EP2681007A1 - Paste zum verbinden von bauteilen elektronischer module, system und verfahren zum auftragen der paste - Google Patents
Paste zum verbinden von bauteilen elektronischer module, system und verfahren zum auftragen der pasteInfo
- Publication number
- EP2681007A1 EP2681007A1 EP12710028.7A EP12710028A EP2681007A1 EP 2681007 A1 EP2681007 A1 EP 2681007A1 EP 12710028 A EP12710028 A EP 12710028A EP 2681007 A1 EP2681007 A1 EP 2681007A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- paste
- solder
- binder
- flux
- metal powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
- B23K35/0222—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering, brazing
- B23K35/0244—Powders, particles or spheres; Preforms made therefrom
- B23K35/025—Pastes, creams, slurries
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
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- B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
- B23K35/0222—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering, brazing
- B23K35/0244—Powders, particles or spheres; Preforms made therefrom
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
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- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K35/262—Sn as the principal constituent
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- B23K35/264—Bi as the principal constituent
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- B23K35/3006—Ag as the principal constituent
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- B23K35/302—Cu as the principal constituent
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
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- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
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- B23K35/3613—Polymers, e.g. resins
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29363—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/29364—Palladium [Pd] as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29363—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/29369—Platinum [Pt] as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29499—Shape or distribution of the fillers
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/325—Material
- H01L2224/32505—Material outside the bonding interface, e.g. in the bulk of the layer connector
- H01L2224/32507—Material outside the bonding interface, e.g. in the bulk of the layer connector comprising an intermetallic compound
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00013—Fully indexed content
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
Definitions
- Paste for joining components of electronic modules system and method for applying the paste
- the present invention relates to a paste, preferably for joining components of electronic modules comprising a solder powder, a metal powder and a binder, wherein the solder powder and the metal powder binds before heating, as well as the use of a paste for connecting power modules and a method for connecting components of electrical modules by means of a paste, as previously described.
- lead-free solders have been banned, lead-free soft solders are used by default as the connection between the semiconductor and the substrate as well as the base plate, which fail after a short to medium load due to fatigue.
- One way to solve this problem is to adapt the dimensioning of the power semiconductor, that is, that the power modules are not operated at the maximum possible power.
- Transient Liquid Phase Bonding in which, after melting the solder, it further reacts with refractory metals and transforms into higher-melting, intermetallic phases. This occurs during soldering (also called isothermal or “chemical” solidification) or by subsequent tempering after solidification of the solder as a result of diffusion processes.
- soldering also called isothermal or “chemical” solidification
- subsequent tempering after solidification of the solder as a result of diffusion processes.
- the solder wets the metal layer, dissolves it and converts parts of it into intermetallic phases. In the prior art, it is thus possible to produce only thin intermetallic layers, since otherwise the diffusion processes would lead to very high temperatures and extremely long diffusion times.
- the refractory metal is added as a powder to the solder powder and the melting of the solder, the metal powder is wetted by the solder, dissolved and converted into intermetallic phases. In this variant, thicker connecting layers can be produced compared to variant a), ie, uneven joining gaps can also be filled between the various modules.
- the variant b) represents a progress, this has the problem that the solder wets the metal powder, but this immediately creates intermetallic phases, which fix the metal powder grains at the contact points.
- the molten solder is not enough to fill the gaps between the metal powder bodies. The compound is therefore traversed by many larger cavities, which reduce the mechanical and electrical strength of the joining layer.
- the polymers fill out the cavities and, as an adhesive, also improve the adhesion between the joining partners.
- the disadvantage here is that the thermal resistance of the bonding layer is increased again by the polymers and the polymers are not stable at higher temperatures.
- Object of the present invention is to produce stable connections between modules of the power electronics, which do not have the aforementioned disadvantages.
- the object is achieved by means of a paste according to the features of claim 1, a use of the paste according to claim 10 and a method according to claim 11.
- the paste comprises, in addition to the solder and the metal powder, a flux-free binder or a binder which has a flux with only slight activation.
- the paste is printed after mixing with a stencil or a screen on a substrate or a base plate or other component of an electric power module.
- the paste may be brushed or sprayed.
- the first component provided with the paste is connected to a second component, wherein the second component is advantageously pressed onto the first component, in such a way that the contact points between the first and second component comprise the region loaded with the paste.
- the solder powder is melted in a first melting step.
- the bonding device for connecting the first and second component may comprise a hot tool, which melts under application of pressure, the solder powder in the paste. In this way, several components can be pre-assembled sequentially on a substrate.
- the solder partially wets an optionally present metallization of the first or second component and fixes the metal powder on the metallization.
- the applied pressure leads to a pre-compression of the powder mixture and during the melting to a further compaction.
- the fact that the binder has no flux or has a flux with a low activation, can first be prevented that the liquid solder wets the metal powder and immediately form solid bridges of intermetallic phases between the individual particles of the metal powder. In this way, the paste initially remains kompaktierdip, since no solid framework is formed.
- the paste and the method for bonding electronic components by means of the paste make it possible to produce a joining layer between the first and second components with low thermal resistance, high thermal shock resistance and high temperature resistance.
- the compound is also characterized by lower costs than the compounds made with gold-containing solders or with sintered silver were. Due to the fact that the solder powder does not immediately wet the particles of the metal powder during melting, a connection between a first and a second component can be created in such a way that the paste arranged and remelted in the joint gap is present essentially without voids and pores, so that the Quality of the connection between the components is greatly improved.
- the solder powder comprises tin, indium or gallium as a solder base.
- the solder powder may include a mixture of different solder bases, such as tin and indium, or tin and bismuth.
- tin-based solders there are, for example, SnCu, SnIn, SnZn, SnSb, Sn100, SnAg, SnAgCu.
- indium-based solders may be Agln, Culn, or gallium-based solders may include, for example, CuGa, NiGa, AgGa.
- SnBi or Biln only one element of the solder powder forms an intermetallic phase, while the other element does not undergo such phase formation, causing the
- Melting point of the paste raised only limited who can, as for example in the case of bismuth with a melting temperature of 271 ° C.
- tin, indium or gallium based solders are the good availability and low cost associated with purchasing the solder powder.
- the metal powder comprises copper, silver, nickel, palladium, platinum or gold alone or as an alloying partner.
- suitable alloys for example, CuSn, CuMn, CuAl, CuZn, NiFe, AgPd, CuAg can be used.
- metal powders based on copper are advantageous, since both the economic factors and the formation of the intermetallic phases are advantageous here.
- the intermetallic phases are passed through in a short period of time.
- an alcohol such as a monohydric or polyhydric alcohol
- the viscosity of the paste can be well adjusted.
- the viscosity is selected such that the paste can be applied well on the one hand, for example by printing, stamping or dispensing, and that the alcohols dissolve as completely as possible during the abovementioned first melting process.
- the effect of reducing agents is only limited desired, just enough so that a sufficient adhesion of the solder between the first and second component takes place and the refractory metal powder remains involved.
- a porous filling in the joint gap is even desired to allow the entry of a gaseous reducing agent.
- the alcohols as binders, it is also possible to use higher-order alkanes or phenols as binders.
- a flux is understood to mean an agent having surface-reducing properties, i. It is suitable for dissolving oxide layers on metals.
- a flux-free binder or the constituents of the binder, which are not flux, has no reducing properties.
- a binder with a low activatable flux is preferably understood to mean a binder with a flux of the LO type. This type is defined in standard IPC J-STD-004. Fluxes which show a stronger activation than the activation of the type LO, according to the invention are not used or occur only in small amounts or traces.
- the proportion by weight of the flux in the binder is preferably less than 5% by weight, particularly preferably less than 3% by weight. Of this amount, preferably less than 20% (i.e., less than 1% by weight and 0.6% by weight of the total binder, respectively) are fluxes of a type other than LO. Particularly preferably, the flux has only traces of a type other than LO, so that a total of a low
- activatable flux can be spoken. Traces are here understood to mean small amounts of flux of a type other than LO, so that the small amount can not reduce the metal powder of the solder over the entire area but only locally. In other words shows the flux during the application of a pressure on the electronic component or power component in the first remelting phase no reducing effect.
- rosin is preferred as a flux, especially pure rosin.
- the binder has a flux contrary to the case described above, in the case of a low activatable agent only a slow dissolution of an oxide occurs, so that wetting of the metal powder by the solder during the first reflow is prevented.
- the paste comprises only the solder powder, the metal powder and the binder which is either flux-free or has only a low-activation flux.
- the solder powder and the metal powder have a weight ratio between 25 wt .-%: 75 wt .-% and 80 wt .-%: 20 wt .-%.
- the ratio between solder powder and metal powder is usually chosen to be close to the composition of the desired intermetallic phase. However, an excess of solder is advantageous in order to obtain a better filling of the cavities. An excess of refractory metal powder leaves metal inclusions in the bond layer and reduces the amount of residual solder residue that may otherwise still be present locally because of random powder distribution.
- the ratio of metal powder, solder powder and binder is selected such that the resulting paste a Melting temperature of more than 200 ° C, preferably more than 300 ° C has, so that the temperatures occurring in the field of high-performance electronics do not lead to delamination of the solder.
- the paste is used for connecting various components in the field of power electronics.
- the paste may be used to connect a power semiconductor and a substrate or a substrate and a base plate.
- the substrate, the semiconductor or the base plate have a metalization corresponding to the metal powder of the paste.
- a wetting of the metallization by the solder is achieved during the first melting, so that the metal powder of the paste is fixed.
- the binder has no flux or only a low activatable flux, however, prevents the liquid solder wets the particles of the metal powder and immediately form solid bridges of intermetallic phases. In this way the paste remains kompaktiertransport.
- active atmosphere eg from formic acid
- the metal powder and the solder surface are reduced, followed by a substantially complete wetting of the metal powder takes place by the solder and a conversion into intermetallic phases takes place.
- the degree of transformation depends on the metal powder size, the soldering temperature, the soldering time and the metal powder content. An incomplete transformation can also be continued and completed by a subsequent thermal aging.
- the particle size for the metal powder is preferably an average particle size between 1 pm, preferably 3 pm and 50 pm, preferably 30 ⁇ chosen. While during the first heating of the first and second components, the components are adhered to one another, in the case of a second melting between the first and second melting, a reduction of mostly existing oxide layers is carried out.
- a reducing agent gaseous reducing agents offer, as they can penetrate deep into the porous joint gap, there to reduce the oxide layers.
- typical reducing reaction gases are hydrogen, carbon monoxide or gaseous organic acids, such as formic acid or acetic acid.
- the exposure time until the oxide layers are reduced depends on the reducing gas, the temperature, the oxide size and the size of the pores in the bonding layer.
- the exposure time ranges from a few minutes to several hours, taking into account that metal oxides have quite different reducing power: while copper and silver oxides are easily reducible, the reduction of nickel makes much more difficult.
- the refractory metal powders and the respective connection surfaces of the first and second components are wetted and the cavities are largely filled with the liquid solder.
- the reaction of the solder with the refractory metal powder leads to the formation of the intermetallic phase and a consumption of the solder during the remelting. If the solder has largely been converted, the remelt point is shifted to high temperatures, with small residual amounts of the solder powder merely leading to local melting, which is not due to the formed framework of intermetallic phase for connecting the first and second component, but not the mechanical and electrical properties abruptly affected.
- the joining layer having only local cavities.
- Local voids are preferably to be understood as meaning that preferably less than 5% by volume, more preferably less than 3% by volume, of the joining layer is occupied by voids, with 100% by volume being the volume of the joining gap between the first and second Describe component or describe the total volume of the joining layer including the voids. Ie the joining is more than 95 vol .-% or more than 97 vol .-% of the molten metal powder, solder powder and components of the metallization of the first or second component. A backfilling of the cavities, for example with a polymer, is not necessary.
- Fig. 1 is a constructed of a first and second component system, wherein the first and second components are interconnected via a joining layer.
- the joining layer consists of the remainder of a paste of a paste according to the invention, i. the metal and solder powder as well as traces of the binder and possibly the low activatable flux.
- the traces are constituents which have not volatilized during remelting.
- a variant of the paste according to the invention consists of a solder powder, a metal powder and a mixture of different alcohols.
- the solder powder is SnAg4CuO, 5.
- the metal powder is Cu and is in the form of small balls of a diameter of about 10 ⁇ m.
- the binder used is the mixture of different alcohols, in the present case butanol and terpineol in a ratio of 1: 2 are mixed together.
- the binder has no flux or its solid components. Other ingredients are not on the paste.
- solder and metal powder are present in a weight ratio of 60:40. That from the combiners Lot and metal powder, 60% by weight is the tin-based solder and 40% by weight is the copper.
- Example 1 The paste of Example 1 is now printed on a ceramic-based substrate and a copper metallization, and an IGBT chip with a full-area metallization of copper is hot-tooled Bonding device placed on the substrate and pressed under the application of pressure. The heat and the pressure lead to a melting of the tin-based solder powder. The solder partially wets the metallizations of the substrate and the IGBT chip, thereby fixing the copper powder. Since the binder has no flux, the liquid tin-based solder prevents the copper balls from wetting and solid bridges of intermetallic phases are immediately present. In the case of different stacks of components such as base plate, substrate and power module, the individual components can be pre-assembled one after the other.
- the ceramic-based substrate with the preassembled IGBT chip is heated in an oven under activated atmosphere and remelted again.
- the copper and the tin-based solder are reduced, followed by a substantially complete wetting of the copper balls by the tin-based solder and a conversion into copper-tin-based intermetallic phases.
- the cavities between the copper balls are largely filled with solder. In this way and by the formation of the intermetallic phases, a bonding layer is produced between the substrate and the IGBT chip, which have only local cavities. However, the mechanical and electrical properties are not greatly affected.
- Local voids are preferably to be understood as taking up less than 5% by volume, particularly preferably less than 3% by volume, of the joint gap.
- the remaining 95 vol .-% (or 97 vol .-%) of the joining gap or the joining layer are filled with the copper and the Lot strigddling trouble and at the top with the components of the metallization. A polymer filling of the cavities is not present.
- the joining layer formed between the first and second component is shown in FIG.
- the IGBT chip 1 with the metallization 2 is applied to the ceramic substrate 3, wherein the paste was printed on the substrate before the first and second remelting.
- the illustrated joining layer 4 which is composed of the copper and the solder constituents, is formed.
- the joining layer 4 is characterized by the small proportion of void inclusions 5, the void inclusions 5, calculated on the volume of the joint gap 6, contributing less than 5% by volume.
- the volume of the joint is defined by the height H and the surface F of the component, ie H * F corresponds to 100 vol .-% of the joint gap.
- the joining layer can occupy less than 100% by volume of the joint gap. In this case, the 5% by volume cavitation inclusions are based on the bonding layer including cavity inclusions. A filling of the cavity inclusions, for example with a polymer, is not necessary since the stability of the joining layer itself is sufficient.
- Example 2 In the composition, the paste corresponds to Example 1, except that the
- Metal powder of silver beads (Ag particles) consists (or alternatively a mixture of Cu and Ag particles) and the binder, a proportion of 3 wt .-% rosin is buried. Further variations of Examples 1 and 2 result from a change in the percentages of solder and metal powder as described in the general part of the application.
- the paste or the method for applying the paste is particularly suitable for the construction of electronic modules, in particular power electronics, for mounting the semiconductors or power semiconductors on DCB substrates and the DCB substrates on the base plates.
- electronic modules in particular power electronics, for mounting the semiconductors or power semiconductors on DCB substrates and the DCB substrates on the base plates.
- Such modules are used in automobiles for electromobility, in systems for energy transmission and switching high power.
- Such components can be used in modules for high-temperature electronics and sensors.
- the modules for lighting technology such as LED modules or ignition electronics can be used.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102011013172A DE102011013172A1 (de) | 2011-02-28 | 2011-02-28 | Paste zum Verbinden von Bauteilen elektronischer Leistungsmodule, System und Verfahren zum Auftragen der Paste |
PCT/EP2012/000978 WO2012116846A1 (de) | 2011-02-28 | 2012-02-28 | Paste zum verbinden von bauteilen elektronischer module, system und verfahren zum auftragen der paste |
Publications (1)
Publication Number | Publication Date |
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EP2681007A1 true EP2681007A1 (de) | 2014-01-08 |
Family
ID=45875914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP12710028.7A Withdrawn EP2681007A1 (de) | 2011-02-28 | 2012-02-28 | Paste zum verbinden von bauteilen elektronischer module, system und verfahren zum auftragen der paste |
Country Status (5)
Country | Link |
---|---|
US (1) | US9815146B2 (de) |
EP (1) | EP2681007A1 (de) |
JP (1) | JP6147675B2 (de) |
DE (1) | DE102011013172A1 (de) |
WO (1) | WO2012116846A1 (de) |
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JP5796685B2 (ja) * | 2012-10-15 | 2015-10-21 | 千住金属工業株式会社 | 低温ソルダペーストのはんだ付け方法 |
CN105873713B (zh) * | 2014-01-07 | 2018-07-10 | 株式会社村田制作所 | 结构材料接合方法、接合用片材和接合结构 |
US9682533B1 (en) * | 2014-09-09 | 2017-06-20 | Hrl Laboratories, Llc | Methods to form electrical-mechanical connections between two surfaces, and systems and compositions suitable for such methods |
JP6511768B2 (ja) * | 2014-10-21 | 2019-05-15 | 三菱マテリアル株式会社 | はんだバンプの形成方法 |
DE102015200991B4 (de) | 2015-01-22 | 2024-08-08 | Robert Bosch Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen einer Lötverbindung und Schaltungsträger mit einer Lötverbindung |
US10043731B2 (en) | 2015-09-01 | 2018-08-07 | Toyota Motor Engineering & Manufacturing North America, Inc. | Multi-step processes for high temperature bonding and bonded substrates formed therefrom |
JP6721329B2 (ja) | 2015-12-21 | 2020-07-15 | 三菱電機株式会社 | パワー半導体装置およびその製造方法 |
US10879102B2 (en) * | 2017-08-07 | 2020-12-29 | Boston Process Technologies, Inc | Flux-free solder ball mount arrangement |
NL2020406B1 (nl) * | 2018-02-09 | 2019-08-19 | Inteco B V | Werkwijze en inrichting voor het vervaardigen van warmtewisselende elementen, en elemten als zodanig |
CN112756842A (zh) * | 2020-12-30 | 2021-05-07 | 福达合金材料股份有限公司 | 一种银基钎焊膏及其制备方法和应用 |
CN113399863B (zh) * | 2021-06-25 | 2022-06-21 | 西安热工研究院有限公司 | TA1-Q345中间层焊接用Ni-Cu-Ag-Co焊丝及其制备方法 |
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JPS57107501A (en) * | 1980-12-25 | 1982-07-05 | Sony Corp | Conduction material |
JPS62179889A (ja) * | 1986-01-31 | 1987-08-07 | Senjiyu Kinzoku Kogyo Kk | クリ−ムはんだ |
GB8628916D0 (en) * | 1986-12-03 | 1987-01-07 | Multicore Solders Ltd | Solder composition |
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JPH02194632A (ja) | 1989-01-24 | 1990-08-01 | Toshiba Corp | 電子部品の半田付方法 |
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JPH11189894A (ja) * | 1997-12-24 | 1999-07-13 | Murata Mfg Co Ltd | Sn合金メッキ皮膜、電子部品およびチップ型セラミック電子部品 |
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JP2001237512A (ja) * | 1999-12-14 | 2001-08-31 | Nitto Denko Corp | 両面回路基板およびこれを用いた多層配線基板ならびに両面回路基板の製造方法 |
JP3671815B2 (ja) * | 2000-06-12 | 2005-07-13 | 株式会社村田製作所 | はんだ組成物およびはんだ付け物品 |
JP3597810B2 (ja) * | 2001-10-10 | 2004-12-08 | 富士通株式会社 | はんだペーストおよび接続構造 |
JP2003211289A (ja) * | 2002-01-21 | 2003-07-29 | Fujitsu Ltd | 導電性接合材料、それを用いた接合方法及び電子機器 |
JP3797990B2 (ja) * | 2003-08-08 | 2006-07-19 | 株式会社東芝 | 熱硬化性フラックス及びはんだペースト |
US7017795B2 (en) * | 2003-11-03 | 2006-03-28 | Indium Corporation Of America | Solder pastes for providing high elasticity, low rigidity solder joints |
EP1837119B1 (de) | 2005-01-11 | 2015-02-11 | Murata Manufacturing Co., Ltd. | Lötpaste und elektronisches bauteil |
US8388724B2 (en) * | 2006-04-26 | 2013-03-05 | Senju Metal Industry Co., Ltd. | Solder paste |
JP4385061B2 (ja) * | 2006-08-28 | 2009-12-16 | ハリマ化成株式会社 | はんだペースト組成物およびその用途 |
JP5871450B2 (ja) | 2007-01-22 | 2016-03-01 | ユニヴァーシティー オブ メリーランドUniversity Of Maryland | 高温はんだ材料 |
US7821130B2 (en) * | 2008-03-31 | 2010-10-26 | Infineon Technologies Ag | Module including a rough solder joint |
-
2011
- 2011-02-28 DE DE102011013172A patent/DE102011013172A1/de not_active Withdrawn
-
2012
- 2012-02-28 US US14/001,486 patent/US9815146B2/en not_active Expired - Fee Related
- 2012-02-28 JP JP2013555804A patent/JP6147675B2/ja not_active Expired - Fee Related
- 2012-02-28 WO PCT/EP2012/000978 patent/WO2012116846A1/de active Application Filing
- 2012-02-28 EP EP12710028.7A patent/EP2681007A1/de not_active Withdrawn
Non-Patent Citations (2)
Title |
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None * |
See also references of WO2012116846A1 * |
Also Published As
Publication number | Publication date |
---|---|
DE102011013172A1 (de) | 2012-08-30 |
WO2012116846A1 (de) | 2012-09-07 |
US20140079472A1 (en) | 2014-03-20 |
JP2014511279A (ja) | 2014-05-15 |
JP6147675B2 (ja) | 2017-06-14 |
US9815146B2 (en) | 2017-11-14 |
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