EP2633279A1 - Dispositif de détection d'un rayonnement électromagnétique - Google Patents
Dispositif de détection d'un rayonnement électromagnétiqueInfo
- Publication number
- EP2633279A1 EP2633279A1 EP11787697.9A EP11787697A EP2633279A1 EP 2633279 A1 EP2633279 A1 EP 2633279A1 EP 11787697 A EP11787697 A EP 11787697A EP 2633279 A1 EP2633279 A1 EP 2633279A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- cover
- electromagnetic radiation
- substrate
- active
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005670 electromagnetic radiation Effects 0.000 title claims abstract description 102
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 230000005855 radiation Effects 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 11
- 230000008878 coupling Effects 0.000 claims description 10
- 238000010168 coupling process Methods 0.000 claims description 10
- 238000005859 coupling reaction Methods 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 3
- 230000002401 inhibitory effect Effects 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 2
- 239000005083 Zinc sulfide Substances 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 238000005192 partition Methods 0.000 claims description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 2
- 229910021332 silicide Inorganic materials 0.000 claims description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 50
- 230000035945 sensitivity Effects 0.000 abstract description 10
- 238000005530 etching Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000002745 absorbent Effects 0.000 description 7
- 239000002250 absorbent Substances 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 239000012528 membrane Substances 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000009931 harmful effect Effects 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- WNUPENMBHHEARK-UHFFFAOYSA-N silicon tungsten Chemical compound [Si].[W] WNUPENMBHHEARK-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000006903 response to temperature Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/041—Mountings in enclosures or in a particular environment
- G01J5/045—Sealings; Vacuum enclosures; Encapsulated packages; Wafer bonding structures; Getter arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/046—Materials; Selection of thermal materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
- G01J5/064—Ambient temperature sensor; Housing temperature sensor; Constructional details thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
- G01J5/068—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity by controlling parameters other than temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0853—Optical arrangements having infrared absorbers other than the usual absorber layers deposited on infrared detectors like bolometers, wherein the heat propagation between the absorber and the detecting element occurs within a solid
Definitions
- the invention relates to a device for detecting an electromagnetic radiation comprising on the same substrate:
- At least one active detector of the electromagnetic radiation provided with a first element sensitive to said radiation
- At least one reference detector comprising a second element sensitive to said electromagnetic radiation, said second sensing element having a first main face facing the incident electromagnetic radiation and a second main face facing the substrate and
- a cover provided with first reflecting means reflecting incident electromagnetic radiation parallel to the first main face of the second sensitive element, said cover covering the second sensitive element without contact and delimiting with the substrate a cavity in which the reference detector is housed, said active detector being outside the cavity.
- Devices for detecting electromagnetic radiation include one or more electromagnetic radiation detectors.
- the detectors of electromagnetic radiation are bolometers which use a change of thermal origin of the electrical properties of the materials constituting the bolometer such as the resistance or the dielectric constant.
- Bolometers measure the power of electromagnetic radiation in the terahertz or infrared range by converting radiation into an electrical signal.
- a bolometric detector of the resistive type comprises a bolometric plate 1 suspended above a substrate 2.
- the bolometric plate 1 is constituted by a membrane 3 absorbing electromagnetic radiation and a thermistor 4 constituted by of a thermosensitive semiconductor material, the essential characteristic of which is to present a variation of electrical resistance when its temperature varies.
- the membrane 3 is suspended via thermal insulation arms 5 fixed to the substrate 2 by anchoring points 6.
- the membrane 3 absorbs incident radiation, transforms it into heat and transmits heat to a thermistor 4.
- L The temperature rise of the thermistor 4 then induces a variation of voltage or current, across the bolometric detector, measured by a suitable electrical circuit.
- Electrodes (not shown) are, for example, disposed at the anchor points 6.
- a read circuit is integrated in the substrate 2 and ensures the exploitation of the measurements made.
- the heat insulating arms 5 thermally insulate the membrane 3 vis-à-vis the substrate 2 and thus improve the sensitivity of the measurement.
- An efficient operation of the bolometric detector requires three main conditions: a low heat mass, a good thermal insulation of the membrane 3 vis-à-vis the substrate 2 and a good sensitivity of the heating conversion effect in electrical signal.
- the first two conditions are obtained thanks to a thin layer implementation of the bolometric detector.
- Monolithic infrared imagers operating at ambient temperature are manufactured by directly connecting a matrix of bolometric detectors to a silicon multiplexing circuit of the CMOS or CCD type.
- the principle of reading a bolometric detector consists in measuring the value of the resistance of thermistor 4 and its variations. When these variations are very small, in particular, for the infrared (IR) detection, the detected signal is amplified within the reading circuit through an amplifier or integrator stage with high gain. In general, the integrator stage is preferred because it intrinsically reduces the bandwidth and eliminates white noise.
- the current from the bolometric detector and integrated into the integrator quickly saturates the output signal of an integrated circuit (in English "read out integrated circuit", noted ROIC).
- the useful current containing the information of the scene then represents only a fraction of the integrated total current.
- the invariant fraction of the current is conventionally derived in a so-called "baseline" branch of the circuit which sends only the variable portion of the current, corresponding to the imaged scene, to the integrator.
- FIG. 3 illustrates the principle of reading a bolometer detection device.
- the device comprises an active bolometer 7 which absorbs an incident electromagnetic radiation 8 and makes it possible to measure the radiation 8.
- the variation of the resistance of the active bolometer 7 is representative of the value of this radiation 8.
- a current reading is, for example, used to do this.
- the current, at the output of the active bolometer 7, comprises a variable fraction and an invariant fraction.
- the detection device operates in absolute, that is to say, it detects a continuous invariant background signal, which can hinder the measurement of the useful variable signal, which is, in general, small in front of this signal. background. It is therefore desirable to eliminate this invariant fraction of the current to obtain an optimal measurement of the value of the radiation.
- the invariant fraction of the current is preferably derived in a bypass branch, to send only the variable part of the current, called the useful current, to An integrator 9.
- the element that serves the branch branch must be low noise to generate the least possible disturbances.
- the bypass branch is made via a resistor whose value is of the order of magnitude of that of the active bolometer 7.
- the resistor is connected to a MOS transistor mounted in a common gate, or mounted in direct injection, which allows both to bias the resistance and to achieve impedance matching between the resistor and the amplifier stage.
- a conventional solution consists in using a reference bolometer 10 as resistance of the branch branch, that is to say a bolometer 10 which does not detect the electromagnetic radiation 8.
- the branch branch thus comprises, as represented in FIG. 3, a reference bolometer 10, which is made blind, by a protective screen 11 placed between the electromagnetic radiation 8 and the reference bolometer 10.
- the reference bolometer 10 is thus transformed in a passive bolometer, which absorbs no radiation and serves as a reference.
- US-A-2007138395 proposes a detection device comprising an active bolometer 7 and a reference bolometer 10 made on the same first substrate 2a.
- First and second covers are made from a second substrate 2b and sealed to the first substrate 2a by means of a sealing material for capping, respectively, the active bolometer 7 and the reference bolometer 10.
- the second cover is made opaque to the electromagnetic radiation 8 incident by deposition of an opaque layer 11 disposed on the outer face of the second cover, between the incident electromagnetic radiation 8 and the reference bolometer 10.
- the infrared detection device has the disadvantage of being bulky. Indeed, the assembly by sealing requires the use of covers having sufficiently large dimensions to allow their handling and meet the mechanical stresses of the device.
- the infrared detection device has hoods 2b having a high lateral wall thickness, typically between 50 ⁇ and ⁇ and providing an important space, typically 160pm, between a plane AA passing through the bolometers 7 and 10, and a plane BB parallel to the plane AA passing through the cover 2b, for a wavelength to be detected at 10pm.
- a large distance separating the opaque layer 11 from the plane AA makes it necessary, on the one hand, to space the active bolometer 7 from the reference bolometer 10 accordingly and, on the other hand, to use a reflective screen larger than the bolometer.
- the opaque layer 11 must generally be dimensioned so as to be substantially larger than the surface of the reference bolometer 10 to take account of the angle of incidence of the optical rays coming from the focusing system of the camera.
- the angles of incidence are, generally, between -30 ° and + 30 ° for an open optics F / 1 corresponding to the objectives generally used for infrared cameras based on microbolometer detectors.
- the active bolometer 7 and the reference bolometer 10 must be spaced a sufficiently large distance to correctly mask the reference bolometer 7, without however, obscure the active bolometer 7.
- the sealing operation is particularly delicate and expensive because it consists in handling a set of fragile bolometers and generally takes place in a clean room with demanding and costly cleanliness specifications.
- the object of the invention is to provide a detection device enabling a reliable and accurate measurement of electromagnetic radiation and, in particular, a better resolution of the signal emitted by the detection device and an improved sensitivity.
- Another object of the invention is to provide a low-profile and inexpensive detection device.
- the object of the invention is to provide an optimized detection device comprising a large number of pixels and making it possible to amplify at best one signal of IR imaging scenes, with high gains and improved offset current skew.
- the cover is arranged above the first main face a gap separating said first main face of the hood with a distance d between 0.5pm and 5pm,
- the cover comprises second lateral reflector means inhibiting the emission of a secondary electromagnetic radiation resulting from a transmission of said electromagnetic radiation by electromagnetic coupling and,
- the second lateral reflector means extend the first reflector means and form a continuous reflective screen with the first reflector means.
- FIGS. 2 show, schematically and respectively in top view and in perspective, a bolometric detector according to the prior art.
- FIG. 3 shows schematically the principle of reading a detection device according to the prior art.
- FIG. 4 shows, schematically and in section, a detection device according to the prior art.
- FIG. 5 and 6 show, schematically and respectively in section and in perspective view, a first particular embodiment of the detection device according to the invention.
- Figures 7 and 8 show, schematically and in perspective, variants of the detection device according to Figure 6.
- FIG. 9 shows schematically and in perspective, another particular embodiment of the detection device according to the invention.
- FIG. 10 shows schematically and in section, another particular embodiment of the detection device according to the invention.
- FIG. 11 to 18 show, schematically and in section, the various steps of a manufacturing method of the detection device according to Figure 10.
- FIG. 22 and 23 show, schematically and respectively in perspective and in section, another particular embodiment of the device according to the invention.
- the device for detecting electromagnetic radiation 8 is preferably a device for detecting IR and terahertz (THz).
- a device for detecting electromagnetic radiation 8 comprises an active detector 7 for electromagnetic radiation 8 provided with a first sensitive element 12 to said electromagnetic radiation 8 and a reference detector 10 having a second sensing element 13 to said electromagnetic radiation 8.
- the reference detector 10 is preferably identical to the active detector 7 of the electromagnetic radiation 8.
- the dimension characteristics and / or the constituent materials of the reference detector 10 are chosen so as to obtain, for a given electromagnetic radiation, a response at the same temperature as the active detector 7.
- the active detector 7 of the electromagnetic radiation 8 and the reference detector 10 are, respectively, an active bolometer 7 of the electromagnetic radiation 8 and a reference bolometer 10.
- each of the first and second sensitive elements, 12 and 13 has a first main face, respectively 14 and 15, facing the incident electromagnetic radiation 8 and a second main face, respectively 16 and 17.
- the first main faces 14 and 15 are preferably parallel to the second main faces, 16 and 17.
- the active bolometer 7 and the reference bolometer 10 are arranged on the same substrate 18, close to each other and in an identical arrangement so that the first main faces, 14 and 15, are advantageously in the same plane P.
- the plane P is preferably parallel to the main plane of the substrate 18.
- the active bolometer 7 and the reference bolometer 10 are in proximity to one another in order to subject them to the same environment.
- the reference bolometer 10 is positioned on as close as possible to the active bolometer 7 without however touching it in order to obtain a response to the thermal and electrical disturbances identical to that of the active bolometer 7.
- the proximity of the two bolometers, 7 and 10 contributes to making the detection device more compact.
- the substrate 18 is a support conventionally made of silicon.
- the substrate 18 provides the mechanical rigidity of the active bolometer 7 and the reference bolometer 10 and preferably comprises devices for polarization and for reading the resistance of the thermistor (not shown).
- the substrate 18 may also comprise multiplexing components making it possible, especially in the case of an IR detection device with a matrix structure of several microbolometers, to serialize the signals from the different microbolometers and to transmit them to a small number of outputs, to be exploited by a common imaging system.
- the joint presence of the active bolometer 7 and the reference bolometer 10 allows a differential reading of the signals delivered by the two bolometers, 7 and 10, and makes it possible to extract the signal resulting from the incident electromagnetic radiation 8 while canceling, or at least minimizing the sensitivity of the detection device to electrical and thermal disturbances.
- the active bolometer 7 and the reference bolometer 10 advantageously have a microbolometer-type microbridge insulating structure.
- Each structure conventionally comprises anchoring points 6 and thermal insulation arms 5 (FIG. 6) in order to minimize the conduction of heat.
- the microbridge structure advantageously decreases the response time of the signals emitted by the electromagnetic radiation detection device 8 and improves the signal / noise ratio.
- the device for detecting electromagnetic radiation 8 also comprises a cover 19 which covers, without contact, the second sensitive element 13 exposed to electromagnetic radiation 8.
- the cover 19 and the substrate 18 delimit a cavity 20 in which is housed the reference bolometer 10.
- the cover 19 is formed by an upper side 21 and two lateral sides 22 substantially perpendicular to the upper side 21, to form an inverted U on the substrate 18 and open at both ends.
- the cover 19 bears on the substrate 18 via the two lateral sides 22 and covers the reference bolometer 10 forming a bridge over the reference bolometer 10.
- Each lateral side 22 has a continuous inner face and a continuous outer face .
- external face is meant an outward facing face of the cover 19 in opposition to the internal face oriented towards the inside of the cover 19, that is to say towards the cavity 20.
- the second reflector means form at least the continuous internal faces or the continuous outer faces of the lateral sides 22.
- the upper side 21 and the two lateral sides 22 form a bridge over the reference bolometer 10.
- the cavity 20 is open at both ends of the cover 19.
- the upper side 21 is preferably parallel to the first main face 15 of the second sensitive element 13 and has a continuous outer face facing the incident electromagnetic radiation 8 so as to mask the reference bolometer 10 vis-à-vis the incident electromagnetic radiation 8.
- Each lateral side 22 has a continuous outer face.
- the dimensions of the cover 19 are greater than the dimensions of the reference bolometer 10.
- each opening 23 has small dimensions relative to the wavelength to be detected.
- the opening 23 may have different shapes, for example, a square or circular shape.
- Each opening 23 has a size smaller than 1 ⁇ m in its largest dimension, to satisfactorily attenuate the transmission via the opening 23 of the incident radiation 8 inside the cover 19.
- the cover 19 arranges above the first main face 15 of the second sensitive element 13 a blank space.
- the empty space is advantageously small in order to minimize the volume of the electromagnetic radiation detection device 8.
- the empty space separates the first main face 15 of the cover 19 from a distance d, advantageously between 0.5 pm and 5pm, preferably greater than or equal to 0.5 ⁇ m and strictly less than 2 ⁇ m.
- the distance d separates the first main face 15 from the inner face of the upper side 21 of the cover 19.
- the cover 19 comprises first reflector means and second lateral reflector means.
- the first and second reflector means may be constituted by reflectors, for example formed by a metal layer.
- the first reflector means constitute the upper side 21 of the cover 19 and the second reflector means constitute the lateral sides 22.
- the second lateral reflector means extend the first reflector means and form a screen continuously reflecting with the first reflector means.
- the cover 19 is entirely constituted by the continuous reflecting screen.
- the cover 19 forming a reflective screen may consist of a layer reflective thin of at least one material highly opaque to electromagnetic radiation 8 considered.
- the attenuation factors of the incident electromagnetic radiation 8 are preferably between about 60 dB to 80 dB. .
- a metal layer having a low resistivity and an adequate thickness makes it possible to guarantee sufficient reflection of the incident electromagnetic radiation 8 so as to deflect it towards the outside of the cover 19.
- the cover 19 may advantageously be constituted by a metal layer of at least one metallic material chosen from aluminum, titanium, gold, nickel, tantalum, tungsten, molybdenum, nitrides and silicides of these and their alloys.
- tungsten silicide WSi
- titanium nitride ⁇
- the continuous reflective screen is preferably a thin metal layer having a mean thickness of between 100 nm and 1000 nm and a resistivity of between I Q.cm and 500 ⁇ . ⁇ .
- the continuous reflecting screen consists of metal polymer reflectors or Bragg filter type reflectors, conventionally constituted by an alternation of two layers of different refractive index materials.
- the first reflector means are intended to reflect the incident electromagnetic radiation 8.
- the first reflector means prevent transmission of the electromagnetic radiation 8 through the cover 19 to the reference bolometer 10.
- the first reflector means mask the reference bolometer 10 which becomes insensitive to the incident electromagnetic radiation 8.
- the second lateral reflector means are intended to inhibit the emission of secondary electromagnetic radiation from a transmission of electromagnetic radiation 8 by electromagnetic coupling.
- the electromagnetic radiation 8 transmitted inside the cover then constitutes secondary electromagnetic radiation which disturbs the measured.
- the secondary electromagnetic radiation originates from surface waves of the plasmon type, which occur under the effect of electromagnetic radiation 8 incident at the first reflector means of the upper side 21 of the cover 19 which act as a lateral Perot-Fabry cavity.
- the energy of the surface waves absorbed by the Perot-Fabry cavity is emitted in the form of a secondary electromagnetic radiation which couples with the resonance modes of the lateral Perot-Fabry cavity.
- the secondary electromagnetic radiation is then important in the lateral Perot-Fabry cavity and the confined energy is absorbed by the reference bolometer 10.
- the presence of second lateral reflector means 22 makes it possible to remove this disadvantage by inhibiting secondary electromagnetic radiation.
- the second lateral reflector means 22 direct the energy of the secondary electromagnetic radiation towards the substrate 18 and prevent it from penetrating inside the cover 19.
- the cover 19 has flanges 24 along each end of the lateral sides 22, forming a support on the substrate 18.
- the flanges 24 may be formed by a horizontal return of the cover 19 forming support zone.
- the flanges 24 may, alternatively, be constituted by a first horizontal return forming a bearing zone on the substrate 18 and extending upwards (at the top in FIG. 8) by a second portion until at upper side height 21 of the cover 19, to end with a third portion forming a horizontal return, essentially in the same plane as the upper side 21.
- the embodiment of such a cover 19 is advantageously carried out by techniques conventional deposits and etchings of thin layers.
- the cover 19 completely encapsulates the reference bolometer 10 located in the cavity 20.
- the cover 19 completely covers the reference bolometer 10, without being in contact therewith.
- the cover 19 thus forms a capsule which arranges a closed, possibly hermetic cavity 20 in which the reference bolometer 10 is placed (FIG. 9).
- the closed cavity 20 is delimited by the cover 19 in the upper part (at the top in FIG. 9) and by the substrate 18 at the bottom (at the bottom in FIG. 9).
- the cover 19 may comprise a flange 24 forming a support on the substrate 18 which extends over a portion of the substrate 18. flange 24 is present all around the cover 19 thus improving the adhesion and, possibly, the tightness of the cover 19.
- the detection device differs from the particular embodiments described above in that the cover 19 comprises an additional structural layer 25 arranged between the continuous reflecting screen and the cavity 20.
- the cover 19 is formed by an outer wall and an inner wall, the outer wall being partly distinct from the inner wall.
- the outer wall of the cover 19 constitutes the continuous reflecting screen and the structural layer 25 constitutes a part of the inner wall of the cover 19.
- the upper side 21 is constituted by a stack of two layers formed by the first reflector means and the structural layer 25.
- the structural layer 25 and the first reflector means are located preferably parallel to the first main face 15 of the second sensitive element 13.
- the method of manufacturing a device for detecting electromagnetic radiation 8 comprises the production of metal bonding pads 26 from a silicon substrate 18 containing a read circuit (not represented) already completed, obtained by any known method of silicon microelectronics.
- the metal bonding pads 26 make it possible to make the electrical connections between, on the one hand, the electronic devices of the reading circuit and, on the other hand, the active bolometer 7 and the reference bolometer 10.
- a layer of Passivation 27 insulation conventionally covers the substrate 18 while providing uncovered portions 28 at the metal pads 26 connection.
- a metal layer for example made of aluminum, is advantageously deposited and defined by photolithography and etching according to any known method, in order to produce two infrared reflectors, 29a and 29b, at the surface of the reading circuit.
- a first sacrificial layer 30, conventionally polyimide, is then extended and optionally annealed.
- bolometric plates 31a and 31b, respectively, of the active bolometer 7 and the reference bolometer 10 are constructed on the first sacrificial layer 30 according to any known method.
- the bolometric plates 31a and 31b respectively comprise the first and second sensitive elements 12 and 13.
- the first sacrificial layer 30 which is removed in fine makes it possible to provide a space separating each reflector 29a and 29b, respectively, from the bolometric plate. 31a and 31b.
- the bolometric plates, 31a and 31b are thus thermally isolated from the reading circuit.
- the space is adapted to produce a quarter-wave resonant cavity, for example of the order of 2.5 ⁇ to detect a range of wavelengths centered on 10pm.
- a second sacrificial layer 32 is extended above the active bolometer 7 and the reference bolometer 10.
- the second sacrificial layer 32 on which is constructed the cover 19 and which is removed in fine, allows to provide the empty space, defined above, between the first main face 15 of the reference bolometer 10 and the cover 19.
- the distance d between the cover 19 of the first face main part 15 of the second sensitive element 13 corresponds to the thickness of the second sacrificial layer 32 preferably included between about ⁇ , ⁇ to ⁇ .
- the creation of a void space in fine ensures a significant thermal insulation between the first main face 15 and the cover 19.
- a structural layer 25 is then produced, according to any known method.
- the structural layer 25 is, for example, obtained by depositing a first layer 33 of amorphous silicon or aluminum on the surface of the second sacrificial layer 32 followed by photolithography and etching. The etching of the first layer 33 is performed by sparing at least the zones located above the active bolometer 7 and the reference bolometer 10. At the end of this step, the structural layer 25 and the first residual layer 33 are obtained. on the surface of the second sacrificial layer 32. As shown in FIG. 15, the structural layer 25 and the first residual layer 33 then serve as a hard mask for etching more easily, vertically, the first and second sacrificial layers 30 and 32, up to the substrate 18.
- the etching thus forms a recess 34 in accordance with the desired shape of the cover 19.
- the obviously 34 may be constituted by a continuous trench surrounding the reference bolometer 10 and which traverses the entire thickness of the first and second sacrificial layers, respect
- the recess 34 may be constituted by two trenches substantially parallel, on both sides. reference bolometer 10 (right and left in Figure 15).
- the etching conditions are adapted to obtain etching flanks with little overhang, especially at the interface between the structural layer 25 and the second sacrificial layer 32.
- a reactive ion etching in English "reactive-ion etching, rated RIE) is preferred.
- the etching of a first 2.5 ⁇ m thick polyimide layer and a second 2 ⁇ m thick polyimide layer can be obtained, by limiting said overhang, under the following RIE conditions:
- a second reflective, preferably metallic, layer 35 is then deposited, by any known method, so as to cover the structural layer 25 as well as the spared areas of the first layer 33.
- the second layer 35 covers also, the flank and the bottom of the recess 34.
- the overlap of the structural layer 25 allows for the upper side 21 of the cover 19.
- the covering or flanks of the recess 34 forms the side or sides 22
- the covering of the flanks or sides of the recess 34 by this metal deposit is particularly important to ensure good opacity of the cover 19 vis-à-vis the secondary electromagnetic radiation.
- the side or sides 22 constitute the second reflective means of the electromagnetic radiation detection device 8 and form a shield vis-à-vis the secondary electromagnetic radiation making the detector insensitive to this type of secondary radiation.
- the deposition of a second reflective layer of conformal type is preferred because this characteristic contributes to the effectiveness of the continuous reflective screen and to the improvement of the protection of the bolometer. reference 10.
- a second conformal metal layer may be obtained by LPCVD (Low Pressure Chemical Vapor Deposition) deposition of a thin layer of tungsten silicide (WSi) with a thickness of between 100 nm and 500 nm, with a resistivity of order of 200 ⁇ . ⁇ , with the ranges already described above corresponding to the deposition conditions of which a particular point is repeated here as an example:
- LPCVD Low Pressure Chemical Vapor Deposition
- metal layers may be used, for example, titanium nitride (TiN), molybdenum (Mo), tantalum (Ta), titanium (Ti), nikel (Ni), all preferentially deposited by LPCVD.
- Second metal layers deposited by plasma-assisted chemical decomposition may also be suitable nevertheless the property of conformity being less, this deposit then requires the realization of a thickness of seconds 35 larger metal layers.
- the first layer 33 spared and the second metal layer are etched opposite the location of the active bolometer 7 and are kept opposite the reference bolometer 10, with the possible exception of one or several areas smaller than 1 ⁇ corresponding to the opening or openings 23 intended to facilitate the subsequent evacuation of the first and second sacrificial, 30 and 32.
- the etching conditions are defined to allow removal of the first spared layer 33 and the second metal layer above the active bolometer 7 and to give the final shape to the cap 19, including the shape of the rim 24.
- the first and second sacrificial layers, respectively 30 and 32 are finally eliminated by a step of chemical etching in the gaseous phase, in particular through the opening 23.
- This step allows the reactive etching species and the etching residues to communicate between the inside and the outside of the cover 19.
- the elimination of the first and second sacrificial layers, respectively 30 and 32, makes it possible to release the cavity 20 of the cover 19 and the empty space between the second element sensitive 13 and the cover 19.
- the device for detecting electromagnetic radiation 8 differs from the third particular embodiment described above by the fact that cover 19 has a support wall 36 that is transparent to electromagnetic radiation 8 taking support on the substrate 18 and disposed between the continuous reflective screen 37 and the cavity 20.
- the support wall 36 contributes to the strength of the cover 19.
- the support wall 36 is in contact with the structural layer 25.
- the upper side 21 of the cover 19 is advantageously formed by a stack of three corresponding layers, starting from the outside of the cover 19 towards the cavity 20, the first reflector means, the upper part of the support wall 36 and the layer 25.
- the first reflector means form the upper part of the continuous reflective screen 37.
- the support wall 36 is preferably constituted by a material chosen from monocrystalline, polycrystalline or amorphous silicon, monocrystalline, polycrystalline or amorphous germanium and silicon / germanium (SiGe) alloys.
- the support wall 36 is formed by at least one dielectric material selected from silicon, germanium, zinc sulphide, zinc selenide, silicon oxides and silicon oxynitrides.
- the support wall 36 is arranged between the continuous reflective screen 37 and the structural layer 25.
- the lateral sides 22 of the cover 19 consist of the stack of two layers corresponding to the second reflector means and the lateral parts of the support wall 36.
- the continuous outer faces of the two lateral sides 22 are constituted by the second reflector means.
- the second reflector means form the side portions of the continuous reflective screen 37.
- the inner wall of the cover 19 is, therefore, constituted by the side portions of the support wall 36 and the structural layer 25, and the outer wall of the cover is constituted by the continuous reflective screen 37.
- the external wall forming the continuous reflective screen 37 does not join the substrate 18 because of the presence of the support wall 36 which interposes between the continuous reflective screen 37 and the substrate 18, level of the rim 24 and forms an edge 38 capable of creating a secondary electromagnetic radiation by electromagnetic coupling.
- the support wall 36 advantageously has a small thickness of between 10 nm and 500 nm.
- the device for detecting an electromagnetic radiation 8 comprises an additional cover 39 that is transparent to the electromagnetic radiation 8 in which the active bolometer 7 is housed.
- the additional cover 39 transparent is optionally provided with a layer
- the additional cover 39 transparent and the support wall 36 preferably form a single and same layer formed by one or more materials transparent to the electromagnetic radiation, identical to that described above, but by choosing one or more electromagnetic radiation-transparent materials. 8.
- the realization of the additional cover 39 transparent brings advantages to the detection device without significantly burdening the cost of realization of the detection device, insofar as the realization of the additional cover 39 transparent can be performed at the same time as the support wall 36 which makes already part of the device manufacturing process, according to known collective techniques of microelectronics.
- an additional transparent cover 39 advantageously makes it possible to protect the active bolometer 7 having a fragile suspended structure.
- the additional transparent cover 39 isolates the bolometers 7 and 10 from the external environment and, in particular, makes it possible to clean the detection device by standard blowing or washing processes that are impossible in the absence of a hood 39. , setting The housing of the electromagnetic radiation detection device 8 becomes standard and does not need to be carried out in a clean room-type clean room as is the case for non-cleaning detection devices. This results in a significant reduction in production costs.
- an additional cover 39 allows the active bolometer 7 and the reference bolometer 10 to be sealed under vacuum using known vacuum microencapsulation methods.
- the microencapsulation process described in the article "Innovative on-chip packaging applied to uncooled IRFPA” by G. Dumont et al., Published in the proceedings of the SPIE conference "Infrared Technology and Applications XXXIV", Vol. . 6940, pages 1 Y-1 to 1Y-6 (2008), or in the patent application FR-A-2822541 is to be regarded as an integral part of the present application.
- the sensitivity of the bolometers 7 and 10 of the electromagnetic radiation detection device 8 is substantially improved by vacuum operation.
- An evacuation orifice for example in the form of a baffle as described in the aforementioned article allows the elimination of the sacrificial layers via the opening 23 and is sealed by deposition of one or more thin layers constituting the additional cover 39.
- the continuous reflective screen 37 is produced according to a method identical to the third particular embodiment. Note however that the size of the opening 23 becomes compared to the third particular embodiment described above, a parameter that affects the efficiency of the device and can, therefore, be greater than 1 ⁇ .
- the support wall 36 is open at the edge 24 of the cover 19 by localized etching, to remove the presence of the edge 38 and so as to put in direct contact the second lateral reflector means of the lateral sides 22 with the substrate 18.
- the device for detecting the electromagnetic radiation 8 differs mainly from the fourth particular embodiment in that the outer wall of the cover 19 is constituted by the support wall 36.
- the continuous reflective screen 37 is arranged between the support wall 36 and the cavity 20, for example between the support wall 36 and the structural layer 25, and bears directly on the substrate 18.
- the cover 19 has an internal wall constituted by an absorbent layer 40.
- the absorbent layer 40 is intended to absorb at least the thermal radiation emitted by the second sensitive element 13 of the bolometer of reference 10 so that the cavity 20 constitutes an absorbent cavity.
- Absorbent layer 40 is advantageously formed by at least one porous metallic absorbent material selected from black gold, platinum, silver and chromium. Black gold and platinum are commonly used in the field of pyroelectric or thermopile detection devices and silver and chromium to develop black absorbers.
- the thermalization of the bolometer is a consequence of the internal wall constituted by a black body.
- the absorbent layer 40 is formed by at least one polymeric material containing graphite.
- Polymeric materials containing graphite can absorb up to 80% between 2pm and 20 ⁇ of wavelength.
- the term polymer covers, also, epoxy-type polymeric resins, polyimide and photosensitive resins. To improve the absorption capacity of the absorbent layer 40, the latter may also be in the form of a multilayer and / or comprise several absorbing materials of different nature.
- the reference bolometer 10 having the cover 19 described above then has an identical or at least comparable thermal resistance to that of the active bolometer 7.
- the device for detecting electromagnetic radiation 8 comprises a plurality of reference bolometers 10.
- the device for detecting electromagnetic radiation 8 may comprise a plurality of reference detectors 10 and a plurality of covers 19.
- the electromagnetic radiation detection device 8 may comprise at least two covers 19 each independently covering a reference detector 10
- Each reference detector 10 may advantageously be covered by a cover 19.
- the device for detecting electromagnetic radiation 8 may comprise a plurality of reference detectors 10 and a cover 19.
- the cover 19 covers the plurality of reference bolometers 10 and no active bolometer 7.
- the device for detecting electromagnetic radiation 8 may comprise at least three active bolometers 7.
- the active bolometers 7 and the reference bolometers 10 are arranged on the substrate 18 in the form of a network of rows and columns. Each reference bolometer 10 is placed on the substrate 18 at the head of a line and / or a column of the network.
- the plurality of reference bolometers 10 is housed in a single cavity 20.
- the cover 19 covers only the reference bolometers 10 arranged on the same line or the same column of the network.
- the cover 19 is constituted by an upper side 21 and two lateral sides 22 forming a single cavity 20 covering the reference bolometers 10 and forming, as previously described, an inverted U, open at two ends.
- the upper side 21 and the lateral sides 22 must be long enough to provide an overtaking at the ends of the inverted U. Indeed, the cover 19 must cover by exceeding the first and last reference bolometers 10 located at the head of line or column, so as to eliminate or, at least, reduce the electromagnetic coupling may occur at the ends of the cover 19.
- the active bolometers 7 of the same row or of the same column are read simultaneously and in conjunction with the reference bolometer 10 common to the row or column and located at the top of the line or column.
- the number of reference bolometers 10 is preferably less than the number of active bolometers 7, to allow on-line differential reading with duplication of the signal delivered by a reference bolometer 10 at the head end.
- the duplication of the signal delivered by the reference bolometer 10 located at the head of the line is redistributed towards the active bolometers 7 of the line considered, in order to perform the differential reading operation, one line at a time.
- This duplication and redistribution device can be realized by an electronic assembly according to any known method, for example by a current mirror circuit which can advantageously be integrated on the silicon substrate 18.
- the purified signals resulting from the differential reading of the active bolometers 7 on the one hand and the duplicated signal of the reference bolometers 10 on the other hand are respectively transmitted to signal processing means (not shown).
- the signal processing means may, for example, consist of localized amplifiers, samplers or multiplexers, preferably at the foot of the column (FIG. 22), so as to provide them with a large area relative to the surface of the bolometer. active 7 network, which allows to offer a low noise level.
- the device for detecting electromagnetic radiation 8 After reading the first line, the device for detecting electromagnetic radiation 8 proceeds to read simultaneously the active bolometers 7 of the second line, together with the reference bolometer 10 of the second line and so on for all electromagnetic radiation detection device lines 8.
- a column reading, based on the same principle, is also possible.
- Synchronous reading makes it possible to compensate the sources of random disturbances that fluctuate over time, such as the common-mode electronic noise that affects the accuracy of the measuring current, differently at each moment, but in a common way for the active bolometer. and for the reference bolometer 10.
- the active bolometers 7 and the reference bolometers 10 are read only once to make an image and thus know the same reading cycle in pulsed read configuration.
- the network may comprise eight reference bolometers 10 per
- the network may comprise, by line, four reference bolometers 10 at the head of the line and four reference bolometers 10 at the end of the line, to limit the overall noise generated by the reference bolometers. line, to limit the spatial non-uniformities introduced by the pairing imperfections between the active bolometers 7 and the reference bolometers 10 and contribute to improving the quality of the differential reading of the detection device.
- the reference bolometers 10 thus delimit the active bolometers 7 located in the center of the network.
- the network may include several thousand reference bolometers to efficiently read a matrix of 640 x 480 active bolometers 7 constituting, for example, the pixels of an IR detection device, in differential reading mode.
- the cover 19 has at least one internal separation wall 41 placed between two adjacent reference bolometers 10 so that the cover 19 delimits with the substrate 18 several cavities 20 in each of which is housed a single reference bolometer 10. All reference bolometers 10 then strictly know the same environment.
- the cover 19 advantageously makes it possible to arrange a strictly identical environment for each reference bolometer 10 whatever their situation within the network. Indeed, the reference bolometers 10 placed at the edges of the lateral sides 22 of the cover 19 encapsulating several columns of reference bolometers 10 may, possibly, be subject to minimal variations of the manufacturing processes. These variations then differentiate reference bolometers 10 spaced from the lateral sides 22 of the cover 19. The lack of uniformity of the properties of the reference bolometers 10 encapsulated by the cover 19 is detrimental to the operation of the electromagnetic radiation detection device 8. One introduces, therefore, one or more internal walls 41 to avoid the lack of uniformity.
- the internal partition wall 41 advantageously forms with the support wall 36 a single and same layer made in a single step according to any known method.
- the electromagnetic radiation detection device 8 comprises several active bolometers 7 and as many reference bolometers 10 as active bolometers 7, avoiding the duplication of the signal from the reference bolometers 10.
- the device for detecting an electromagnetic radiation according to the invention is remarkable because it makes it possible to eliminate the harmful effects of the secondary electromagnetic radiation and to optimize, therefore, the bashing of the offset current.
- the device for detecting an electromagnetic radiation according to the invention avoids ghosting due to a residual sensitivity of the reference bolometers and an insufficiently opaque cover.
- the detection device according to the invention allows a synchronous differential reading of the active bolometer and reference bolometer with a good pairing.
- the device according to the invention is advantageous in that it makes it possible to subtract the disturbing effects, both thermal and electrical, in order to restore a more precise signal, without presenting the disadvantages of volume, manufacturing complexity and cost. manufacturing of the prior art.
- the first sensitive element 12 is not located in the cavity 20 delimited by the cover 19 and the substrate 18.
- the cavity 20 then contains only the second sensitive element 13.
- the first sensitive element 12 is located outside the cavity 20 so that the first sensitive element 12 and the second sensitive element 13 are separated by the cover 19.
- the device for detecting an electromagnetic radiation according to the invention makes it possible to obtain a device with a small footprint. This feature is particularly advantageous for IR detection devices with a high number of pixels.
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR1004203A FR2966595B1 (fr) | 2010-10-26 | 2010-10-26 | Dispositif de detection d'un rayonnement electromagnetique. |
PCT/FR2011/000573 WO2012056124A1 (fr) | 2010-10-26 | 2011-10-25 | Dispositif de détection d'un rayonnement électromagnétique |
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EP11787697.9A Withdrawn EP2633279A1 (fr) | 2010-10-26 | 2011-10-25 | Dispositif de détection d'un rayonnement électromagnétique |
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US (1) | US8816283B2 (ja) |
EP (1) | EP2633279A1 (ja) |
JP (1) | JP5940551B2 (ja) |
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WO2024023402A1 (fr) | 2022-07-28 | 2024-02-01 | Lynred | Micro-bolometre d'imagerie infrarouge aveugle et procede de realisation |
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EP3673250A4 (en) * | 2017-08-25 | 2021-06-09 | The Government Of The United States Of America As The Secretary of The Navy | HIGH SPEED GRAPHIC OXIDE BOLOMETER AND METHOD OF MANUFACTURING THEREOF |
FR3073941B1 (fr) * | 2017-11-21 | 2021-01-15 | Commissariat Energie Atomique | Dispositif de detection d’un rayonnement electromagnetique a diaphotie reduite |
FR3081989B1 (fr) * | 2018-05-30 | 2020-08-21 | Commissariat Energie Atomique | Systeme de detection a pixel sensible comportant un detecteur thermique et un dispositif de compensation |
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FR3101414B1 (fr) * | 2019-09-30 | 2021-09-03 | Commissariat Energie Atomique | procede de fabrication d’un dispositif de detection de rayonnement electromagnétique comportant un materiau getter |
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- 2011-10-25 US US13/881,324 patent/US8816283B2/en not_active Expired - Fee Related
- 2011-10-25 WO PCT/FR2011/000573 patent/WO2012056124A1/fr active Application Filing
- 2011-10-25 EP EP11787697.9A patent/EP2633279A1/fr not_active Withdrawn
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024023402A1 (fr) | 2022-07-28 | 2024-02-01 | Lynred | Micro-bolometre d'imagerie infrarouge aveugle et procede de realisation |
FR3138517A1 (fr) | 2022-07-28 | 2024-02-02 | Lynred | Micro-bolometre d’imagerie infrarouge aveugle et procede de realisation |
Also Published As
Publication number | Publication date |
---|---|
JP2013542437A (ja) | 2013-11-21 |
US8816283B2 (en) | 2014-08-26 |
WO2012056124A1 (fr) | 2012-05-03 |
JP5940551B2 (ja) | 2016-06-29 |
FR2966595B1 (fr) | 2013-01-25 |
FR2966595A1 (fr) | 2012-04-27 |
US20130240738A1 (en) | 2013-09-19 |
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