EP3137771B1 - Méthode de pompage dans un système de pompage et système de pompes à vide - Google Patents

Méthode de pompage dans un système de pompage et système de pompes à vide Download PDF

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Publication number
EP3137771B1
EP3137771B1 EP14721361.5A EP14721361A EP3137771B1 EP 3137771 B1 EP3137771 B1 EP 3137771B1 EP 14721361 A EP14721361 A EP 14721361A EP 3137771 B1 EP3137771 B1 EP 3137771B1
Authority
EP
European Patent Office
Prior art keywords
ejector
vacuum pump
return valve
pumping
rotary vane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP14721361.5A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP3137771A1 (fr
Inventor
Didier MÜLLER
Jean-Eric Larcher
Théodore ILTCHEV
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ateliers Busch SA
Original Assignee
Ateliers Busch SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ateliers Busch SA filed Critical Ateliers Busch SA
Priority to PT147213615T priority Critical patent/PT3137771T/pt
Priority to PL14721361T priority patent/PL3137771T3/pl
Publication of EP3137771A1 publication Critical patent/EP3137771A1/fr
Application granted granted Critical
Publication of EP3137771B1 publication Critical patent/EP3137771B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/30—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
    • F04C18/34—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
    • F04C18/344—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the inner member
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/0021—Systems for the equilibration of forces acting on the pump
    • F04C29/0028—Internal leakage control
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/02—Lubrication; Lubricant separation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
    • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
    • F04F5/14—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid
    • F04F5/16—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids
    • F04F5/20—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids for evacuating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
    • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
    • F04F5/54—Installations characterised by use of jet pumps, e.g. combinations of two or more jet pumps of different type

Definitions

  • the present invention relates to a pumping method making it possible to reduce the consumption of electrical energy as well as the performance in terms of flow rate and final vacuum in a pumping system in which the main pump is a vacuum pump with lubricated vanes. Also, the present invention relates to a pumping system which can be used to carry out the method according to the present invention.
  • Roots type booster pumps arranged upstream of the primary pumps with lubricated vane.
  • This type of system is bulky, works either with bypass valves presenting reliability problems, or by using means of measurement, control, adjustment or control.
  • these means of control, adjustment or control must be actively controlled, which necessarily results in an increase in the number of system components, its complexity and its cost.
  • the document WO20141012896A2 proposes to use downstream of a primary vacuum pump of the roots type an ejector mounted in parallel with the outlet port of the primary pump in order to reduce the final vacuum attainable by this type of pump.
  • the ejector is supplied with working fluid by an external gas line which may advantageously be the same as that which is used for purging the primary pump of the roots type.
  • the document FR2952683A1 teaches that it is possible to lower the electrical consumption of a dry primary vacuum pump if means for controlling the external supply of working fluid to the aforementioned ejector are incorporated into the pumping system. The purpose of these control means is to switch on and off the ejector at the most favorable moments for optimal reduction of the electrical power of the primary pump.
  • JP2007100562A proposes to replace the source of working fluid for the ejector, placed downstream of a dry primary pump, in the form of a gas line with an external and isolated air compressor.
  • the object of the present invention is to propose a pumping method in a pumping system making it possible to reduce the electrical energy necessary for the evacuation of a vacuum enclosure and the maintenance of vacuum in this enclosure, as well as to achieve a lower outlet gas temperature.
  • the present invention also aims to propose a pumping method in a pumping system making it possible to obtain a higher flow rate at low pressure than that which can be obtained using a vacuum pump with vanes lubricated alone during the pumping of a vacuum enclosure.
  • Another object of the present invention is to propose a pumping method in a pumping system making it possible to obtain a better vacuum than that which can be obtained using a vacuum pump with vanes lubricated alone in a vacuum enclosure. .
  • a pumping method which is carried out within the framework of a pumping system the configuration of which essentially consists of a primary vacuum pump with lubricated vanes provided with an orifice gas inlet connected to a vacuum enclosure and a gas outlet opening into a conduit which is fitted with a non-return valve before opening into the atmosphere or into other devices.
  • the suction of an ejector is connected in parallel to this non-return valve, its outlet going to the atmosphere or joining the duct of the primary pump after the non-return valve.
  • the ejector is supplied with working fluid by the compressor and the ejector continues to be supplied with working fluid all the time that the primary vacuum pump with lubricated vanes is supplied by an energy source and evacuates the vacuum enclosure .
  • the method essentially consists in supplying working fluid and operating the ejector continuously all the time that the primary vacuum pump with lubricated vanes pumps the gases contained in the vacuum enclosure through the gas inlet port, but also all the time that the primary vacuum pump with lubricated vanes maintains a defined pressure (eg the final vacuum) in the enclosure by discharging the gases rising through its outlet.
  • a defined pressure eg the final vacuum
  • the invention resides in the fact that the coupling of the primary vacuum pump with lubricated vanes and the ejector does not require specific measurements and devices (e.g. pressure, temperature sensors, current, etc.), servo or data management and calculation. Consequently, the pumping system suitable for implementing the pumping method according to the present invention comprises a minimum number of components, is very simple and costs considerably less than the existing systems.
  • the ejector integrated in the pumping system can always operate without damage according to the present pumping method. Its dimensioning is conditioned by a minimum consumption of working fluid for the operation of the device. It is normally single-stage. Its nominal flow rate is chosen according to the volume of the outlet pipe of the primary vacuum pump with lubricated vanes, limited by the non-return valve. This flow can be from 1/500 to 1/20 of the nominal flow of the primary vacuum pump with lubricated vanes, but can also be lower or higher than these values.
  • the working fluid for the ejector can be compressed air, but also other gases, for example nitrogen.
  • the non-return valve placed in the duct at the outlet of the primary vacuum pump with lubricated vanes can be a standard element available commercially. It is sized according to the nominal flow rate of the primary vacuum pump with lubricated vanes. In particular, it is intended that the non-return valve closes when the suction pressure of the primary vacuum pump with lubricated vanes is between 500 mbar absolute and the final vacuum (eg 100 mbar).
  • the ejector is multi-stage.
  • the ejector can be made of a material with high chemical resistance to substances and gases commonly used in the chemical industry, that of semiconductors, both in the single-stage ejector variant and in that of the multi-stage ejector.
  • the ejector is preferably small.
  • the ejector is integrated in a cartridge which incorporates the non-return valve.
  • the ejector is integrated in a cartridge which incorporates the non-return valve and this cartridge itself is housed in the oil separator of the primary vacuum pump with lubricated vanes.
  • the pressure is high, for example equal to atmospheric pressure.
  • the gas pressure pumped at its outlet is higher than atmospheric pressure (if the gases at the outlet of the primary pump are discharged directly to the atmosphere) or higher than the pressure at the inlet of another device connected downstream. This causes the non-return valve to open.
  • the gas flow at the pressure necessary for the operation of the ejector is provided by a compressor.
  • this compressor is driven by the primary pump with lubricated vanes.
  • This compressor can draw atmospheric air or gases into the gas outlet pipe after the non-return valve.
  • the presence of such a compressor makes vacuum pump systems with lubricated vane independent of a source of compressed gas, which can respond to certain industrial environments.
  • the compressor can supply the gas flow at the pressure necessary for the operation of several ejectors, which are respectively part of several vacuum pump systems with lubricated vane pumps as primary pumps.
  • Figure 1 represents a first SP pumping system suitable for implementing a pumping method.
  • This pumping system SP comprises an enclosure 1, which is connected to the suction port 2 of a primary vacuum pump with lubricated vanes 3.
  • the gas outlet port of the primary vacuum pump with lubricated vanes 3 is connected to the duct 5.
  • a discharge check valve 6 is placed in the duct 5, which after this non-return valve 6 continues in the gas outlet duct 8.
  • the non-return valve 6, when closed allows the formation of a volume 4, between the gas outlet orifice of the primary vacuum pump 3 and itself.
  • the pumping system SP also includes an ejector 7, connected in parallel to the non-return valve 6.
  • the suction port of the ejector is connected to the volume 4 of the conduit 5 and its delivery orifice is connected to the conduit 8.
  • the supply duct 9 supplies the working fluid for the ejector 7.
  • the primary vacuum pump with lubricated vanes 3 draws the gases into the enclosure 1 by the conduit 2 connected to its inlet and compresses them to then discharge them on its outlet in the conduit 5 by the non-return valve 6.
  • the closing pressure of the non-return valve 6 it closes. From this moment the pumping of the ejector 7 gradually decreases the pressure in the volume 4 until the value of its limit pressure.
  • the power consumed by the primary vacuum pump with lubricated vanes 3 gradually decreases. This happens in a short time, for example for a certain cycle in 5-10 seconds.
  • Figure 2 shows a second pumping system SP suitable for implementing a pumping method according to an embodiment of the present invention.
  • the system shown in figure 2 further includes a compressor 10 which supplies the gas flow at the pressure necessary for the operation of the ejector 7.
  • this compressor 10 can suck atmospheric air or gases into the gas outlet duct 8 after the check valve 6. Its presence makes the pumping system independent of a source of compressed gas, which can respond to certain industrial environments.
  • the compressor 10 is driven by the primary pump with lubricated vane 3. In all cases, the energy consumption of the compressor 10 when it supplies the gas flow at the pressure necessary to operate the ejector 7 is much smaller by ratio to the gain made on the energy consumption of the main pump 3.
  • FIG. 3 shows an SPP vacuum pump system outside the scope of the present invention.
  • the system shown in figure 3 corresponds to a piloted pumping system, which further comprises sensors 11, 12, 13 which control eg the motor current (sensor 11) of the primary vacuum pump with lubricated vane 3, the pressure (sensor 13) gases in the volume of the outlet pipe of the primary vacuum pump with lubricated vanes (limited by the non-return valve 6), the temperature (sensor 12) of the gases in the volume of the outlet pipe of the primary vacuum pump with lubricated paddles (limited by the non-return valve 6) or a combination of these parameters.
  • sensors 11, 12, 13 which control eg the motor current (sensor 11) of the primary vacuum pump with lubricated vane 3
  • the pressure (sensor 13) gases in the volume of the outlet pipe of the primary vacuum pump with lubricated vanes limited by the non-return valve 6
  • the temperature (sensor 12) of the gases in the volume of the outlet pipe of the primary vacuum pump with lubricated paddles limited by the non-return valve 6) or a combination of these parameters.
  • the primary vacuum pump with lubricated vanes 3 begins to pump the gases from the vacuum chamber 1, these parameters cited (in particular the current of its motor, the temperature and the pressure of the gases in the volume of the output 4) begin to change and reach threshold values detected by the corresponding sensors 11, 12, 13. This causes the ejector 7 to start up (after a certain delay). When these parameters return to the initial ranges (outside the setpoints) the ejector is stopped (again after a certain delay).
  • the SSP piloted pumping system can have as a compressed gas source a distribution network or else a compressor 10 under the conditions described in figure 2 .

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Jet Pumps And Other Pumps (AREA)
EP14721361.5A 2014-05-01 2014-05-01 Méthode de pompage dans un système de pompage et système de pompes à vide Active EP3137771B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PT147213615T PT3137771T (pt) 2014-05-01 2014-05-01 Método de bombagem num sistema de bombagem e sistema de bombas de vácuo
PL14721361T PL3137771T3 (pl) 2014-05-01 2014-05-01 Sposób pompowania w układzie pompującym i układ pomp próżniowych

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/058948 WO2015165544A1 (fr) 2014-05-01 2014-05-01 Méthode de pompage dans un système de pompage et système de pompes à vide

Publications (2)

Publication Number Publication Date
EP3137771A1 EP3137771A1 (fr) 2017-03-08
EP3137771B1 true EP3137771B1 (fr) 2020-05-06

Family

ID=50639522

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14721361.5A Active EP3137771B1 (fr) 2014-05-01 2014-05-01 Méthode de pompage dans un système de pompage et système de pompes à vide

Country Status (15)

Country Link
US (1) US20170045051A1 (es)
EP (1) EP3137771B1 (es)
JP (1) JP6410836B2 (es)
KR (1) KR102235562B1 (es)
CN (1) CN106255828A (es)
AU (1) AU2014392229B2 (es)
BR (1) BR112016024380B1 (es)
CA (1) CA2944825C (es)
DK (1) DK3137771T3 (es)
ES (1) ES2797400T3 (es)
PL (1) PL3137771T3 (es)
PT (1) PT3137771T (es)
RU (1) RU2666379C2 (es)
TW (1) TWI698585B (es)
WO (1) WO2015165544A1 (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2752762T3 (es) * 2014-03-24 2020-04-06 Ateliers Busch S A Procedimiento de bombeo en un sistema de bombas de vacío y sistema de bombas de vacío
FR3094762B1 (fr) * 2019-04-05 2021-04-09 Pfeiffer Vacuum Pompe à vide de type sèche et installation de pompage
CN113621936A (zh) * 2021-10-12 2021-11-09 陛通半导体设备(苏州)有限公司 一种真空镀膜中真空泵系统的工作方法及真空泵系统

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JP4745779B2 (ja) * 2005-10-03 2011-08-10 神港精機株式会社 真空装置
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JP5389419B2 (ja) * 2008-11-14 2014-01-15 株式会社テイエルブイ 真空ポンプ装置
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FR2952683B1 (fr) * 2009-11-18 2011-11-04 Alcatel Lucent Procede et dispositif de pompage a consommation d'energie reduite
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Also Published As

Publication number Publication date
RU2016142607A3 (es) 2018-06-01
BR112016024380A2 (pt) 2017-08-15
TW201608134A (zh) 2016-03-01
CA2944825A1 (fr) 2015-11-05
ES2797400T3 (es) 2020-12-02
DK3137771T3 (da) 2020-06-08
TWI698585B (zh) 2020-07-11
JP2017515031A (ja) 2017-06-08
AU2014392229A1 (en) 2016-11-03
PL3137771T3 (pl) 2020-10-05
RU2666379C2 (ru) 2018-09-07
AU2014392229B2 (en) 2018-11-22
RU2016142607A (ru) 2018-06-01
EP3137771A1 (fr) 2017-03-08
CN106255828A (zh) 2016-12-21
WO2015165544A1 (fr) 2015-11-05
BR112016024380B1 (pt) 2022-06-28
JP6410836B2 (ja) 2018-10-24
CA2944825C (fr) 2021-04-27
KR102235562B1 (ko) 2021-04-05
US20170045051A1 (en) 2017-02-16
PT3137771T (pt) 2020-05-29
KR20170005410A (ko) 2017-01-13

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