EP3323141A1 - Procédé pour faire fonctionner une lampe à excimère au xénon et système de lampe comprenant une lampe à excimère - Google Patents

Procédé pour faire fonctionner une lampe à excimère au xénon et système de lampe comprenant une lampe à excimère

Info

Publication number
EP3323141A1
EP3323141A1 EP16729273.9A EP16729273A EP3323141A1 EP 3323141 A1 EP3323141 A1 EP 3323141A1 EP 16729273 A EP16729273 A EP 16729273A EP 3323141 A1 EP3323141 A1 EP 3323141A1
Authority
EP
European Patent Office
Prior art keywords
excimer lamp
lamp
operating
temperature
operating temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP16729273.9A
Other languages
German (de)
English (en)
Inventor
Erich Arnold
Franz-Josef Schilling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Noblelight GmbH
Original Assignee
Heraeus Noblelight GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Noblelight GmbH filed Critical Heraeus Noblelight GmbH
Publication of EP3323141A1 publication Critical patent/EP3323141A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel

Definitions

  • the present invention relates to methods for operating a xenon excimer lamp with a quartz glass exit window, comprising the method steps:
  • the present invention relates to a lamp system comprising a xenon excimer lamp with a quartz glass exit window, and a tempering unit for adjusting an operating temperature of the excimer lamp, wherein the excimer lamp for operation with an irradiance of more than 80 W / cm 2 is designed.
  • Lamp systems according to the invention which have an excimer lamp with a xenon-containing filling gas, are designed for the emission of high-energy radiation with a wavelength around 172 nm. They are used for example for the decomposition of organic material, for the cleaning and activation of surfaces or in CVD processes, for example in the semiconductor or display industry.
  • Known excimer lamps have a closed discharge vessel with a discharge space.
  • the discharge space is filled with a filling gas which is suitable for the emission of excimer radiation.
  • the discharge vessel comprises terhin an exit window for the radiation generated by the excimer lamp, which is made of quartz glass.
  • Excimers (“excited dimers”) are short-lived molecules that exist only in the excited state and, when they return to their unbound ground state, emit radiation in a narrow spectral range, the wavelength of the radiation emitted by the excimer lamp depends on the fill gas Excimer lamps with xenon fill (xenon excimer lamps) emit predominantly vacuum ultraviolet radiation (VUV radiation) with a wavelength around 172 nm.
  • VUV radiation vacuum ultraviolet radiation
  • FIG. 1 shows by way of example a diagram in which the irradiance of a xenon-excimer lamp is shown as a function of the power consumption.
  • the irradiance of excimer lamps can not be arbitrarily increased by increasing the operating performance. The reason for this is essentially a material property of the quartz glass, namely its temperature-dependent transmission.
  • Urbachkante This can be described after Urbach by an empirical formula; It is also referred to as the "Urbachkante.”
  • the Urbachkante specifies a lower limit for the transmission of photons of wavelength ⁇ , which is common to all quartz glasses, regardless of whether the quartz glass was made from synthetically produced or naturally occurring starting materials.
  • the position of the Urbachkante is temperature-dependent, and it shifts with increasing temperature of the quartz glass to longer wavelengths (see also Figure 3).
  • the shift of the Urbach edge has an influence on the radiation spectrum emitted by the excimer lamp. Xenon excimer lamps emit no monochromatic radiation, but radiation with a maximum at a wavelength of 172 nm and a full half-width of about 15 nm (FWHM).
  • the shift of the Urbachkante has ge that in particular the high energy content of the emitted radiation is increasingly absorbed by the quartz glass of the lamp with increasing temperature.
  • an active cooling of the lamp tube is necessary, for example by forced cooling by means of a blower or via increased heat conduction via the rear lamp surface.
  • An excimer lamp tempered to a predetermined operating temperature is known, for example, from the dissertation by M. Paravia (Paravia, 2010; Efficient operation of xenon excimer discharges at high power density [Dissertation]; KIT Düsseldorf, pages 48-50). Therein a range of 20 ° C ⁇ T ⁇ 180 ° C is discussed as a possible temperature range for the operating temperature T to be set.
  • xenon excimer lamps operating at high power and low operating temperature often have a low useful life, usually less than 1, 000 hours.
  • the invention is therefore based on the object to provide a method for operating a xenon excimer lamp with an irradiance above 80 mW / cm 2 , which allows a high useful life of the xenon excimer lamp.
  • the invention has for its object to provide a lamp system with an excimer lamp, which has a high useful life.
  • the abovementioned object is achieved on the basis of a method of the type mentioned in the introduction by tempering the excimer lamp to an operating temperature in the range from 181 ° C. to 199 ° C.
  • the invention is based on the finding that the shortened useful life of high-power excimer lamps, which are operated with a high irradiance and a low quartz glass temperature, is due to the formation of defect centers in the quartz glass. These can be caused by the interaction of the plasma in the discharge space with the quartz glass.
  • the plasma formed during operation of excimer lamps in the discharge space contains electrons and ions which, due to their charge in the E field of the excimer lamp, can be accelerated so that they strike the inner quartz glass surface of the excimer lamp with high energy , This results in damage in the quartz glass, which favor the construction of defect centers with characteristic absorption bands, in particular in the ultraviolet range.
  • high-energy photons can also generate radiation damage in the quartz glass.
  • These defect centers are also called "color centers.”
  • the absorption bands of the defect centers can affect the transmission of useful radiation at wavelengths around 172 nm.
  • Si-H + (hv, e, ion) -> Si + H is an E 'center with a broad absorption band for UV radiation is generated, whose maximum is 215 nm. Analogously, the reaction takes place in OH-containing quartz glasses for the production of so-called NBOH defect centers
  • Si-OH + (hv, e, ion) -> SiO ° + H also producing a defect center with a broad absorption band whose maximum is at 265 nm.
  • the manifestation of the defect centers is a function of the quartz glass temperature. Especially at low temperatures around 20 ° C an increased formation of these centers is observed.
  • quartz glass temperature In order to reduce the build-up of defect centers and to allow regression of resulting defect centers, it is necessary to maintain a minimum quartz glass temperature, particularly to provide activation energy for the recovery. It has been found that an optimum quartz glass temperature for the recovery of resulting defect centers in the range of 181 ° C to 199 ° C. A temperature in this range is on the one hand suitable to counteract defect center-related radiation losses and on the other hand low enough to keep the influence of the Urbachkante on the xenon excimer spectrum low. A quartz glass temperature of 200 ° C or more is accompanied by a reduced transmission of the quartz glass. At temperatures below 181 ° C only a small regression of defect centers is observed.
  • the optimum temperature range for the operation of xenon high-performance excimer lamps is therefore in the above range. It has proven to be advantageous if the operating temperature is as close as possible to the upper limit of 199 ° C.
  • the excimer lamp is heated to an operating temperature in the range of 191 ° C to 199 ° C, more preferably at a temperature of 195 ° C to 199 ° C. In this way, an operation of xenon excimer lamps with VUV irradiances above 80 mW / cm 2 , in particular in an irradiation intensity range of 85 mW / cm 2 to
  • the irradiance is a measure of the energy of the radiation emitted by the excimer lamp with respect to a surface spaced from the excimer lamp.
  • the irradiation measures referred to in the previous paragraph and Strengths are all related to a distance of 1 cm to the exit window surface.
  • the exit window is the area of the discharge vessel intended to emit radiation. It has a good transmission for ultraviolet radiation, in particular in comparison to other regions of the discharge vessel, and is made of quartz glass.
  • the exit window may have various shapes, for example, it is planar, curved, round or annular gap-shaped.
  • the optimum operating temperature in the range of 181 ° C to 199 ° C is to be set primarily at the exit window.
  • a regulating unit for controlling the temperature of the excimer lamp, which determines an actual value of the operating temperature, compares the actual value of the operating temperature with a desired value of the operating temperature, and sends a control signal to the temperature control.
  • Unit outputs, for setting the cooling / heating capacity of the temperature control unit.
  • a control unit contributes to a preferably uniform excimer lamp operating temperature, so that the formation of defect centers can be effectively counteracted.
  • the setting of the temperature of the exit window of an excimer lamp is easy and inexpensive to carry out a fan.
  • the blower power is easily adjustable. This allows the amount of fluid that is moved by the fan to be quickly adjusted to the current ambient temperature. It has proved to be advantageous if the excimer lamp has a discharge tube delimiting lamp tube with the exit window having a back window opposite the outlet window, and if the tempering according to process step (b) is carried out with a fluid that on the back Lamp tube surface is guided.
  • the excimer radiation is directed to a predetermined irradiation area.
  • Excimer lamps therefore often have an exit window in the form of an illuminated tube section.
  • the discharge vessel In order to direct the excimer radiation to a certain area outside the discharge vessel, the discharge vessel also has a rear section with a lower transmission in addition to a lighted lamp tube section. Frequently, a reflector layer is also provided in this area, which reflects the radiation directed in the direction of the rear lamp tube surface.
  • the temperature of the exit window is fundamentally decisive for the operating method according to the invention, this can not be cooled directly with a fluid. This would have the disadvantage of further radiation losses due to the absorption of radiation fractions by the fluid.
  • the fluid is water. Water is suitable for transporting heat and is also often available in a simple and sufficient amount.
  • the method for operating a xenon excimer lamp with an exit window and an exit window thickness in the range of 1 mm to 2 mm.
  • the thickness of the exit window has an influence on the formation and regression of defect centers.
  • a temperature gradient can be formed as seen across the outlet window thickness. If the temperature in an area of the exit window is too low, defect centers can form there, which are the radiation transmission and useful life can affect the excimer lamp.
  • exit windows with a thickness of more than 2 mm more defect centers occur. Exit windows with a thickness of less than 1 mm are fragile and therefore only expensive to handle.
  • the abovementioned object is achieved on the basis of a lamp system of the type mentioned in the introduction in that the tempering unit is designed such that it tempers the excimer lamp to an operating temperature in the range from 181 ° C. to 199 ° C.
  • a lamp system with a tempering unit designed in this way is suitable for carrying out the method according to the invention.
  • FIG. 1 is a diagram in which the VUV irradiance [mW / cm 2 ] a
  • Xenon excimer lamp is shown as a function of electrical power consumption [W] immediately after starting,
  • FIG. 2 shows a diagram in which the VUV irradiance as a function of the electrical power consumption immediately after a lamp start is compared with the VUV irradiance after the burning-in of the xenon excimer lamp,
  • FIG. 3 shows a diagram which shows the shift of the absorption edge (Urbach edge) of high-purity, synthetic quartz glass as a function of the temperature
  • FIG. 4 shows a spectrum of the radiation emitted by the xenon excimer lamp immediately after its ignition
  • Figure 5 is a spectrum of a xenon excimer lamp immediately after
  • FIG. 6 shows a diagram in which the relative VUV intensity [%] of a xenon excimer lamp is shown as a function of the burn-in time of the lamp (with cooling (measurement curve 20), without cooling (measurement curve 10)),
  • FIG. 7 shows a transmission spectrum of high-purity, synthetic quartz glass after prolonged irradiation.
  • Figure 8 transmission spectra of high purity, synthetic quartz glass after irradiation at a quartz glass temperature of 20 ° C and 160 ° C.
  • FIG. 1 shows by way of example the VUV irradiance E of a planar xenon excimer lamp as a function of its electrical power consumption P.
  • a planar excimer lamp was used whose discharge space is limited by two quartz glass plates.
  • the quartz glass plates of the lamp are fused together at their edges; they are arranged parallel to one another and have a spacing of 1 mm from one another.
  • the wall thickness of the quartz glass plates is 1 mm.
  • the illuminated area of the excimer lamp is 64 cm 2 .
  • the excimer lamp was operated in a nitrogen atmosphere such that it was cooled only by natural convection.
  • the VUV irradiance was measured immediately after ignition of the excimer lamp at a distance of 1 cm from the surface of an excimer lamp.
  • Measurement curve A shows that with an increase in the electrical power consumption of the excimer lamp, the irradiance increases almost linearly over a wide power range.
  • the quartz glass surface is still at room temperature, because only after a certain period of operation does the excimer lamp reach its operating temperature.
  • FIG. 2 shows the measurement results of the VUV irradiance after reaching the operating temperature of the excimer lamp (measurement curve B).
  • the trace B is shown by a dashed line.
  • the measurement results from FIG. 1 are also plotted in FIG. 2, which were obtained immediately after the lamp was started (measurement curve A, shown by a solid line).
  • the measured curve B after reaching the operating temperature (burn-in) does not differ from the measuring curve A, which was measured immediately after the lamp was started.
  • an operating power above 15 W, in particular above 140 W irradiation intensities of approximately 80 mW / cm 2 are achieved at best with a burned-in excimer lamp.
  • FIG. 4 shows the emission spectrum of an excimer lamp immediately after ignition, as is known from the comments on FIG.
  • the spectrum has mainly radiation components in the VUV range.
  • the maximum is about 172 nm with a FWHM (fill width at half maximum) of 15 nm.
  • FIG. 5 shows the emission spectra of an excimer lamp before (1) and after the burn-in (2) in comparison.
  • the temperature of the quartz glass of the exit window increases, resulting in a shift of the absorption edge (Urbach edge) to longer wavelengths.
  • the shift of the absorption edge has the consequence that preferably the high-energy radiation components are absorbed.
  • Figure 6 shows the effect of cooling on the relative VUV intensity [%] of a xenon excimer lamp.
  • the excimer lamp used was a planar excimer lamp.
  • the lamp consists of two sheets of synthetic quartz glass (10x10 cm 2 ), each 1 mm thick, which are fused in a decency of 1 mm to each other held at the sides vacuum-tight. The resulting space between the plates is filled with several hundred mbar xenon. Electrically conductive, thin (200 m), grid-like, photolithographically applied structures in contact with the outer surfaces of the excimer lamp form the electrodes, which generate a dielectric gas discharge in the excimer lamp in the usual way by means of a high-frequency alternating electric field.
  • the active photon emitting area is 64 cm 2 .
  • the electrical power consumed by the system Ballast and Excimer Lamp is a maximum of 240 W and can be dimmed.
  • the excimer lamp was operated in a nitrogen-flooded chamber in which a blower is installed.
  • the blower can be switched on or off. It optionally generates an additional cooling stream of nitrogen that lowers the temperature of the front of the excimer lamp.
  • the measurement curve 10 shows the relative VUV intensity E re i of the emitted radiation of an excimer lamp with cooling switched off. From the curve of the Measurement curve 10 shows that the VUV intensity E re i decreases with operating time and increasing operating temperature.
  • Measurement curve 20 shows a curve when the excimer lamp is continuously cooled by the additional cooling current. As a result, a higher VUV irradiance E re i can be maintained over the course of time.
  • the transmission curve from FIG. 7 shows the transmission of a quartz glass plate made of high-purity, synthetic quartz glass with a thickness of 1 mm after irradiation with UV radiation at a quartz glass temperature of 40 ° C.
  • the irradiation has formed a color center, which absorbs in particular high-energy radiation.
  • FIG. 8 shows, in comparison, two transmission spectra of quartz glass plates of high-purity, synthetic quartz glass after irradiation at a quartz glass temperature of 20 ° C. or 160 ° C. for 1 000 hours.

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Glass Compositions (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)

Abstract

Des procédés connus pour faire fonctionner une lampe à excimère au xénon présentant une fenêtre de sortie en verre de silice consistent à : (a) faire fonctionner la lampe à excimère avec une intensité d'irradiation supérieure à 80 mW/cm2 et (b) réguler la température de la lampe à excimère à une température de fonctionnement. L'invention vise à améliorer ce procédé pour faire fonctionner une lampe à excimère au xénon avec une intensité d'irradiation supérieure à 80 mW/cm2 de sorte que la lampe à excimère au xénon présente une durée de vie élevée. A cet effet, la température de la lampe à excimère est régulée à une température de fonctionnement comprise entre 181 °C et 199 °C.
EP16729273.9A 2015-07-13 2016-06-16 Procédé pour faire fonctionner une lampe à excimère au xénon et système de lampe comprenant une lampe à excimère Withdrawn EP3323141A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015111284.1A DE102015111284A1 (de) 2015-07-13 2015-07-13 Verfahren zum Betreiben einer Xenon-Excimer-Lampe und Lampensystem mit einer Excimer-Lampe
PCT/EP2016/063848 WO2017008987A1 (fr) 2015-07-13 2016-06-16 Procédé pour faire fonctionner une lampe à excimère au xénon et système de lampe comprenant une lampe à excimère

Publications (1)

Publication Number Publication Date
EP3323141A1 true EP3323141A1 (fr) 2018-05-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP16729273.9A Withdrawn EP3323141A1 (fr) 2015-07-13 2016-06-16 Procédé pour faire fonctionner une lampe à excimère au xénon et système de lampe comprenant une lampe à excimère

Country Status (5)

Country Link
US (1) US20180211827A1 (fr)
EP (1) EP3323141A1 (fr)
CN (1) CN107836033A (fr)
DE (1) DE102015111284A1 (fr)
WO (1) WO2017008987A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10983430B2 (en) 2018-02-22 2021-04-20 Taiwan Semiconductor Manufacturing Company, Ltd. Mask assembly and haze acceleration method
CN114272402B (zh) * 2021-11-09 2023-05-26 郑州圣华药物食品技术开发有限公司 保障氙准分子消毒器械安全有效运行的技术管理方案

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5748656A (en) * 1996-01-05 1998-05-05 Cymer, Inc. Laser having improved beam quality and reduced operating cost
US6201355B1 (en) * 1999-11-08 2001-03-13 Triton Thalassic Technologies, Inc. Lamp for generating high power ultraviolet radiation
DE60013239T2 (de) * 2000-01-20 2005-09-22 Ushiodenki K.K. Dielektrisch behinderte Entladungslampe und Bestrahlungsvorrichtung
JP4093065B2 (ja) * 2003-01-17 2008-05-28 ウシオ電機株式会社 エキシマランプ発光装置
JP2005005258A (ja) * 2003-05-19 2005-01-06 Ushio Inc エキシマランプ発光装置
DE102006042529A1 (de) * 2006-09-07 2008-03-27 Heraeus Noblelight Gmbh Excimer-UV-Bestrahlungsgerät
US9603268B2 (en) * 2010-11-19 2017-03-21 Konica Minolta, Inc. Gas barrier film, method of producing a gas barrier film, and electronic device

Also Published As

Publication number Publication date
US20180211827A1 (en) 2018-07-26
WO2017008987A1 (fr) 2017-01-19
DE102015111284A1 (de) 2017-01-19
CN107836033A (zh) 2018-03-23

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