EP3449040B1 - Zusammensetzung zur verminderung des beizabtrags beim beizen von metallischen oberflächen enthaltend blanken und/oder verzinkten stahl - Google Patents
Zusammensetzung zur verminderung des beizabtrags beim beizen von metallischen oberflächen enthaltend blanken und/oder verzinkten stahl Download PDFInfo
- Publication number
- EP3449040B1 EP3449040B1 EP17721118.2A EP17721118A EP3449040B1 EP 3449040 B1 EP3449040 B1 EP 3449040B1 EP 17721118 A EP17721118 A EP 17721118A EP 3449040 B1 EP3449040 B1 EP 3449040B1
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- EP
- European Patent Office
- Prior art keywords
- pickling
- composition
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- range
- diol
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- 238000005554 pickling Methods 0.000 title claims description 86
- 239000000203 mixture Substances 0.000 title claims description 76
- 239000000463 material Substances 0.000 title claims 2
- 229910000831 Steel Inorganic materials 0.000 title description 6
- 239000010959 steel Substances 0.000 title description 6
- 229910052751 metal Inorganic materials 0.000 title description 5
- 239000002184 metal Substances 0.000 title description 5
- 150000001875 compounds Chemical class 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 12
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 claims description 12
- 229910001335 Galvanized steel Inorganic materials 0.000 claims description 10
- 239000008397 galvanized steel Substances 0.000 claims description 10
- IXAWTPMDMPUGLV-UHFFFAOYSA-N 2-[4-(2-hydroxyethoxy)but-2-ynoxy]ethanol Chemical compound OCCOCC#CCOCCO IXAWTPMDMPUGLV-UHFFFAOYSA-N 0.000 claims description 9
- 238000011282 treatment Methods 0.000 claims description 7
- 239000012141 concentrate Substances 0.000 claims description 5
- 238000010790 dilution Methods 0.000 claims description 4
- 239000012895 dilution Substances 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 239000002612 dispersion medium Substances 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 24
- 239000003112 inhibitor Substances 0.000 description 18
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- FLVIGYVXZHLUHP-UHFFFAOYSA-N N,N'-diethylthiourea Chemical compound CCNC(=S)NCC FLVIGYVXZHLUHP-UHFFFAOYSA-N 0.000 description 6
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000002401 inhibitory effect Effects 0.000 description 5
- KWPNNZKRAQDVPZ-UHFFFAOYSA-N 1,3-bis(2-methylphenyl)thiourea Chemical compound CC1=CC=CC=C1NC(=S)NC1=CC=CC=C1C KWPNNZKRAQDVPZ-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- KFFQABQEJATQAT-UHFFFAOYSA-N N,N'-dibutylthiourea Chemical compound CCCCNC(=S)NCCCC KFFQABQEJATQAT-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 239000011707 mineral Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000004922 lacquer Substances 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000010960 cold rolled steel Substances 0.000 description 2
- 238000007739 conversion coating Methods 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000002110 toxicologic effect Effects 0.000 description 2
- 231100000027 toxicology Toxicity 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 150000002363 hafnium compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- CPSYWNLKRDURMG-UHFFFAOYSA-L hydron;manganese(2+);phosphate Chemical compound [Mn+2].OP([O-])([O-])=O CPSYWNLKRDURMG-UHFFFAOYSA-L 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- -1 iron (III) ions Chemical class 0.000 description 1
- UBUHAZKODAUXCP-UHFFFAOYSA-N iron(2+);oxygen(2-);hydrate Chemical class O.[O-2].[Fe+2] UBUHAZKODAUXCP-UHFFFAOYSA-N 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
- C23G1/06—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors
- C23G1/065—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors sulfur-containing compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
- C23G1/06—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
- C23G1/06—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors
- C23G1/061—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors nitrogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
- C23G1/06—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors
- C23G1/068—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors compounds containing a C=C bond
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/08—Iron or steel
- C23G1/081—Iron or steel solutions containing H2SO4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/19—Iron or steel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
- C23G1/26—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions using inhibitors
Definitions
- the invention relates to an aqueous composition for reducing the pickling removal when pickling metallic surfaces containing bright and / or galvanized steel and a method for pickling a corresponding metallic surface with reduced pickling removal.
- Atmospheric corrosion or during heat treatment e.g. heat development during forming or welding
- heat treatment e.g. heat development during forming or welding
- pickling refers to the dissolution of these oxide layers in mineral acid solutions in order to achieve a clean metallic surface for further processing.
- This essentially serves to remove oxide films from rust - FeO, Fe 2 O 3 , Fe 3 O 4 and iron oxide hydrates - or zinc oxide from the surface, which in turn increases the adhesive strength and uniformity of subsequent coatings, in particular a conversion coating, on the surface.
- the atomic hydrogen (H ⁇ ) which develops in accordance with equation (4) is preferably absorbed on iron, penetrates into the crystal lattice and combines there to form hydrogen molecules (H 2 ).
- the pressures generated by the hydrogen gas deteriorate the mechanical properties of the metal.
- This embrittlement is irreversible and can lead to cracks or pickling bubbles.
- the decisive factor for the extent of embrittlement is the amount of hydrogen developed during pickling removal.
- the metallic surface Due to excessive pickling removal and, above all, the cracks and pickling bubbles formed due to the pickling hydrogen embrittlement, the metallic surface receives an uneven morphology, which is transferred to subsequent coatings to the extent that they also have a certain unevenness. This in turn leads to a reduction in the adhesive strength of the coatings and in the corrosion protection they produce.
- alkali metal alkoxylates or thiodiglycolate alkoxylates which act as pickling inhibitors, i.e. reduce the pickling removal.
- N, N'-diethylthiourea and mixtures of N, N'-di (o-tolyl) thiourea, N, N'-dibutylthiourea and hexamethylenetetraamine give satisfactory results due to an inhibition value of 96 percent each.
- N, N'-diethylthiourea is increasingly undesirable since this is very questionable from a toxicological and environmental point of view.
- Each of the pamphlets FR 1 475 895 A , US 2009/032057 A1 , FR 2 158 664 A5 , US 3,310,497 A. , DE 25 07 059 A1 , DE 10 2015 005521 A1 each discloses an aqueous composition for reducing the pickling removal when pickling steel surfaces and / or galvanized steel surfaces containing an acid, such as sulfuric acid, hydrochloric acid or phosphoric acid, and 2-butyne-1,4-diol as a corrosion inhibitor.
- an acid such as sulfuric acid, hydrochloric acid or phosphoric acid
- 2-butyne-1,4-diol as a corrosion inhibitor.
- the object of the invention was therefore to provide a composition for reducing the removal of pickling when pickling metallic surfaces containing bright and / or galvanized steel, and a method for pickling a corresponding metallic surface with reduced pickling removal, which completely with a subsequent pickling Conversion treatment is compatible and less toxicologically harmful and less harmful to the environment.
- the reduced pickling removal should preferably increase the service life of a corresponding pickling bath.
- composition according to claim 1 a concentrate according to claim 7, a method according to claim 8 and a use according to claim 15.
- Advantageous embodiments are described in the dependent claims.
- the aqueous composition according to the invention for reducing the removal of pickling when pickling metallic surfaces containing bright and / or galvanized steel contains a mixture of a compound of the formula I.
- an "aqueous composition” is to be understood to mean one which for the most part, i.e. contains more than 50% by weight of water as a solvent / dispersant.
- the aqueous composition is preferably a solution, more preferably a solution which contains only water as a solvent.
- the “galvanized steel” can be either electrolytically galvanized or hot-dip galvanized steel.
- Compounds of the formula I act as physical corrosion inhibitors which are adsorbed on the metallic surface by Van der Waals forces, as a result of which a monomolecular, homogeneous, densely packed layer is formed thereon. Said layer physically shields the metallic surface from a proton attack at least partially and thus prevents or at least reduces the pickling removal of the surface.
- the aqueous composition according to the invention is essentially free of N, N'-diethylthiourea, N, N'-di (o-tolyl) thiourea, N, N'-dibutylthiourea and hexamethylenetetraamine.
- Essentially free means that the aforementioned compounds have not been added to the composition at will, so that they are at most impurities in the starting materials used.
- the total content of these compounds in the composition according to the invention is preferably below 5 mg / l, more preferably below 1 mg / l.
- the mixing ratio, based on% by weight, of the compound of the formula I in which R 1 and R 2 are both H and the compound of the formula I in which R 1 and R 2 are each independently an HO- (CH 2 ) w Group with w ⁇ 2 is preferably in the range from 0.5: 1 to 2: 1, particularly preferably in the range from 0.75: 1 to 1.75: 1 and very particularly preferably in the range from 1: 1 to 1.5: 1 (calculated as 2-butyne-1,4-diol and 2-butyne-1,4-diol-bis (2-hydroxyethyl ether)).
- the sum of x and y in each of the two compounds of the formula I is preferably 2 to 5.
- the aqueous composition contains a mixture of 2-butyne-1,4-diol and 2-butyne-1,4-diol-bis (2-hydroxyethyl ether).
- the mixing ratio based on% by weight is again preferably in the range from 0.5: 1 to 2: 1, particularly preferably in the range from 0.75: 1 to 1.75: 1 and very particularly preferably in the range 1: 1 up to 1.5: 1.
- the composition additionally contains at least one compound of the formula II R 1 O- (CH 2 ) x -S- (CH 2 ) y -OR 2 (II), wherein R 1 and R 2 are each independently H or a HO- (CH 2 ) w group with w ⁇ 2, and x and y are each independently 1 to 4.
- the at least one compound of the formula II is preferably HO-CH 2 -S-CH 2 .
- the aqueous composition according to the invention can be obtained from the concentrate according to the invention by dilution with a suitable solvent and / or dispersion medium, preferably with water, and if necessary adjusting the pH.
- the dilution factor is preferably in the range from 1:23 to 1: 225.
- the dilution factor when adding the concentrate to the rinsing solution in step iii) is preferably in the range from 1: 225 to 1: 2250.
- an alkaline cleaning solution is preferably used, particularly preferably with a pH of 9.5 or more.
- the pickling composition ii) preferably contains at least one compound selected from the group consisting of phosphonates, condensed phosphates and citrate and / or at least one mineral acid selected from the group consisting of sulfuric acid, hydrochloric acid, hydrofluoric acid and nitric acid, particularly preferably it contains at least one mineral acid selected from the group consisting of sulfuric acid, hydrochloric acid, hydrofluoric acid and nitric acid, very particularly preferably contains sulfuric acid.
- the pH of the rinsing composition in step iii) is preferably strongly acidic, neutral or slightly alkaline, particularly preferably it is in the range from 2 to 8.
- the pickling composition in step ii) is a composition according to the invention as described above.
- the total concentration of the mixture of the two compounds of the formula I in the pickling composition is preferably in the range from 31 to 620 mg / l, particularly preferably in the range from 31 to 310 mg / l (calculated as 2-butyne-1,4-diol) .
- the use of the mixture of the two compounds of the formula I in the pickling composition has the advantage of reducing the pickling removal particularly effectively.
- the rinsing composition in step iii) is a composition according to the invention as described above.
- the total concentration of the mixture of the two compounds of the formula I in the rinsing composition is preferably in the range from 3 to 62 mg / l, particularly preferably in the range from 3 to 31 mg / l (calculated as 2-butyne-1,4-diol) . Even during the rinsing of the previously pickled metallic surface, mineral acid is still present from the liquid film adhering to the surface, so that the pickling attack continues, albeit in a weakened form. As a result, flash rust is formed.
- the use of the mixture of the two compounds of formula I in the rinsing composition has the advantage of reducing this rust formation.
- the pickling composition in step ii) and the rinsing composition in step iii) are each a composition according to the invention as described above.
- the mixture of the two compounds of the formula I in the pickling composition and that in the rinsing composition can be the same or a different mixture.
- the total concentration of the mixture of the two compounds of the formula I in the pickling composition is again preferably in the range from 31 to 620 mg / l, particularly preferably in the range from 31 to 310 mg / l (calculated as 2-butyne-1,4-diol ) and in the rinsing composition preferably in the range from 3 to 62 mg / l, particularly preferably in the range from 3 to 31 mg / l (calculated as 2-butyne-1,4-diol).
- the metallic surface containing bright and / or galvanized steel pickled with the method according to the invention is preferably the surface of a metallic component / workpiece, for example a steel tube, of wires or screws (piece goods).
- the metallic surface pickled with the method according to the invention is therefore used in the area of parts treatment.
- the pickled and rinsed metallic surface is preferably first conversion-treated.
- For the conversion treatment there is preferably one acidic aqueous composition for use, which contains zinc phosphate, manganese phosphate and optionally nickel ions (so-called zinc phosphating).
- a thin film coating can also be carried out by means of an acidic aqueous composition which contains a titanium, zirconium and / or hafnium compound and optionally copper ions and / or a compound which releases copper ions, optionally a polymer and / or copolymer and optionally a Organoalkoxysilan and / or a hydrolysis and / or a condensation product thereof.
- an acidic aqueous composition which contains a titanium, zirconium and / or hafnium compound and optionally copper ions and / or a compound which releases copper ions, optionally a polymer and / or copolymer and optionally a Organoalkoxysilan and / or a hydrolysis and / or a condensation product thereof.
- a base lacquer which is preferably a KTL (cathodic electro-dipping lacquer), particularly preferably a (meth) acrylate or epoxy-based KTL, is preferably applied first, and then a top lacquer is applied.
- KTL cathodic electro-dipping lacquer
- a top lacquer is applied.
- a lubricant containing salts, polymers and / or soaps is applied to the pickled and rinsed metallic surface.
- Aqueous pickling solutions A to F were prepared, each containing 20% by weight H 2 SO 4 , 50 g / L Fe 2+ and optionally one or two pickling inhibitors.
- Test sheets made of CRS were weighed before treatment with one of the pickling solutions.
- pickling inhibitors of pickling solutions B and C to be avoided from a toxicological and environmental point of view each had an excellent inhibitory value of 96%.
- the inhibitory values of the individual inhibitors but-2-in-1,4-diol (pickling solution D) and 2-butyne-1,4-diol-bis (2-hydroxyethyl ether) (pickling solution E) remained clear at 85% and 92%, respectively back there.
- the inhibitory value of the mixture according to the invention of the two last-mentioned pickling inhibitors (pickling solution F) was surprisingly high at 97% and even exceeded that of the aforementioned pickling inhibitors.
- the sheets were then zinc-phosphated.
- the pickling solutions B and F were added to the phosphating bath in increasing amounts.
- the look of the sheets was evaluated.
- the layer weights in g / m 2 calculated from P 2 O 5 were determined by means of XRF.
- the mixture according to the invention not only reduces the pickling removal, but also does not lead to any disturbances in the layer formation in a subsequent phosphating step, for example due to the carryover of the pickling solution.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Detergent Compositions (AREA)
- ing And Chemical Polishing (AREA)
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PL17721118T PL3449040T3 (pl) | 2016-04-29 | 2017-04-28 | Kompozycja do zmniejszania ubytku wskutek trawienia podczas trawienia powierzchni metalowych zawierających stal niepowlekaną i/lub ocynkowaną |
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DE102016207429 | 2016-04-29 | ||
PCT/EP2017/060227 WO2017186929A1 (de) | 2016-04-29 | 2017-04-28 | Zusammensetzung zur verminderung des beizabtrags beim beizen von metallischen oberflächen enthaltend blanken und/oder verzinkten stahl |
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EP3449040A1 EP3449040A1 (de) | 2019-03-06 |
EP3449040B1 true EP3449040B1 (de) | 2020-03-18 |
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EP17721118.2A Active EP3449040B1 (de) | 2016-04-29 | 2017-04-28 | Zusammensetzung zur verminderung des beizabtrags beim beizen von metallischen oberflächen enthaltend blanken und/oder verzinkten stahl |
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US (1) | US11124884B2 (zh) |
EP (1) | EP3449040B1 (zh) |
JP (1) | JP6968825B2 (zh) |
KR (1) | KR102369545B1 (zh) |
CN (1) | CN109072454B (zh) |
DE (1) | DE102017207232A1 (zh) |
ES (1) | ES2795655T3 (zh) |
MX (1) | MX2018013233A (zh) |
PL (1) | PL3449040T3 (zh) |
RU (1) | RU2747720C2 (zh) |
WO (1) | WO2017186929A1 (zh) |
ZA (1) | ZA201807922B (zh) |
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EP3548582A1 (en) * | 2016-12-02 | 2019-10-09 | Ecolab USA Inc. | Thiol-formyl hemiacetal corrosion inhibitors |
US11242480B2 (en) | 2017-08-03 | 2022-02-08 | Championx Usa Inc. | Thiol adducts for corrosion inhibition |
JP7394761B2 (ja) | 2017-12-12 | 2023-12-08 | ケメタル ゲゼルシャフト ミット ベシュレンクテル ハフツング | クリオライトを含有する析出物を除去するためのホウ酸を含まない組成物 |
Family Cites Families (19)
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US3310497A (en) * | 1965-02-23 | 1967-03-21 | United States Steel Corp | Embrittlement-free pickling of ferrous metal |
FR1475895A (fr) * | 1966-02-23 | 1967-04-07 | Framalite Soc | Nouvel inhibiteur synergétique de corrosion métallique |
FR2158664A5 (en) * | 1971-10-27 | 1973-06-15 | Nivoxal Procedes | Metal surface treatment baths - additive - for addition to hydrochloric and sulphuric acid based baths |
DE2507059A1 (de) * | 1975-02-19 | 1976-09-02 | Basf Ag | Verfahren zur reinigung von eisen enthaltenden metallgegenstaenden |
US4302246A (en) * | 1980-01-03 | 1981-11-24 | Enthone, Incorporated | Solution and method for selectively stripping alloys containing nickel with gold, phosphorous or chromium from stainless steel and related nickel base alloys |
US5843373A (en) * | 1997-08-22 | 1998-12-01 | Betzdearborn Inc. | Corrosion inhibitor for alkanolamine units |
JP4241821B2 (ja) * | 2003-02-24 | 2009-03-18 | ビーエーエスエフ ソシエタス・ヨーロピア | 金属表面処理用カルボキシレート含有ポリマー |
EP1670972A1 (de) * | 2003-09-30 | 2006-06-21 | BASF Aktiengesellschaft | Verfahren zum beizen metallischer oberflächen unter verwendung von alkoxylierten alkinolen |
DE10345801A1 (de) | 2003-09-30 | 2005-04-14 | Basf Ag | Verfahren zum Beizen metallischer Oberflächen unter Verwendung von alkoxylierten Alkinolen |
KR20050044085A (ko) | 2003-11-07 | 2005-05-12 | 삼성전자주식회사 | 집적회로 소자의 세정액 및 그 세정액을 이용한 세정방법 |
AU2007217257B2 (en) * | 2006-02-23 | 2013-08-01 | Henkel Ag & Co. Kgaa | Acid inhibitor compositions for metal cleaning and/or pickling |
US8278258B2 (en) * | 2007-02-01 | 2012-10-02 | Henkel Ag & Co. Kgaa | Acid inhibitor compositions for metal cleaning and/or pickling |
US8901060B2 (en) | 2008-11-17 | 2014-12-02 | Basf Se | Use of thioglycol ethoxylate as a corrosion inhibitor |
CN102011129A (zh) * | 2010-12-14 | 2011-04-13 | 南通飞拓生物科技有限公司 | 一种腐蚀抑制剂 |
CN102330099B (zh) * | 2011-09-09 | 2013-11-06 | 北京星航机电设备厂 | 一种不锈钢酸洗缓蚀剂 |
RU2539129C1 (ru) * | 2013-08-19 | 2015-01-10 | Федеральное государственное бюджетное учреждение науки Институт физической химии и электрохимии им. А.Н. Фрумкина Российской академии наук (ИФХЭ РАН) | Ингибитор кислотной коррозии металлов |
EP3137651B1 (de) * | 2014-04-30 | 2018-12-19 | Rio Verwaltungs AG | Behandlungsvorrichtung und behandlungsverfahren zum beizen und phosphatieren von metallteilen |
MX2018013229A (es) | 2016-04-29 | 2019-02-13 | Chemetall Gmbh | Proceso para el tratamiento anticorrosion de una superficie metalica con remocion corrosiva reducida de material. |
WO2017202891A1 (de) | 2016-05-25 | 2017-11-30 | Chemetall Gmbh | Verfahren zur korrosionsschützenden phosphatierung einer metallischen oberfläche mit vermindertem beizabtrag |
-
2017
- 2017-04-28 CN CN201780024275.0A patent/CN109072454B/zh active Active
- 2017-04-28 PL PL17721118T patent/PL3449040T3/pl unknown
- 2017-04-28 DE DE102017207232.6A patent/DE102017207232A1/de not_active Withdrawn
- 2017-04-28 MX MX2018013233A patent/MX2018013233A/es unknown
- 2017-04-28 ES ES17721118T patent/ES2795655T3/es active Active
- 2017-04-28 KR KR1020187030705A patent/KR102369545B1/ko active IP Right Grant
- 2017-04-28 JP JP2018556914A patent/JP6968825B2/ja active Active
- 2017-04-28 RU RU2018140856A patent/RU2747720C2/ru active
- 2017-04-28 EP EP17721118.2A patent/EP3449040B1/de active Active
- 2017-04-28 US US16/097,134 patent/US11124884B2/en active Active
- 2017-04-28 WO PCT/EP2017/060227 patent/WO2017186929A1/de active Application Filing
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Also Published As
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ES2795655T3 (es) | 2020-11-24 |
US11124884B2 (en) | 2021-09-21 |
US20190112717A1 (en) | 2019-04-18 |
ZA201807922B (en) | 2020-02-26 |
CN109072454A (zh) | 2018-12-21 |
KR102369545B1 (ko) | 2022-03-03 |
JP6968825B2 (ja) | 2021-11-17 |
MX2018013233A (es) | 2019-02-13 |
RU2018140856A3 (zh) | 2020-06-25 |
KR20190003514A (ko) | 2019-01-09 |
PL3449040T3 (pl) | 2020-08-24 |
EP3449040A1 (de) | 2019-03-06 |
RU2018140856A (ru) | 2020-05-29 |
RU2747720C2 (ru) | 2021-05-13 |
BR112018071497A2 (pt) | 2019-02-19 |
WO2017186929A1 (de) | 2017-11-02 |
CN109072454B (zh) | 2021-03-05 |
DE102017207232A1 (de) | 2017-11-02 |
JP2019515133A (ja) | 2019-06-06 |
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