EP4330448A1 - Dispositif et procédé de revêtement d'un composant ou d'un produit semi-fini avec une couche de chrome - Google Patents

Dispositif et procédé de revêtement d'un composant ou d'un produit semi-fini avec une couche de chrome

Info

Publication number
EP4330448A1
EP4330448A1 EP22725776.3A EP22725776A EP4330448A1 EP 4330448 A1 EP4330448 A1 EP 4330448A1 EP 22725776 A EP22725776 A EP 22725776A EP 4330448 A1 EP4330448 A1 EP 4330448A1
Authority
EP
European Patent Office
Prior art keywords
chromium
cathode
cell
anode
deposition cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22725776.3A
Other languages
German (de)
English (en)
Inventor
Andreas Bán
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BFI VDEH Institut fuer Angewandte Forschung GmbH
Original Assignee
BFI VDEH Institut fuer Angewandte Forschung GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BFI VDEH Institut fuer Angewandte Forschung GmbH filed Critical BFI VDEH Institut fuer Angewandte Forschung GmbH
Publication of EP4330448A1 publication Critical patent/EP4330448A1/fr
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C25B15/087—Recycling of electrolyte to electrochemical cell
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C25D17/04—External supporting frames or structures
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys

Definitions

  • the invention relates to a device for coating a component or a semi-finished product with a chromium layer. Furthermore, the invention relates to a method for coating a component with a chromium layer. It is known from practice that decorative chromium layers and hard chromium layers are deposited on a component from electrolytic solutions containing chromium(VI). The chromic acid used is toxic and carcinogenic and has therefore been included in the lists of substances of very high concern (SVHC) of the EU Chemicals Regulation (REACH). For this reason, attempts have been made for many years to use the chromium(VI)-containing electrolyte solutions
  • a fundamental problem is that stable complexes between chromium(III) ions and six water molecules, the so-called hexaaquachrome(III) complexes, form in aqueous electrolyte solutions, which prevent the reduction of the
  • Chromium (III) ions Chromium (III) ions and thus kinetically inhibit the deposition of chromium. For this reason, complexing agents such as formates, oxalates or glycinates are usually added to the electrolyte solutions. Faster separation of the chromium from the chromium complexes that form is possible. In the reduction of the chromium(III) ion, the chromium(III) ion is first reduced to the chromium(II) ion and then the chromium(II) ion to the metallic chromium.
  • the kinetic inhibition of the chromium deposition is therefore caused in particular by the preceding reduction of the chromium(III) ion to the chromium(II) ion.
  • the invention was based on the object of creating a device and a method that allow a component to be provided with a chromium layer on an industrial scale without having to use electrolyte solutions with chromium(VI) compounds, at least to be able to reduce the use of chromium(VI)-containing solutions.
  • the basic idea of the invention is the reduction of the chromium(III) ion to the chromium(II) ion and the chromium(II) reduction to the metallic chromium in two different electrochemical cells whose electrolyte solutions are mutually exchanged via a circulation system , to execute.
  • the device according to the invention has an undivided deposition cell in which there is an anode and which is suitable for accommodating a cathodically connected component.
  • an anode instead of a single anode, a number of anodes and, in addition, smaller auxiliary anodes can also be arranged in the cell.
  • the deposition cell can be a dip tank. The use of a dip tank allows individual or multiple parts or even a larger number of parts to be immersed in drums or on racks.
  • the separation cell can also be a continuous cell in which the material is passed through a basin past one or more anodes arranged vertically, horizontally or radially.
  • the deposition cell can also be combined with a reservoir and a pump in order to circulate the electrolyte solution in order to ensure thorough mixing of the electrolyte solution, in particular between the component and the anode.
  • the deposition cell can also be a coating cell in which the electrolyte solution is guided between the anode and the surface of the component or semi-finished product without the component or semi-finished product and/or the anode being located in a basin.
  • the cell is also combined with a pump and a reservoir for the electrolyte solution.
  • the invention offers the advantage that conventional coating cells can be used to coat individual parts, but also mass-produced goods and semi-finished products. For the coating of mass-produced goods, preference is given to using rack and barrel processes.
  • Continuous systems are preferably used for semi-finished products such as wire, strip and tubes.
  • the invention can also be practiced with internal coating methods, e.g. B. for containers, pipes and bores.
  • the electrolytic solution is poured into the container or tube and an anode is inserted.
  • the deposition cell is an undivided cell.
  • An undivided separation cell is understood to mean a space in which a liquid is located, which space is not divided by a membrane into sub-cells which are only connected to one another via the membrane.
  • the deposition cell contains a liquid in which a substance containing chromium(II) is dissolved.
  • the liquid can also contain anions such as chloride, sulphate, hydrogen sulphate, fluoride, formate, oxalate, methanesulphonate, glycinate, citrate or acetate in addition to the dissolved chromium(II) ions.
  • the liquid can contain at least one solvent such as water, ethylene glycol, acetic acid, dimethyl sulfoxide, formamide, dimethylformamide or ethylene carbonate.
  • chromium(III) ions can also be present in the liquid, in particular if the chromium(II) ions are oxidized at the anode of the deposition cell.
  • the liquid can contain one or more acid buffers and/or one or more conductive salts such as sodium sulfate, sodium chloride, sodium methanesulfonate, potassium sulfate, potassium chloride, potassium sulfate, aluminum sulfate and boric acid or uncharged complexing agents such as ammonia, glycine, thiosulfate, diethanolamine, thiourea or urea and additives such as polyethylene glycol.
  • the device also has an electrolytic cell.
  • the electrolytic cell is separated by a membrane arranged in the electrolytic cell into a cathode compartment, in which a cathode is located, and an anode compartment, in which an anode is located.
  • the electrolytic cell can be designed as a basin.
  • the cathode and anode are designed and aligned geometrically in such a way that their distances from one another are the same everywhere and the membrane is arranged approximately in the middle.
  • the cathode, membrane and anode are designed to be plane-parallel to one another and small distances in the range from 2 mm to 5 cm chosen between cathode and membrane and anode and membrane. If small distances are selected, it is advantageous to design both the cathode and the anode space as flow cells.
  • the electrolyte solution can also be circulated in the anode chamber with the aid of a pump.
  • An electrolyte reservoir can also be present in the electrolyte circuit.
  • Several cells can also be combined to form a cell stack with separate inlets and outlets.
  • the membrane that separates the cathode space from the anode space is preferably an anion exchanger.
  • anion exchange membranes with a polymer structure based on polyetheretherketones, polysulfones, polyphenylene ethers, polybenzimidazoles, fluoropolymers or polystyrene copolymers can be used.
  • Trimethylammonium, pyridinium, sulfonium, phosphonium, guanidinium, imidazolium or piperidinium can be bonded to the polymer backbone as cationic functional groups.
  • the cathode located in the cathode space is preferably made of an electrically conductive material which is characterized by a high overvoltage for the cathodic decomposition of water.
  • Cathodes made of copper, lead, tin, titanium, lead-antimony alloys or carbon are particularly suitable. Solid as well as porous electrodes such as metal foams or carbon tiles can be used. Coatings of e.g. copper or carbon fleece are conceivable. For example, bismuth, indium, lead, bismuth-lead, silver-lead, gold-lead or copper-lead are suitable for this.
  • the anode located in the anode space is preferably a titanium anode coated with iridium mixed oxide.
  • other electrode materials such as platinized titanium, lead, lead-antimony, carbon or stainless steel can also be used.
  • the liquid that is placed in the anode compartment preferably contains the same solvent as the liquid of the cathode compartment and an acid whose anion is identical to an anion that is in the electrolyte solution of the cathode compartment.
  • the cathode compartment is connected to the deposition cell via a line and a pump arranged in the line, the pump being able to pump liquid from the cathode compartment into the deposition cell and/or liquid from the deposition cell into the cathode compartment.
  • a method that can be carried out with the device according to the invention is conceivable, in which the direction of flow through the line is changed.
  • the inventive method can be carried out in such a way that • in a first operating state, liquid is conveyed by means of the pump through the line from the cathode space into the deposition cell and
  • liquid is conveyed by means of the pump through the line from the deposition cell into the cathode space.
  • the method can consist of a series of the two operating states. However, other operating states can also be provided in which no liquid is conveyed through the line.
  • the line with the pump arranged in it is only used to convey the liquid in one direction.
  • Execution forms are conceivable in which liquid is conveyed by means of the pump through the line from the cathode compartment into the deposition cell.
  • the cathode compartment can be connected to the deposition cell via an additional return line, liquid flowing from the deposition cell into the cathode compartment via the return line.
  • Embodiments are conceivable in which liquid is conveyed by means of the pump through the line from the deposition cell into the cathode space.
  • the deposition cell may be connected to the cathode compartment via an additional return line, liquid flowing from the cathode compartment into the deposition cell via the return line.
  • the previously described exchange of the electrolyte solution can also take place between the reservoir and the cathode space of the membrane cell.
  • the line can also be a gutter.
  • the invention enables a high concentration of chromium (II) ions to be maintained in an undivided deposition cell.
  • the kinetically severely inhibited chromium deposition can be accelerated and the power required (amount of charge in ampere-hours per mass of deposited chromium in kilograms) for the chromium deposition in the deposition cell can be reduced. Since there is no need for a divided deposition cell, parts with complex shapes can also be coated in a chromium(II)-containing electrolyte solution, in particular using additional auxiliary anodes.
  • electrolyte solutions containing chloride can also be used in an undivided coating cell, since only the chromium (II) ion is oxidized to the chromium (III) ion at the anode of the deposition cell due to the lower oxidation potential of the chromium (II) ion and so the Oxidation of the chloride to the toxic chlorine is avoided. For the same reason, the oxidation of the chromium(III) ion to chromium(VI) is avoided.
  • pulsed current deposition of the chromium from the chromium(II)-containing electrolyte solution is made possible at high pulsed current densities. It is conceivable that even finely cracked chromium layers can be deposited with this process, which previously could only be produced from the toxic chromium(VI)-containing electrolyte solutions.
  • a chromium(III)-containing liquid is located in the cathode space.
  • the liquid containing chromium(III) contains chromium(III) ions.
  • the liquid in the cathode compartment can contain the same components as the liquid in the deposition cell, especially if the liquids are constantly changed.
  • the concentration of chromium(II) ions can be somewhat higher in the catholyte.
  • the pH (acid concentration) in the catholyte and in the separation cell can be different.
  • a reference electrode is provided in the cathode compartment.
  • This reference electrode can also be located outside the cathode compartment.
  • the electrolyte solution of the reference electrode can be connected to the electrolyte solution in the cathode compartment via a capillary, the so-called Haber-Luggin capillary.
  • the opening of the capillary in the cathode space is preferably positioned in the immediate vicinity of the cathode surface.
  • Suitable reference electrodes include silver-silver chloride electrodes, calomel electrodes, lead sulphate electrodes or mercury sulphate electrodes.
  • the device has a connecting piece which can be electrically connected to the component to be coated and with which a potential can be applied to the component.
  • the connector can be a clamp, for example.
  • the electrical contact can also be made via frames with holders for the components (frame process), via conductor electrodes in drums (drum process), via current rollers in a continuous process, via sliding contacts or other contact-making conductor electrodes.
  • the device has a (first) current or voltage source with a first pole and a second pole.
  • the anode of the deposition cell is electrically connected to the first pole of the first voltage source.
  • a connecting piece is provided which can be connected to the component to be coated and with which a potential can be applied to the component, the connecting piece being electrically connected to the second pole of the first voltage source.
  • the device has a second current or voltage source with a first pole and a second pole.
  • the anode of the anode compartment is electrically connected to the first pole of the second voltage source.
  • the cathode of the cathode compartment is electrically connected to the second pole of the second voltage source.
  • the inventive method for coating a component with a chromium layer provides that
  • the chromium(II) cations can oxidize to chromium(III) cations.
  • the electrolyte solution which is depleted in chromium(II) cations and enriched in chromium(III) cations in the coating cell can be pumped into the cathode space.
  • a constant flow of liquid can be used as well as an intermittent supply and removal of the electrolyte solution.
  • the flow of liquid or the amounts of liquid exchanged can be measured in such a way that the concentration of chromium(II) ions in the deposition cell is only slightly lower than in the cathode space of the electrolytic cell.
  • the cathode potential of the cathode can be measured against a reference electrode and adjusted.
  • the cathode potential can be set by controlling the cell voltage or current.
  • a cathode potential can be set which is small enough to reduce the chromium (III) ions to chromium (II) ions and large enough to avoid chromium deposition on the cathode of the electrolytic cell.
  • chromium(III) ions and chromium(II) ions are usually present in solutions as complex-bound chromium cations. Depending on the number of anions bound to the chromium cation and the number of charges, the charge on the complexes is positive, neutral or negative.
  • an anion exchange membrane can be used to prevent or minimize the transfer of chromium ions into the anode compartment. If the chromium complexes are predominantly present as negatively charged ions, the use of a cation exchange membrane can also be considered. If no starting salt containing chloride is used, a diaphragm electrolysis cell can also be used instead of a membrane electrolysis cell. The use of membrane electrolysis cells, which are divided into three chambers by an anion and cation exchange membrane, is also possible.
  • a three-chamber cell with a cathode compartment, anode compartment and a central compartment without an electrode is ideal if anions from the electrolyte solution in the cathode compartment must not reach the anode in the anode compartment, as they can be oxidized there to form toxic substances.
  • chlorides in the electrolyte solution in the cathode compartment are oxidized to form poisonous chlorine gas if they reach the anode in the anode compartment.
  • This can be avoided with a three-chamber cell, the center space of which is separated from the cathode space by an anion exchange membrane and the center space is separated from the anode space by a cation exchange membrane. In this way, the chlorides can pass through the anion exchange membrane into the center space, but their transfer into the anode space is almost completely avoided by using the cation exchange membrane.
  • the invention can also be applied to the electroplating of alloys containing chromium, e.g. B. in the galvanic zinc-chromium or chromium-iron deposition.
  • it is applicable to galvanic iron plating or plating of an alloy containing iron.
  • the process can also be used for the galvanic chromium and iron recovery or recovery of these metals from salt solutions.
  • the electrolyte solutions should contain appropriate metal salts in the solvent:
  • Iron alloys instead of substances containing chromium, at least one salt containing iron and salts from the alloy partners must be used
  • figure 1 shows a schematic representation of the device according to the invention.
  • the component 1 to be chromed is connected cathodically in an electrolytic solution containing chromium(II) ions with the aid of a power source 4 and an anode 2 in the deposition cell 3, so that chromium is deposited.
  • the chromium(II) and chromium(III) ions which are almost exclusively present as complex-bound chromium cations, are shown in the exemplary embodiment simply as Cr 2+ or Cr 3+ ions (cations).
  • the anions of the electrolyte solution in the deposition cell and in the cathode and anode compartment of the electrolytic cell were also not included.
  • the chromium salt is supplied to the electrolytic solution in the electrolytic cell 7 as chromium (II) or chromium (III) salt and the chromium (III) cation at the cathode 8 of the divided electrolytic cell 7 to chromium (II) cation according to the following equation 4) reduced: 4) 2cr 3+ +2e- ⁇ 2cr 2+
  • the electrolyte solution from the cathode compartment of the electrolytic cell 7 is transferred via a line by means of a pump 5 into the deposition cell 3 and from there returned to the cathode compartment of the electrolytic cell 7 via a return line 6 .
  • a pump 5 into the deposition cell 3
  • a return line 6 returns to the cathode compartment of the electrolytic cell 7 via a return line 6 .
  • the voltage Uz of the voltage source 12 must be regulated in such a way that the voltage difference UB between the cathode 8 and a reference electrode 11 corresponds to a target voltage which is suitable for converting the chromium(III) to the chromium(II ) but not to be reduced to metallic chromium.
  • the feasibility of such voltage regulation is evident from the fact that the standard potential of the response in Equation 1) is -0.913V and that of the response in Equation 3) is only -0.41V.
  • the membrane 10 in the electrolytic cell 7 can be a cation or anion exchange membrane, or a simple diaphragm is used. Depending on the choice of chromium salt, it may be appropriate to use a cation or anion exchange membrane. If, for example, chromium(III) sulfate is used as the starting material, it makes sense to use an anion exchange membrane, since the sulfate anions supplied with chromium(III) sulfate are removed from the electrolyte circuit by the anion exchange membrane, i.e. transferred to the anode compartment. In this way, the concentration of the electrolyte can be kept constant despite constant replenishment of the chromium sulphate.
  • chromium sulfate is used as the chromium salt for the process
  • sulfuric acid is expediently initially introduced into the anode compartment.
  • the sulfuric acid produced in the anode compartment can then be used to adjust the pH of the chromium-containing electrolyte solution.
  • complexing agents such as formate, glycinate or oxalate and other bath additives can be added to the coating electrolyte.
  • Pulsed current deposition of the chromium layer is also possible in the coating cell. For this purpose, instead of the DC power source 4, a pulsed power source or pulsed reverse power source must be used. Also chromium deposits with temporary or pulsed current reversal can be done with this

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Inorganic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

L'invention concerne un dispositif de revêtement d'un composant ou d'un produit semi-fini avec une couche de chrome, comprenant une cellule de dépôt non divisée, dans laquelle se trouve une anode et qui est appropriée pour recevoir un composant monté de manière cathodique, la cellule de dépôt contenant une solution électrolytique contenant du chrome (ll), le dispositif comprenant une cellule d'électrolyse, qui est divisée par une membrane disposée dans la cellule d'électrolyse en une chambre de cathode, dans laquelle se trouve une cathode, et une chambre d'anode, dans laquelle se trouve une anode, la chambre de cathode étant reliée à la cellule de dépôt par l'intermédiaire d'une conduite et d'une pompe disposée dans la conduite, la pompe pouvant pomper du liquide de la chambre de cathode vers la cellule de dépôt et/ou du liquide de la cellule de dépôt vers la chambre de cathode.
EP22725776.3A 2021-04-27 2022-04-26 Dispositif et procédé de revêtement d'un composant ou d'un produit semi-fini avec une couche de chrome Pending EP4330448A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021002197.5A DE102021002197A1 (de) 2021-04-27 2021-04-27 Vorrichtung und Verfahren zum Beschichten eines Bauteils oder Halbzeugs mit einer Chromschicht
PCT/EP2022/061036 WO2022229175A1 (fr) 2021-04-27 2022-04-26 Dispositif et procédé de revêtement d'un composant ou d'un produit semi-fini avec une couche de chrome

Publications (1)

Publication Number Publication Date
EP4330448A1 true EP4330448A1 (fr) 2024-03-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP22725776.3A Pending EP4330448A1 (fr) 2021-04-27 2022-04-26 Dispositif et procédé de revêtement d'un composant ou d'un produit semi-fini avec une couche de chrome

Country Status (6)

Country Link
EP (1) EP4330448A1 (fr)
JP (1) JP2024516407A (fr)
KR (1) KR20230173685A (fr)
CN (1) CN117396638A (fr)
DE (1) DE102021002197A1 (fr)
WO (1) WO2022229175A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022121557A1 (de) * 2022-08-25 2024-03-07 Maschinenfabrik Kaspar Walter Gmbh & Co Kg Verfahren zur steuerung der chromzufuhr in einem elektrolyseverfahren zur herstellung von chromschichten sowie eine elektrolysezelle hierfür

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1482747A (en) * 1973-10-10 1977-08-10 Bnf Metals Tech Centre Chromium plating baths
AT510422B1 (de) 2010-11-04 2012-04-15 Univ Wien Tech Verfahren zur abscheidung von hartchrom aus cr(vi)- freien elektrolyten
DE102010062680A1 (de) 2010-12-09 2012-06-28 Robert Bosch Gmbh Vorrichtung und Verfahren zur Abscheidung chromhaltiger Überzüge

Also Published As

Publication number Publication date
KR20230173685A (ko) 2023-12-27
CN117396638A (zh) 2024-01-12
WO2022229175A1 (fr) 2022-11-03
JP2024516407A (ja) 2024-04-15
DE102021002197A1 (de) 2022-10-27

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