EP3663304B1 - Agent de traitement de surface et procédé de traitement de surface l'utilisant - Google Patents

Agent de traitement de surface et procédé de traitement de surface l'utilisant Download PDF

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EP3663304B1
EP3663304B1 EP19209615.4A EP19209615A EP3663304B1 EP 3663304 B1 EP3663304 B1 EP 3663304B1 EP 19209615 A EP19209615 A EP 19209615A EP 3663304 B1 EP3663304 B1 EP 3663304B1
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surface treatment
substrate
silacyclopentane
aza
group
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German (de)
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EP3663304A1 (fr
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Takeshi NYUUGAKU
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/76—Hydrophobic and oleophobic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds

Definitions

  • the present invention relates to a surface treatment agent and a surface treatment method using the same, and more specifically to a surface treatment agent containing an alkoxysilane compound having a cyclic silazane structure and a surface treatment method using the same.
  • an organosilicon compound having a hydrolyzable silyl group and an organic group enables bonding an organic material and an inorganic material together, which is normally unlikely to be bonded, because a silanol group generated by hydrolysis of the hydrolyzable silyl group forms a covalent bond with a hydroxyl group on the surface of the substrate and the organic group reacts with the organic material.
  • the organosilicon compound is capable of imparting properties such as heat resistance, water resistance, weather resistance, improved mechanical strength, adhesion, dispersibility, hydrophobicity, rust resistance, and the like to organic-inorganic composite materials, and is therefore known as a compound particularly useful as a surface treatment agent.
  • organosilicon compound examples include alkoxysilane compounds having an amino group such as 3-(n-butylamino)propyltrimethoxysilane (Patent Document 1), and alkoxysilane compounds having a cyclic silazane structure such as 2,2-dimethoxy-1-butyl-1-aza-2-silacyclopentane (Patent Document 2) JP2014208805 is another relevant document which discloses compounds with a different chain for the same use.
  • silanol groups produced by hydrolysis condense to produce siloxane since silanol groups produced by hydrolysis condense to produce siloxane, the reactivity with the hydroxyl group on the surface of the substrate may be degraded. In order to sufficiently react the silanol groups with the hydroxyl groups on the surface of the substrate, it is necessary to increase the reaction temperature or lengthen the reaction time, but in this case, the productivity is lowered. In addition, if unreacted silanol groups are present, the surface of the substrate after the surface treatment is in a state in which silanol groups and amino groups are mixed, so that a desired effect derived from the amino groups may not be sufficiently exhibited.
  • Patent Document 2 As one method for reducing the amount of alcohol generated from an alkoxysilane compound having an amino group, there is known a method in which an amino group and an alkoxysilyl group are cyclized in the molecule to derive a cyclic silazane structure (Patent Document 2).
  • This cyclic silazane structure reacts with a hydroxyl group on the surface of the substrate without hydrolysis to form a covalent bond, and therefore, has a merit that, when used as a surface treatment agent, the problem of hydrolysis in the alkoxysilane compound having the amino group described above does not occur.
  • the reactivity of the alkoxysilane compound having a cyclic silazane structure described in Patent Document 2 with the hydroxyl group on the surface of the substrate varies greatly depending on the steric hindrance of a substituent of the amino group.
  • the substituent of the amino group is a cyclic silazane structure having a large steric hindrance such as a t-butyl group or a phenyl group
  • the reactivity with the hydroxyl group on the surface of the substrate is low, and thus the surface treatment is difficult to complete.
  • the substituent of the amino group is a cyclic silazane structure having a small steric hindrance such as an n-butyl group
  • the cyclic silazane structure easily reacts with a hydroxyl group on the surface of the substrate to form a covalent bond.
  • the covalent bond portion with the substrate is also hydrolyzed in addition to the alkoxysilyl group, so that there are problems such as low durability and low stability of the substrate after the surface treatment.
  • the present invention has been made in view of the above circumstances, and an object thereof is to provide a surface treatment agent containing an alkoxysilane compound having a cyclic silazane structure in which the cyclic silazane structure easily reacts with a hydroxyl group on the surface of the substrate to form a covalent bond and the covalent bond portion with the substrate is not hydrolyzed during hydrolysis in the post-treatment and a surface treatment method using the same.
  • a cyclic silazane structure easily reacts with a hydroxyl group on the surface of the substrate to form a covalent bond by treating the surface of the substrate by using a surface treatment agent containing an alkoxysilane compound having a cyclic silazane structure in which a substituent of the amino group is a linear alkyl group having a predetermined carbon number and that the covalent bond portion with the substrate is not hydrolyzed during hydrolysis in post-treatment, and thus has completed the invention.
  • the present invention provides:
  • the cyclic silazane structure easily reacts with a hydroxyl group on the surface of the substrate to form a covalent bond, and thus the surface treatment can be completed in a short reaction time. Furthermore, since the covalent bond portion with the substrate is not hydrolyze during hydrolysis in post-treatment, durability and stability of the substrate after the surface treatment can be improved.
  • a surface treatment agent according to the present invention includes an alkoxysilane compound having a cyclic silazane structure represented by the following general formula (1).
  • R 1 represents an unsubstituted linear alkyl group having 6 to 20 carbon atoms, preferably 8 to 16 carbon atoms, or more preferably 8 to 14 carbon atoms.
  • a linear alkyl group having 6 to 20 carbon atoms the cyclic silazane structure easily reacts with a hydroxyl group on the surface of the substrate to form a covalent bond and the covalent bond portion with the substrate is not hydrolyzed during hydrolysis in the post-treatment, and therefore the durability and stability of the substrate after the surface treatment can be improved by a surface treatment agent containing the alkoxysilane compound represented by the above general formula (1).
  • a linear alkyl group having 8 to 14 carbon atoms is particularly excellent in reactivity with the hydroxyl group on the surface of the substrate, and can significantly improve the durability and stability of the substrate after the surface treatment.
  • unsubstituted linear alkyl group having 6 to 20 carbon atoms corresponding to R 1 include n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, and n-icosyl groups.
  • an n-hexyl group, an n-octyl group, an n-decyl group, an n-dodecyl group, an n-tetradecyl group, an n-hexadecyl group, an n-octadecyl group, and an n-icosyl group are more preferable, and from the viewpoints of reactivity with hydroxyl groups on the surface of the substrate and durability and stability of the substrate after the surface treatment, an n-octyl group, an n-decyl group, an n-dodecyl group, and an n-tetradecyl group, which are unsubstituted linear alkyl groups having 8 to 14 carbon atoms, are even more preferable.
  • R 2 represents a substituted or unsubstituted alkylene group that may include a heteroatom having 3 to 6 carbon atoms, preferably 3 to 5 carbon atoms, or more preferably 3 or 4 carbon atoms.
  • the alkylene group having 3 to 6 carbon atoms may be linear, branched, or cyclic, and specific examples thereof include trimethylene, propylene, tetramethylene, and isobutylene groups.
  • alkylene groups may include a heteroatom and may have one or more of ether groups, ester groups, carbonyl groups, sulfide groups, disulfide groups and the like interposed in the molecular chain.
  • the hydrogen atoms of these alkylene groups may be substituted with other substituents.
  • substituents include alkoxy groups having 1 to 3 carbon atoms such as methoxy, ethoxy, and (iso)propoxy groups; halogen atoms such as fluorine, chlorine, and bromine; aromatic hydrocarbon groups such as a phenyl group; and a cyano group, an amino group, an ester group, an ether group, a carbonyl group, an acyl group, a sulfide group, and so forth, and one or more of these may be used in combination.
  • the substitution position of these substituents is not particularly limited, and the number of substituents is neither limited.
  • R 2 an unsubstituted linear alkylene group having 3 or 4 carbon atoms is preferable, and in particular, a trimethylene group is more preferable from the viewpoint of availability of a precursor raw material.
  • R 3 and R 4 each independently represent a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, preferably 1 to 8 carbon atoms, and more preferably 1 to 6 carbon atoms.
  • the monovalent hydrocarbon group having 1 to 10 carbon atoms may be linear, branched, or cyclic, and specific examples thereof include linear alkyl groups such as methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, and n-decyl groups; branched alkyl groups such as isopropyl, isobutyl, tert-butyl, sec-butyl, isopentyl, neopentyl, isohexyl, isoheptyl, isooctyl, tert-octyl, isononyl, and isodecyl groups; cyclic alkyl groups such as cyclopentyl and cyclohexyl groups; alkenyl groups such as vinyl, allyl, butenyl, and me
  • R 3 and R 4 unsubstituted linear alkyl group having 1 to 6 carbon atoms are preferable, and from the viewpoint of easy availability of a precursor raw material, unsubstituted linear alkyl groups having 1 to 3 carbon atoms is more preferable, and a methyl group and an ethyl group are even more preferable.
  • n represents an integer of 0 or 1, and is preferably 0 from the viewpoint of increasing adhesion by reacting with a plurality of hydroxyl groups on the surface of the substrate, particularly when used as a surface treatment agent.
  • alkoxysilane compounds having a cyclic silazane structure represented by the general formula (1) include
  • the surface treatment agent containing an alkoxysilane compound having a cyclic silazane structure (hereinafter simply referred to as a surface treatment agent), although there is no problem in using the alkoxysilane compound having a cyclic silazane structure as it is. Although there is no problem, the alkoxysilane compound having a cyclic silazane structure may be used in a state of being diluted with a solvent.
  • the solvent include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene, and xylene; ketone solvents such as acetone and methyl isobutyl ketone; ether solvents such as diethyl ether, tetrahydrofuran, and dioxane; ester solvents such as ethyl acetate and butyl acetate; aprotic polar solvents such as acetonitrile and N, N-dimethylformamide; and chlorinated hydrocarbon solvents such as dichloromethane and chloroform, and these solvents may be used alone, in a mixture of two or more kinds.
  • hydrocarbon solvents and ether solvents are particularly preferable from the viewpoint of compatibility with the alkoxysilane compound having a cyclic silazane structure.
  • the concentration of the alkoxysilane compound having a cyclic silazane structure that is used is not particularly limited, but from the viewpoint of reactivity and productivity, the alkoxysilane compound having a cyclic silazane structure may be used by being diluted with a solvent described above such that the content of the alkoxysilane compound having a cyclic silazane structure is in a range of 0.001 to 50% by weight, preferably 0.1 to 20% by weight, and more preferably 0.1 to 10% by weight.
  • the concentration of the alkoxysilane compound having a cyclic silazane structure is less than 0.001% by weight, the surface treatment may not be sufficiently performed, and if the concentration exceeds 50% by weight, the effect of imparting the properties by the surface treatment peaks, and the amount of use of the alkoxysilane compound having a cyclic silazane structure just increases, which is not economical.
  • the durability and stability of the substrate after the surface treatment can be improved.
  • the method of performing the surface treatment of the substrate by using the surface treatment agent of the present invention includes a method of applying the surface treatment agent on the substrate, a method of entraining the surface treatment agent in an inert gas and bringing the substrate into contact with the entrained gas, and a method of directly mixing the surface treatment agent with the substrate with a mixer or a mill.
  • Examples of the method of applying the surface treatment agent include a brush coating method, a spray coating method, a wire bar method, a blade method, a roll coating method, and a dipping method.
  • the time (reaction time) for applying the surface treatment agent of the present invention on the substrate, bringing the surface treatment agent into contact with the substrate, or mixing the surface treatment agent with the substrate is not particularly limited, and is preferably 1 second to 10 minutes, more preferably 1 second to 5 minutes, and even more preferably 1 second to 1 minute from the viewpoint of reactivity and productivity.
  • reaction temperature when applying the surface treatment agent of the present invention on the substrate, bringing the surface treatment agent into contact with the substrate, or mixing the surface treatment agent with the substrate is not particularly limited, and is preferably 0 to 100°C, more preferably 10 to 50°C, and even more preferably 20 to 30°C from the viewpoint of reactivity and productivity.
  • the reaction temperature may be appropriately set in consideration of a relationship with the reaction time described above.
  • the substrate on which the surface treatment is performed may be either an inorganic material or an organic material.
  • the inorganic material examples include silicon compounds such as glass plates, glass fibers, diatomaceous earth, calcium silicate, silica, silicon, talc, and mica; metal oxides such as zinc oxide, aluminum oxide, tin oxide, titanium oxide, iron oxide, and magnesium oxide; metal hydroxides such as aluminum hydroxide and magnesium hydroxide; and carbonates such as calcium carbonate, zinc carbonate, and magnesium carbonate, and the silicon compounds and metal oxides are particularly preferable from the viewpoint of reactivity with the alkoxysilane compound having a cyclic silazane structure.
  • silicon compounds and metal oxides are particularly preferable from the viewpoint of reactivity with the alkoxysilane compound having a cyclic silazane structure.
  • organic material examples include natural polymers such as rubber, paper, and cellulose; synthetic polymers such as acrylic resins, urethane resins, epoxy resins, and phenol resins; and oils and fats, surfactants, and liquid crystals, and natural polymers and synthetic polymers are particularly preferable from the viewpoint of reactivity with the alkoxysilane compound having a cyclic silazane structure.
  • washing solvent there is no particular limitation on a washing solvent, and the same things as the solvents exemplified as solvents for diluting the alkoxysilane compound having a cyclic silazane structure may be used.
  • washing method There is no particular limitation on a washing method, and a method of immersing the substrate after the surface treatment in the washing solvent, a method of spraying the washing solvent onto the substrate after the surface treatment, or the like may be employed.
  • the cleaning time is not particularly limited as long as the substrate after the surface treatment is not adversely affected, and is preferably 1 to 240 minutes, more preferably 1 to 180 minutes, and even more preferably 1 to 120 minutes from the viewpoint of productivity.
  • the cleaning temperature is not particularly limited as long as the substrate after the surface treatment is not adversely affected, and is preferably 0 to 200°C, more preferably 0 to 150°C, and even more preferably 0 to 100°C from the viewpoint of productivity.
  • the cleaning temperature may be appropriately set in consideration of a relationship with the cleaning time described above.
  • the drying time is not particularly limited as long as the substrate after the surface treatment is not adversely affected, and is preferably 1 to 240 minutes, more preferably 1 to 180 minutes, and even more preferably 1 to 120 minutes from the viewpoint of productivity.
  • the drying temperature is not particularly limited as long as the substrate after the surface treatment is not adversely affected, and is preferably 0 to 200°C, more preferably 0 to 150°C, and even more preferably 0 to 100°C from the viewpoint of productivity.
  • the drying temperature may be appropriately set in consideration of a relationship with the drying time described above.
  • the substrate after removing the excess surface treatment agent is exposed to a humid atmosphere to hydrolyze the alkoxysilyl group.
  • thermo-hygrostat There is no particular limitation on the method of exposing the substrate to the humid atmosphere, and a method of immersing the substrate in pure water such as ion-exchanged water or distilled water, a method of treating the substrate at a predetermined humidity using a thermo-hygrostat, or the like can be employed.
  • the time of exposure (exposure time) to the humid atmosphere is not particularly limited as long as the substrate after the surface treatment is not adversely affected, and is preferably 1 to 240 minutes, more preferably 1 to 180 minutes, and even more preferably 1 to 120 minutes from the viewpoint of productivity.
  • the temperature of exposure (exposure temperature) to the humid atmosphere is not particularly limited as long as the substrate after the surface treatment is not adversely affected, and is preferably 0 to 100°C, more preferably 10 to 80°C, and even more preferably 20 to 60°C from the viewpoint of productivity.
  • the exposure temperature may be appropriately set in consideration of a relationship with the exposure time described above.
  • the surface treatment agent of the present invention can be also used as a composition containing one or more other additives selected from a pigment, an antifoaming agent, a lubricant, an antiseptic, a pH adjuster, a film forming agent, an antistatic agent, an antibacterial agent, a surfactant, a dye, and the like as long as the effects of the present invention are not impaired.
  • a flask equipped with a stirrer, a reflux condenser, a fractionation head, and a thermometer was charged with 362.6 g of the precursor reaction solution and 3.8 g (0.020 mol) of a methanol solution of sodium methoxide (28% by weight sodium methoxide), and 136.3 g of a colorless transparent fraction having a boiling point of 47 to 48°C/0.2 kPa was obtained by performing distillation while distilling off generated methanol.
  • the obtained fraction was subjected to 1 H-NMR spectrum (deuterated chloroform solvent) measurement and IR spectrum measurement. The results are shown in FIGS. 1 and 2 , respectively.
  • a flask equipped with a stirrer, a reflux condenser, a dropping funnel, and a thermometer was charged with 517.2 g (4.000 mol) of n-octylamine and heated to 150°C. After the internal temperature was stabilized, 198.7 g (1.000 mol) of chloropropyltrimethoxysilane was added dropwise over 10 hours, and the system was stirred at that temperature for 10 hours. After cooling the system to room temperature, n-octylamine hydrochloride generated by the reaction was removed by filtration to obtain 522.6 g of a precursor reaction solution.
  • a flask equipped with a stirrer, a reflux condenser, a fractionation head, and a thermometer was charged with 522.6 g of the precursor reaction solution and 3.8 g (0.020 mol) of a methanol solution of sodium methoxide (28% by weight sodium methoxide), and 233.6 g of a colorless transparent fraction having a boiling point of 104 to 105°C/0.2 kPa was obtained by performing distillation while distilling off generated methanol.
  • the obtained fraction was subjected to 1 H-NMR spectrum (deuterated chloroform solvent) measurement and IR spectrum measurement. The results are shown in FIGS. 3 and 4 , respectively.
  • a flask equipped with a stirrer, a reflux condenser, a dropping funnel, and a thermometer was charged with 853.6 g (4.000 mol) of n-tetradecylamine and heated to 150°C. After the internal temperature was stabilized, 198.7 g (1.000 mol) of chloropropyltrimethoxysilane was added dropwise over 10 hours, and the system was stirred at that temperature for 10 hours. After cooling the system to room temperature, n-tetradecylamine hydrochloride generated by the reaction was removed by filtration to obtain 763.2 g of a precursor reaction solution.
  • a flask equipped with a stirrer, a reflux condenser, a fractionation head, and a thermometer was charged with 763.2 g of the precursor reaction solution and 3.8 g (0.020 mol) of a methanol solution of sodium methoxide (28% by weight sodium methoxide), and 307.5 g of a colorless transparent fraction having a boiling point of 167 to 168°C/0.2 kPa was obtained by performing distillation while distilling off generated methanol.
  • the obtained fraction was subjected to 1 H-NMR spectrum (deuterated chloroform solvent) measurement and IR spectrum measurement. The results are shown in FIGS. 5 and 6 , respectively.
  • a flask equipped with a stirrer, a reflux condenser, a dropping funnel, and a thermometer was charged with 372.4 g (4.000 mol) of aniline and heated to 150°C. After the internal temperature was stabilized, 198.7 g (1.000 mol) of chloropropyltrimethoxysilane was added dropwise over 10 hours, and the system was stirred at that temperature for 10 hours. After cooling the system to room temperature, aniline hydrochloride generated by the reaction was removed by filtration to obtain 419.4 g of a precursor reaction solution.
  • a flask equipped with a stirrer, a reflux condenser, a fractionation head, and a thermometer was charged with 419.4 g of the precursor reaction solution and 3.8 g (0.020 mol) of a methanol solution of sodium methoxide (28% by weight sodium methoxide), and 162.0 g of a colorless transparent fraction having a boiling point of 125 to 126°C/0.3 kPa was obtained by performing distillation while distilling off generated methanol.
  • the obtained fraction was subjected to 1 H-NMR spectrum (deuterated chloroform solvent) measurement and IR spectrum measurement. The results are shown in FIGS. 7 and 8 , respectively.
  • a glass plate (manufactured by Matsunami Glass Ind., Ltd.; edge-polished white frost slide glass No. 1, size: 76 mm * 26 mm, thickness: 0.8-1.0 mm, frosted surface: 15 mm * 26 mm) cleaned by ultraviolet light and ozone in advance was subjected to surface treatment by immersing the glass plate in a solution (surface treatment agent) obtained by adding 1.3 g (0.005 mol) of 2,2-dimethoxy-1-n-octyl-1-aza-2-silacyclopentane obtained in Synthesis Example 2 to 100 mL of toluene, at 25°C and for 30 seconds.
  • the glass plate was lifted from the solution, newly immersed in 100 mL of toluene and ultrasonically cleaned at 25°C for 60 minutes by an ultrasonic cleaner (W-221 manufactured by Hyundai Electronics Co., Ltd.), and then dried at 50°C for 60 minutes. Thereafter, the glass plate was subjected to post-treatment by exposing the glass plate to a relative humidity of 90% at 25°C for 60 minutes in a thermo-hygrostat (IW243 manufactured by Yamato Scientific Co., Ltd.).
  • the contact angle when the reaction time was short (Examples 1, 4, 7, and 10) was the same as the contact angle when the reaction time was long (Examples 2, 5, 8, and 11). That is, the cyclic silazane structure easily reacts with a hydroxyl group on the surface of the substrate to form a covalent bond, so that the contact angle reaches the maximum value in a short reaction time, and it can be seen that the surface treatment is completed even in a short reaction time. Furthermore, the contact angle does not change even with long exposure times (Examples 3, 6, 9, and 12). That is, it can be seen that the durability and stability of the substrate after the surface treatment are improved as a result of the covalent bond portion with the substrate not being hydrolyzed during the hydrolysis in the post-treatment.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
  • Paints Or Removers (AREA)
  • Dental Preparations (AREA)

Claims (4)

  1. Agent de traitement de surface comprenant un composé alcoxysilane ayant une structure silazane cyclique représentée par la formule générale (1) suivante :
    Figure imgb0005
     R1 représentant un groupe alkyle linéaire non substitué ayant 6 à 20 atomes de carbone, R2 représentant un groupe alkylène substitué ou non substitué ayant 3 à 6 atomes de carbone pouvant comporter un hétéroatome, R3 et R4 représentant chacun indépendamment un groupe hydrocarboné monovalent substitué ou non substitué comportant 1 à 10 atomes de carbone, et n représentant un nombre entier de 0 ou 1.
  2. Agent de traitement de surface selon la revendication 1, dans lequel R1 représente un groupe alkyle linéaire non substitué ayant 8 à 14 atomes de carbone.
  3. Agent de traitement de surface selon la revendication 1 ou 2, comprenant en outre un solvant.
  4. Procédé de traitement de surface comprenant l'application de l'agent de traitement de surface selon l'une quelconque des revendications 1 à 3 sur un substrat, la mise en contact de l'agent de traitement de surface avec le substrat, ou le mélange de l'agent de traitement de surface avec le substrat.
EP19209615.4A 2018-12-04 2019-11-18 Agent de traitement de surface et procédé de traitement de surface l'utilisant Active EP3663304B1 (fr)

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CN112853336A (zh) * 2020-12-31 2021-05-28 广州和力表面处理技术有限公司 一种铝罐盖包装材料用无铬表面处理剂及其制备方法、钝化工艺

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JP3027340B2 (ja) 1996-11-12 2000-04-04 株式会社熊谷組 杭を柱に利用した建築構造物
DE10049183C1 (de) * 2000-10-05 2002-01-17 Consortium Elektrochem Ind Cyclische Silazane
DE10140563A1 (de) 2001-08-18 2003-02-27 Degussa Verfahren zur Herstellung von aminofunktionellen Organosilanen
WO2003091186A2 (fr) 2002-04-23 2003-11-06 Gelest, Inc. Azasilanes et procedes de fabrication et d'utilisation correspondants
US8455165B2 (en) * 2006-09-15 2013-06-04 Cabot Corporation Cyclic-treated metal oxide
JP5680932B2 (ja) * 2009-11-13 2015-03-04 東京応化工業株式会社 表面処理剤及び表面処理方法
CN103980390B (zh) * 2010-04-16 2017-04-12 旭化成株式会社 改性共轭二烯系聚合物以及改性共轭二烯系聚合物组合物
US20130189495A1 (en) * 2010-11-12 2013-07-25 The Regents Of The University Of Michigan Nanoscale Photolithography
JP5835116B2 (ja) * 2012-06-15 2015-12-24 信越化学工業株式会社 アミノ基と保護された水酸基を有する有機ケイ素化合物及びその製造方法
JP2014208805A (ja) * 2013-03-27 2014-11-06 日本ゼオン株式会社 変性共役ジエン系ゴムの製造方法
JP6167936B2 (ja) * 2014-02-26 2017-07-26 信越化学工業株式会社 環状シラザン化合物の製造方法
JP6195425B2 (ja) * 2014-03-27 2017-09-13 日本曹達株式会社 疎水化表面基板の製造方法

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TW202031669A (zh) 2020-09-01
US11560481B2 (en) 2023-01-24
US20200172737A1 (en) 2020-06-04
JP7151690B2 (ja) 2022-10-12
JP2020094188A (ja) 2020-06-18
TWI821465B (zh) 2023-11-11
KR20200067757A (ko) 2020-06-12
CN111269656A (zh) 2020-06-12
CN111269656B (zh) 2022-05-27

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