hydrogen peroxide and silver nitrate as an oxidizing agent is disclosed in U.S. Patent No. 5,225,034, U.S. Patent No. 5,354,490.
- U.S. Patent No. 5,958,288 discloses the use of ferric nitrate as a catalyst and hydrogen peroxide as an oxidant for tungsten chemical mechanical polishing. Due to the presence of iron ions, hydrogen peroxide rapidly decomposes and fails, so the polishing solution has a problem of poor stability.
- U.S. Patent No. 5,980,775 and U.S. Patent No. 6,068,787 are based on U.S. Patent No. 5,958,288, the addition of an organic acid as a stabilizer to reduce the rate of decomposition of hydrogen peroxide.
- the pH of the polishing solution is low (usually lower than about 2.7), which is likely to cause corrosion of the equipment.
- the polishing solution containing ferric nitrate has a narrow pH adjustment range. Because when the pH is higher than 2.7, the ferric nitrate will hydrolyze to form a precipitate of iron hydroxide, causing the polishing solution to fail.
- the organic matter content (COD) in the polishing waste liquid is increased due to the addition of organic acid.
- COD organic matter content
- the synergistic effect produced by the combination of silver ions and manganese ions is such that the polishing liquid produces an unexpected positive effect on the polishing of tungsten in the presence of peroxide.
- the technical problem to be solved by the present invention is to significantly increase the tungsten polishing speed by using a chemical mechanical polishing liquid containing two or more kinds of synergistic non-ferrous transition metal salts and peroxides.
- the chemical mechanical polishing liquid of the present invention contains water, an abrasive, an oxidizing agent and two or more kinds of non-ferrous transition metal salts.
- the two or more non-ferrous transition element metal salts have a synergistic effect. Any one of the two or more non-ferrous transition element metal salts described above, in the presence of the oxidizing agent alone, does not have a significant increase in the polishing rate of tungsten.
- the abrasive is one or more selected from the group consisting of fumed silica, silica sol, alumina, and cerium oxide.
- the abrasive is present in an amount of 0.1 to 20% by weight, preferably 0.5 to 3% by weight.
- the oxidizing agent is a peroxide.
- the peroxide is hydrogen peroxide or monopersulfate, preferably hydrogen peroxide (hydrogen peroxide).
- the oxidizing agent has a weight percentage of 0.1 to 10%.
- the non-ferrous transition element metal salt is selected from the group consisting of Sc, Ti, V, Cr, Mn, Co, Ni, Cu, Zn, Zr, Mo, Ag metal salts, preferably Mn, Ag metal salts.
- the Mn metal salt is 0.05% to 2% by weight, preferably 0.05% to 1% by weight.
- the Ag metal salt is 0.05% to 2% by weight, preferably 0.05 to 0.2% by weight.
- the non-ferrous transition element metal salt is a non-ferrous transition element mineral acid salt and/or a non-ferrous transition element organic acid salt.
- the organic acid salt is a citrate salt.
- the two non-ferrous transition element metal salts are nitrates and sulfates.
- the nitrate and sulfate are silver nitrate and manganese sulfate.
- the polishing liquid further contains a pH adjuster.
- the polishing liquid has a pH of 0.5 to 4.5.
- the polishing rate of tungsten is significantly improved by using a chemical mechanical polishing liquid containing two or more kinds of synergistic non-ferrous transition metal salts and peroxides.
- the hydrogen peroxide in the chemical mechanical polishing liquid can still be stably present in the polishing liquid.
- the chemical mechanical polishing liquid does not contain organic substances (stabilizers, such as organic acids, etc.). Therefore, the content of organic matter (COD emissions) in the polishing waste liquid is lowered.
- the chemical mechanical polishing liquid has a wider pH adjustment range. Therefore, corrosion of the apparatus can be reduced by raising the pH in the chemical mechanical polishing liquid.
- Table 1 shows the formulations of the chemical mechanical polishing liquids of Examples 1 to 14 and Comparative Examples 1-5 of the present invention, which are uniformly mixed in deionized water according to the components listed in Table 1 and their contents, and adjusted with a pH adjusting agent. Go to the place A chemical mechanical polishing solution can be prepared by pH.
- Polishing machine is Logitech (UK) 1PM52 type, IC1000 polishing pad, 4cm X4cm square wafer (Wafer), grinding pressure 4psi, grinding table rotation speed 70rev/min, grinding head rotation speed 150rev/min, polishing liquid Drop rate of 100 ml / min.
- Example 3 Silica 1.3 Hydrogen Potassium 5 Silver 0.2 Acid 2.5 192 Contrast Gas Phase II Peroxygen Nitric Acid Diluted Nitrate
- Example 5 Silica 1.3 Silver 0.2 Manganese 0.5 2.5 136 Implementation Gas Phase II Peroxy Nitric Acid Sulfuric Acid Diluted Nitrate
- Example 1 Silica 1.3. Hydrogen 5 Silver 0.2 Manganese 0.5 Acid 2.5 1082 Implementation Gas phase II Peroxy nitric acid Nitric acid Diluted nitrate
- Example 2 Silica 1.3 Hydrogenation 5 Silver 0.2 Manganese 0.25 2.5 1041 Implementation Gas phase II Peroxy nitric acid Sulfuric acid 'Diluted nitrate
- Example 3 Silica 1.3 Hydrogenation 5 Silver 0.05 Manganese 0.5 Acid 2.5 756 Implementation Gas Phase II Peroxy Nitric Acid Nitric Acid Diluted Nitrate
- Example 6 Silica 1.3 Hydrogen Potassium 5 Silver 0.5 Manganese 0.05 2.5 863 Implementation Peroxy Nitric Acid Sulfuric Acid Diluted Nitrate
- Example 7 Silica Sol 0.5 Hydrogen 10 Silver 1 Manganese 0.25 Acid 0.5
- Example 8 Silica Sol 10 Hydrogen 1 Silver 2 Manganese 0.25 Potassium 4.5
- Example 12 Silica 0.1 Hydrogen 10 Silver 0.2 Manganese 0.5 3.5 Implementation Gas phase II Peroxy nitric acid Sulfuric acid Diluted nitrate
- Example 14 Silica 20 Hydrogen Potassium 1 Silver 0.2 Manganese 0.5 3.5 Comparative Example 1 shows that the polishing rate of tungsten is very low only in the case of hydrogen peroxide.
- Comparative Example 2 showed that in the polishing liquid containing hydrogen peroxide, the polishing rate of silver ions to tungsten was improved in the absence of manganese ions, but it was not remarkable.
- Comparative Example 3 showed that in the polishing solution containing potassium monopersulfate, the polishing rate of silver ions to tungsten was improved in the absence of manganese ions, but it was not remarkable.
- Comparative Example 4 shows that manganese ions have no effect on the polishing rate of tungsten in the absence of silver ions.
- Comparative Example 5 shows that tungsten is polished at a low rate only when manganese ions and silver ions are present at the same time.
- Examples 1 to 6 show that the polishing rate of tungsten is remarkably improved in the presence of an oxidant, a manganese ion, and a silver ion.
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
一种化学机械抛光液 技术领域
本发明涉及一种化学机械抛光液，具体涉及一种含有两种或两种以上的 非铁过渡元素金属盐的抛光液。 背景技术
随着半导体技术的不断发展， 以及大规模集成电路互连层的不断增加， 导电层和绝缘介质层的平坦化技术变得尤为关键。二十世纪 80年代，由 IBM 公司首创的化学机械抛光（CMP)技术被认为是目前全局平坦化的最有效的 方法。
化学机械抛光（CMP)由化学作用、机械作用以及这两种作用结合而成。 它通常由一个带有抛光垫的研磨台， 及一个用于承载芯片的研磨 组成。其 中研磨头固定住芯片， 然后将芯片的正面压在抛光垫上。 当进行化学机械抛 光时， 研磨头在抛光垫上线性移动或是沿着与研磨台一样的运动方向旋转。 与此同时， 含有研磨剂的浆液被滴到抛光垫上， 并因离心作用平铺在抛光垫 上。 芯片表面在机械和化学的双重作用下实现全局平坦化。
对金属层机械抛光（CMP)的主要机制被认为是： 氧化剂先将金属表面 氧化成膜， 以二氧化硅和氧化铝为代表的研磨剂将该层氧化膜机械去除， 产 生新的金属表面继续被氧化， 这两种作用协同进行。
作为机械抛光（CMP)对象之一的金属钨， 在高电流密度下， 抗电子迁 移能力强， 并且能够与硅形成很好的欧姆接触， 所以可作为接触窗及介层洞 的填充金属及扩散阻挡层。
针对钨机械抛光（CMP)， 常用的氧化剂主要有含铁金属盐类， 碘酸盐 类以及双氧水等。
1991年， F. B. Kaufinan等报道了将铁氰化钾用于钨机械抛光 （CMP) 技术。 ( "Chemical Mechanical Polishing for Fabricating Patterned W Metal Features as Chip Interconnects" , Journal of the Electro chemical Society, Vol.138, No.l l， 1991年 11月）。
美国专利 5340370公开了一种用于钨机械抛光（CMP)的配方， 其中含 有 0.1M铁氰化钾， 5%氧化硅， 同时含有作为 pH缓冲剂的醋酸盐。
美国专利 5527423， 美国专利 6008119， 美国专利 6284151等公开了将 Fe (N03 ) 3， 氧化铝体系用于钨机械抛光（CMP)的方法。 该抛光体系在静 态腐蚀速率（static etch rate)方面具有优势， 但是在产品缺陷（defect)方面 存在显著不足。
美国专利 5225034， 美国专利 5354490公开了将双氧水和硝酸银用做氧 化剂的抛光方法。美国专利 5958288公开了将硝酸铁用做催化剂， 双氧水用 做氧化剂， 进行钨化学机械抛光的方法。 由于铁离子的存在， 双氧水会迅速 分解失效， 因此该抛光液存在稳定性差的问题。
美国专利 5980775和美国专利 6068787在美国专利 5958288基础上，加 入有机酸做稳定剂， 降低了双氧水的分解速率。但是由于有机酸的引入， 使 得抛光液 pH值较低（通常低于 2.7左右）， 容易造成设备的腐蚀。 此外， 含 有硝酸铁的抛光液， pH值调节范围很窄。 因为当 pH值高于 2.7时， 硝酸铁 会水解， 生成氢氧化铁沉淀， 造成抛光液失效。在环保上， 由于有机酸的加 入， 提高了抛光废液中有机物含量 （COD)。
在上述抛光液中， 都没有提到锰离子的特殊作用， 更没有提到银离子和 锰离子结合后产生的协同作用。所述协同所用使得抛光液在过氧化物存在的 情况下， 对钨的抛光产生意想不到的积极效果。 发明内容
本发明所要解决的技术问题是用含有两种或两种以上具有协同作用的 非铁过渡元素金属盐和过氧化物的化学机械抛光液， 来显著提高钨抛光速 度。
本发明的化学机械抛光液， 含有水， 研磨剂， 氧化剂和两种或两种以上 的非铁过渡元素金属盐。所述的两种或两种以上的非铁过渡元素金属盐具有 协同作用。所述的两种或两种以上的非铁过渡元素金属盐中的任一种， 在单 独存在的情况下， 其与氧化剂的组合物对钨的抛光速度没有显著提升的作 用。
本发明中， 所述的研磨剂为气相二氧化硅、 硅溶胶、 氧化铝、 氧化铈中 的一种或多种。
本发明中， 所述的研磨剂的重量百分比为 0.1~20%， 优选为 0.5~3%。 本发明中， 所述的氧化剂为过氧化物。
本发明中， 所述的过氧化物为过氧化氢或单过硫酸氢盐， 优选为过氧化 氢 （双氧水） 。
本发明中， 所述的氧化剂的重量百分比为 0.1~10%。
本发明中， 所述的非铁过渡元素金属盐选自 Sc， Ti， V， Cr, Mn, Co, Ni, Cu， Zn， Zr， Mo, Ag金属盐， 优选为 Mn， Ag金属盐。
本发明中， 所述的 Mn金属盐重量百分比 0.05%〜2%， 优选为 0.05~1%。
本发明中，所述的 Ag金属盐重量百分比 0.05%〜2%，优选为 0.05~0.2%。 本发明中，所述的非铁过渡元素金属盐为非铁过渡元素无机酸盐和 /或非 铁过渡元素有机酸盐。
本发明中， 所述的有机酸盐为柠檬酸盐。
本发明中， 所述的两种非铁过渡元素金属盐为硝酸盐和硫酸盐。
本发明中， 所述的硝酸盐和硫酸盐为硝酸银和硫酸锰。
本发明中， 所述的抛光液进一步含有 pH调节剂。
本发明中， 所述的抛光液的 pH值为 0.5~4.5。
本发明的积极进步效果在于：
1、 用一种含有两种或两种以上具有协同作用的非铁过渡元素金属盐和 过氧化物的化学机械抛光液， 来显著提高了钨的抛光速度。
2、 在不加入双氧水稳定剂的情况下， 所述化学机械抛光液中的双氧水 仍能非常稳定地存在于抛光液中。
3、 所述化学机械抛光液中不含有机物（稳定剂， 诸如有机酸等） 。 因 此， 降低了抛光废液中有机物的含量（COD排放量） 。
4、所述化学机械抛光液具有更宽的 pH调节范围。因此，在所述化学机 械抛光液中可以通过升高 pH值来降低对设备的腐蚀。 具体实施方式
下面用实施例来进一步说明本发明， 但本发明并不受其限制。下述实施 例中， 百分比均为质量百分比。
表 1给出了本发明的化学机械抛光液实施例 1~14及对比例 1-5的配方， 按表 1中所列组分及其含量， 在去离子水中混合均匀， 用 pH调节剂调到所
需 pH值， 即可制得化学机械抛光液。
抛光条件：抛光机台为 Logitech (英国） 1PM52型， IC1000抛光垫， 4cm X4cm正方形晶圆 （Wafer), 研磨压力 4psi， 研磨台转速 70转 /分钟， 研磨 头自转转速 150转 /分钟， 抛光液滴加速度 100 ml/分钟。
表 1化学机械抛光液实施例 1〜14及对比例 1-5 研磨剂 氧匕剂 过渡金属
重量 里里 星里 星里 钨抛光速 百分 百分 金属 百分 金属 百分 pH调
名称 比％ 名称 比％ 盐 1 比％ ±卜；？ 比％ 节剂 H (A/rain) 对比 气相二 过氧 稀硝
例 1 氧化硅 1.3 化氢 5 酸 2.5 121 对比 气相二 过氧 硝酸 稀硝
例 2 氧化硅 1.3 化氢 5 银 0.2 2.5 178 单过
对比 气相二 硫酸 硝酸 稀硝
例 3 氧化硅 1.3 氢钾 5 银 0.2 酸 2.5 192 对比 气相二 过氧 硝酸 稀硝
例 4 氧化硅 1.3 化氢 5 锰 0.5 2.5 52 对比 气相二 硝酸 硝酸 稀硝
例 5 氧化硅 1.3 银 0.2 锰 0.5 2.5 136 实施 气相二 过氧 硝酸 硫酸 稀硝
例 1 氧化硅 1.3. 化氢 5 银 0.2 锰 0.5 酸 2.5 1082 实施 气相二 过氧 硝酸 硝酸 稀硝
例 2 氧化硅 1.3 化氢 5 银 0.2 锰 0.25 2.5 1041 实施 气相二 过氧 硝酸 硫酸' 稀硝
例 3 氧化硅 1.3 化氢 5 银 0.05 锰 0.5 酸 2.5 756 实施 气相二 过氧 硝酸 硝酸 稀硝
例 4 氧化硅 1.3 化氢 5 银 0.1 锰 0.5 酸 2.5 939 单过
实施 气相二 硫酸 硝酸 硫酸 稀硝
例 5 氧化硅 1.3 氢钾 5 银 0.1 锰 1 酸 2.5 626 单过
实施 气相二 硫酸 硝酸 硝酸 稀硝
例 6 氧化硅 1.3 氢钾 5 银 0.5 锰 0.05 2.5 863 实施 过氧 硝酸 硫酸 稀硝
例 7 硅溶胶 0.5 化氢 10 银 1 锰 0.25 酸 0.5
实施 过氧 硝酸 硝酸
例 8 硅溶胶 10 化氢 1 银 2 锰 0.25 化钾 4.5
实施 过氧 柠檬 硫酸 稀硝
例 9 硅溶胶 0.1 化氢 0.1 酸银 0.1 锰 0.25 酸 1
实施 氧化铝 2 单过 5 硝酸 0.1 硫酸 2 稀硝 3
例 10 硫酸 银 锰 酸
氢钾
实施 过氧 硝酸 硫酸 稀硝
例 11 氧化铈 2 化氢 8 银 0.1 锰 0.5 3.5 实施 气相二 过氧 硝酸 硫酸 稀硝
例 12 氧化硅 0.1 化氢 10 银 0.2 锰 0.5 3.5 实施 气相二 过氧 硝酸 硫酸 稀硝
例 13 氧化硅 6 化氢 0.5 银 0.2 锰 0.5 酸 3.5
单过
实施 气相二 硫酸 硝酸 硫酸 稀硝
例 14 氧化硅 20 氢钾 1 银 0.2 锰 0.5 3.5 对比例 1表明， 只有双氧水的情况下， 钨的抛光速度很低。
对比例 2表明，在含过氧化氢的抛光液中，在没有锰离子存在的情况下， 银离子对钨的抛光速度有提高， 但不显著。
对比例 3表明， 在含单过硫酸氢钾的抛光液中， 在没有锰离子存在的情 况下， 银离子对钨的抛光速度有提高， 但不显著。
对比例 4表明， 在没有银离子存在的情况下， 锰离子对钨的抛光速度没 有提升作用。
对比例 5表明， 只有锰离子和银离子同时存在的情况下， 钨的抛光速度 很低。
实施例 1~6表明， 在氧化剂、锰离子、 银离子同时存在的情况下， 钨的 抛光速度显著提高。
表 2化学机械抛光液实施例 1~6的分解时间
Claims
1、 根据权利要求 10所述的抛光液， 所述的有机酸盐为柠檬酸盐。
2、根据权利要求 1所述的抛光液， 所述的两种非铁过渡元素金属盐为硝酸 盐和硫酸盐。
3、 根据权利要求 12所述的抛光液， 所述的硝酸盐和硫酸盐为硝酸银和硫 酸锰。
4、 根据权利要求 1所述的抛光液， 所述的抛光液进一步含有 pH调节剂。
、 根据权利要求 1所述的抛光液， 所述的抛光液的 pH值为 0.5〜4.5。
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