EP4160683A3 - Thin-film transistor array substrate and display device - Google Patents

Thin-film transistor array substrate and display device Download PDF

Info

Publication number
EP4160683A3
EP4160683A3 EP22191462.5A EP22191462A EP4160683A3 EP 4160683 A3 EP4160683 A3 EP 4160683A3 EP 22191462 A EP22191462 A EP 22191462A EP 4160683 A3 EP4160683 A3 EP 4160683A3
Authority
EP
European Patent Office
Prior art keywords
conductorized
auxiliary electrode
thin
display device
array substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22191462.5A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP4160683A2 (en
Inventor
ChanYong JEONG
Kyungchul OK
Jiyong NOH
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Display Co Ltd
Original Assignee
LG Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Display Co Ltd filed Critical LG Display Co Ltd
Publication of EP4160683A2 publication Critical patent/EP4160683A2/en
Publication of EP4160683A3 publication Critical patent/EP4160683A3/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/121Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/45Ohmic electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78633Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with a light shield
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • H01L29/78693Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate the semiconducting oxide being amorphous
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78696Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/121Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1216Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being capacitors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Geometry (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
EP22191462.5A 2021-10-01 2022-08-22 Thin-film transistor array substrate and display device Pending EP4160683A3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020210131187A KR20230047845A (ko) 2021-10-01 2021-10-01 박막 트랜지스터 어레이 기판 및 표시 장치

Publications (2)

Publication Number Publication Date
EP4160683A2 EP4160683A2 (en) 2023-04-05
EP4160683A3 true EP4160683A3 (en) 2023-05-10

Family

ID=83005953

Family Applications (1)

Application Number Title Priority Date Filing Date
EP22191462.5A Pending EP4160683A3 (en) 2021-10-01 2022-08-22 Thin-film transistor array substrate and display device

Country Status (5)

Country Link
US (1) US20230104382A1 (ko)
EP (1) EP4160683A3 (ko)
KR (1) KR20230047845A (ko)
CN (1) CN115939145A (ko)
TW (1) TWI836608B (ko)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012117936A1 (ja) * 2011-03-01 2012-09-07 シャープ株式会社 薄膜トランジスタおよびその製造方法、並びに表示装置
US20140183476A1 (en) * 2012-12-27 2014-07-03 Lg Display Co. Ltd. Thin-film transistor, method for manufacturing the same and display device comprising the same
WO2018016456A1 (en) * 2016-07-20 2018-01-25 Ricoh Company, Ltd. Field-effect transistor, method for producing the same, display element, image display device, and system
US20200402467A1 (en) * 2019-06-19 2020-12-24 Samsung Display Co., Ltd. Display device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100712295B1 (ko) * 2005-06-22 2007-04-27 삼성에스디아이 주식회사 유기 전계 발광 소자 및 그 제조 방법
KR101393637B1 (ko) * 2006-11-23 2014-05-12 삼성디스플레이 주식회사 표시판
KR20120140474A (ko) * 2011-06-21 2012-12-31 삼성디스플레이 주식회사 유기 발광 디스플레이 장치와, 이의 제조 방법
KR102458907B1 (ko) * 2015-12-29 2022-10-25 엘지디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
JP2017162852A (ja) * 2016-03-07 2017-09-14 株式会社ジャパンディスプレイ 半導体装置および表示装置
KR102493128B1 (ko) * 2016-04-12 2023-01-31 삼성디스플레이 주식회사 박막트랜지스터 기판, 이를 포함하는 표시 장치 및 그 제조 방법
TWI713003B (zh) * 2016-09-20 2020-12-11 日商半導體能源研究所股份有限公司 顯示裝置及電子機器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012117936A1 (ja) * 2011-03-01 2012-09-07 シャープ株式会社 薄膜トランジスタおよびその製造方法、並びに表示装置
US20140183476A1 (en) * 2012-12-27 2014-07-03 Lg Display Co. Ltd. Thin-film transistor, method for manufacturing the same and display device comprising the same
WO2018016456A1 (en) * 2016-07-20 2018-01-25 Ricoh Company, Ltd. Field-effect transistor, method for producing the same, display element, image display device, and system
US20200402467A1 (en) * 2019-06-19 2020-12-24 Samsung Display Co., Ltd. Display device

Also Published As

Publication number Publication date
EP4160683A2 (en) 2023-04-05
KR20230047845A (ko) 2023-04-10
TW202316678A (zh) 2023-04-16
CN115939145A (zh) 2023-04-07
US20230104382A1 (en) 2023-04-06
TWI836608B (zh) 2024-03-21

Similar Documents

Publication Publication Date Title
EP3557623A3 (en) Display apparatus
US9373724B2 (en) Method of driving transistor and device including transistor driven by the method
EP1005093A3 (en) Semiconductor circuit with TFTs
EP1998373A3 (en) Semiconductor device having oxide semiconductor layer and manufacturing method thereof
US20150001534A1 (en) Thin film transistor and fabricating method thereof
EP2001046A3 (en) Display device and method of manufacturing the same
US9911618B2 (en) Low temperature poly-silicon thin film transistor, fabricating method thereof, array substrate and display device
EP1947695A3 (en) Display device
US20070007524A1 (en) Thin film transistor plate and method of fabricating the same
KR20180030275A (ko) 메모리 트랜지스터 및 이를 갖는 표시장치
WO2009044614A1 (ja) 有機半導体装置
GB0327848D0 (en) Array substrate having color filter ion thin film transistor structure for lcd device and method of fabricating the same
EP1648030A3 (en) Organic thin film transistor array
JP4145352B2 (ja) 直線的に傾斜したフィールド酸化物及び線形なドーピング・プロファイルを有するラテラル薄膜soiデバイス
EP1460681A3 (en) Silicon carbide semiconductor device and method for fabricating the same
EP1701387A3 (en) Organic thin film transistor array panel and manufacturing method thereof
EP1887619A3 (en) MIS transistors with different gate electrodes or gate oxides and method for manufacturing the same
EP3799133A1 (en) Thin film transistor, method of manufacturing the thin film transistor, and display apparatus including the thin film transistor
EP1968105A3 (en) Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
TW200729508A (en) Thin-film transistor panel and method for manufacturing the same
TW200736786A (en) Thin film transistor array substrate and electronic ink display device
US20170162710A1 (en) Method for Fabricating Enhancement-mode Field Effect Transistor Having Metal Oxide Channel Layer
EP1770783A3 (en) Thin film transistor and method of fabricating the same
US8704305B2 (en) Thin film transistor
US10727289B1 (en) Array substrate and manufacturing method thereof

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20220822

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

RIC1 Information provided on ipc code assigned before grant

Ipc: H01L 29/786 20060101ALI20230331BHEP

Ipc: H01L 29/45 20060101ALI20230331BHEP

Ipc: H01L 27/12 20060101AFI20230331BHEP

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR