EP2242339B1 - Gasinjektionssystem für eine Partikeltherapieanlage, Verfahren zum Betrieb eines solchen Gasinjektionssystems, und Partikeltherapieanlage umfassend das Gasinjektionssystem - Google Patents

Gasinjektionssystem für eine Partikeltherapieanlage, Verfahren zum Betrieb eines solchen Gasinjektionssystems, und Partikeltherapieanlage umfassend das Gasinjektionssystem Download PDF

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Publication number
EP2242339B1
EP2242339B1 EP10155350.1A EP10155350A EP2242339B1 EP 2242339 B1 EP2242339 B1 EP 2242339B1 EP 10155350 A EP10155350 A EP 10155350A EP 2242339 B1 EP2242339 B1 EP 2242339B1
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EP
European Patent Office
Prior art keywords
line
gas
injection system
valve
gas injection
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP10155350.1A
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German (de)
English (en)
French (fr)
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EP2242339A2 (de
EP2242339A3 (de
Inventor
Thomas Uhl
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Siemens Healthcare GmbH
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Siemens Healthcare GmbH
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Publication date
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Publication of EP2242339A3 publication Critical patent/EP2242339A3/de
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H05H2007/081—Sources
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86493—Multi-way valve unit

Definitions

  • the invention relates to a gas injection system for a particle therapy system and to a method for operating such a gas injection system.
  • Gas injection devices or gas injection systems for the targeted introduction of gas into an ionization chamber are known from various technical fields and, for example, in the publications JP 2009 054 445 A . JP H02 12748 A . EP 0 185 926 A2 . US 2006/192103 A1 . US 2006/093754 A1 . JP S59 9500 U described. However, special requirements are placed on a gas injection system for a particle therapy system.
  • a particle beam is made of, for example, protons or heavy ions, e.g. Carbon ions generated.
  • the particle beam is generated in an accelerator and fed into a treatment room and enters there via an exit window.
  • the particle beam can be directed by the accelerator alternately into different treatment rooms.
  • a patient to be treated is e.g. positioned on a patient table and immobilized if necessary.
  • the accelerator contains an ion source, for example an electron cyclotron resonance ion source (ECR ion source).
  • ECR ion source an electron cyclotron resonance ion source
  • a directed movement of free ions with a certain energy distribution is generated.
  • positively charged ions such as protons or carbon ions
  • the reason for this is that they can be brought to high energies with the help of the accelerator and on the other hand they give their energy in the body tissue very precise again.
  • the particles generated in the ion source travel in a synchrotron ring with more than 50 MeV / u in a circular path.
  • a pulsed particle beam with exactly predefined energy, focus and intensity is delivered for the therapy.
  • a gas which is to be ionized is introduced into the ion source.
  • a highly accurate and constant gas flow of the supplied gas is required.
  • different gases e.g. Carbon dioxide or hydrogen
  • separate lines are provided for the gas streams, which open into the ion source.
  • the flow rates depend on the type of gas selected and are generally below 1 sccm (standard cubic centimeters per minute), for carbon dioxide in a sputtering ion source, e.g. at 0.002sccm. And for an EZR ion source, e.g. at about 0.3sccm.
  • the invention has for its object to enable the fastest possible switching between the different gases that are introduced into the ion source.
  • the object is achieved by a gas injection system according to claim 1.
  • An important advantage of the gas injection system is that, thanks to the multi-way switching valve, to which both the second and the third line are connected, a particularly fast switching between these lines takes place, so that alternately the gas flow from the second or from the third line is introduced into the first line or in the ion source.
  • the time for switching in such a valve is less than 1 second and less than 5 seconds, the gas flow in the first line is stable.
  • a new constant gas flow can be set and the type of ions in the particle beam can be changed without having to clean the system when the operating gas is changed.
  • valve By switching valve is here understood a valve that alternately without mixing the two gas streams the one or fluidly connects the other input to the output. There is therefore a quasi-digital switching between the gas streams.
  • Another advantage of using the reusable switching valve is that only one line is required, through which alternating different gas flows are introduced into the ion source, so that there is a reduction in space requirements.
  • each of the second line and the third line fluidly connected upstream of a needle valve and the second and third line are at least partially formed of capillaries, in particular of glass capillaries, for adjusting the volume flow.
  • the gas in the system passes to the ion source due to the vacuum prevailing in the ion source.
  • 1 bar 1 000 000 Pa, for example, of 200000 Pa (2 bar) provided.
  • the capillaries are provided.
  • the properties of the capillary such as length and inner diameter, taking into account the pressure on the high pressure side (200,000 Pa and 2 bar) and the low pressure side (0 Pa or 0 bar) are chosen so that the desired pressure drop occurs along the capillaries.
  • the gas flow is kept constant due to the constant pressure difference between the high pressure side and the vacuum in the ion source.
  • the glass capillary is generally a passive-acting throttle body, which is insensitive to external influences, such as temperature fluctuations.
  • the Capillaries are the narrowest areas of the conduits and have an outer diameter ⁇ 1mm and in particular ⁇ 0.5mm and a length of several decimeters or several meters.
  • the capillaries open into the fittings or into a conduit section with a larger diameter, wherein the flow rate of the gas, which is adjusted by a capillary, remains constant downstream. Since the pressure drop across the capillaries is controlled in the gas injection system, the settings do not have to be checked after replacing a valve and no fine adjustment is required, ie the parameter settings of the system are highly reproducible.
  • a control system determines from the geometric data of the capillaries the flow rate of the gas supplied through the first line of the ion source.
  • the multi-way switching valve further comprises a second output, wherein the line which does not communicate with the first line fluidically connected to the second output.
  • the gas that is not introduced into the ion source in particular flows continuously out of the multi-way switching valve, so that sets a stable gas flow.
  • a pump in particular a vacuum pump, is connected to the second outlet.
  • the line which does not fluidly communicate with the first source of gas supply to the ion source via the multi-way change-over valve is connected to the pump so that the gas in that line is continuously sucked out of the system.
  • the vacuum pump simulates the evacuated ion source.
  • the flow parameters for the gas streams therefore do not change in the operation of the particle therapy system, even if one of these gas streams for the generation of the particle beam is currently not used. If stable gas flows have set in the second and third line, then these are preferably not interrupted, too if one of these gas streams is not introduced into the ion source.
  • the gas streams are interrupted if they are not needed for more than 30 minutes, for example, but an additional on-off valve is installed on each line before the reusable changeover valve.
  • the gas streams flow continuously either in the direction of the ion source or out of the gas injection system. Since these are very small gas flows, which are in the range of a few standard microliters per minute, the gas losses are very small.
  • the reusable switching valve is a 2-position 4-way valve. This means that the valve has two inputs and two outputs, so that through the valve parallel two gas streams can flow in two different directions.
  • each of the inputs is connected to the other output so that the direction of the gas flows out of the valve is changed.
  • an additional multi-position valve is preferably provided, which is fluidly connected to one of the inputs of the multi-way switching valve.
  • the multi-position valve is upstream of the multi-way change-over valve.
  • the second and the third line and at least one further line are connected.
  • a gas mixture In order to form a gas mixture, at least two precursors open into the second line, which are connected in particular via a Y-connector to the second line. It is often necessary for the gas to be ionized to be transported into the ion source with the aid of a carrier gas, for example an inert gas. To get a good mix reach the two gases, their lines open at the same point in the second line, this being technically realized by a Y-connector.
  • a carrier gas for example an inert gas
  • a check valve is provided for interrupting the gas streams before they have mixed in the Vor Oberen.
  • blocking valves are provided in front of the inputs of the reusable switching valve.
  • a check valve is provided between the multi-way switching valve and the ion source according to a third preferred variant. The check valves are opened or closed during startup or shutdown of the particle therapy system, whereby the provision of the operating gases is regulated. Even if an operating gas is not needed for a time longer than 30 minutes, the corresponding check valve is closed and reopened about 5 minutes before re-use of the operating gas. Even in case of malfunction, the check valves are closed individually or groups, so that the gas flows are interrupted in the different line sections of the gas injection system.
  • a control system for central control of the valves is provided.
  • the complex gas injection system is centrally controlled and has a high degree of automation and synchronization.
  • the object is further achieved by a method for operating a gas injection system according to claim 12.
  • the advantages and preferred embodiments listed with regard to the gas injection system are to be transferred analogously to the process.
  • a permanently stable gas flow is established, regardless of whether gas from the second or the third line is introduced into the ion source by the gas injection system is preferably controlled such that during operation as long as the gas flow from the second line is introduced into the ion source is, the gas flow out the third line is sucked by the pump via the multi-way switching valve, and when switching the multi-way switching valve, the gas flow from the third line is introduced into the ion source and the gas flow from the second line is sucked by the pump via the multi-way switching valve.
  • a gas injection system 2 which essentially comprises an ion source 4 and a multi-way change-over valve 6, which is also connected upstream of the ion source 4 and is furthermore simply called a valve.
  • a first line 8 leads to the ion source 4 and a second and a third line 10, 12 open into the valve 6.
  • a vacuum pump 16 is connected to the valve 6.
  • the lines 8, 10, 12 are formed in the illustrated embodiment of stainless steel.
  • the valve 6 is a 2-position 4-way valve, that is, the valve 6 has four ports: two inputs 17a for the second and third lines 10, 12 and two outputs 17b for the first and fourth lines 8, 14 By combining the two inputs 17a with the two outputs 17b, two positions of the valve 6 are created, which are associated with FIG. 2 are explained.
  • a Y-connector 18 is arranged so that two Vortechnischen 20,22 in the same place in the second line 10 open.
  • carbon dioxide is provided from a first pressure vessel 24 with low-flow pressure reducer.
  • Helium is used as the carrier gas, which is stored in a further pressure vessel 26 with low-pressure regulator and passes via the foreline 22 to the second line 8, in which it is mixed in the region of the Y-connector 18 with the carbon dioxide.
  • Both Vortechnischen 20,22 each have a needle valve 28a, 28b, a pressure sensor 30a, 30b for measuring the pressure in the Vortechnischen 20, 22 and a check valve 32, 34 for interrupting the respective gas flow from the pressure vessels 24, 26.
  • the low pressure valves 28a, 28b allow for rapid regulation of the pressure in the fore-lines 22, 24. In reducing the pressure in a conduit, the pressure can only change slowly at a flow of 1 sccm. To accelerate the setting, the gas extraction by the needle valves 28a, 28b is increased.
  • hydrogen can be introduced into the ion source 4 from a further pressure vessel 36 with a low-pressure regulator in order to generate a particle beam of protons.
  • a needle valve 28c At the hydrogen line also a needle valve 28c, a pressure sensor 30c and a check valve 38 are arranged.
  • the multi-way change-over valve 6 is preceded by a multiposition valve 40 through which further gases, such as e.g. Oxygen, are introduced via the third line 12 when needed in the ion source 4.
  • a check valve 42 is also provided, through which the gas flow can be interrupted after the multi-way switching valve 6.
  • the gas injection system 2 also has a control system 44 for the central control of at least the check valves 32, 34, 35, 38 and 42 on.
  • the control of the check valves 32, 34, 35, 38 and 42 is pneumatically by means of compressed air from a pressure vessel 46 with low-pressure regulator.
  • the supply and discharge of the air by means of electrical valves 48, which are digitally controlled.
  • the gas is transported to the evacuated ion source 4 or to the vacuum pump 16 due to the pressure difference between the pressure vessels 24, 26, 36, in which initially a pressure of, for example, about 2 bar prevails.
  • a pressure of, for example, about 2 bar prevails.
  • the portion of the leads 20,22 between the check valves 32,34 and the Y-connector 18, the portion of the second line 10 between the Y-connector 18 and the check valve is provided 35 and the section of the third line 12 between the pressure vessel 36 and the check valve 38 capillaries C 1 , C 2 , C 3 , in particular glass capillary, form.
  • the length and the inner diameter of the capillaries C 1 , C 2 , C 3 are selected such that the desired pressure drop along the capillaries C 1 , C 2 , C 3 can take place.
  • the length of the capillaries C 1 , C 2 , C 3 varies in the decimeter or meter range, for example, the desired pressure drop takes place over a distance of about 2m.
  • the outer diameter of the capillaries C 1 , C 2 , C 3 is preferably less than 1 mm, for example in the range 0.2 to 0.3 mm, and the inner diameter is smaller by about 10 -1 and is for example 0.02 to 0.06 mm.
  • the gas injection system 2 is configured such that helium and carbon dioxide are introduced into the ion source 4 at a desired flow rate.
  • the capillary C 1 is provided between the helium shut-off valve 34 and the Y-connector 18 and the capillary C 2 is provided between the carbon dioxide shut-off valve 32 and the Y-connector , This ensures a higher pressure on the side of the helium shut-off valve 24 in comparison to the Y-connector 18, so that the direction of the gas flow is predetermined.
  • the carbon dioxide gas stream is passed through a glass capillary C 2 to the Y-connector 18 and fed there into the helium.
  • the properties of these capillaries C 2 and the pressure of the carbon dioxide determine the concentration of carbon dioxide in helium.
  • another glass capillary C 3 is provided from the y-connector 18 to the shut-off valve 35 for gas transport to the ion source 4.
  • the pressure drop between the hydrogen tank 36 and the check valve 38 is adjusted by a capillary C 4 .
  • the carbon dioxide and helium cutoff valves 32 and 34 must be closed to prevent mixing of the gases in the pressure vessels 24, 26 due to diffusion.
  • the gas streams from the lines 10,12 are introduced into the 2-position 4-way valve 6 and by means of the valve 6 is set whether the helium-carbon dioxide gas mixture or the hydrogen of the ion source 4 is supplied.
  • FIG. 1 a first position of the valve 6 is shown, in which the gas mixture from the second line 10 is fed via the first line 8 into the ion source 4.
  • the hydrogen from the third conduit 12 is sucked in after the valve 6 from the vacuum pump 16, whereby the operating conditions in the ion source 4 are simulated by the vacuum pump 16. Due to the continuous suction of the hydrogen by the vacuum pump 16, a stable flow can be established before the hydrogen is introduced into the ion source 4 by switching over the valve 6. If the standby gas, in this case the hydrogen from the third line 12, is not used for a long time, can the corresponding check valve 38 are closed to minimize the gas losses.
  • the second position of the valve 6 is in FIG. 2 3, it can be seen that, after switching over of the valve 6, hydrogen is fed from the third line 12 into the ion source 4 and the helium-carbon dioxide gas mixture from the second line 10 is sucked by the vacuum pump 16.
  • valve 6 a particularly fast switching of the gas streams can take place.
  • the operating gas which was previously fed into the ion source 4 passed out of the system 2 by the vacuum pump 16 and the previous standby gas, in which now has set a stable flow, is in the first line 8 and thus introduced into the ion source 4.
  • Such a switching process usually takes about 0.5 seconds and after less than 5 seconds, the gas flow in the direction of the ion source 4 has already stabilized.
  • the lines 8, 10, 12 and 14 are made of stainless steel and are therefore at the electrical potential of the ion source 4, which is about 24kv.
  • the region of high potential is indicated in the figures by a dashed block, this region being defined by the electrically insulating glass capillaries C 3 and C 4 along the lines 10 and 12.
  • the connection between the valve 6 and the vacuum pump 16 is realized by a glass tube 50.
  • the check valve 42 may be closed directly in front of the ion source 4. This valve can also be used to quickly shut off the flow of gas into the ion source 4 in the event of a power failure.
  • gas injection system 2 Another advantage of the gas injection system 2 is that the settings of the gas flows are reproducible after maintenance. Since the flow of the gas streams is regulated by the pressure difference on both sides of the lines 8, 10, 12, the replacement of any valve in the system 2 does not lead to changes in the pressure along the lines 8, 10, 12. In addition, the system 2 is designed so that no Totvolumenzonen arise.
  • the gas injection system 2 and the ion source 4 are part of a particle therapy system not shown here in detail for generating a particle beam of positively charged particles.
  • the operating gas from the containers 24, 26, or 36 is introduced into a plasma chamber of the ion source 4 by means of the gas injection system 2, wherein alternately depending on the type of particle beam either the helium-carbon dioxide gas mixture from the line 10 or the Hydrogen from the line 12 of the ion source 4 is supplied.
  • the generated ions are then brought to a final energy of more than 50 MeV / u (at a shot-up energy of 7 MeV / u) by magnets on a synchrotron ring of the particle therapy equipment and finally they are directed to a patient's body region to be treated.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Radiation-Therapy Devices (AREA)
  • Physical Vapour Deposition (AREA)
EP10155350.1A 2009-04-16 2010-03-03 Gasinjektionssystem für eine Partikeltherapieanlage, Verfahren zum Betrieb eines solchen Gasinjektionssystems, und Partikeltherapieanlage umfassend das Gasinjektionssystem Not-in-force EP2242339B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE200910017648 DE102009017648A1 (de) 2009-04-16 2009-04-16 Gasinjektionssystem und Verfahren zum Betrieb eines Gasinjektionssystems, insbesondere für eine Partikeltherapieanlage

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EP2242339A2 EP2242339A2 (de) 2010-10-20
EP2242339A3 EP2242339A3 (de) 2014-04-09
EP2242339B1 true EP2242339B1 (de) 2017-08-02

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EP10155350.1A Not-in-force EP2242339B1 (de) 2009-04-16 2010-03-03 Gasinjektionssystem für eine Partikeltherapieanlage, Verfahren zum Betrieb eines solchen Gasinjektionssystems, und Partikeltherapieanlage umfassend das Gasinjektionssystem

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US (1) US20100263756A1 (zh)
EP (1) EP2242339B1 (zh)
JP (1) JP2010251324A (zh)
CN (1) CN101868113B (zh)
DE (1) DE102009017648A1 (zh)

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Also Published As

Publication number Publication date
EP2242339A2 (de) 2010-10-20
US20100263756A1 (en) 2010-10-21
JP2010251324A (ja) 2010-11-04
CN101868113B (zh) 2016-06-01
CN101868113A (zh) 2010-10-20
EP2242339A3 (de) 2014-04-09
DE102009017648A1 (de) 2010-10-21

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