EP3859971A4 - COMPOSITE SUBSTRATE, PIEZOELECTRIC ELEMENT AND METHOD FOR MAKING A COMPOSITE SUBSTRATE - Google Patents
COMPOSITE SUBSTRATE, PIEZOELECTRIC ELEMENT AND METHOD FOR MAKING A COMPOSITE SUBSTRATE Download PDFInfo
- Publication number
- EP3859971A4 EP3859971A4 EP19866251.2A EP19866251A EP3859971A4 EP 3859971 A4 EP3859971 A4 EP 3859971A4 EP 19866251 A EP19866251 A EP 19866251A EP 3859971 A4 EP3859971 A4 EP 3859971A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- composite substrate
- piezoelectric element
- manufacturing
- manufacturing composite
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002131 composite material Substances 0.000 title 2
- 239000000758 substrate Substances 0.000 title 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
- H10N30/706—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings characterised by the underlying bases, e.g. substrates
- H10N30/708—Intermediate layers, e.g. barrier, adhesion or growth control buffer layers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/072—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies
- H10N30/073—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies by fusion of metals or by adhesives
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/08—Shaping or machining of piezoelectric or electrostrictive bodies
- H10N30/085—Shaping or machining of piezoelectric or electrostrictive bodies by machining
- H10N30/086—Shaping or machining of piezoelectric or electrostrictive bodies by machining by polishing or grinding
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018178801 | 2018-09-25 | ||
JP2018181814 | 2018-09-27 | ||
PCT/JP2019/037272 WO2020067013A1 (ja) | 2018-09-25 | 2019-09-24 | 複合基板、圧電素子および複合基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3859971A1 EP3859971A1 (en) | 2021-08-04 |
EP3859971A4 true EP3859971A4 (en) | 2022-07-06 |
Family
ID=69949676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19866251.2A Pending EP3859971A4 (en) | 2018-09-25 | 2019-09-24 | COMPOSITE SUBSTRATE, PIEZOELECTRIC ELEMENT AND METHOD FOR MAKING A COMPOSITE SUBSTRATE |
Country Status (6)
Country | Link |
---|---|
US (1) | US20220021368A1 (zh) |
EP (1) | EP3859971A4 (zh) |
JP (3) | JP7194194B2 (zh) |
CN (1) | CN112740551A (zh) |
TW (1) | TWI747050B (zh) |
WO (1) | WO2020067013A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220007691A (ko) * | 2020-04-21 | 2022-01-18 | 지난 징젱 일렉트로닉스 씨오., 엘티디. | 복합 기판 및 이의 제조방법 |
CN113872557B (zh) * | 2021-09-29 | 2022-07-12 | 北京超材信息科技有限公司 | 用于声表面波器件的复合衬底及制造方法、声表面波器件 |
TWI792857B (zh) * | 2022-01-12 | 2023-02-11 | 合晶科技股份有限公司 | 複合基板及其製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017163722A1 (ja) * | 2016-03-25 | 2017-09-28 | 日本碍子株式会社 | 接合方法 |
WO2018016169A1 (ja) * | 2016-07-20 | 2018-01-25 | 信越化学工業株式会社 | 弾性表面波デバイス用複合基板の製造方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3132065B2 (ja) * | 1991-08-08 | 2001-02-05 | 住友電気工業株式会社 | 弾性表面波素子及びその製造方法 |
JPH11122073A (ja) * | 1997-10-17 | 1999-04-30 | Kazuhiko Yamanouchi | 弾性表面波素子 |
JP2001053579A (ja) * | 1999-06-02 | 2001-02-23 | Matsushita Electric Ind Co Ltd | 弾性表面波素子と移動体通信機器 |
JP3925132B2 (ja) | 2000-09-27 | 2007-06-06 | セイコーエプソン株式会社 | 表面弾性波素子、周波数フィルタ、周波数発振器、電子回路、及び電子機器 |
JP3929983B2 (ja) * | 2004-03-03 | 2007-06-13 | 富士通メディアデバイス株式会社 | 接合基板、弾性表面波素子および弾性表面波デバイス並びにその製造方法 |
JP4657002B2 (ja) * | 2005-05-12 | 2011-03-23 | 信越化学工業株式会社 | 複合圧電基板 |
JP2008066355A (ja) * | 2006-09-05 | 2008-03-21 | Sumitomo Electric Ind Ltd | 3族窒化物基板の製造方法、3族窒化物基板、エピタキシャル層付き3族窒化物基板、3族窒化物デバイス、エピタキシャル層付き3族窒化物基板の製造方法、および3族窒化物デバイスの製造方法。 |
JP5180104B2 (ja) * | 2009-01-09 | 2013-04-10 | 日本碍子株式会社 | 弾性表面波素子 |
JP5539602B1 (ja) * | 2012-08-17 | 2014-07-02 | 日本碍子株式会社 | 複合基板,弾性表面波デバイス及び複合基板の製造方法 |
CN202931260U (zh) * | 2012-11-14 | 2013-05-08 | 日本碍子株式会社 | 用于弹性波装置的复合基板 |
JP2014147054A (ja) | 2013-01-30 | 2014-08-14 | Sumitomo Electric Ind Ltd | 圧電基板及び弾性表面波素子 |
JPWO2014129433A1 (ja) * | 2013-02-19 | 2017-02-02 | 日本碍子株式会社 | 複合基板及び半導体デバイスの製法 |
WO2014148648A1 (ja) * | 2013-03-21 | 2014-09-25 | 日本碍子株式会社 | 弾性波素子用複合基板および弾性波素子 |
JP6347553B2 (ja) | 2013-05-31 | 2018-06-27 | 日本碍子株式会社 | 複合基板用支持基板および複合基板 |
JP2015111649A (ja) * | 2013-10-30 | 2015-06-18 | 京セラ株式会社 | 金属体付きサファイア構造体、金属体付きサファイア構造体の製造方法、電子機器、および外装体 |
JP6349979B2 (ja) | 2014-06-05 | 2018-07-04 | 株式会社デンソー | 弾性表面波式センサ |
US9576816B2 (en) * | 2015-02-13 | 2017-02-21 | Tokyo Electron Limited | Method for roughness improvement and selectivity enhancement during arc layer etch using hydrogen |
JP2017092791A (ja) * | 2015-11-13 | 2017-05-25 | 住友金属鉱山株式会社 | 複合基板の製造方法 |
NL2018040A (en) * | 2015-12-23 | 2017-06-28 | Asml Netherlands Bv | Method for removing photosensitive material on a substrate |
US9978563B2 (en) * | 2016-01-27 | 2018-05-22 | Tokyo Electron Limited | Plasma treatment method to meet line edge roughness and other integration objectives |
JP6250856B1 (ja) * | 2016-07-20 | 2017-12-20 | 信越化学工業株式会社 | 表面弾性波デバイス用複合基板及びその製造方法とこの複合基板を用いた表面弾性波デバイス |
JP6998650B2 (ja) * | 2016-08-10 | 2022-01-18 | 株式会社日本製鋼所 | 接合基板、弾性表面波素子、弾性表面波デバイスおよび接合基板の製造方法 |
-
2019
- 2019-09-24 JP JP2020549214A patent/JP7194194B2/ja active Active
- 2019-09-24 US US17/278,612 patent/US20220021368A1/en active Pending
- 2019-09-24 WO PCT/JP2019/037272 patent/WO2020067013A1/ja unknown
- 2019-09-24 CN CN201980062393.XA patent/CN112740551A/zh active Pending
- 2019-09-24 EP EP19866251.2A patent/EP3859971A4/en active Pending
- 2019-09-25 TW TW108134633A patent/TWI747050B/zh active
-
2022
- 2022-10-04 JP JP2022159991A patent/JP7454622B2/ja active Active
-
2024
- 2024-03-11 JP JP2024037513A patent/JP2024056101A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017163722A1 (ja) * | 2016-03-25 | 2017-09-28 | 日本碍子株式会社 | 接合方法 |
WO2018016169A1 (ja) * | 2016-07-20 | 2018-01-25 | 信越化学工業株式会社 | 弾性表面波デバイス用複合基板の製造方法 |
Non-Patent Citations (2)
Title |
---|
ANONYMOUS: "SINGLE CRYSTAL SAPPHIRE", KYOCERA, 1 January 2020 (2020-01-01), pages 1 - 8, XP055917113, Retrieved from the Internet <URL:https://www.kyocera-solutions.se/wp-content/uploads/2020/10/Kyocera_Single_Crystal_Sapphire_web.pdf> [retrieved on 20220502] * |
KIM Y. S. ET AL: "Thermal Expansion of Lithium Tantalate and Lithium Niobate Single Crystals", JOURNAL OF APPLIED PHYSICS, vol. 40, no. 11, 1 October 1969 (1969-10-01), 2 Huntington Quadrangle, Melville, NY 11747, pages 4637 - 4641, XP055924868, ISSN: 0021-8979, DOI: 10.1063/1.1657244 * |
Also Published As
Publication number | Publication date |
---|---|
TWI747050B (zh) | 2021-11-21 |
JP7454622B2 (ja) | 2024-03-22 |
WO2020067013A1 (ja) | 2020-04-02 |
CN112740551A (zh) | 2021-04-30 |
US20220021368A1 (en) | 2022-01-20 |
JP2024056101A (ja) | 2024-04-19 |
TW202018981A (zh) | 2020-05-16 |
JPWO2020067013A1 (ja) | 2021-09-02 |
EP3859971A1 (en) | 2021-08-04 |
JP2022191327A (ja) | 2022-12-27 |
JP7194194B2 (ja) | 2022-12-21 |
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Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
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17P | Request for examination filed |
Effective date: 20210319 |
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AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
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DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20220603 |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: H03H 3/08 20060101ALN20220530BHEP Ipc: H03H 9/02 20060101ALN20220530BHEP Ipc: H01L 41/313 20130101ALI20220530BHEP Ipc: H01L 41/08 20060101ALI20220530BHEP Ipc: H01L 41/337 20130101ALI20220530BHEP Ipc: H01L 41/312 20130101ALI20220530BHEP Ipc: H01L 41/187 20060101ALI20220530BHEP Ipc: H01L 41/113 20060101ALI20220530BHEP Ipc: H01L 41/09 20060101ALI20220530BHEP Ipc: H03H 9/25 20060101AFI20220530BHEP |
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P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230505 |