EP3094772A1

EP3094772A1 - Device and method for cleaning a component arranged in a process air circuit of a dryer, and a dryer comprising such a device

Info

Publication number: EP3094772A1
Application number: EP14821219.4A
Authority: EP
Inventors: Holger Hennig; Martin Schubert; René BEDEWITZ
Original assignee: BSH Hausgeraete GmbH
Current assignee: BSH Hausgeraete GmbH
Priority date: 2014-01-17
Filing date: 2014-12-30
Publication date: 2016-11-23
Anticipated expiration: 2034-12-30
Also published as: EP3094772B1; WO2015106948A1; DE102014200768A1; CN105917042A; CN105917042B

Abstract

The invention relates to a device 1 and a method for cleaning a component 2 arranged in a process air circuit of a dryer, using a rinsing liquid, said cleaning device 1 having a receptacle 3 for receiving the rinsing liquid after it has made contact with the component 2 to be cleaned, and a sensor chamber 5 in which a filling level sensor 4 is arranged, said sensor chamber 5 being arranged outside of the receptacle 3 so as to be in hydraulic communication with same via an opening system 6. A supply line system 7 of said cleaning device 1 comprises a first supply line 8 running directly to the sensor chamber 5, and a second supply line 9 running to the component 2 to be cleaned, said supply line system 7 and opening system 6 being designed such that per unit of time, a greater volume of the rinsing liquid can flow into the sensor chamber 5 via the first supply line 8 than can flow out of the sensor chamber 5 into the receptacle 3 through the opening system 6, and said cleaning device 1 being designed such that, during filling, the filling level of the rinsing liquid in the sensor chamber 5 reaches at least a height which corresponds to the upper limit of the opening system 6 before the filling level of the rinsing liquid in the receptacle 3 has reached a height that corresponds to the lower limit of the opening system 6. The invention also relates to a preferred dryer which comprises such a cleaning device 1.

Description

Apparatus and method for cleaning a arranged in a process air cycle of a dryer component and dryer with such a device

The invention relates to a device and a method for cleaning a arranged in a process air cycle of a dryer component and a dryer with such a device. The invention relates in particular to a device and a method for cleaning a component arranged in a process air cycle of a dryer with a rinsing liquid, wherein the device has a depot for receiving the rinsing liquid after its contact with the component to be cleaned and a sensor chamber in which a filling level sensor is arranged , having. The invention more particularly relates to a dryer with such a device. Dryers are understood here to mean both a washer-dryer and a tumble dryer. A washer-dryer is a combination device that has a washing function for washing laundry and a drying function for drying laundry. By contrast, a tumble dryer only has a drying function for drying laundry.

In a dryer air (so-called process air) is passed through a fan via a heater in a wet laundry containing drum as a drying chamber. In the drum are moist, to be dried items of laundry. The hot air absorbs moisture from the laundry to be dried. After passing through the drum, the now moist process air is fed into a heat exchanger, which is usually preceded by a lint filter (also called a "lint filter"), in which the moist process air is added (eg air-to-air heat exchanger or heat sink of a heat pump) The condensed water (condensate) is then usually collected in a condensate pan, and the cooled and dried air is returned to the heater and then to the drum.

From the process air lint are contained in the laundry items to be dried when passing through the drying chamber, which are small floatable Tissue particles are entrained, with larger lint being retained by the lint filter. Finer lint, however, reach the heat exchanger where, due to the cooling of the moist, warm process air, condensate is present and the lint is moistened, so that they remain sticky. The deposition of fluff on the lint filter and heat exchanger hinder the process air flow, so that the efficiency of the dryer decreases and its susceptibility may increase. Failure to clean the lint filter and heat exchanger in a timely manner may result in deterioration of the dryer's performance, or even failure, or failure of the dryer, requiring repair. Although fluff filter and heat exchangers, in particular air-to-air heat exchangers, are frequently removable, they can be removed from the dryer for cleaning and, after a removal of adhering lint, for example by rinsing with a rinsing liquid such as water, can be re-introduced into the dryer. However, this is cumbersome and not possible if a heat sink of a heat pump is used as a heat exchanger, since the components of a heat pump are usually firmly connected. There are therefore measures for an internal cleaning of a dryer, in particular an internal cleaning of a heat exchanger and / or a lint filter known, which is often used for cleaning the resulting condensate in the dryer.

DE 10 2007 049 061 A1 describes a method and a device for cleaning a component arranged within a process air cycle of a washer or dryer, in particular an evaporator of a condenser device, in the condensate water obtained in the process air cycle from the wet laundry and in a condensate pan is collected, is passed to a rinsing chamber of a collecting vessel provided above the evaporator. In addition to the rinsing chamber, the collecting container also has an overflow region serving as a storage chamber. From the outlet side of the rinsing chamber, the condensate water is released by abrupt opening as a flood of water to said component and then collected again in the condensate pan.

In a repeated use of the condensate water for purging a component, however, it is of interest that the condensate water before rinsing Pollution, in particular of lint, for example, from the previous rinsing process, is cleaned. For example, DE 10 2010 042 495 A1 discloses a cleaning device for a component subjected to lint, which has a container for receiving rinsing liquid for rinsing the lint from the component, wherein the container comprises a rinsing chamber and a storage chamber. The rinsing chamber has an inlet, via which rinsing liquid can be conveyed into the rinsing chamber by means of a pump, wherein a sieve for cleaning the rinsing liquid is arranged in the region of the inlet. In addition, the cleaning device has two processes. The first drain, which is arranged on the other side of the screen as the inlet, serves to supply the cleaned flushing liquid to the component to be cleaned. The second drain, which is arranged on the same side of the screen as the inlet, serves for the discharge of superfluous Uncleaned rinsing liquid to prevent unwanted overflow of the rinsing liquid. About the second sequence, the superfluous rinsing liquid is passed into the storage chamber, wherein the rinsing liquid, when the storage chamber is filled, in turn, is discharged into the bottom group of the dryer.

Accordingly, in the known internal cleaning devices for components arranged in the process cycle of a dryer which use a rinsing liquid, the rinsing liquid must be suitably collected and removed after the component has been rinsed. In particular, if the catch is made by the condensate pan, it must be ensured that it does not overflow. Even with a continuous outflow from the collecting container for the rinsing liquid monitoring is necessary because the rinsing liquid entrains the rinsed lint, which can lead to obstructions in the drain and thus overflow of the collection container. In addition, if the level of the rinsing liquid in the collecting container is too high, it is possible in the collecting container for the component to be cleaned to remain in contact with lint, depending on the structural arrangement, with already used rinsing water. Thus, it is desirable to reliably determine the level of the collection container for the rinsing liquid. For this purpose, the use of level sensors is known. However, there is the danger that the function of such sensors by deposition of contamination, in particular by the contact with the lint-guiding rinsing liquid, is impaired, so that the level can not be reliably determined. Therefore, measures are known to clean level sensors or preventively protect against contamination. Thus, it is known to clean a level sensor by a combination of rinses of dirt, especially lint, and prevent pollution counteract preventively by a part of the rinsing liquid is passed directly over the sensor during the rinsing process for cleaning the component and also a further part of the rinsing liquid is passed into a separate chamber for storage, so that in addition a time-delayed rinsing of the sensor after completion of the rinsing of the component with rinsing liquid from this storage chamber is made possible. Furthermore, it is also known to avoid contamination of the level sensor by the level sensor is arranged in a separate chamber of the collecting container, wherein the chamber is filled only when exceeding a certain filling level with rinsing liquid and the inflow opening is equipped in the chamber with a sieve, which prevents the ingress of dirt and its attachment to the sensor. However, this has the disadvantage that the screen can affect the inflow into the chamber state-dependent, so that in particular a contamination of the screen can lead to a delayed or reduced inflow and thus to a faulty level detection.

Against this background, the object of the present invention was to provide a cleaning device, a cleaning method and a corresponding dryer, in which the fill level in the collecting container, which serves to receive the rinsing liquid after its contact with the component to be cleaned, can be reliably determined. Thus, the disposal of the contaminated flushing liquid can be ensured, so that a component arranged in the process air duct can be cleaned in an improved manner.

The solution of this object is achieved according to this invention by a device and a dryer with the features of the corresponding independent claims and the method of the corresponding independent claim. Preferred embodiments of the device according to the invention and of the dryer according to the invention are listed in corresponding dependent claims. Preferred embodiments of the device according to the invention correspond to preferred embodiments of the invention Trockners and the inventive method and vice versa, although this is not explicitly stated herein.

The invention thus relates to a device for cleaning a arranged in a process air cycle of a dryer component with a rinsing liquid, which has a depot for receiving the rinsing liquid after their contact with the component to be cleaned and a sensor chamber in which a level sensor is arranged, wherein

i. the sensor chamber is arranged outside the depot and with this via an opening system hydraulically communicating;

ii. a supply system of the cleaning device has a first inlet directly to the sensor chamber and a second inlet to the component to be cleaned; iii. the supply system and the opening system are designed so that per unit time, a larger volume of the washing liquid can flow into the sensor chamber via the first inlet as can flow out of the sensor chamber through the opening system in the depot and

iv. the cleaning device is designed so that when filling the level of the washing liquid in the sensor chamber has reached at least a height corresponding to the upper limit of the opening system before the level of the washing liquid in the depot has reached a height corresponding to the lower limit of the opening system ,

The device according to the invention for cleaning (hereinafter also abbreviated to "cleaning device") operates with a rinsing liquid, which is an aqueous liquid, which generally comprises condensate and / or tap water from the water supply In order to improve the cleaning effect, additives such as other solvents (for example alcohols) or surface-active agents may be added to the rinsing liquid.

The rinsing liquid can be provided in various ways. For this purpose, the cleaning device is preferably connected to a water supply and / or a condensate tray. In addition, for use already used Rinsing liquid these are also supplied from the depot of the cleaning device via a corresponding connection to the supply system.

By water supply is meant herein generally a water supply of home-available tap water which is normally supplied at a tap water pressure of at least 3 bar, but sometimes at a higher pressure, e.g. with 6 bar, is provided.

The connection with a water supply allows the cleaning with fresh water, which contains no impurities. The connection with a condensate tray and / or a depot, is stored in the rinsing liquid from previous rinses, allows the use of accumulating in the dryer condensate or rinse liquid already used. Since the condensate in the condensate pan or already used rinsing liquid in the depot usually contain lint, a filtration and / or an admixture of fresh water from a water supply is preferably carried out prior to their use in the cleaning device.

The water supply, the condensate tray and / or the depot can be connected directly to the supply system of the cleaning device, possibly with the interposition of a pump and / or a filter. However, the fresh water from the water supply and / or the condensate or already used rinsing liquid can also initially reach a rinsing container, which in turn is connected to the supply system of the cleaning device.

The cleaning device is preferably operated directly or shortly after completion of a drying operation of wet laundry to be dried, since at this time on the component, such as a heat exchanger, adhesive contaminants, especially lint, are still wet or dissolved and are relatively easily removed by the dispensed rinse liquid , In addition, at this time, condensate tray or rinse tanks are usually filled with condensate that can be used to clean the component. Furthermore, generally after each drying process, a longer time passes until the next drying process, so that there is enough time to remove the rinsing liquid. The cleaning device according to the invention has a depot for receiving the rinsing liquid after its contact with the component to be cleaned. The depot is a collecting container for the rinsing liquid after rinsing the component. Thus, the depot is usually located below the component to be cleaned. In general, the depot has a liquid drain (also called "drain"). This may be a passive liquid flow, in which the liquid is drained only by utilizing gravity, or the liquid can be actively removed from the deposit, for example by a pump. In addition, the combination of both variants is possible, for example by a correspondingly dimensioned passive liquid flow and the operation of a pump on the same process or on different processes of the depot.

Preferably, the depot corresponds to the condensate tray or is structurally connected to it, so that it forms part of the condensate tray, wherein it is particularly preferred that the depot corresponds to the condensate tray. This has the advantage that no additional component is required for the depot. In particular, if it is the component to be cleaned to a heat exchanger or the heat exchanger in the process air circuit upstream possibly lint filter, the condensate tray can serve as a depot for receiving the rinsing liquid after their contact with the component to be cleaned by their spatial arrangement simultaneously.

In addition, the cleaning device according to the invention has a sensor chamber. The sensor chamber is a container which can receive rinsing liquid and in which a level sensor (hereinafter also referred to as "sensor") is arranged, the type of sensor being not limited according to the invention, as long as the sensor contains information about the level of the rinsing liquid In the simplest case, the sensor is an electrode which can detect a resistance of the medium surrounding the electrodes When the medium surrounding the electrodes changes, for example during the filling of the sensor chamber from air into rinsing liquid, that of Thus, such a sensor provides information on whether a certain level of flushing liquid is reached or not. However, other types of sensors for filling level detection can also be used according to the invention, such as optical sensors, pressure sensors, etc. In general, it can be determined by the sensor how long flushing liquid is applied to the sensor, for example by a single signal that over the duration Δt of Contact of the sensor with the liquid stops or by several, for example, two signals at the times t-ι, the beginning of the contact with the rinsing liquid, and t ₂ , the end of the contact with the rinsing liquid, from which At can be determined.

In addition, the cleaning device according to the invention has a supply system, which comprises a first inlet directly to the sensor chamber and a second inlet to the component to be cleaned. In general, the rinsing liquid from the water supply, the condensate pan and / or the depot passes directly or via a rinsing container, possibly with the interposition of a pump and / or a filter in the supply system of the cleaning device. In the supply system, the rinsing liquid volume is divided such that a portion of the rinsing liquid is passed through the first inlet without contact with the component to be cleaned directly to the sensor chamber and another part of the rinsing liquid is passed through the second inlet to the component to be cleaned. As a rule, the first and second inlets are therefore two different, correspondingly configured cavities, such as, for example, channels, pipes or connections. Thus, part of the rinsing fluid volume flows directly via the first inlet of the supply system to the sensor chamber.

The other part of the rinsing liquid passes through the second inlet to the component to be cleaned, in which case optionally further elements, such as means for influencing the flow and / or a distribution system, may be interposed. This proportion of the rinsing liquid passes into the depot after rinsing of the component to be cleaned. Depot and sensor chamber according to the invention separated by structural or constructive measures, so that the sensor chamber is disposed outside the depot. This means that the sensor chamber and depot form two separate chambers, each of which can receive rinsing liquid. However, it is possible to sensor chamber and depot as to integrate two separate chambers in one component. Since the level sensor is arranged according to the invention in the sensor chamber, so a contact of the sensor with the polluted flushing liquid located in the depot can be easily avoided without the risk of clogging a screen to protect the sensor. In addition, additional cleaning measures of the sensor, such as rinses, unnecessary.

According to the invention, the sensor chamber is hydraulically communicating with the depot via an opening system. In this way, information about the level in the depot is made possible, although the level sensor is located in the separate sensor chamber. The type of opening system, in particular the shape, number and size as well as the arrangement pattern of the openings, is not limited according to the invention. For example, it may be one or more circular openings, such as e.g. Boreholes, act in a common partition between depot and sensor chamber. Alternatively, a partition with the opening system may also be arranged in a connecting channel between the sensor chamber and the depot or between the sensor chamber and a connecting channel to the depot or between the depot and a connecting channel to the sensor chamber.

In addition, supply system and opening system according to the invention are designed so that per unit time, a larger volume of the rinsing liquid can flow into the sensor chamber via the first inlet than can flow out of the sensor chamber through the opening system in the depot. This means that the flow of flushing fluid to the sensor chamber is greater than the flow of flushing fluid from the sensor chamber. This ensures a high level of flushing fluid in the sensor chamber. In particular, when a complete filling of the sensor chamber is reached, the level in the sensor chamber does not decrease, as long as flushing liquid is supplied further into the sensor chamber.

Constructively, a corresponding configuration of supply system and opening system can be achieved, for example, in that the cross-sectional area of the first inlet leading to the sensor chamber is greater than the sum of the areas of all openings of the opening system. According to the invention, the cleaning device is also designed so that when filling the level of the rinsing liquid has reached at least a height in the sensor chamber, which corresponds to the upper limit of the opening system before the level of rinsing liquid in the depot has reached a level that the lower limit of Opening system corresponds. In the following, this is also referred to as "preferred filling" of the sensor chamber.

Constructively, such a preferred filling of the sensor chamber with rinsing liquid can be achieved in various ways, this is not restricted according to the invention. In particular, this can be done by a corresponding design of the supply system and / or by a corresponding dimensioning of depot and sensor chamber and / or by an appropriate dimensioning of the flowed through by the flushing liquid components of the cleaning device until this depot or sensor chamber. For example, the rinsing fluid can travel a longer distance from the supply line to the depot floor compared to the path from the supply line to the sensor chamber floor. With regard to the dimensioning of depot and sensor chamber, for example, the depot may have a greater base area than the sensor chamber, so that a higher fill level is achieved more quickly in the sensor chamber. In addition, the bottom of the depot can be arranged in the dryer lower than the bottom of the sensor chamber.

The preferred filling of the sensor chamber causes, in particular in connection with the fact that the inlet to the sensor chamber is greater than the drain, that the rinsing liquid from the beginning through the opening system always flows from the sensor chamber into the depot and not vice versa. In particular, then so no polluted flushing liquid penetrates from the depot into the sensor chamber when the level in the depot reaches or exceeds the height of the opening system, since the level in the sensor chamber by the measures already at least at the same level as in the depot or the Sensor chamber is even completely filled. This prevents the ingress of soiled rinsing liquid from the depot into the sensor chamber and the sensor does not come into contact with the dirty rinsing liquid. In this way, a reliable level detection can be ensured by the sensor. Since, after completion of the rinsing liquid supply in a corresponding cleaning process, the rinsing liquid can be removed only on the expiration of depot from the cleaning device according to the invention, the flow direction of the rinsing liquid is guaranteed by the sensor chamber via the opening system in the depot even after completion of Spülflüssigkeitszufuhr.

In particular, the flushing liquid located in the sensor chamber can only flow into the depot via the opening system when the fill level in the depot falls below at least the height of the upper boundary of the opening system. After completion of the rinsing liquid supply, this is generally achieved only by removal of the rinsing liquid over the course of the depot.

Only then is the outflow of the rinsing liquid from the sensor chamber into the depot the fill level sensor in the sensor chamber again free of rinsing liquid. Thus, in a cleaning device according to the invention, the duration At of the flushing liquid contact of the sensor in the sensor chamber ends when, after the end of the flushing liquid feed, the fill level in the depot drops below a certain minimum level. This minimum dimension is dependent, for example, on the total quantity of rinsing liquid supplied, on the quantity of rinsing liquid supplied per unit time and / or on the dimensioning and / or arrangement of the depot, the sensor chamber and in particular the opening system.

This type of hydraulic communication between the sensor chamber and the depot via the opening system thus allows, for example, that the duration At of the flushing liquid contact of the sensor in the sensor chamber varies depending on the flow rate of the flushing liquid from the depot and thus it can be determined how quickly the flushing liquid is removed from the depot ,

In a preferred embodiment of the cleaning device according to the invention, a preferred filling of the sensor chamber, ie a filling in which the level of the rinsing liquid in the sensor chamber has reached at least a height corresponding to the upper limit of the opening system, before the level of the rinsing liquid in the depot a height has reached the lower limit of the Opening system corresponds, made possible by the invariable geometry of the supply system.

The fixed geometry of the delivery system herein means the sizing and placement of the corresponding channel or channels of the delivery system. This includes permanent cross-sectional constrictions or extensions of the channels of the supply system. For example, a corresponding dimensioning of the cross section may allow a preferred filling of the sensor chamber in that the first inlet has a larger cross section than the second inlet. Furthermore, the second feed may be longer than the first feed. In addition, an exploitation of gravity in the supply system can allow a preferred filling of the sensor chamber.

In this case, a supply system with a common supply line to the first and the second inlet is very particularly preferred, the first inlet leading to the sensor chamber in a substantially vertical direction downwards, and the second inlet leading in a substantially horizontal direction to the component or components to be cleaned ., To elements such as a distribution system, which are upstream of the component to be cleaned leads. As an alternative to a corresponding configuration of the invariable geometry of the supply system, a valve can also be provided in the supply system, for example, which is closed initially and is opened only after the preferred filling of the sensor chamber, in order to release the second feed to the cleaning component. However, the design of the invariable geometry of the supply system has the advantage that possible sources of error are kept low.

In a further preferred embodiment, the opening system is arranged at a distance from the depot floor in the vertical direction. This means that the lower limit of the opening system does not end directly with the depot floor. By maintaining such a distance in the vertical direction to the bottom of the depot, a certain amount of rinsing liquid can flow into the depot via the component to be cleaned without the level of the infused rinsing liquid reaching the height of the opening system. Thus, the flow direction of the rinsing liquid is advantageous influences the opening system from the sensor chamber to the depot and prevents the sensor from being contaminated.

Furthermore, it is preferred that the cleaning device has a distribution system for the rinsing liquid, which is arranged in the flow direction of the rinsing liquid in front of the component to be cleaned. Such a distribution system is usually arranged above the component to be cleaned and causes a distribution of the washing liquid over the component to be cleaned, for example, a uniform distribution of the washing liquid is desired. The distribution system can be, for example, a diffuser, as described for example in DE 10 2009 046 683 A1. This diffuser has a distribution channel extending over its width for distributing the rinsing liquid introduced into the diffuser and an overflow channel coupled in fluid communication with the distribution channel, with which the rinsing liquid can be conducted downwards in the vertical flow direction to the component. By means of such a distribution system virtually all areas of the component can be rinsed and thus a significantly improved cleaning effect can be achieved.

In a further preferred embodiment, the depot has a depot cleaning system for cleaning the rinsing liquid from soiling, in particular fluff. This has the advantage that the already used rinsing liquid can already be cleaned in the depot and used for a further rinsing process or further rinsing operations. This depot cleaning system may be, for example, a sieve, a sieve cloth, a sponge, gauze, etc. Preferably, the depot cleaning system is arranged on or directly above the bottom plate of the depot. The depot cleaning system is preferably removable and particularly preferably designed as an exchangeable filter bag or replaceable filter box.

In this embodiment, it is particularly preferred if the depot corresponds to the condensate tray. Such advantageous condensate trays, which simultaneously serve as depots, ie as collecting containers for the rinsing liquid, and which have a depot cleaning system, are described, for example, in WO 2010/028992 A1, in DE 10 2009 047 155 A1 and in DE 10 2010 039 603 A1 , Preferably, the cleaning device according to the invention has a pump, with the rinsing liquid can be supplied to the supply system again. This has the advantage that the rinsing liquid can be used several times.

According to the invention, it is preferred that rinsing liquid which has already been used be cleaned before it again enters the supply system of the cleaning device. This cleaning of the rinsing liquid can be done for example by a lint filter or a lint filter. In particular, if the depot has a depot cleaning system, the thus purified rinsing liquid can be fed back to the supply system, for example by means of a pump. Alternatively, a lint filter outside the depot, for example, between depot and a pump, be mounted in front of a washing and / or before the supply system of the cleaning device.

In a further preferred embodiment, the cleaning device according to the invention is connected to a rinsing container for the storage of lint-free rinsing liquid. In this case, the rinsing liquid passes from the rinsing container into the supply system of the cleaning device. Lint-free rinsing liquid herein means, for example, fresh water from a water supply, optionally purified condensate and / or already rinsed washing liquid. Accordingly, lint-free rinsing liquid already reaches the rinsing container and / or the rinsing container itself contains a corresponding cleaning system, for example a lint filter, which is arranged in particular in the inlet region of the rinsing container. In this way, it is ensured that the rinsing liquid stored in the rinsing container is lint-free and thus lint-free rinsing liquid is used during a cleaning process.

The rinsing container can also be part of a larger collecting container for aqueous liquid, in which case the portion of the collecting container containing the rinsing liquid can also be referred to as rinsing chamber. If this is the case of washing containers, both options should be covered. The rinse tank can be fixed or removable in the dryer. The rinsing container for the aqueous rinsing liquid optionally used in the dryer according to the invention preferably comprises a lower container opening and is connected by the latter to the supply system of the cleaning apparatus. Preferably, the washing compartment is mounted in the dryer above the component to be cleaned. This has the advantage that the rinsing liquid can, by utilizing gravity, for example via a downpipe, flow into the cleaning device and a particularly good cleaning effect on the component to be cleaned can be achieved by the resulting pressure. When using condensate and / or already used rinsing liquid it is usually funded by a pump in the washing.

Alternatively, no separate rinsing container can be provided in the inventive cleaning device and, for example, the depot or a condensate tray serving as a depot serve as a container for storing the rinsing liquid. In this case, it is preferable that the depot or the condensate tray contains a depot cleaning system. In this case, the rinsing liquid is usually conveyed as required by a cleaning operation via a pump in the supply system of the cleaning device according to the invention.

The cleaning device can be used for cleaning of various arranged in the process air cycle of a dryer components, preferably those components are cleaned, the inner surfaces with process air, especially with lint laden process air in contact. The components to be cleaned are therefore preferably a heat exchanger arranged in the process air duct and / or a lint filter optionally upstream of the heat exchanger in the process air circuit. The heat exchanger is preferably an air-to-air heat exchanger or, if a heat pump is provided, an evaporator.

The invention also relates to a dryer with at least one arranged in the process air cycle of the dryer, can be acted upon with lint and a device for cleaning the component with a rinsing liquid, wherein the device is a depot for receiving the rinsing liquid after their contact with the component to be cleaned and a Sensor chamber in which a level sensor is arranged, wherein

i. the sensor chamber is arranged outside the depot and with this via an opening system hydraulically communicating; ii. a supply system of the cleaning device has a first inlet directly to the sensor chamber and a second inlet to the component to be cleaned; iii. the supply system and the opening system are designed so that per unit time, a larger volume of the washing liquid can flow into the sensor chamber via the first inlet as can flow out of the sensor chamber through the opening system in the depot and

The dryer according to the invention can be designed as a pure dryer, but also as a washer-dryer. A washer-dryer is here understood to mean a combination appliance which has a washing function for washing laundry and a drying function for drying wet laundry. A washer-dryer has the advantage that it is already connected as such to a water supply. In both cases, a condensation dryer is preferred. Condensation dryer is herein understood a dryer whose operation is based on the condensation of moisture vaporized by means of warm process air from the laundry.

A dryer usually has at least one control device, a drying chamber for the objects to be dried and a process air duct in which at least one heater for heating the process air, a heat exchanger for cooling the process air after passing through the drying chamber and a blower for the transport of the Process air are on. In addition, a lint filter may be arranged in the process air channel between the drying chamber and the heat exchanger in order to minimize the deposition of lint, which are carried along by the process air after passing through the drying chamber, at the heat exchanger.

In a dryer according to the invention, a component arranged in the process air cycle of the dryer is understood to mean a component, that can come in contact with process air that carries lint. In particular, these are the heat exchanger and, if present, the lint filter upstream of the heat exchanger in the process air circuit. Preferably, the heat exchanger is in this case an air-air heat exchanger or, if a heat pump is provided, the evaporator of the heat pump.

In the dryer according to the invention, the cleaning device can be manually put into operation by a user of the dryer or automatically. In both cases, the dryer preferably has a means for detecting a need for cleaning the component to be cleaned.

In a preferred embodiment, the dryer has means for detecting a cleaning requirement for the component to be cleaned, which determine a degree of use U for determining the cleaning requirement, this with a predetermined value U | _in comparing and when reaching U | _im , ie under the condition Uii _m = U, determine the need for cleaning.

In a preferred embodiment, as a means for detecting the cleaning requirement, a counter is provided which determines the number n of the drying processes already carried out and compared with a predetermined limit number ni _im . This counter can preferably be reset when cleaning the heat exchanger is performed.

In a further preferred embodiment, a clock is present as a means for detecting the cleaning requirement, which determines a total duration t _sum of previously performed drying processes and with a predetermined limit duration t | _im comparing. This clock can preferably be reset when a cleaning of the component to be cleaned is performed.

Optionally, the dryer according to the invention comprises in a further preferred embodiment as a means for detecting the cleaning requirement, an evaluation unit which determines a total amount M of previously dried laundry items and with a predetermined limit total amount M | _im comparing. The value for the total quantity M may preferably be reset when a cleaning of the component to be cleaned is performed.

In addition, the dryer may preferably have a sensor for measuring the volume flow as a means for detecting the need for cleaning in the process air duct. The evaluation unit, which determines a total volume flow V and compares it with a limit volume flow V _in , can then set the cleaning device in motion. The value V is then preferably reset.

Finally, by the evaluation unit in a further preferred embodiment, a temperature gradient .DELTA.Τ can be determined via a temperature sensor arranged behind the heater, as viewed in the direction of the process air flow. This temperature gradient is measured with a limit temperature gradient AT | _im compared. When the limit temperature gradient is exceeded, the cleaning process is triggered.

It is inventively preferred that the dryer has an acoustic and / or visual display means for displaying the cleaning requirement and / or for displaying the operation of the cleaning device. After determining the cleaning requirement for the component to be cleaned, a cleaning of the component to be cleaned is preferably carried out with the cleaning device. The cleaning using the aqueous rinsing liquid can be performed automatically or by a user of the dryer controllable. Preferably, this can be set to the dryer, whether automatic or manual cleaning should be performed.

The invention also relates to a method for cleaning a arranged in a process air cycle of a dryer component with a rinsing liquid, wherein a cleaning device of the dryer a depot for receiving the rinsing liquid after their contact with the component to be cleaned and a sensor chamber in which a level sensor is arranged , Wherein the sensor chamber outside of the depot and with this via an opening system is arranged hydraulically communicating and a supply system of Cleaning device has a first inlet directly to the sensor chamber and a second inlet to the component to be cleaned, wherein

i. per unit time, a larger volume of the rinsing liquid flows into the sensor chamber via the first inlet as can flow out of the sensor chamber through the opening system in the depot;

ii. when filling the level of the washing liquid in the sensor chamber has reached at least a height corresponding to the upper limit of the opening system before the level of the washing liquid in the depot has reached a height corresponding to the lower limit of the opening system and iii. Based on the duration At of the contact of the level sensor with rinsing liquid a level of the depot is determined.

In general, after the triggering of the method according to the invention for cleaning a component arranged in a process air circuit of a dryer with a rinsing liquid (hereinafter also abbreviated to "cleaning method"), a rinsing liquid feed into the supply system of the cleaning apparatus takes place into the sensor chamber and another part of the rinsing liquid passes through the second inlet into the depot.

According to the invention, the inflow of flushing fluid into the sensor chamber is greater than the outflow from the sensor chamber and, moreover, a preferred filling of the sensor chamber takes place, ie, when filling, the level of the flushing fluid in the sensor chamber has reached at least one height that corresponds to the upper limit of the opening system before the level of rinse liquid in the depot has reached a level corresponding to the lower limit of the opening system. Thus, a level in the sensor chamber is usually reached after triggering the cleaning process after a relatively short time, which allows contact of the level sensor with the rinsing liquid. This period of time from the triggering of the cleaning process to the contact of the sensor with flushing liquid at the time of _installation generally depends on system-immanent variables such as the design of the cleaning device. Thus, this period varies At _Bef üiiung with repeated cleaning processes in the same dryer usually do not. In general, in the method according to the invention, an amount of rinsing liquid is used which is sufficient to clean a component which is to be cleaned, at least on average, with lint. In general, such an amount of rinsing liquid is also sufficient so that the opening system and the sensor are covered with rinsing liquid in a cleaning _{method according to the} invention at maximum level in the sensor chamber F _maxSe ns.

In addition, such an amount of rinsing liquid is also sufficient to achieve a theoretical maximum filling level in the depot FthmaxDe ot in a cleaning method according to the invention, in which at least one height that corresponds to the lower limit of the opening system would be exceeded - if no rinsing liquid is removed from the depot would. Accordingly, the actual maximum level in the depot

FmaxDepot FthmaxDepot

if during the cleaning process rinsing fluid drains from the depot or is removed.

Here, at least between three cases can be distinguished. In a first case, in a cleaning process, the actual maximum level in the depot FmaxDepot does not reach the level corresponding to the lower limit of the opening system. In this case, at the same dryer neither the period from the initiation of the cleaning operation until the contact of the sensor with rinsing liquid _Be At füiiung nor the duration of At-i of the contact of the level sensor with the washing liquid varies. The latter is due to the fact that the drainage of the rinsing liquid from the sensor chamber into the depot can take place unhindered during the entire cleaning process, since the fill level in the depot does not reach the opening system. Such unimpeded outflow thus depends only on system-immanent variables such as the design of the cleaning device or the amount of flushing liquid used.

Accordingly, if the duration At of the contact of the filling level sensor with flushing liquid corresponds to a value At-i, which is predetermined for a particular dryer with the same amount of flushing liquid, then it can be concluded that the actual maximum level in the depot F _maxDe pot has not reached the height that corresponds to the lower limit of the opening system.

In a second case, in a cleaning process, the actual maximum level in the depot F _maxDe pot _exceeds the height corresponding to the lower limit of the opening system, wherein the level in the depot does not fall below this level again. Thus, no flushing liquid can flow out of the sensor chamber and the sensor remains covered with flushing liquid. The duration At _{2 of} the contact of the filling level sensor with rinsing liquid in this case approaches infinity. Preferably, however, the cleaning method in this case provides a "time-ouf" function. This means that if the duration At _{2 of} the contact of the filling level sensor with rinsing liquid exceeds a certain set value, approximately 15 minutes, it is assumed that the level in the depot does not drop any further.

Since such a case may occur in the case of poor removal of the rinsing liquid from the depot and as a rule indicates a blockage of the depot and thus the danger of overflowing, if the duration At of the contact of the filling level sensor with rinsing liquid corresponds to a value At ₂ , Thus, for example, the time-out value is reached, preferably the user a corresponding message displayed. In a third case exceeds in a cleaning process, the actual maximum level in depot F _maxDe pot initially the height corresponding to the lower limit of the opening system, however, the level drops in the depot even before reaching the time-out again, for example after completion of the rinsing liquid , In this case, depends on the same dryer, the duration At _{3 of} the contact of the level sensor with rinsing liquid of the duration At _F De ot, in which the level in the depot exceeds the height corresponding to the lower limit of the opening system. Only after the level falls below this level, the rinsing liquid from the sensor chamber can flow unhindered into the depot. In this case, the value of At ₃ is generally between At-i and At ₂ . Thus, it can be concluded at such a value At ₃ that in this case, the actual maximum level in depot F _maxDe pot initially exceeded the height that corresponds to the lower limit of the opening system, but then has fallen again.

Accordingly, based on the duration At of the contact of the level sensor with rinsing liquid at least between three different levels of the depot are distinguished, namely a sustained low level, which does not reach the height of the lower limit of the opening system at At-i, a first higher, but then again sinking level at At ₃ and a constantly high level at At ₂ . In addition, even a malfunction of the cleaning device can be detected if, after a single triggering, the sensor was in contact with flushing fluid for a period of time At-i or At ₃ and renewed contact of the sensor with flushing fluid takes place without renewed triggering of a cleaning operation. This would indicate that rinse fluid has entered the sensor chamber from the depot and could contaminate the sensor.

In a preferred embodiment of the method according to the invention, the depot has a depot cleaning system for cleaning the rinsing liquid from soiling, in particular lint, and after contact of the rinsing liquid with the component to be cleaned, the depot cleaning system purifies the rinse liquid from soiling, in particular from lint. This can be done for example by the arrangement of a lint filter in the depot, so that the rinsing liquid must pass through the lint filter before it is removed via the expiry of the depot. By such a cleaning of the rinsing liquid, it can then be supplied, for example via a pump, to the supply system of the cleaning device, either directly or via a rinsing container for storing the rinsing liquid. In the method, it may be specified that such a cycle is run more than once. In this case, it is very particularly preferred that in the method according to the invention, the rinsing liquid comprises condensate and a condensate tray at the same time serves as a depot. Thus, the rinsing liquid or the condensate is passed into the cleaning device and subsequently collected in the condensate tray after use and cleaned via a depot cleaning system located therein, such as a lint filter, and then pumped back into the supply system of the cleaning device.

In a preferred embodiment of the method according to the invention, the flow rate of the rinsing liquid from the depot is determined on the basis of the duration Δt of the contact of the filling level sensor with rinsing liquid.

In particular, the duration At of the covering of the sensor with rinsing liquid during the cleaning process depends not only on system-internal sizes of the cleaning device, which do not change over time, such as the dimensioning and arrangement of the components of the cleaning device, substantially from the flow rate of the rinsing liquid from the Depot off. In this case, the flow rate may change, mainly because of the entrained in the used rinse liquid lint. In particular, a slowing down of the discharge rate in comparison to the discharge rate of lint-free rinsing liquid indicates a contamination or leaching of the depot, in particular of the depot outlet.

Preferably, this is displayed to the user so that he can make a corresponding cleaning or the dryer has internal cleaning agents that initiate a corresponding cleaning at a certain, determinable by this method pollution.

In a particularly preferred embodiment of the method according to the invention, the degree of soiling of the depot cleaning system is determined on the basis of the duration Δt of the contact of the filling level sensor with rinsing liquid. Since a contamination or leaching of such a depot cleaning system leads to a slowing down of the drainage speed, the duration At of the contact of the sensor with the flushing liquid allows a statement about the leaching state of such a depot cleaning system. In particular, the depot cleaning system prevents leaching at the outlet of the depot, so that the duration Δt can be directly related to the leaching state of the depot cleaning system. Preferably, the user is displayed when a purge of the Depot cleaning system is to make or that, for example, interchangeable filter bags or boxes, they must be replaced.

Said determination of the contamination of the depot cleaning system is very particularly preferred if, in the method according to the invention, the rinsing liquid comprises condensate and at the same time serves as a depot for a condensate tray and has a depot cleaning system.

If, in the method according to the invention, a flow rate of the flushing liquid from the depot and / or a degree of soiling of the depot cleaning system is determined based on the duration Δt of the contact of the level sensor with flushing liquid, this implies herein that an implicit determination of the depot level is included, even if these is not made in an explicit process step.

The controller of the dryer can perform automatic cleaning even at nighttime if the user does not use the dryer anyway. In any case, the dryer can indicate an imminent cleaning phase and possibly inform the user that, for example, a condensate container used as a depot and / or rinsing container should not be emptied, so that sufficient condensate is available for cleaning with the cleaning device.

The invention has the advantage that the depot level in a cleaning device of a dryer can be determined in a simple manner to prevent overflow of the depot. In addition, such a high cleaning effect on the component to be cleaned can be ensured, since it can be prevented that in particular the lower part of the component to be cleaned with the soiled washing liquid remains in contact due to lack of drainage. In particular, a reduction of the maintenance effort is achieved by the invention, since contamination of the sensor with the dirty rinsing liquid in the depot is avoided in a simple manner, without the risk of clogging a screen to protect the sensor. In addition, additional cleaning measures of the sensor, such as rinses, unnecessary. In addition, the invention also allows, depending on the flow rate of the rinsing liquid from the depot, the duration of the coverage of the sensor in the sensor chamber varies with rinsing liquid and thus it can be determined how quickly the rinsing liquid is removed from the depot. This allows conclusions about a leaching in the depot and allows, for example, an indication to the user whether or when filter devices in the depot are to be cleaned or replaced. Further details of the invention will become apparent from the following description of non-limiting embodiments of the cleaning device according to the invention and the inventive method. Reference is made to FIGS. 1 to 3. Figure 1 shows schematically a vertical section through a cleaning device according to a first embodiment of the invention, wherein the cleaning device has a separate rinsing container for storing lint-free rinsing liquid.

Figure 2 shows schematically a vertical section through a cleaning device according to a second embodiment of the invention, wherein the cleaning device has no separate washing container.

FIG. 3 schematically shows in FIGS. 3A to 3C the sequence of a method according to an embodiment of the invention. In this case, arrows indicate the flow direction of the dotted rinsing liquid shown.

The cleaning device 1 illustrated in FIG. 1 has a component 2 arranged in a process air circuit of a dryer, for example a condensation dryer, which can be cleaned by the cleaning device 1. The component 2 to be cleaned comes into contact with fluff which is in the process air after passing through the drying chamber of the dryer, which is not shown here, and which is a drum rotatable about a horizontal axis. The component 2 to be cleaned is, for example, a heat exchanger, such as an evaporator of a heat pump.

Furthermore, the cleaning device 1 shown in Figure 1, a rinse tank 13 for storing lint-free rinsing liquid, which is not shown here, on. The washing compartment 13 is arranged in the dryer above the component 2 to be cleaned and connected via a designed as a downpipe Spülbehälterableitung 16 with the supply system 7 of the cleaning device 1. The supply system 7 has a common supply line 10 and a vertically arranged first inlet 8, which leads directly to the sensor chamber 5, and a horizontally disposed second inlet 9, via a flow-influencing member 14, such as a diaphragm, and a distribution system 1 1 to the leads to be cleaned component 2, on. Below the component 2 to be cleaned, a depot 3 for receiving the rinsing liquid, not shown here, is arranged after its contact with the component 2 to be cleaned.

In the sensor chamber 5, a level sensor 4 is arranged. The sensor 4 are electrodes that can detect the resistance of the surrounding medium, such as air or rinsing liquid. The sensor chamber 5 is arranged here next to the depot 3, so that the sensor chamber 5 and depot 3 have a common partition which has an opening system 6. The opening system 6, which is not shown here in detail in section, has four equally large circular openings, each two of these openings are arranged side by side at the same height and two of these openings directly above the other. The opening system 6 is spaced from the bottom of the depot 3, i. the lower boundary of the lower openings is spaced from the depot bottom 21. Sensor chamber 5 and depot 3 can communicate hydraulically via the opening system 6.

The depot 3 has a liquid outlet 17, via which the rinsing liquid can be continuously removed. Here, the removal is carried out passively by gravity, since the drain 17 is arranged laterally at the lower end of the depot 3, as well as actively via a pump 12. The pump 12 causes the flushing liquid in the subsequent to the pump 12 Spülbehälterzuleitung 15th is pumped and passes to the washing compartment 13. In the inlet region of the washing container 13 is a means for cleaning the washing liquid 19, such as a lint filter.

Upon initiation of a cleaning operation by the user or automatically via the control device of the dryer after, for example, a means for detecting the cleaning requirement of the dryer, the cleaning requirement of the component to be cleaned 2, about the evaporator of a heat pump, has detected lint-free rinsing fluid from the washing tank 13 in the serving as Spülbehälterableitung downpipe 16 and from there into the common supply line 10 of the supply system 7 of the cleaning device 1. Due to the invariable geometry of the supply system 7, wherein the first Inlet 8 to the sensor chamber 5 is arranged vertically and the second inlet 9 is arranged horizontally to the component to be cleaned 2 and through the aperture 14, the flow of the rinsing liquid is influenced such that initially fills the sensor chamber 5 with rinsing liquid. This is additionally ensured by the fact that the opening system 6 is dimensioned such that the inflow of flushing liquid into the sensor chamber 5 is greater than the outlet from the sensor chamber 5 through the opening system 6.

As soon as the first inlet 8 and the sensor chamber 5 are filled with rinsing liquid, another part of the rinsing liquid flows into the distributor system 11 arranged above the component 2 to be cleaned. The distribution system 1 1 distributes the rinsing liquid over the length of the component 2 to be cleaned so that it is thoroughly cleaned by the rinsing liquid. In this case, the rinsing liquid runs down to the component 2 to be cleaned and is collected in the depot 3.

From the depot 3, the rinsing liquid passes through its outlet 17 and by means of the pump 12 in the Spülbehälterzuleitung 15 and further into the washing compartment 13. Upon entering the rinsing liquid from the Spülbehälterzuleitung 15 in the washing compartment 13, the rinsing liquid via the arranged in the inlet region of the washing compartment 13 means for cleaning the rinsing liquid 19, such as a lint filter, freed from lint, so that in the rinsing tank 13 lint-free rinsing liquid is stored for a new cleaning process.

Figure 2 shows a vertical section through a cleaning device 1 according to a second embodiment of the invention, wherein the cleaning device 1 here has no separate rinse tank 13. In contrast to the falling stream principle of the rinsing liquid guide described in connection with FIG. 1, the cleaning device 1 shown in FIG. 2 operates with a pumping system. In contrast to the cleaning device 1 shown in FIG. 1, in the second embodiment of the cleaning device 1 according to the invention shown in FIG. 2, the flushing liquid is pumped directly into the supply line 7 of the cleaning device 1 via a supply line to the cleaning device 18 without a separate flushing container 13. Again, the supply system 7 has a common supply line 10 and a vertically arranged first inlet 8, which leads directly to the sensor chamber 5, and a horizontally disposed second inlet 9, via a distributor system 1 1, but here without upstream aperture 14, to the cleaning component 2 leads, on. Below the component 2 to be cleaned, in turn, a depot 3 for receiving the rinsing liquid, not shown here, is arranged after its contact with the component 2 to be cleaned.

In this embodiment shown in Figure 2, the depot 3 is a condensate tray, which is conventionally located below the heat exchanger 2 of the dryer, and the depot 3 and the condensate tray has a depot cleaning system not shown here for cleaning the rinsing liquid from dirt, especially lint, on. This is about a removable lint filter or a replaceable filter bag. This has the effect that the rinsing liquid is already cleaned in the depot 3 or in the condensate tray and can be removed continuously as a lint-free rinsing liquid via a liquid outlet 17. Again, the removal is carried out both passively by gravity, since the drain 17 is also arranged laterally at the lower end of the depot 3, as well as actively via a pump 12. The pump 12 causes the lint-free flushing liquid on which the pump 12th subsequent supply line 18 to the cleaning device can be transported directly back into the supply system 7 of the cleaning device.

The configuration of the sensor chamber 5 with the sensor 4 and the opening system 6 between the sensor chamber 3 and depot 3 correspond to the first embodiment shown in Figure 1 in the second embodiment shown in Figure 2. When triggering a cleaning process thus lint-free rinsing liquid from serving as a depot 3 condensate tray, which also serves for storing and cleaning the rinsing liquid, by means of the pump 12 via the supply line 18 in the embodiment shown in Figure 2 Cleaning device 1 in the supply system 7 and that initially pumped into the common inlet 10. Due to the invariable geometry of the supply system 7, wherein also here the first inlet 8 is arranged vertically to the sensor chamber 5 and the second inlet 9 is arranged horizontally to the component to be cleaned 2, the flow of the rinsing liquid is influenced such that initially mainly the sensor chamber. 5 fills with a portion of the rinsing liquid and only a very small other part of the rinsing liquid in the part to be cleaned 2 upstream distribution system 1 1 passes. In addition, the preferred filling of the sensor chamber with rinsing liquid is ensured here as well by the opening system 6 being dimensioned such that the inlet of rinsing liquid into the sensor chamber 5 is greater than the outlet from the sensor chamber 5 through the opening system 6.

As soon as the first inlet 8 and the sensor chamber 5 are filled with rinsing liquid, the rinsing liquid flows almost completely into the distributor system 11 arranged above the component 2 to be cleaned. The distribution system 1 1 distributes the rinsing liquid over the length of the component 2 to be cleaned so that it is thoroughly cleaned by the rinsing liquid. In this case, the rinsing liquid runs down to the component 2 to be cleaned and is collected in the serving as a depot 3 condensate tray. In the serving as a depot 3 condensate tray flushing liquid is cleaned by a therein, not shown here depot cleaning system. About the expiration of the depot 3 and the condensate tray, the now lint-free flushing liquid passes by means of the pump 12 for a renewed cleaning process in the supply line 18 to the cleaning device.

FIG. 3 schematically shows the sequence of a method according to an embodiment of the invention. In this case, arrows indicate the flow direction of the dotted rinsing liquid shown. In each case the same cleaning device 1 is shown at different times of the course of an embodiment of the method according to the invention in the figures 3A to 3C. This schematically illustrated cleaning device 1 has a supply system 7 with a common inlet 10 and a vertically arranged first inlet 8 to the sensor chamber 5 and a horizontally arranged second inlet 9 to the component 2 to be cleaned. Above the component to be cleaned 2, a distributor system 1 1 is arranged, which is connected upstream of the component 2 to be cleaned in the flow direction of the rinsing liquid. Below the component 2 to be cleaned there is a depot 3 for receiving the rinsing liquid after its contact with the component 2 to be cleaned, at the bottom 21 of which in the flow direction before the outlet 17 a depot cleaning system 20 for cleaning the rinsing liquid from soiling, in particular lint, located. In the sensor chamber 5, a sensor 4 and an opening system 6 is arranged, wherein the opening system enables a hydraulic communication between the sensor chamber 5 and depot 3.

FIG. 3A shows the cleaning device with the rinsing liquid shown in dots at a point in time shortly after the triggering of the cleaning process. Due to the invariable geometry of the supply system 7, wherein the first inlet 8 is arranged vertically to the sensor chamber 5 and the second inlet 9 is arranged horizontally to the component to be cleaned 2, the rinsing liquid has flowed primarily via the first inlet 8 into the sensor chamber and only one very little other part of the rinsing liquid is in the part to be cleaned 2 upstream distribution system 1 1 passes. As soon as the sensor 4 has come into contact with the rinsing liquid due to the rising level in the sensor chamber, the resistance detected by the electrodes changes. By virtue of the fact that the opening system 6 is dimensioned such that the inflow of rinsing liquid is greater than the outflow through the opening system 6, it is ensured that the sensor 4 remains covered after the first contact with rinsing liquid after the triggering of the rinsing liquid, so that no further resistance change occurs.

At the time shown in FIG. 3A, the first inlet 8 and the sensor chamber 5 are filled with rinsing liquid; from this point on, the rinsing liquid can flow almost completely into the distributor system 1 1 arranged above the component 2 to be cleaned. A later point in time at which the rinsing liquid has flowed almost completely into the distributor system 1 1 arranged above the component 2 to be cleaned is shown in FIG. 3B. The distribution system 1 1 distributes the rinsing liquid over the length of the component 2 to be cleaned, so that this thoroughly through the rinsing liquid is cleaned. In this case, the rinsing liquid, as shown by the arrows, down to the component to be cleaned 2 and is collected in the depot 3 and discharged continuously through a drain 17 of the depot 3. Before the drain 17 at the bottom of the depot 3 is a depot cleaning system 20, such as a lint filter or a replaceable filter bag, so that the effluent flushing liquid is cleaned of lint.

FIG. 3C again shows a later point in time of the cleaning method according to the invention, to which no rinsing liquid is introduced into the cleaning device 1. Here, first, the rinsing liquid contained in the depot 3 via the depot cleaning system 20 and the drain 17 so far drained that the level in the depot 3 is below the distance to the bottom of the depot 3 arranged opening system 6. Since on the side of the depot 3 no liquid is applied to the opening system 6, now the flushing liquid flows from the sensor chamber 5 and its inlet 8 via the opening system 6 in the depot 3 from. Although the sensor 4 is still covered with rinsing liquid at the time shown in FIG. 3C, it will no longer be covered at a short time after the rinsing liquid in the sensor chamber 5 has subsided below the sensor 4, and thus will become covered the sensor electrodes 4 change resistance detected again. Thus, the duration At of the contact of the sensor 4 with rinsing liquid can be determined.

As long as the sensor 4 is covered with flushing liquid, this means herein that the level of the depot 3 is above a certain level. This level results constructively in dependence on the arrangement and design of the opening system 6 and the dimensioning of depot 3 and sensor chamber. 5

In the embodiment shown in FIG. 3, in which the depot 3 has a depot cleaning system 20 connected upstream of a drain 17, in addition the drainage speed of the flushing liquid and thus the depot fill level depend decisively on the soiling of the depot cleaning system 20. Thus, depending on the degree of soiling, the passage of flushing liquid into the outlet 17 varies. Thus, in this case, the duration At of the contact of the sensor 4 with flushing liquid provides a conclusion as to the contamination of the depot cleaning system 20 arranged in the depot 3 In a simple way allows the user can also receive a signal to clean or replace the depot 3 arranged depot cleaning system 20.

LIST OF REFERENCE NUMBERS

1 cleaning device

2 component to be cleaned, e.g. Heat exchanger or lint filter

3 depot

4 sensor for level detection

5 sensor chamber

6 Opening system between sensor chamber and depot

7 supply system

8 first inlet to the sensor chamber

9 second inlet to the component to be cleaned

10 common supply line

1 1 distribution system

12 pump

13 washing containers

14 Flow influencing device, e.g. cover

15 Spülbehälterzuleitung

16 rinse tank discharge, e.g. downspout

17 Expiry of the depot

18 supply line to the cleaning device

19 means for cleaning the rinsing liquid, e.g. lint

20 depot cleaning system

21 depot floor

Claims

Device (1) for cleaning a component (2) arranged in a process air circuit of a dryer with a rinsing liquid, which has a depot (3) for receiving the rinsing liquid after its contact with the component to be cleaned (2) and a sensor chamber (5) a level sensor (4) is arranged, characterized in that

i. the sensor chamber (5) outside the depot (3) and with this via an opening system (6) is arranged to communicate hydraulically;

ii. a supply system (7) of the cleaning device (1) has a first inlet (8) directly to the sensor chamber (5) and a second inlet (9) to the component to be cleaned (2);

iii. the supply system (7) and the opening system (6) are designed so that per unit time a larger volume of the rinsing liquid via the first inlet (8) can flow into the sensor chamber (5) than from the sensor chamber (5) through the opening system (6 ) can flow into the depot (3) and

iv. the cleaning device (1) is designed so that when filling the level of the rinsing liquid in the sensor chamber (5) has reached at least a height corresponding to the upper limit of the opening system (6) before the level of the rinsing liquid in the depot (3) has reached a height corresponding to the lower limit of the opening system (6).

Device (1) according to claim 1, characterized in that a filling, wherein the level of the rinsing liquid in the sensor chamber (5) has reached at least one height corresponding to the upper limit of the opening system (6) before the level of the rinsing liquid in Depot (3) has reached a height corresponding to the lower limit of the opening system (6), by the invariable geometry of the supply system (7) is made possible. Device (1) according to claim 1 or 2, characterized in that the opening system (6) to the depot bottom (21) is arranged spaced apart in the vertical direction.

Device (1) according to one of claims 1 to 3, characterized in that it comprises a distribution system (1 1) for the rinsing liquid, which is arranged in the flow direction of the rinsing liquid before the component to be cleaned (2).

Device (1) according to one of claims 1 to 4, characterized in that it is the level sensor (4) are electrodes which can detect a resistance of the medium surrounding the electrodes.

Device (1) according to one of claims 1 to 5, characterized in that the depot (3) has a depot cleaning system (20) for cleaning the rinsing liquid of dirt, in particular lint.

Device (1) according to claim 6, characterized in that the device (1) comprises a pump (12), with the rinsing liquid to the supply line system (7) can be fed again.

Device (1) according to one of claims 1 to 7, characterized in that the device (1) is connected to a rinsing container (13) for the storage of lint-free rinsing liquid.

Device (1) according to one of Claims 1 to 8, characterized in that the component (2) to be cleaned is a heat exchanger and / or a lint filter.

A dryer (1) for cleaning the component (2) with a rinsing liquid, wherein the apparatus (1) a depot (3) for receiving the rinsing liquid after their contact with the component to be cleaned (2) and a sensor chamber (5) in which a level sensor (4) is arranged, characterized in that

Dryer according to claim 10, characterized in that the dryer has a means for detecting a cleaning requirement for the component to be cleaned.

Method for cleaning a component (2) arranged in a process air cycle of a dryer with a rinsing liquid, wherein a cleaning device (1) of the drier is a depot (3) for receiving the rinsing liquid after its contact with the component to be cleaned (2) and a sensor chamber ( 5), in which a filling level sensor (4) is arranged, wherein the sensor chamber (5) outside of the depot (3) and with this via an opening system (6) is arranged hydraulically communicating and a supply system (7) of the cleaning device (1 ) Has a first inlet (8) directly to the sensor chamber (5) and a second inlet (9) to the component to be cleaned (2), characterized in that i. per unit time, a larger volume of the rinsing liquid via the first inlet (8) into the sensor chamber (5) flows into it as from the sensor chamber (5) through the opening system (6) can flow into the depot (3) and ii. when filling the level of the rinsing liquid in the sensor chamber (5) has reached at least one height corresponding to the upper limit of the opening system (6) before the level of the rinsing liquid in the depot (3) has reached a level corresponding to the lower limit of the Opening system (6) corresponds to and

iii. Based on the duration At of the contact of the level sensor (4) with rinsing liquid a level of the depot (3) is determined.

A method according to claim 12, characterized in that the depot (3) a depot cleaning system (20) for cleaning the rinsing liquid of contaminants, in particular fluff, and that after contact of the rinsing liquid with the component to be cleaned (2) in the depot by the Depot cleaning system (20), a cleaning of the rinsing liquid of dirt, especially of lint takes place.

A method according to claim 13, characterized in that based on the duration At of the contact of the filling level sensor (4) with rinsing liquid, the flow rate of the rinsing liquid from the depot (3) is determined.

A method according to claim 14, characterized in that based on the duration At of the contact of the filling level sensor (4) with rinsing liquid, the degree of contamination of the depot cleaning system (20) is determined.