EP2717293A1 - Source de rayonnement infrarouge et procédé de fabrication d'une source de rayonnement infrarouge - Google Patents

Source de rayonnement infrarouge et procédé de fabrication d'une source de rayonnement infrarouge Download PDF

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Publication number
EP2717293A1
EP2717293A1 EP12187412.7A EP12187412A EP2717293A1 EP 2717293 A1 EP2717293 A1 EP 2717293A1 EP 12187412 A EP12187412 A EP 12187412A EP 2717293 A1 EP2717293 A1 EP 2717293A1
Authority
EP
European Patent Office
Prior art keywords
radiation source
discharge vessel
infrared radiation
mbar
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP12187412.7A
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German (de)
English (en)
Inventor
Karl Ferdinand Schubert
Frank R. Müller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Quercus Light GmbH
Original Assignee
Quercus Light GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quercus Light GmbH filed Critical Quercus Light GmbH
Priority to EP12187412.7A priority Critical patent/EP2717293A1/fr
Priority to CN201310463820.XA priority patent/CN103794464A/zh
Publication of EP2717293A1 publication Critical patent/EP2717293A1/fr
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/38—Devices for influencing the colour or wavelength of the light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/70—Lamps with low-pressure unconstricted discharge having a cold pressure < 400 Torr
    • H01J61/76—Lamps with low-pressure unconstricted discharge having a cold pressure < 400 Torr having a filling of permanent gas or gases only

Definitions

  • the present invention relates to an infrared radiation source and a method of manufacturing an infrared radiation source.
  • NIR radiation near infrared
  • NIR near infrared
  • the control, procedural change and / or prevention of unwanted, unauthorized or punishable acts by persons or other living beings or devices used in economical and for living beings health-safe way is from the EP 1 548 798 B1 a metal halide lamp which emits NIR radiation.
  • a disadvantage of this lamp is that highly reactive and expensive raw materials are used for its production.
  • such a radiation source operates at a high pressure, which makes complex security measures necessary.
  • a low-pressure discharge lamp with hot cathodes is known, the filling of which comprises mercury and emits the NIR radiation.
  • mercury is used to force UV excitation of a phosphor used in such low-pressure discharge lamps.
  • the mercury vapor gives rise to the UV light that stimulates the phosphor.
  • Mercury vapor emitted at about 250 nm and therefore not in the infrared range.
  • a disadvantage of such a low-pressure discharge lamp is the fact that the filling comprises mercury, which leads to problems in disposal after the end of life, in particular to undesirably high costs.
  • the efficiency of such a low-pressure discharge lamp is undesirably low and the production of rare and therefore expensive raw materials is necessary for their production.
  • NIR radiation sources which emit NIR radiation. Examples include LED spotlights, incandescent lamps with elimination of visible radiation and HID spotlights. Furthermore, radiation sources are known in which dielectrically impeded xenon discharge is used. Examples are the products Xeradex and Planon from Osram.
  • the object of the present invention is therefore to provide an infrared radiation source, which is characterized by low production costs, environmental compatibility and high efficiency.
  • the present invention is further based on the object to provide a corresponding method for producing such an infrared radiation source.
  • the present invention is based on the finding that with low-pressure discharge lamps with thermally emitting electrodes waiving mercury at certain xenon partial pressures as a function of the discharge volume of the discharge vessel surprisingly sets an effect that leads to the emission of radiation in the infrared wavelength range to an unexpectedly high extent , Empirically, it could be determined that this effect occurs when at a discharge volume less than or equal to 50 cm 3, a xenon partial pressure between 0.008 mbar and 0.010 mbar is used, and for a discharge volume greater than 50 cm 3, a xenon partial pressure between 0.3 mbar and 2 mbar.
  • the discharge vessel of an infrared radiation source according to the invention is designed such that it is transmissive to radiation in the infrared wavelength range.
  • the present invention provides an infrared light source that produces high intensity, high efficiency, and low bandwidth NIR radiation.
  • the low-pressure discharge lamp used in an infrared radiation source according to the invention is characterized in that the electrode and gas temperatures are hardly coupled. There is therefore no thermal equilibrium.
  • This type of discharge is also referred to as an annealing emission followed by an impulse discharge.
  • a typical application is the fluorescent lamp.
  • In partially evacuated glass tube forms at opposite electrodes at sufficiently high voltage an annealing emission followed by shock discharge.
  • "Opposite” here means "opposite in the discharge vessel". In this case, the electrodes need not be opposed in a plane, but are each arranged at the end of an arbitrarily shaped discharge vessel.
  • Low-pressure discharge lamps can work with directly heated hot cathodes, wherein the hot cathodes are usually heated before ignition and then maintain their temperature by itself by heating.
  • an excimer discharge may also be used to achieve the object of the present invention. As is well known to those skilled in the art, this can be achieved by adjusting the excitation frequency and current flow while maintaining pressure and gas composition.
  • the total filling gas pressure in the discharge vessel is between 2.5 and 200 mbar, preferably between 6.5 and 20 mbar. In particular, in the latter area, a particularly high efficiency and thus a particularly high efficiency were found.
  • the electrodes may be designed for a DC power supply or an AC power supply. Both types of care are possible.
  • the electrodes are preferably designed as filament electrodes.
  • the object of the present invention has already been satisfactorily solved if the filling of the discharge vessel does not comprise a phosphor. Even in this case, the radiation emitted in the infrared wavelength range is sufficiently high enough that such an infrared radiation source already works sufficiently efficiently for most applications. However, the efficiency can be further optimized if the filling of the discharge vessel comprises a phosphor which is designed to convert radiation at a wavelength of in particular 154 nm and / or 172 nm into NIR radiation.
  • the excitation of the xenon fraction by impulse discharge or excimer discharge also radiation components in the UV range, which can contribute by transformation or conversion by means of a suitable phosphor to the total output signal in the infrared wavelength range.
  • the phosphor is preferably attached to the inner wall of the discharge vessel, wherein it is the phosphor to a single-photon phosphor or a multi-photon phosphor can act.
  • a particularly preferred phosphor is available on the market under the designation Nichia NP-870.
  • the filling of the discharge vessel may further comprise at least one of the following elements as a carrier gas: argon, neon, krypton, helium, radon, nitrogen in combination with at least one noble gas, oxygen in combination with at least one noble gas.
  • argon argon
  • neon krypton
  • helium helium
  • radon nitrogen in combination with at least one noble gas
  • oxygen in combination with at least one noble gas.
  • argon for tubes with a diameter of up to 120 mm
  • neon-argon gas mixtures work well. Even better results are obtained with a gas mixture comprising neon, argon and krypton. In both cases results in a long life.
  • the radiation power and the efficiency of the low-pressure discharge lamp are significantly increased.
  • the use of neon as the carrier gas provides the highest radiation density and the highest radiation efficiency. However, there are still missing results regarding the lifetime.
  • the discharge vessel is designed so that it absorbs UV-A, UV-B and / or UV-C radiation.
  • the charging vessel may consist of borosilicate or soft glasses. In this way, the formation of environmentally and harmful ozone is prevented. This is otherwise produced when short-wave / high-energy UV radiation is absorbed by atmospheric oxygen.
  • an infrared radiation source comprises an optical filter device.
  • the optical filter device can be designed such that it is impermeable to radiation in the wavelength range between 380 nm and 600 nm, in particular absorbs radiation in this wavelength range.
  • the discharge vessel is the optical filter device and consists of optical filter glass, which is designed to absorb radiation in the wavelength range between 380 nm and 600 nm.
  • the optical filter device can also be applied to the discharge vessel, for example in the form of a protective lacquer or a tube.
  • a filter vessel may be provided which comprises the optical filter device and which at least partially surrounds the discharge vessel.
  • the optical filter device can preferably be designed to also filter minimal spectral components in the visible wavelength range from the emission spectrum.
  • the optical filter device is therefore impermeable in particular to radiation in the visible wavelength range. With the naked eye, an infrared radiation source according to the invention can thus not be detected. In this way, it does not interfere.
  • Fig. 1 shows a schematic representation of an embodiment of an infrared radiation source according to the invention 10.
  • This comprises a low-pressure discharge lamp with a discharge vessel 12, the filling is characterized in dependence on its discharge volume by the following features: If the discharge volume is less than 50 cm 3 , contains the filling xenon with a partial pressure between 0.008 mbar and 0.010 mbar. If the discharge volume is more than 50 cm 3 , the partial pressure of the xenon fraction is between 0.3 mbar and 2 mbar.
  • the filling expressly contains no mercury.
  • the low-pressure discharge lamp comprises a first 14 a and a second filament electrode 14 b, which are arranged opposite to respective ends of the discharge vessel 12 and within the discharge vessel 12.
  • the filling of the discharge vessel 12 contains no phosphor.
  • the filling contains as carrier gas at least one of the elements argon, neon, krypton, helium, radon, nitrogen in combination with at least one noble gas, oxygen in combination with at least one noble gas.
  • the total filling gas pressure in the discharge vessel is between 2.5 and 200 mbar, preferably between 6.5 and 20 mbar.
  • the discharge vessel 12 may comprise a phosphor which is designed in particular to convert radiation at a wavelength of 154 nm and / or 172 nm in NIR radiation.
  • the discharge vessel 12 itself can be designed to absorb UV-A, UV-B and / or UV-C radiation.
  • an optical filter 16 is applied to the discharge vessel 12.
  • the optical filter 16 is impermeable to radiation in the wavelength range between 360 nm and 600 nm or absorbs radiation in this wavelength range.
  • the optical filter can be applied to the discharge vessel 12, for example in the form of a lacquer or a powder layer, inside or outside.
  • a filter vessel 18 is provided which surrounds the discharge vessel 12 at least partially, wherein the filter vessel 18 is the optical filter device.
  • an infrared radiation source according to the invention can be operated in different operating modes, once invisible to the human eye and once visible to the human eye, provided that the filter vessel 18 can be reversibly coupled to the discharge vessel 12.
  • the filter vessel 18 can continue to be used for the replacement low-pressure discharge lamp.
  • Fig. 4 shows an embodiment in which the discharge vessel 12 represents the optical filter device.
  • the discharge vessel 12 is made of optical filter glass, which is designed to absorb radiation in said wavelength range between 380 nm and 600 nm.
  • Fig. 5 the transmittance as a function of the wavelength for a first embodiment of an optical filter device, as it is used in an infrared radiation source according to the invention, shown.
  • an optical filter device is impermeable to radiation up to a wavelength of 600 nm.
  • Fig. 6 shows the corresponding course for a second embodiment of an optical filter device. This is designed so that it is impermeable to radiation up to wavelengths of about 730 nm.
  • the advantage of using an optical filter device having a like in Fig. 6 has spectral shape shown, is that almost no visible light is emitted.
  • the disadvantage of this, however, is the fact that the efficiency is lowered by about 20%.
  • a phosphor can be provided which is designed to convert radiation into NIR radiation, in particular at a wavelength of 154 nm and / or 172 nm.
  • Fig. 7 the emission and absorption spectrum of a suitable phosphor available under the name Nichia NP-870 on the market.
  • a phosphor absorbs electromagnetic energy in the range of UV-A, UV-B and / or UV-C radiation, see curve a), which shows the excitation spectrum.
  • Curve b) shows the emission spectrum of electromagnetic energy when excited according to curve a). As can be clearly seen from the course of the curve b), energy is emitted in the infrared wavelength range.
  • the phosphor can be applied in the form of a powder layer to the inside of a UV-A, C-band or C-radiation absorbing or outside of a discharge vessel 12 that is transmissive to UV-A, UV-B and / or UV-C radiation.
  • the application on the inside has the advantage that the phosphor is protected from mechanical influences.
  • a discharge vessel 12 In the method according to the invention for producing an infrared radiation source, first of all a discharge vessel 12 is provided. Then, in the discharge vessel, the first 14 a and the second thermally emitting electrode 14 b are arranged such that they are arranged in the discharge vessel opposite, that is, at both ends of the discharge vessel. Subsequently, the discharge vessel is heated and evacuated. After a cooling step, the discharge vessel with a filling which contains no mercury, but xenon with a partial pressure which depends on the discharge volume of the discharge vessel.
  • the xenon partial pressure is between 0.008 mbar and 0.010 mbar, while for discharge volumes greater than 50 cm 3 the xenon partial pressure is between 0.3 mbar and 2 mbar.
  • the order of the steps of the method according to the invention can be varied appropriately.

Landscapes

  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Discharge Lamp (AREA)
EP12187412.7A 2012-10-05 2012-10-05 Source de rayonnement infrarouge et procédé de fabrication d'une source de rayonnement infrarouge Withdrawn EP2717293A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP12187412.7A EP2717293A1 (fr) 2012-10-05 2012-10-05 Source de rayonnement infrarouge et procédé de fabrication d'une source de rayonnement infrarouge
CN201310463820.XA CN103794464A (zh) 2012-10-05 2013-10-08 红外线辐射源和用于制造红外线辐射源的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP12187412.7A EP2717293A1 (fr) 2012-10-05 2012-10-05 Source de rayonnement infrarouge et procédé de fabrication d'une source de rayonnement infrarouge

Publications (1)

Publication Number Publication Date
EP2717293A1 true EP2717293A1 (fr) 2014-04-09

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EP12187412.7A Withdrawn EP2717293A1 (fr) 2012-10-05 2012-10-05 Source de rayonnement infrarouge et procédé de fabrication d'une source de rayonnement infrarouge

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EP (1) EP2717293A1 (fr)
CN (1) CN103794464A (fr)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58119150A (ja) * 1982-01-07 1983-07-15 Mitsubishi Electric Corp 近赤外発光低圧ガス放電灯
JPS5991654A (ja) * 1982-11-18 1984-05-26 Mitsubishi Electric Corp 近赤外発光低圧希ガス放電灯
US4837478A (en) * 1984-05-09 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Near-infrared ray radiation illuminator and near-infrared ray image pick-up device
US4914347A (en) * 1987-10-28 1990-04-03 Mitsubishi Denki Kabushiki Kaisha Hot-cathode discharge fluorescent lamp filled with low pressure rare gas
US5837478A (en) 1993-12-23 1998-11-17 Icos Corporation Method of identifying modulators of binding between and VCAM-1
US5866984A (en) * 1996-02-27 1999-02-02 General Electric Company Mercury-free ultraviolet discharge source
US20050062429A1 (en) * 2003-09-09 2005-03-24 Fuji Xerox Co., Ltd. Light source and image reading device using the same
EP1548798B1 (fr) 2003-12-22 2008-04-16 Harison Toshiba Lighting Corporation Lampe à halogénure métallique et dispositif d'éclairage pour l'imagerie proche infrarouge
US20100060138A1 (en) * 2005-06-29 2010-03-11 Koninklijke Philips Electronics, N.V. Low-pressure discharge lamp comprising molecular radiator and additive

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58119150A (ja) * 1982-01-07 1983-07-15 Mitsubishi Electric Corp 近赤外発光低圧ガス放電灯
JPS5991654A (ja) * 1982-11-18 1984-05-26 Mitsubishi Electric Corp 近赤外発光低圧希ガス放電灯
US4837478A (en) * 1984-05-09 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Near-infrared ray radiation illuminator and near-infrared ray image pick-up device
US4914347A (en) * 1987-10-28 1990-04-03 Mitsubishi Denki Kabushiki Kaisha Hot-cathode discharge fluorescent lamp filled with low pressure rare gas
US5837478A (en) 1993-12-23 1998-11-17 Icos Corporation Method of identifying modulators of binding between and VCAM-1
US5866984A (en) * 1996-02-27 1999-02-02 General Electric Company Mercury-free ultraviolet discharge source
US20050062429A1 (en) * 2003-09-09 2005-03-24 Fuji Xerox Co., Ltd. Light source and image reading device using the same
EP1548798B1 (fr) 2003-12-22 2008-04-16 Harison Toshiba Lighting Corporation Lampe à halogénure métallique et dispositif d'éclairage pour l'imagerie proche infrarouge
US20100060138A1 (en) * 2005-06-29 2010-03-11 Koninklijke Philips Electronics, N.V. Low-pressure discharge lamp comprising molecular radiator and additive

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