EP1742269A4 - Dispositif semi-conducteur et procédé de production de celui-ci - Google Patents

Dispositif semi-conducteur et procédé de production de celui-ci

Info

Publication number
EP1742269A4
EP1742269A4 EP20040730082 EP04730082A EP1742269A4 EP 1742269 A4 EP1742269 A4 EP 1742269A4 EP 20040730082 EP20040730082 EP 20040730082 EP 04730082 A EP04730082 A EP 04730082A EP 1742269 A4 EP1742269 A4 EP 1742269A4
Authority
EP
European Patent Office
Prior art keywords
semiconductor device
production method
method therefor
therefor
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP20040730082
Other languages
German (de)
English (en)
Other versions
EP1742269B1 (fr
EP1742269A1 (fr
Inventor
Shigeyoshi Umemiya
Osamu Matsuura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of EP1742269A1 publication Critical patent/EP1742269A1/fr
Publication of EP1742269A4 publication Critical patent/EP1742269A4/fr
Application granted granted Critical
Publication of EP1742269B1 publication Critical patent/EP1742269B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors
    • H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors
    • H01L28/60—Electrodes
    • H01L28/65—Electrodes comprising a noble metal or a noble metal oxide, e.g. platinum (Pt), ruthenium (Ru), ruthenium dioxide (RuO2), iridium (Ir), iridium dioxide (IrO2)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors
    • H01L28/60—Electrodes
    • H01L28/75—Electrodes comprising two or more layers, e.g. comprising a barrier layer and a metal layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B51/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B51/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors
    • H10B51/30—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors characterised by the memory core region
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Formation Of Insulating Films (AREA)
EP04730082.7A 2004-04-28 2004-04-28 Dispositif semi-conducteur et procédé de production de celui-ci Expired - Fee Related EP1742269B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2004/006203 WO2005106956A1 (fr) 2004-04-28 2004-04-28 Dispositif semi-conducteur et procédé de production de celui-ci

Publications (3)

Publication Number Publication Date
EP1742269A1 EP1742269A1 (fr) 2007-01-10
EP1742269A4 true EP1742269A4 (fr) 2009-11-11
EP1742269B1 EP1742269B1 (fr) 2016-07-20

Family

ID=35241934

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04730082.7A Expired - Fee Related EP1742269B1 (fr) 2004-04-28 2004-04-28 Dispositif semi-conducteur et procédé de production de celui-ci

Country Status (4)

Country Link
US (1) US7521745B2 (fr)
EP (1) EP1742269B1 (fr)
JP (1) JP4616830B2 (fr)
WO (1) WO2005106956A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007242930A (ja) * 2006-03-09 2007-09-20 Seiko Epson Corp 強誘電体メモリ装置の製造方法及び強誘電体メモリ装置
JP5232647B2 (ja) * 2006-08-02 2013-07-10 株式会社アルバック 膜形成方法および膜形成装置
KR100999793B1 (ko) * 2009-02-17 2010-12-08 엘지이노텍 주식회사 반도체 발광소자 제조방법
CN103068822A (zh) * 2010-08-05 2013-04-24 日产化学工业株式会社 具有含氮环的环氧化合物
US8962350B2 (en) * 2013-02-11 2015-02-24 Texas Instruments Incorporated Multi-step deposition of ferroelectric dielectric material
US20170338350A1 (en) * 2016-05-17 2017-11-23 Globalfoundries Inc. Semiconductor device and method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000033361A1 (fr) * 1998-11-30 2000-06-08 Interuniversitair Micro-Elektronica Centrum Procede de fabrication d'un condensateur ferroelectrique et procede de formation d'une couche en pzt sur un substrat
US6111284A (en) * 1998-08-24 2000-08-29 Murata Manufacturing Co., Ltd. Ferroelectric thin-film device
US20020043677A1 (en) * 1998-07-07 2002-04-18 Samsung Electronics Co., Ltd Ferroelectric capacitor and method for fabricating the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3210007B2 (ja) * 1990-11-30 2001-09-17 松下電器産業株式会社 半導体装置
US5753934A (en) 1995-08-04 1998-05-19 Tok Corporation Multilayer thin film, substrate for electronic device, electronic device, and preparation of multilayer oxide thin film
JP3310881B2 (ja) * 1995-08-04 2002-08-05 ティーディーケイ株式会社 積層薄膜、電子デバイス用基板、電子デバイスおよび積層薄膜の製造方法
JPH10173139A (ja) * 1996-12-12 1998-06-26 Hitachi Ltd 半導体装置の製造方法
JP3385889B2 (ja) * 1996-12-25 2003-03-10 株式会社日立製作所 強誘電体メモリ素子及びその製造方法
US6312816B1 (en) 1998-02-20 2001-11-06 Advanced Technology Materials, Inc. A-site- and/or B-site-modified PbZrTiO3 materials and (Pb, Sr, Ca, Ba, Mg) (Zr, Ti, Nb, Ta)O3 films having utility in ferroelectric random access memories and high performance thin film microactuators
KR100433465B1 (ko) 1998-08-03 2004-05-31 닛본 덴끼 가부시끼가이샤 금속산화물유전체막의 기상성장방법 및 금속산화물유전체재료의 기상성장을 위한 장치
JP3937033B2 (ja) * 1998-10-06 2007-06-27 ヤマハ株式会社 強誘電体材料、その製造方法及び強誘電体メモリ
JP2001028426A (ja) * 1999-07-14 2001-01-30 Toshiba Corp 半導体装置およびその製造方法
US6523943B1 (en) * 1999-11-01 2003-02-25 Kansai Research Institute, Inc. Piezoelectric element, process for producing the piezoelectric element, and head for ink-jet printer using the piezoelectric element
JP3353835B2 (ja) * 2000-07-07 2002-12-03 日本電気株式会社 金属酸化物誘電体膜の気相成長方法
JP2003204088A (ja) * 2001-09-27 2003-07-18 Matsushita Electric Ind Co Ltd 強誘電体薄膜構成体とそれを用いた応用素子、及び、強誘電体薄膜構成体の製造方法
JP3971598B2 (ja) * 2001-11-01 2007-09-05 富士通株式会社 強誘電体キャパシタおよび半導体装置
JP3971279B2 (ja) * 2002-09-20 2007-09-05 キヤノン株式会社 圧電体素子の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020043677A1 (en) * 1998-07-07 2002-04-18 Samsung Electronics Co., Ltd Ferroelectric capacitor and method for fabricating the same
US6111284A (en) * 1998-08-24 2000-08-29 Murata Manufacturing Co., Ltd. Ferroelectric thin-film device
WO2000033361A1 (fr) * 1998-11-30 2000-06-08 Interuniversitair Micro-Elektronica Centrum Procede de fabrication d'un condensateur ferroelectrique et procede de formation d'une couche en pzt sur un substrat

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
DOI H ET AL: "Influence of buffer layers and excess Pb/Zr+Ti ratios on fatigue characteristics of sol-gel-derived Pb(Zr,Ti)O3 thin films", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO,JP, vol. 34, no. 9B, 1 September 1995 (1995-09-01), pages 5105 - 5112, XP002140471, ISSN: 0021-4922 *
See also references of WO2005106956A1 *

Also Published As

Publication number Publication date
EP1742269B1 (fr) 2016-07-20
JP4616830B2 (ja) 2011-01-19
JPWO2005106956A1 (ja) 2008-03-21
EP1742269A1 (fr) 2007-01-10
US20070029595A1 (en) 2007-02-08
WO2005106956A1 (fr) 2005-11-10
US7521745B2 (en) 2009-04-21

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