EP2252721B1 - Body coated with hard material - Google Patents

Body coated with hard material Download PDF

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Publication number
EP2252721B1
EP2252721B1 EP09718954.2A EP09718954A EP2252721B1 EP 2252721 B1 EP2252721 B1 EP 2252721B1 EP 09718954 A EP09718954 A EP 09718954A EP 2252721 B1 EP2252721 B1 EP 2252721B1
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Prior art keywords
layer
layers
hard material
hard
coated body
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EP09718954.2A
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German (de)
French (fr)
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EP2252721A1 (en
Inventor
Hendrikus Van Den Berg
Hartmut Westphal
Volkmar Sottke
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Kennametal Inc
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Kennametal Inc
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Application filed by Kennametal Inc filed Critical Kennametal Inc
Priority to PL09718954T priority Critical patent/PL2252721T3/en
Priority to EP15185878.4A priority patent/EP3031948B1/en
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick

Definitions

  • the invention relates to a hard-coated body with a plurality of CVD applied hard material layers.
  • the cutting material should be resistant to abrasion, which at an early stage has led to hard metal or cermet substrate bodies being provided with surface coatings, with carbides, nitrides or carbonitrides of titanium and later aluminum oxide layers being used as wear protection layers.
  • hard metal or cermet substrate bodies being provided with surface coatings, with carbides, nitrides or carbonitrides of titanium and later aluminum oxide layers being used as wear protection layers.
  • multi-layer wear protection layers of different hard materials As wear-reducing layers, for example, aluminum oxide layers are known, which are arranged on one or more intermediate layers such as titanium carbonitride or titanium nitride.
  • Ti-Al-N layer which can be produced as a monophase layer with aluminum contents up to 60% by PVD. At higher aluminum contents, however, a mixture of cubic and hexagonal TiAlN is formed, and with even higher proportions of aluminum, only the softer and not wear-resistant hexagonal wurtzite structure is produced.
  • PVD plasma CVD
  • plasma CVD requires high plasma homogeneity because the plasma power density has a direct bearing on the Ti / Al atomic ratio of the layer.
  • the production of single-phase cubic Ti 1-x Al x -N layers with a high aluminum content is not possible with the industrially used PVD processes.
  • WO 2007/003648 A1 in order to improve the wear resistance and the oxidation resistance, it is proposed to produce a hard-coated body with a single or multilayer coating system by CVD containing at least one Ti 1-x Al x N hard material layer, including the body in a reactor at temperatures in the range of 700 ° C to 900 ° C by CVD without plasma excitation is coated and should be used as precursors titanium hallogenides, aluminum halides and reactive nitrogen compounds, which are mixed at elevated temperature.
  • the chlorine content is in the range between 0.05 to 0.9 at%. It is also known from this document that the Ti 1-x Al x N hard-material layer or layers can contain up to 30% by mass of amorphous layer constituents.
  • the hardness value of the layers obtained is in the range of 2,500 HV to 3,800 HV.
  • the layer system applied to a substrate body consists of a titanium nitride, titanium carbonitride or titanium carbide bonding layer applied to the body, followed by a phase gradient layer and finally an outer layer of a single- or multi-phase Ti 1-x Al x N hard-material layer.
  • the phase gradient layer consists of a TiN / h-AlN phase mixture on its side facing the connection layer and, with increasing layer thickness, has an increasing phase fraction of fcc-TiAIN with a proportion of more than 50% and, concomitantly, a simultaneous decrease in the phase proportions of TiN and h- AlN on.
  • the thermal resistance of the coating is of great importance for the application of this material during machining operations, in particular at high cutting speeds.
  • temperatures are well above 1,000 ° C. At such temperatures, different coefficients of expansion that exist for the substrates between the individual layers, significantly. This leads to the formation of stresses between the individual layers and, if the high temperature is transported by heat conduction from the outer layer to the substrate body, in the worst case to a detachment of the coating, making the cutting insert is unusable.
  • Ti 1-x Al x N, Ti 1-x Al x C or Ti 1-x Al x CN layer instead of a TiCN layer commonly used in the prior art has the advantage that the thermal conductivity in the layer disposed below the Al 2 O 3 layer is about 80% smaller, so that the Ti 1-x Al x N, Ti 1-x Al x C or -CN layer as significantly improved thermal insulation for Substrate body proves.
  • the outer Al 2 O 3 layer is also more resistant to oxidation and harder by about 50% compared to a TiCN outer layer, resulting in a higher wear resistance.
  • the Ti 1-x Al x CN, Ti 1-x Al x C or Ti 1-x Al x N layer may be single-phase and have a cubic structure or be multi-phase, and in addition to a main cubic phase another phase in wurtzite structure and / or have TiN. Up to 30 mass% may contain amorphous layer constituents. The chlorine content is between 0.01 to 3 At%.
  • a TiN and / or TiCN layer can be used as a bonding layer to the substrate body, which consists of a hard metal, a cermet or a ceramic, so that the sequence of layers from inside to outside TiN or TiCN TiAlC (N) -Al 2 O 3 is.
  • TiCN layers are also present between the Al 2 O 3 outer layer and the Ti 1-x Al x N layer, Ti 1-x Al x C layer or the Ti 1-x Al x CN layer possible.
  • the aluminum content as metal content is preferably between 70% and 90%.
  • the layer thickness of a Ti 1-x Al x N layer, Ti 1-x Al x C layer or a Ti 1-x Al x CN layer may vary between 2 ⁇ m to 10 ⁇ m, preferably 3 ⁇ m to 7 ⁇ m.
  • the aforementioned layer may also contain proportions of hexagonal aluminum nitride, at most 25%.
  • TiAlN / TiAlCN / TiAlC alternating layer then has a total thickness resulting from the sum of the thicknesses of each individual layer, which is between 1 nm and 5 nm.
  • the total thickness should be at least 1 micron to 5 microns.
  • Ti 1-x Al x N or Ti 1-x Al x CN or Ti 1-x Al x C successively until reaching the desired total thickness of between 1 micron and 5 microns applied.
  • the TiAlN, TiAIC or TiAICN layer can contain up to 30% amorphous constituents and chlorine contents up to 3 at%.
  • the consisting of a hard metal, a cermet or a ceramic substrate body is subjected to a CVD coating at coating temperatures between 650 ° C and 900 ° C, wherein in the gas atmosphere titanium and aluminum chlorides and ammonia are introduced to produce a TiAIN layer.
  • a first between 2 .mu.m and 10 .mu.m preferably 3 microns to 7 microns thick layer is applied in a conventional manner by means of the CVD method at least 2 microns maximum 10 microns thick Al 2 O 3 layer.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Carbon And Carbon Compounds (AREA)

Description

Die Erfindung betrifft einen hartstoffbeschichteten Körper mit mehreren mittels CVD aufgetragenen Hartstoffschichten.The invention relates to a hard-coated body with a plurality of CVD applied hard material layers.

An Schneidwerkzeuge, die für die zerspanende Bearbeitung verwendet werden, werden hohe Anforderungen hinsichtlich der Standfestigkeit und der Belastbarkeit gestellt, insbesondere bei der Zerspanung harter oder zäher Materialien wie vergüteten bzw. gehärteten Stählen durch Drehen mit hohen Schnittgeschwindigkeiten. Der Schneidwerkstoff soll insbesondere abrasionsbeständig sein, was bereits frühzeitig dazu führte, dass Hartmetall- oder Cermetsubstratkörper mit Oberflächenbeschichtungen versehen worden sind, wobei zunächst Carbide, Nitride oder Carbonitride des Titans und später auch Aluminiumoxidschichten als Verschleißschutzschichten verwendet worden sind. Bekannt sind auch mehrlagige Verschleißschutzschichten aus unterschiedlichen Hartstoffen. Als verschleißmindernde Schichten sind beispielsweise Aluminiumoxidschichten bekannt, die auf einer oder mehreren Zwischenlagen wie beispielsweise Titancarbonitrid oder Titannitrid angeordnet sind.High demands are placed on cutting tools and tools used for machining operations, especially in the machining of hard or tough materials such as tempered or hardened steels by turning at high cutting speeds. In particular, the cutting material should be resistant to abrasion, which at an early stage has led to hard metal or cermet substrate bodies being provided with surface coatings, with carbides, nitrides or carbonitrides of titanium and later aluminum oxide layers being used as wear protection layers. Also known are multi-layer wear protection layers of different hard materials. As wear-reducing layers, for example, aluminum oxide layers are known, which are arranged on one or more intermediate layers such as titanium carbonitride or titanium nitride.

Aus der WO 03/085152 A2 ist die Verwendung einer Ti-Al-N-Schicht bekannt, die als monophasige Schicht mit Aluminiumgehalten bis 60% mittels PVD erzeugt werden kann. Bei höheren Aluminiumgehalten entsteht allerdings ein Gemisch aus kubischen und hexagonalen TiAlN und bei noch höheren Aluminiumanteilen nur noch die weichere und nicht verschleißfeste hexagonale Wurtzitstrucktur.From the WO 03/085152 A2 the use of a Ti-Al-N layer is known, which can be produced as a monophase layer with aluminum contents up to 60% by PVD. At higher aluminum contents, however, a mixture of cubic and hexagonal TiAlN is formed, and with even higher proportions of aluminum, only the softer and not wear-resistant hexagonal wurtzite structure is produced.

Es ist auch bekannt, dass mittels Plasma-CVD einphasige Ti1-xAlx-N-Hartstoffschichten mit x= 0,9 herstellbar sind. Nachteilig sind jedoch hierbei die unzureichende Homogenität der Schichtzusammensetzung und der relativ hohe Chlorgehalt in der Schicht.It is also known that one-phase Ti 1-x Al x -N hard material layers with x = 0.9 can be produced by means of plasma CVD. However, the disadvantages here are the insufficient homogeneity of the layer composition and the relatively high chlorine content in the layer.

Soweit für die Herstellung von Ti1-xAlxN-Hartstoffschichten PVD- oder Plasma-CVD-Verfahren eingesetzt wurden, war deren Anwendung auf Temperaturen unter 700°C beschränkt. Nachteilig ist, dass die Beschichtung komplizierter Bauteilgeometrien Schwierigkeiten bereitet. PVD ist ein gerichteter Prozess, bei dem komplexe Geometrien unregelmäßig beschichtet werden. Das Plasma-CVD erfordert eine hohe Plasmahomogenität, da die Plasmaleistungsdichte einen direkten Einschluss auf das Ti/Al-Atomverhältnis der Schicht hat. Die Herstellung einphasiger kubischer Ti1-xAlx-N-Schichten mit hohem Aluminiumanteil ist mit den industriell eingesetzten PVD-Verfahren nicht möglich.Insofar as PVD or plasma CVD processes were used for the production of Ti 1-x Al x N hard coatings, their application was limited to temperatures below 700 ° C. The disadvantage is that the coating of complicated component geometries Difficulties. PVD is a directed process in which complex geometries are coated irregularly. Plasma CVD requires high plasma homogeneity because the plasma power density has a direct bearing on the Ti / Al atomic ratio of the layer. The production of single-phase cubic Ti 1-x Al x -N layers with a high aluminum content is not possible with the industrially used PVD processes.

Auch eine TiAI-Abscheidung mit einem konventionellen CVD-Verfahren bei Temperaturen über 1.000°C ist nicht möglich, da das methastabilie Ti1-xAlxN bei solch hohen Temperaturen in TiN und hexagonalem AIN zerfällt.Also, a TiAl deposition with a conventional CVD method at temperatures above 1000 ° C is not possible because the methastable Ti 1-x Al x N decomposes at such high temperatures in TiN and hexagonal AIN.

Schließlich ist bei dem in der US 6,238,739 B1 beschriebenen Verfahren, durch einen thermischen CVD-Prozess ohne Plasmaunterstützung Ti1-xAlxN-Schichten mit x zwischen 0,1 und 0,6 bei Temperaturen zwischen 550°C und 650°C herzustellen, eine Eingrenzung auf kleinere Aluminiumgehalte mit x ≤0,6 gegeben. Als Gasmischung werden in dem dort beschriebenen Prozess Aluminium- und Titanchloride sowie NH3 und H2 verwendet. Auch bei dieser Beschichtung sind hohe Chlorgehalte bis zu 12 At% in Kauf zu nehmen.Finally, in the case of US 6,238,739 B1 to produce Ti 1-x Al x N layers with x between 0.1 and 0.6 at temperatures between 550 ° C and 650 ° C by a thermal CVD process without plasma assisting, a limitation to smaller aluminum contents with x ≤ 0.6 given. As the gas mixture, aluminum and titanium chlorides as well as NH 3 and H 2 are used in the process described there. Also with this coating high chlorine contents up to 12 At% are to be accepted.

In der WO 2007/003648 A1 wird zur Verbesserung der Verschleißfestigkeit und der Oxidationsbeständigkeit vorgeschlagen, einen hartstoffbeschichteten Körper mit einem ein- oder mehrlagigen Schichtsystem mittels CVD herzustellen, das mindestens eine Ti1-xAlxN-Hartstoffschicht enthält, wozu der Körper in einem Reaktor bei Temperaturen im Bereich von 700°C bis 900°C mittels CVD ohne Plasmaanregung beschichtet wird und als Precursoren Titanhallogenide, Aluminiumhallogenide und reaktive Stickstoffverbindungen Verwendung finden sollen, die bei erhöhter Temperatur gemischt werden. Im Ergebnis wird ein Körper mit einer einphasigen Ti1-xAlxN-Hartstoffschicht in der kubischen NaCl-Struktur mit einem Stöchiometriekoeffizienten x > 0,75 bis x = 0,93 oder eine mehrphasige Schicht erhalten, deren Hauptphase aus Ti1-xAlxN mit kubischer NaCl-Struktur mit einem Stöchiometriekoeffizienten x > 0,75 bis x = 0,93 und als weitere Phase eine Wurtzitstruktur und/oder TiNxNaCl-Struktur besitzt. Der Chlorgehalt liegt im Bereich zwischen 0,05 bis 0,9 At%. Aus diesem Dokument ist auch bekannt, dass die Ti1-xAlxN-Hartstoffschicht oder Schichten bis zu 30 Massen% amorphe Schichtbestandteile enthalten können. Der Härtewert der erhaltenen Schichten liegt im Bereich 2.500 HV bis 3.800 HV.In the WO 2007/003648 A1 For example, in order to improve the wear resistance and the oxidation resistance, it is proposed to produce a hard-coated body with a single or multilayer coating system by CVD containing at least one Ti 1-x Al x N hard material layer, including the body in a reactor at temperatures in the range of 700 ° C to 900 ° C by CVD without plasma excitation is coated and should be used as precursors titanium hallogenides, aluminum halides and reactive nitrogen compounds, which are mixed at elevated temperature. As a result, a body having a single-phase Ti 1-x Al x N hard material layer in the cubic NaCl structure having a stoichiometric coefficient x> 0.75 to x = 0.93 or a multi-phase layer whose main phase is Ti 1-x is obtained Al x N with cubic NaCl structure with a stoichiometric coefficient x> 0.75 to x = 0.93 and has as a further phase a wurtzite structure and / or TiN x NaCl structure. The chlorine content is in the range between 0.05 to 0.9 at%. It is also known from this document that the Ti 1-x Al x N hard-material layer or layers can contain up to 30% by mass of amorphous layer constituents. The hardness value of the layers obtained is in the range of 2,500 HV to 3,800 HV.

Um die Haftung einer Ti1-xAlxN-Hartstoffschicht bei hoher Verschleißfestigkeit zu verbessern, wird in der nicht vorveröffentlichten DE 10 2007 000 512 zudem vorgeschlagen, dass das auf einen Substratkörper aufgetragene Schichtsystem aus einer auf den Körper aufgebrachten Anbindungsschicht aus Titannitrid, Titancarbonitrid oder Titancarbid besteht, worauf eine Phasengradientenschicht folgt und schließlich eine Außenlage aus einer ein- oder mehrphasigen Ti1-xAlxN-Hartstoffschicht. Die Phasengradientenschicht besteht an ihrer der Anbindungsschicht zugewandten Seite aus einem TiN/h-AIN-Phasengemisch und weist mit zunehmender Schichtdicke einen zunehmenden Phasenanteil von fcc-TiAIN mit einem Anteil von mehr als 50% und damit einhergehend simultaner Abnahme der Phasenanteile von TiN und h-AlN auf.In order to improve the adhesion of a Ti 1-x Al x N hard material layer with high wear resistance, is in the non-prepublished DE 10 2007 000 512 Furthermore, it is proposed that the layer system applied to a substrate body consists of a titanium nitride, titanium carbonitride or titanium carbide bonding layer applied to the body, followed by a phase gradient layer and finally an outer layer of a single- or multi-phase Ti 1-x Al x N hard-material layer. The phase gradient layer consists of a TiN / h-AlN phase mixture on its side facing the connection layer and, with increasing layer thickness, has an increasing phase fraction of fcc-TiAIN with a proportion of more than 50% and, concomitantly, a simultaneous decrease in the phase proportions of TiN and h- AlN on.

Neben der Abrasions- und Oxidationsbeständigkeit einer Schicht auf einem Hartmetall-, Cermet- oder Substratkörper ist für die Anwendung dieses Werkstoffes bei zerspanenden Bearbeitungen, insbesondere bei hohen Schnittgeschwindigkeiten die thermische Beständigkeit der Beschichtung von großer Bedeutung. Im Bereich einer Schneidkante eines Schneideinsatzes entstehen beim Drehen von harten Werkstücken Temperaturen, die deutlich oberhalb von 1.000°C liegen. Bei solchen Temperaturen wirken sich unterschiedliche Ausdehnungskoeffizienten, die für die Substrate zwischen den einzelnen Lagen bestehen, erheblich aus. Hierbei kommt es zur Ausbildung von Spannungen zwischen den einzelnen Lagen und, sofern durch Wärmeleitung die hohe Temperatur von der äußeren Schicht bis zum Substratkörper transportiert wird, im ungünstigsten Falle zu einem Ablösen der Beschichtung, womit der Schneideinsatz unbrauchbar wird.In addition to the abrasion and oxidation resistance of a layer on a hard metal, cermet or substrate body, the thermal resistance of the coating is of great importance for the application of this material during machining operations, in particular at high cutting speeds. In the area of a cutting edge of a cutting insert, when turning hard workpieces, temperatures are well above 1,000 ° C. At such temperatures, different coefficients of expansion that exist for the substrates between the individual layers, significantly. This leads to the formation of stresses between the individual layers and, if the high temperature is transported by heat conduction from the outer layer to the substrate body, in the worst case to a detachment of the coating, making the cutting insert is unusable.

Es ist somit Aufgabe der vorliegenden Erfindung, einen hartstoffbeschichteten Körper zu schaffen, dessen Beschichtung durch Auswahl der einzelnen Schichten eine bessere thermische Isolationswirkung hinsichtlich des Wärmetransportes hat.It is therefore an object of the present invention to provide a hardstoffbeschichteten body whose coating has a better thermal insulation effect in terms of heat transfer by selecting the individual layers.

Diese Aufgabe wird durch einen hartstoffbeschichteten Körper nach Anspruch 1 gelöst. Der hartstoffbeschichtete Körper besitzt mehrere Schichten, wobei auf einer Ti1-xAlxN- und/oder Ti1-xAlxC und/oder einer Ti1-xAlxCN-Schicht mit x = 0,65 bis 0,95 eine Al2O3-Schicht als Außenschicht angeordnet ist, wobei jede der genannten Schichten mittels CVD aufgetragen worden ist.This object is achieved by a hard-coated body according to claim 1. The hard-coated body has several layers, wherein on a Ti 1-x Al x N and / or Ti 1-x Al x C and / or a Ti 1-x Al x CN layer with x = 0.65 to 0, 95 an Al 2 O 3 layer is disposed as an outer layer, wherein each of said layers has been applied by CVD.

Die Verwendung einer Ti1-xAlxN-, Ti1-xAlxC- oder Ti1-xAlxCN-Schicht anstelle einer nach dem Stand der Technik allgemein verwendeten TiCN-Schicht hat den Vorteil, dass die Wärmeleitfähigkeit in der unterhalb der Al2O3-Schicht angeordneten Schicht um etwa 80% geringer ist, so dass sich die Ti1-xAlxN-, Ti1-xAlxC- oder -CN-Schicht als signifikant verbesserte thermische Isolation zum Substratkörper erweist. Die äußere Al2O3-Schicht ist auch oxidationsbeständiger und im Vergleich zu einer TiCN-Außenlage um ca. 50% härter, so dass sich eine höhere Verschleißbeständigkeit ergibt.The use of a Ti 1-x Al x N, Ti 1-x Al x C or Ti 1-x Al x CN layer instead of a TiCN layer commonly used in the prior art has the advantage that the thermal conductivity in the layer disposed below the Al 2 O 3 layer is about 80% smaller, so that the Ti 1-x Al x N, Ti 1-x Al x C or -CN layer as significantly improved thermal insulation for Substrate body proves. The outer Al 2 O 3 layer is also more resistant to oxidation and harder by about 50% compared to a TiCN outer layer, resulting in a higher wear resistance.

Überraschender Weise ist darüber hinaus festgestellt worden, dass eine Ti1-xAlxN-, Ti1-xAlxC- oder -CN-Schicht als Zwischenlage im Vergleich zu TiN- oder TiCN-Zwischenlage keine Rissneigung besitzt, so dass sich das nach dem Stand der Technik nachteilig auswirkende typische Rissnetz nicht ausbildet. Insbesondere bei unterbrochenem Schnitt wirkt sich der verbesserte Rissbildungswiderstand standzeiterhöhend aus.Surprisingly, it has also been found that a Ti 1-x Al x N, Ti 1-x Al x C or -CN layer as an intermediate layer in comparison to TiN or TiCN intermediate layer has no tendency to crack, so that does not form the typical crack network which adversely affects the state of the art. In particular, with interrupted cut, the improved cracking resistance has a life-time increasing effect.

Die Ti1-xAlxCN-, Ti1-xAlxC- oder die Ti1-xAlxN-Schicht kann einphasig sein und eine kubische Struktur aufweisen oder mehrphasig sein und neben einer kubischen Hauptphase eine weitere Phase in Wurtzitstruktur und/oder TiN aufweisen. Bis zu 30 Massen% können amorphe Schichtbestandteile enthalten sein. Der Chlorgehalt liegt zwischen 0,01 bis zu 3 At%.The Ti 1-x Al x CN, Ti 1-x Al x C or Ti 1-x Al x N layer may be single-phase and have a cubic structure or be multi-phase, and in addition to a main cubic phase another phase in wurtzite structure and / or have TiN. Up to 30 mass% may contain amorphous layer constituents. The chlorine content is between 0.01 to 3 At%.

Nach einer Weiterbildung der Erfindung kann eine TiN- und/oder TiCN-Schicht als Anbindungsschicht an den Substratkörper, der aus einem Hartmetall, einem Cermet oder einer Keramik besteht, verwendet werden, so dass die Schichtfolge von innen nach außen TiN- oder TiCN-TiAlC(N)-Al2O3 lautet.According to a development of the invention, a TiN and / or TiCN layer can be used as a bonding layer to the substrate body, which consists of a hard metal, a cermet or a ceramic, so that the sequence of layers from inside to outside TiN or TiCN TiAlC (N) -Al 2 O 3 is.

Im Rahmen der vorliegenden Erfindung sind auch zwischen der Al2O3-Außenschicht und der Ti1-xAlxN-Schicht, Ti1-xAlxC-Schicht oder der Ti1-xAlxCN-Schicht TiCN-Schichten möglich.In the context of the present invention, TiCN layers are also present between the Al 2 O 3 outer layer and the Ti 1-x Al x N layer, Ti 1-x Al x C layer or the Ti 1-x Al x CN layer possible.

Vorzugsweise liegt der Aluminiumanteil als Metallanteil zwischen 70% und 90%. Die Schichtdicke einer Ti1-xAlxN-Schicht, Ti1-xAlxC-Schicht oder einer Ti1-xAlxCN-Schicht kann zwischen 2 µm bis 10 µm, vorzugsweise 3 µm bis 7 µm variieren. Die vorgenannte Schicht kann auch Anteile an hexagonalem Aluminiumnitrid enthalten, maximal 25%.The aluminum content as metal content is preferably between 70% and 90%. The layer thickness of a Ti 1-x Al x N layer, Ti 1-x Al x C layer or a Ti 1-x Al x CN layer may vary between 2 μm to 10 μm, preferably 3 μm to 7 μm. The aforementioned layer may also contain proportions of hexagonal aluminum nitride, at most 25%.

Im Rahmen der vorliegenden Erfindung ist es auch möglich, anstelle einer einzigen Zwischenlage eine mehrlagige Schicht aus ein- oder mehreren Doppellagen oder Dreifachlagen des Typs (Ti1-xAlxN, Ti1-xAlxC, Ti1-xAlxCN)n mit n = natürlicher Zahl anzuordnen. Die TiAlN/TiAlCN/TiAlC-Wechseischicht besitzt dann eine Gesamtdicke, die sich aus der Summe der Dicken jeder einzelnen Schicht ergibt, welche zwischen 1 nm bis 5 nm liegt. Vorzugsweise sollte die Gesamtdicke mindestens 1 µm bis 5 µm betragen. Im einfachsten Fall werden jeweils dünne, lediglich einige nm-dicke Einzellagen aus Ti1-xAlxN oder Ti1-xAlxCN oder Ti1-xAlxC nacheinander bis zum Erreichen der gewünschten Gesamtdicke zwischen 1 µm und 5 µm aufgetragen. Es ist jedoch auch ein alternierendes Schichtsystem aus den vorgenannten Zusammensetzungen möglich, einschließlich solcher Schichten, die Lagen mit einem Gradientenverlauf besitzen, bei dem der C-Anteil nach außen sinkt oder steigt.In the context of the present invention, it is also possible, instead of a single intermediate layer, to use a multilayered layer of one or more double layers or triple layers of the type (Ti 1-x Al x N, Ti 1-x Al x C, Ti 1-x Al x CN) n with n = natural number. The TiAlN / TiAlCN / TiAlC alternating layer then has a total thickness resulting from the sum of the thicknesses of each individual layer, which is between 1 nm and 5 nm. Preferably, the total thickness should be at least 1 micron to 5 microns. In the simplest case, each thin, only a few nm-thick individual layers of Ti 1-x Al x N, or Ti 1-x Al x CN or Ti 1-x Al x C successively until reaching the desired total thickness of between 1 micron and 5 microns applied. However, it is also possible to use an alternating layer system of the abovementioned compositions, including those layers which have layers with a gradient profile in which the C content decreases or increases to the outside.

Die TiAlN-, TiAIC- oder TiAICN-Schicht kann bis zu 30% amorphe Bestandteile und Chlorgehalte bis zu 3 At% beinhalten.The TiAlN, TiAIC or TiAICN layer can contain up to 30% amorphous constituents and chlorine contents up to 3 at%.

Zur Herstellung wird der aus einem Hartmetall, einem Cermet oder einer Keramik bestehende Substratkörper einer CVD-Beschichtung bei Beschichtungstemperaturen zwischen 650°C und 900°C unterzogen, wobei in die Gasatmosphäre Titan- und Aluminiumchloride sowie Ammoniak zur Herstellung einer TiAIN-Schicht eingeleitet werden. Nach Herstellung einer ersten zwischen 2 µm und 10 µm, vorzugsweise 3 µm bis 7 µm dicken Schicht wird in konventioneller Weise mittels des CVD-Verfahrens eine mindestens 2 µm maximal 10 µm dicke Al2O3-Schicht aufgetragen.For the production, the consisting of a hard metal, a cermet or a ceramic substrate body is subjected to a CVD coating at coating temperatures between 650 ° C and 900 ° C, wherein in the gas atmosphere titanium and aluminum chlorides and ammonia are introduced to produce a TiAIN layer. After preparation of a first between 2 .mu.m and 10 .mu.m, preferably 3 microns to 7 microns thick layer is applied in a conventional manner by means of the CVD method at least 2 microns maximum 10 microns thick Al 2 O 3 layer.

Claims (7)

  1. Hard material-coated body with several hard-material layers applied by means of CVD,
    characterized in that
    an Al2O3 layer is arranged as an outer layer on a Ti1-xAlxN layer and/or Ti1-xAlxC layer and/or Ti1-xAlxCN layer, with = 0.65 to 0.95,
    wherein each of the named layers was applied by means of CVD.
  2. Hard material-coated body according to claim 1, characterized by a TiN and/or TiCN layer as a bonding layer to the substrate body, consisting of hard metal, a cermet or a ceramic.
  3. Hard material-coated body according to claim 1 or 2, characterized in that a TiCN layer is arranged between the Al2O3 outer layer and the Ti1-xAlxN layer, Ti1-xAlxC layer or Ti1-xAlxCN layer.
  4. Hard material-coated body according to any of claims 1 through 3, characterized in that in the Ti1-xAlxN layer, Ti1-xAlxC layer or Ti1-xAlxCN layer, 0.7 ≤ x ≤0.9.
  5. Hard material-coated body according to any of claims 1 through 4, characterized in that underneath an Al2O3 layer is arranged a multilayer layer consisting of one or more double or triple layers from the group (Ti1-xAlxN, Ti1-xAlxCN, Ti1-xAlxC)n.
  6. Hard material-coated body according to any of claims 1 through 5, characterized in that the thickness of the outer layer is from 1 µm to 5 µm, the thickness of the Ti1-xAlxN, Ti1-xAlxC or Ti1-xAlxCN layer is from 1 µm to 5 µm and the thickness of any other bonding or intermediate layers is between 1 µm and 5 µm.
  7. Hard material-coated body according to any of claims 1 through 6, characterized in that the Ti1-xAlxN, Ti1-xAlxC or Ti1-xAlxCN layer contains no more than 25% hexagonal AIN.
EP09718954.2A 2008-03-12 2009-01-20 Body coated with hard material Active EP2252721B1 (en)

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EP2252721A1 (en) 2010-11-24
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CA2717187C (en) 2015-11-17
ES2561597T3 (en) 2016-02-29
EP3031948B1 (en) 2017-03-15
BRPI0908924B1 (en) 2024-01-23
US20100323176A1 (en) 2010-12-23
CN103834928B (en) 2016-11-02
RU2491368C2 (en) 2013-08-27
CN101970717A (en) 2011-02-09
JP2011516722A (en) 2011-05-26
JP5863241B2 (en) 2016-02-16
KR20100122918A (en) 2010-11-23
CN103834928A (en) 2014-06-04
WO2009112115A1 (en) 2009-09-17
PL2252721T3 (en) 2016-02-29
ES2628524T3 (en) 2017-08-03
PL3031948T3 (en) 2017-07-31
US8389134B2 (en) 2013-03-05
MX2010009890A (en) 2010-09-30
CA2717187A1 (en) 2009-09-17
RU2010141746A (en) 2012-04-20
DE102008013965A1 (en) 2009-09-17

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