EP3960699A4 - Substrat nanostructuré - Google Patents

Substrat nanostructuré Download PDF

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Publication number
EP3960699A4
EP3960699A4 EP20794807.6A EP20794807A EP3960699A4 EP 3960699 A4 EP3960699 A4 EP 3960699A4 EP 20794807 A EP20794807 A EP 20794807A EP 3960699 A4 EP3960699 A4 EP 3960699A4
Authority
EP
European Patent Office
Prior art keywords
nanostructure substrate
nanostructure
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20794807.6A
Other languages
German (de)
English (en)
Other versions
EP3960699A1 (fr
Inventor
Masahiro Ito
Shigeki Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EEJA Ltd
Original Assignee
EEJA Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EEJA Ltd filed Critical EEJA Ltd
Publication of EP3960699A1 publication Critical patent/EP3960699A1/fr
Publication of EP3960699A4 publication Critical patent/EP3960699A4/fr
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/42—Coating with noble metals
    • C23C18/44—Coating with noble metals using reducing agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1837—Multistep pretreatment
    • C23C18/1844—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/42—Coating with noble metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/52—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G01N21/553—Attenuated total reflection and using surface plasmons
    • G01N21/554—Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/008—Surface plasmon devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemically Coating (AREA)
  • Laminated Bodies (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
EP20794807.6A 2019-04-26 2020-03-26 Substrat nanostructuré Pending EP3960699A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019085319A JP6812492B2 (ja) 2019-04-26 2019-04-26 ナノ構造基板
PCT/JP2020/013701 WO2020217842A1 (fr) 2019-04-26 2020-03-26 Substrat nanostructuré

Publications (2)

Publication Number Publication Date
EP3960699A1 EP3960699A1 (fr) 2022-03-02
EP3960699A4 true EP3960699A4 (fr) 2023-07-26

Family

ID=72942465

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20794807.6A Pending EP3960699A4 (fr) 2019-04-26 2020-03-26 Substrat nanostructuré

Country Status (7)

Country Link
US (1) US20220145470A1 (fr)
EP (1) EP3960699A4 (fr)
JP (1) JP6812492B2 (fr)
KR (1) KR102603853B1 (fr)
CN (1) CN113382954A (fr)
TW (1) TWI844633B (fr)
WO (1) WO2020217842A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI792376B (zh) * 2021-06-30 2023-02-11 國立臺北科技大學 利用鐵電模板製作可撓式檢測基板的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130049767A (ko) * 2010-03-19 2013-05-14 신닛테츠 수미킨 가가쿠 가부시키가이샤 금속 미립자 복합체
CN108844943A (zh) * 2018-01-30 2018-11-20 苏州天际创新纳米技术有限公司 Sers单元及其制备方法与应用

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001068804A (ja) * 1999-08-31 2001-03-16 Mitsui Mining & Smelting Co Ltd キャリア箔付電解銅箔及びその電解銅箔の製造方法並びにその電解銅箔を使用した銅張積層板
JP2004051997A (ja) 2002-07-16 2004-02-19 Ulvac Japan Ltd 金属微粒子分散液及びその調製方法、並びに透明着色膜及びその作製方法
JP2005054240A (ja) * 2003-08-05 2005-03-03 Fuji Photo Film Co Ltd 導電性フィルムおよびその作製方法
JP4163606B2 (ja) * 2003-12-10 2008-10-08 富士フイルム株式会社 微細構造体、微細構造体の作製方法、ラマン分光方法および装置
JP4445448B2 (ja) * 2005-09-16 2010-04-07 株式会社東芝 回路基板の製造方法
JP2008026109A (ja) * 2006-07-20 2008-02-07 Fujifilm Corp 微細構造体及びその製造方法、センサデバイス及びラマン分光用デバイス
KR20100105845A (ko) 2008-01-09 2010-09-30 우미코레 아게 운트 코 카게 귀금속 나노입자의 분산액을 제조하고 상기 분산액으로부터 상기 나노입자를 분리하기 위한 방법
JP6018774B2 (ja) 2011-03-31 2016-11-02 住友化学株式会社 金属系粒子集合体
US8873037B2 (en) * 2011-05-13 2014-10-28 Hao Li SERS substrates
US9452929B2 (en) * 2011-06-01 2016-09-27 Gwangju Institute Of Science And Technology Photoelectrode including zinc oxide hemisphere, method of fabricating the same and dye-sensitized solar cell using the same
JP5773484B2 (ja) * 2011-06-30 2015-09-02 新日鉄住金化学株式会社 金属微粒子複合体及びその製造方法
JP2015163845A (ja) 2014-02-28 2015-09-10 国立研究開発法人物質・材料研究機構 表面増強ラマンスペクトル用基板
US10351958B2 (en) * 2014-06-20 2019-07-16 Council On Postsecondary Education Systems and methods for electroless plating of thin gold films directly onto silicon nitride and into pores in silicon nitride
EP3307672A4 (fr) * 2015-06-12 2019-04-10 Rhodia Operations Nanoparticules hybrides contenant des dendrons, procédés de production de ces nanoparticules hybrides, et leurs utilisations
JP6312766B2 (ja) * 2016-09-23 2018-04-18 日本エレクトロプレイテイング・エンジニヤース株式会社 金属膜の積層構造
CN107942428A (zh) * 2017-11-15 2018-04-20 江西师范大学 一种红外光完美吸收器及其制备方法
JP7194944B2 (ja) * 2017-12-25 2022-12-23 国立大学法人北海道大学 光吸収デバイスおよびその製造方法ならびに光電極

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130049767A (ko) * 2010-03-19 2013-05-14 신닛테츠 수미킨 가가쿠 가부시키가이샤 금속 미립자 복합체
CN108844943A (zh) * 2018-01-30 2018-11-20 苏州天际创新纳米技术有限公司 Sers单元及其制备方法与应用

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2020217842A1 *

Also Published As

Publication number Publication date
KR20210132699A (ko) 2021-11-04
KR102603853B1 (ko) 2023-11-17
EP3960699A1 (fr) 2022-03-02
US20220145470A1 (en) 2022-05-12
TWI844633B (zh) 2024-06-11
WO2020217842A1 (fr) 2020-10-29
JP2020180356A (ja) 2020-11-05
TW202106607A (zh) 2021-02-16
JP6812492B2 (ja) 2021-01-13
CN113382954A (zh) 2021-09-10

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