EP2555230A2 - Verfahren zur Herstellung einer Leistungsvorrichtung - Google Patents

Verfahren zur Herstellung einer Leistungsvorrichtung Download PDF

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Publication number
EP2555230A2
EP2555230A2 EP12175632A EP12175632A EP2555230A2 EP 2555230 A2 EP2555230 A2 EP 2555230A2 EP 12175632 A EP12175632 A EP 12175632A EP 12175632 A EP12175632 A EP 12175632A EP 2555230 A2 EP2555230 A2 EP 2555230A2
Authority
EP
European Patent Office
Prior art keywords
drift region
gan
forming
layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP12175632A
Other languages
English (en)
French (fr)
Inventor
Jae Hoon Lee
Ki Se Kim
Jung Hee Lee
Ki Sik Im
Dong Seok Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
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Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of EP2555230A2 publication Critical patent/EP2555230A2/de
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
    • H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
    • H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
    • H01L29/063—Reduced surface field [RESURF] pn-junction structures
    • H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843—Source or drain regions of field-effect devices
    • H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
    • H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
    • H01L29/0873—Drain regions
    • H01L29/0878—Impurity concentration or distribution
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/2003—Nitride compounds

Definitions

  • the present invention relates to a power device manufacturing method, and more particularly, to a power device manufacturing method that manufactures a vertically-structured power device that is capable of operating a normally-OFF operation.
  • a semiconductor light emitting device is a semiconductor device that generates various colored lights based on the re-bonding of an electron and a hole at a P-N junction when a current is applied.
  • Demand for the semiconductor LED has been continuously increased since the semiconductor LED has many advantages, for example, a long lifespan, a low power consumption, a fast start-up, a high vibration resistance, and the like, when compared to a filament-based LED.
  • a nitride semiconductor that emits a blue light, in a short wavelength range, has drawn attention.
  • the nitride semiconductor since the nitride semiconductor has advantageous properties, such as a high energy gap, a high heat stability, a high chemical stability, a high electronic saturation velocity of about 3 ⁇ 10 7 centimeters per second (cm/sec), the nitride semiconductor may be readily utilized as an optical element, and a high frequency and high power electronic device. Accordingly, research on the nitride semiconductor is being actively conducted the world over.
  • An electronic device based on the nitride semiconductor may have varied advantages, such as, a high breakdown field of about 3 ⁇ 10 6 volts per centimeter (V/cm), a maximum current density, a stable high temperature operation, a high heat conductivity, and the like.
  • a heterostructure field effect transistor (HFET) generated based on a heterojunction of compound semiconductors has a high band-discontinuity at a junction interface, a high-electron density may be freed in the interface and thus, an electron mobility may increase.
  • AlGaN aluminum gallium nitride
  • GaN gallium nitride
  • a normally-OFF device that embodies a metal-oxide semiconductor (MOS) HFET by removing an AlGaN layer from a gate portion has been developed.
  • MOS metal-oxide semiconductor
  • the power device may operate vertically and thus, to increase a current density, increasing an area of the AlGaN layer may be needed.
  • a vertically structured field-effect transistor (FET) device using a SiC substrate has been developed.
  • the vertically structured FET device needs an implantation device to implant a carrier, and a process, for example, a heat treatment and the like, to activate a carrier.
  • An aspect of the present invention provides a power device manufacturing method that manufactures a vertically structured power device that is capable of performing a normally-OFF operation.
  • a power device manufacturing method including forming a first drift region on a substrate, forming a trench by patterning the first drift region, forming a second drift region by growing n-gallium nitride (GaN) in the trench, and alternately disposing the first drift region and the second drift region, forming a source electrode contact layer on the second drift region, forming a source electrode and a gate electrode on the source electrode contact layer, and forming a drain electrode on one side of the substrate which is an opposite side of the first drift region.
  • GaN n-gallium nitride
  • the forming of the second drift region may be performed in a temperature range from about 1000 °C to about 1200 °C.
  • the power device manufacturing method may further include forming an n-GaN layer on the second drift region, and a doping concentration of an n-type dopant doped on the n-GaN layer may be higher than the second drift region.
  • the doping concentration of the n-type dopant doped on the n-GaN layer may be in a range from about 1.0 ⁇ 10 17 /cm 3 to about 1.0 ⁇ 10 20 /cm 3 .
  • the first drift region may include at least one of p-GaN and aluminum gallium nitride (AlGaN).
  • the source electrode contact layer may include at least one of an n + -GaN layer and a heterojunction of AlGaN and GaN.
  • the substrate may be selected from n + -GaN, n + -silicone carbide (SiC), sapphire, and silicon (Si).
  • the source electrode may include a material selected from a group consisting of chromium (Cr), aluminum (Al), tantalum (Ta), molybdenum (Mo), tungsten (W), titanium (Ti), and gold (Au).
  • a size of each element in drawings may be exaggerated for ease of description, and does not indicate a real size.
  • FIGS. 1 through 5 describe a power device manufacturing method according to an embodiment of the present invention.
  • the power device manufacturing method may include forming a first drift region 200 on a substrate 100, forming a trench by patterning the first drift region 200, forming a second drift region 400 by growing n-gallium nitride (GaN) in the trench and alternately disposing the first drift region 200 and the second drift region 400, forming a source electrode contact layer 700 on the second drift region 200, forming a gate electrode 910 and source electrodes 920 on the source electrode contact layer 700, and forming a drain electrode 930 on one side of the substrate 100, that is, on an opposite side of the first drift region 200.
  • GaN n-gallium nitride
  • the first drift region 200 may be formed on the substrate 100.
  • the substrate 100 may be an n + -substrate, for example, n + -GaN and n + - silicone nitride (SiC), but the examples may not be limited thereto.
  • the substrate 100 may be an insulating substrate, for example, a glass substrate or a sapphire substrate, or may be a silicon (Si) substrate.
  • the first drift region 200 may be formed by growing p-GaN or aluminum gallium nitride (AlGaN) on the substrate 100.
  • the p-GaN or the AlGaN may be grown based on various schemes, for example, a metal-organic chemical vapor deposition (MOCVD) scheme, a molecular beam epitaxy (MBE) scheme, a hydride vapor phase epitaxy (HVPE) scheme, and the like, so that the first drift region 200 may be formed, however, the examples may not be limited thereto.
  • MOCVD metal-organic chemical vapor deposition
  • MBE molecular beam epitaxy
  • HVPE hydride vapor phase epitaxy
  • the first drift region 200 may operate as a p-type conductive column in a super-junction structure.
  • a passivation layer 300 that performs as an insulating layer, on the first drift region 200.
  • the passivation layer 300 may include a material selected from silicon oxide (SiO x ), silicon nitride (SiN x ), aluminum oxide (Al 2 O 3 ), and SiC.
  • the passivation layer 300 may be used in a process that patterns the first drift region 200 based on a photolithography process.
  • the first drift region 200 may be exposed, and the exposed first drift region 200 may be patterned so as to form a trench.
  • a plurality of trenches may be formed, and a portion where the second drift region 400 is to be formed may be defined.
  • the plurality of trenches may be formed in the patterned first drift region 200. That is, the first drift region 200 and the plurality of trenches may be alternately disposed.
  • the second drift region 400 may be formed by growing n-GaN in the plurality of trenches.
  • the second drift region 400 may be formed by growing n-GaN from the exposed substrate 100 at a lower portion of the plurality of trenches, based on the MOCVD scheme. While n-GaN is grown, a doping concentration of an n-type dopant may be adjusted in the second drift region 400. Since n-GaN is grown in the plurality of trenches, the second drift region 400 and the first drift region 200 may be alternately disposed. Thus, a super-junction structure may be formed.
  • a power device manufactured according to an embodiment of the present invention may have a relatively high withstand voltage since a depletion layer is formed near a p-n junction surface due to the super-junction structure during a p-n junction.
  • a potential difference is locally created as a free electron and a hole are diffused to each other, and the power device is in a state of equilibrium, and thus, the depletion layer that does not contain a carrier may be formed near the p-n junction surface and the withstand voltage may increase.
  • the forming of the second drift region 400 by growing n-GaN may be performed in a temperature range from about 1000 °C to about 1200 °C.
  • n-GaN may be regrown at a high temperature and thus, a crystal may not be damaged and a reliability may be secured.
  • an ion-implantation device and the like may not be additionally used and thus, a process may be simplified and a cost may be reduced.
  • an n-GaN layer 500 that has a higher doping concentration of an n-type dopant than the second drift region 400 may be formed.
  • a doping concentration of the n-GaN layer 500 may be in a range from about 1.0 ⁇ 10 17 /cm 3 to 1.0 ⁇ 10 20 /cm 3 .
  • the n-GaN layer 500 may reduce a resistance, and a two-dimensional electron gas (2-DEG) may not be formed on a portion corresponding to a lower portion of the gate electrode 930 and thus, the power device may be capable of performing a normally-OFF operation.
  • 2-DEG two-dimensional electron gas
  • the source electrode contact layer 700 that may reduce an ohmic resistance occurring when the source electrode contact layer is in a contact with the source electrode 920, may be formed on the n-GaN layer 500 having a higher doping concentration of the n-type dopant than the second drift region 400.
  • the source electrode contact layer 700 may include at least one of n + -GaN and a heterojunction of AlGaN and GaN. That is, an ON-resistance may be reduced by forming the source electrode contact layer 700 from n + -GaN having a high doping concentration of an n-type dopant and thus, a current density may increase.
  • a p-GaN layer 600 may be additionally formed between the source electrode contact layer 700 and the n-GaN layer 500 having a higher doping concentration of the n-type dopant than the second drift region 400.
  • the p-GaN layer 600 may reduce a resistance occurring when the p-GaN layer 600 is in contact with the source electrode contact layer 700, and may increase a current density.
  • a gate insulating layer 800 may be formed after etching the source electrode contact layer 700, the p-GaN layer 600, and an upper portion of the n-GaN layer 500 having a higher doping concentration of the n-type dopant than the second drift region 400.
  • the gate insulating layer 800 may include a material selected from SiO x , SiN x , Al 2 O 3 , hafnium oxide (HfO 2 ), and gallium oxide (Ga 2 O 3 ).
  • the source electrodes 920 may be formed on the source electrode contact layer 700, and the gate electrode 910 may be formed on the insulating layer 800.
  • another insulating layer (not illustrated) may be formed between the source electrodes 920 and the gate electrode 910 and thus, a short occurring between the source electrodes 920 and the gate electrode 910 may be prevented.
  • the source electrodes 920 may be formed on positions corresponding to the source electrode contact layer 700, and may include a material selected from chromium (Cr), aluminum (Al), tantalum (Ta), molybdenum (Mo), tungsten (W), titanium (Ti), and gold (Au).
  • the gate electrode 910 may be formed on a position corresponding to the gate insulating layer 800, and may be formed between the source electrodes 920.
  • the gate electrode 910 may include a material selected from nickel (Ni), Al, Ti, titanium nitride (TiN), platinum (Pt), Au, ruthenium oxide (RuO 2 ), vanadium (V), W, tungsten nitride (WN), hafnium (Hf), hafnium nitride (HfN), Mo, nickel silicide (NiSi), cobalt silicide (CoSi 2 ), tungsten silicide (WSi 2 ), platinum silicide (PtSi), iridium (Ir), zirconium (Zr), Ta, tantalum nitride (TaN), copper (Cu), ruthenium (Ru), cobalt (Co), and combinations thereof.
  • the drain electrode 930 may be formed on one side of the substrate 100, that is, on an opposite side of the first drift region 200.
  • the drain electrode 930 may include a material selected from Cr, Al, Ta, Mo, W, Ti, and Au.
  • the drain electrode 930 may be formed to face the source electrodes 920 and thus, a vertically structured power device may be formed.
  • a process of forming the drain electrode 930 may be different for a type of the substrate 100.
  • various processes of forming the drain electrode 930 based on the type of the substrate 100 will be described.
  • the drain electrode 930 may be directly formed on the substrate 100 without removing the substrate 100.
  • the substrate 100 is a sapphire substrate
  • an n + -GaN layer may be formed on the substrate 100
  • the sapphire substrate may be removed through a laser lift off process
  • the drain electrode 930 may be formed.
  • the substrate 100 is a Si substrate
  • an n + -GaN layer may be formed on the substrate 100
  • the Si substrate may be removed through a wet etching process with a potassium hydroxide (KOH) solution, and the drain electrode 930 may be formed.
  • KOH potassium hydroxide
  • a power device manufactured based on an embodiment of the present invention may grow n-GaN to form a second drift region and thus, a crystal may not be damaged and a reliability may be secured. Also, an ion-implantation device and the like may not be additionally used and thus, a process may be simplified and a cost may be reduced.
  • a first drift region and the second drift region are alternately disposed to form a super-junction structure and thus, a withstand voltage may increase since a depletion layer is formed near a p-n junction surface during a p-n junction. Also, an ON-resistance may be reduced in a source electrode contact layer.
  • An n-GaN layer having a higher doping concentration of an n-type dopant than the second drift region may be formed on the second drift region and thus, the power device may be capable of performing a normally-OFF operation and thus, a power consumption may be reduced.
  • a power device manufacturing method may form a second drift region by growing n-GaN and thus, a crystal may not be damaged and a reliability may be secured. Also, an ion-implantation device and the like may not be additionally used and thus, a process may be simplified and a cost may be reduced.
  • a first drift region and the second drift region are alternately disposed so as to form a super-junction structure of n-GaN and p-GaN and thus, a withstand voltage may increase since a depletion layer is formed between n-GaN and p-GaN when a reverse voltage is applied.
  • a current density may increase by reducing an ON-resistance in a source electrode contact layer.
  • An n-GaN layer having a higher doping concentration of an n-type dopant than the second drift region may be formed on the second drift region, and the power device may be capable of performing a normally-OFF operation and thus, power consumption may be reduced.

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thin Film Transistor (AREA)
EP12175632A 2011-08-01 2012-07-10 Verfahren zur Herstellung einer Leistungsvorrichtung Withdrawn EP2555230A2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110076559A KR20130014850A (ko) 2011-08-01 2011-08-01 파워소자의 제조방법

Publications (1)

Publication Number Publication Date
EP2555230A2 true EP2555230A2 (de) 2013-02-06

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EP12175632A Withdrawn EP2555230A2 (de) 2011-08-01 2012-07-10 Verfahren zur Herstellung einer Leistungsvorrichtung

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Country Link
US (1) US8815688B2 (de)
EP (1) EP2555230A2 (de)
KR (1) KR20130014850A (de)
CN (1) CN102915928A (de)

Cited By (2)

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WO2020088844A1 (de) * 2018-10-31 2020-05-07 Robert Bosch Gmbh Isolierschicht-feldeffekttransistor
CN114203797A (zh) * 2021-11-29 2022-03-18 西安电子科技大学 基于异质结的超结氧化镓晶体管及其制作方法与应用

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CN103531615A (zh) * 2013-10-15 2014-01-22 苏州晶湛半导体有限公司 氮化物功率晶体管及其制造方法
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WO2020181548A1 (zh) 2019-03-14 2020-09-17 中国科学院微电子研究所 GaN基超结型垂直功率晶体管及其制作方法

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020088844A1 (de) * 2018-10-31 2020-05-07 Robert Bosch Gmbh Isolierschicht-feldeffekttransistor
CN114203797A (zh) * 2021-11-29 2022-03-18 西安电子科技大学 基于异质结的超结氧化镓晶体管及其制作方法与应用

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Publication number Publication date
US20130034939A1 (en) 2013-02-07
KR20130014850A (ko) 2013-02-12
CN102915928A (zh) 2013-02-06
US8815688B2 (en) 2014-08-26

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