EP1603673A1 - Procede pour impregner, de maniere controlee, des zones predeterminees avec de faibles volumes de liquide, element de recouvrement de substrat et chambre d'ecoulement - Google Patents

Procede pour impregner, de maniere controlee, des zones predeterminees avec de faibles volumes de liquide, element de recouvrement de substrat et chambre d'ecoulement

Info

Publication number
EP1603673A1
EP1603673A1 EP04722249A EP04722249A EP1603673A1 EP 1603673 A1 EP1603673 A1 EP 1603673A1 EP 04722249 A EP04722249 A EP 04722249A EP 04722249 A EP04722249 A EP 04722249A EP 1603673 A1 EP1603673 A1 EP 1603673A1
Authority
EP
European Patent Office
Prior art keywords
substrate
wetting
carrier plate
substrate according
protective layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04722249A
Other languages
German (de)
English (en)
Inventor
Gerhard Hartwich
Heiko Hillebrandt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Friz Biochem Gesellschaft fuer Bioanalytik mbH
Original Assignee
Friz Biochem Gesellschaft fuer Bioanalytik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Friz Biochem Gesellschaft fuer Bioanalytik mbH filed Critical Friz Biochem Gesellschaft fuer Bioanalytik mbH
Publication of EP1603673A1 publication Critical patent/EP1603673A1/fr
Withdrawn legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00279—Features relating to reactor vessels
    • B01J2219/00281—Individual reactor vessels
    • B01J2219/00286—Reactor vessels with top and bottom openings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00351—Means for dispensing and evacuation of reagents
    • B01J2219/00387—Applications using probes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B01J2219/00511—Walls of reactor vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/0054—Means for coding or tagging the apparatus or the reagents
    • B01J2219/00572—Chemical means
    • B01J2219/00576—Chemical means fluorophore
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00585—Parallel processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00596—Solid-phase processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B01J2219/0061—The surface being organic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
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    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B01J2219/00612—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports the surface being inorganic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B01J2219/00623—Immobilisation or binding
    • B01J2219/00626—Covalent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B01J2219/00623—Immobilisation or binding
    • B01J2219/0063—Other, e.g. van der Waals forces, hydrogen bonding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00657—One-dimensional arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00659—Two-dimensional arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00677—Ex-situ synthesis followed by deposition on the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00718—Type of compounds synthesised
    • B01J2219/0072—Organic compounds
    • B01J2219/00722—Nucleotides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00718—Type of compounds synthesised
    • B01J2219/0072—Organic compounds
    • B01J2219/00725—Peptides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00718—Type of compounds synthesised
    • B01J2219/0072—Organic compounds
    • B01J2219/00729—Peptide nucleic acids [PNA]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/02—Burettes; Pipettes
    • B01L3/0289—Apparatus for withdrawing or distributing predetermined quantities of fluid
    • B01L3/0293—Apparatus for withdrawing or distributing predetermined quantities of fluid for liquids
    • C—CHEMISTRY; METALLURGY
    • C40—COMBINATORIAL TECHNOLOGY
    • C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
    • C40B40/00—Libraries per se, e.g. arrays, mixtures
    • C40B40/04—Libraries containing only organic compounds
    • C40B40/06—Libraries containing nucleotides or polynucleotides, or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C40—COMBINATORIAL TECHNOLOGY
    • C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
    • C40B40/00—Libraries per se, e.g. arrays, mixtures
    • C40B40/04—Libraries containing only organic compounds
    • C40B40/10—Libraries containing peptides or polypeptides, or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C40—COMBINATORIAL TECHNOLOGY
    • C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
    • C40B60/00—Apparatus specially adapted for use in combinatorial chemistry or with libraries
    • C40B60/14—Apparatus specially adapted for use in combinatorial chemistry or with libraries for creating libraries
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N2035/1027—General features of the devices
    • G01N2035/1034—Transferring microquantities of liquid
    • G01N2035/1037—Using surface tension, e.g. pins or wires
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/8305—Miscellaneous [e.g., treated surfaces, etc.]

Definitions

  • the invention relates to a substrate for the controlled wetting of predetermined wetting points with small volumes of liquid.
  • the invention further relates to a production method, a substrate cover for such a substrate, and a flow chamber with a substrate and a substrate cover.
  • the controlled wetting of a substrate with a liquid is widely used in industry and science. Especially in the field of life sciences, medical technology and sensor technology, the manufacture of microstructured substrates for analysis has been advanced in recent years in order to obtain so-called lab-on-a-chip products. In so-called high-throughput screening (HTS), these products should enable a large number of possible reactions to be automatically analyzed in parallel in a short time. For these products, however, it is necessary to be able to apply small amounts of liquid both for functionalizing the surfaces and for applying the test liquids during analysis in a targeted manner at excellent locations on the substrate.
  • HTS high-throughput screening
  • the reaction of two components can be investigated by mixing two liquid phases containing the components in a reaction vessel. This reaction changes the properties of the liquids in the reaction vessel in a detectable manner.
  • the analysis in the volume phase has the advantage that proteins in particular retain their specific functions, on the other hand the often required large volumes are disadvantageous. It is therefore necessary to create substrates that provide extremely small reaction vessels.
  • surfaces are used which are provided with different coupling groups and can bind specific analytes in order to examine unknown liquids for the presence of these analytes.
  • the sensor surface must first be functionalized with the coupling groups, then brought into contact with the unknown liquid and then the binding of the analyte must be detected.
  • small volumes have to be used on substrates.
  • a large number of methods such as fluorescence spectroscopy, radiometry, electrochemistry and a large number of surface-sensitive methods such as AFM, SPR or quartz crystals are available in the prior art for the detection of such binding events on surfaces.
  • the unknown analyte liquids mostly consist of a large number of different substances in extremely small quantities, so that a potential sensor for analyzing these liquids with regard to factors such as costs that are important for industrial applications or have a high degree of parallelization, have to make do with very small amounts of material and have to be very sensitive.
  • the parallelization of such an analysis can be done either by lateral structuring of the sensor surface in areas different functionalities or in the case of a volume approach by a large number of reaction vessels.
  • microtitre plates are available for the parallelization of analyzes in the volume phase, which can be operated with volumes of only about 10 ⁇ l per reaction vessel.
  • expensive pipetting robots are usually necessary.
  • micro-contact printing micro-contact printing
  • ⁇ CP micro-contact printing
  • a microstructured stamp is wetted with a liquid, then in direct contact with the substrate to be processed brought and thus imprinted a lateral chemical structure on the surface.
  • a major difficulty of this technique is the realization of a uniform contact between the stamp and the substrate, which is of crucial importance for the success or the quality.
  • the invention as characterized in the claims, is based on the object of specifying a substrate and a method for its production which enables the controlled wetting of predetermined wetting points with small liquid volumes, in particular for analysis purposes, and avoids the disadvantages of the prior art mentioned at the outset.
  • this object is achieved by the substrate according to claim 1 or claim 28, the substrate cover according to claim 45, the flow chamber according to claim 47 and the production method according to claim 50 or claim 51. Further advantageous details, aspects and configurations of the present invention result from the dependent claims, the description, the figures and the examples.
  • Analyte liquid Liquid that potentially contains an analyte that is to be detected by a sensor. Liquid not only pure liquid substances, but also liquids with detergent, any kind of dissolved organic or inorganic substances, as well as emulsions, suspensions and colloidal solutions.
  • ligate molecules to the wetting points of a substrate. These molecules can be physisorbed, chemisorbed or covalently, coordinatively or bound by complex formation on the substrate.
  • Solder masking lacquer known from printed circuit board technology, which is applied to printed circuit boards to prevent the formation of solder bridges during automated soldering.
  • Protective layer applied to the carrier plate before the actual wetting Any material can be used for this which forms a closed layer on a surface and thus separates the substrate surface from the surroundings and forms a late later time can be removed partially and without residue by laser ablation.
  • This protective layer can consist of organic as well as inorganic materials, depending on the substrate type and application requirements, physisorbed, chemisorbed or covalently, coordinatively or via complex formation and applied with any techniques.
  • SEM Scanning electron microscopy carrier plate solid with a freely accessible horizontal main surface, which can thus be wetted with a liquid.
  • Plastics as well as metals, semiconductors, glasses, composite materials or porous materials can be used as solid support plates.
  • PNA Peptide nucleic acid synthetic DNA or RNA in which the
  • N (COCH 2 base) -CH 2 CO unit hybridizes PNA with DNA).
  • Nucleic acid at least two covalently linked nucleotides or at least at least two covalently linked pyrimidine (e.g. cytosine, thymine or uracil) or purine bases (e.g. adenine or guanine).
  • the term nucleic acid refers to any "backbone" of the covalently linked pyrimidine or purine bases, such as. B. on the sugar-phosphate backbone of the DNA, cDNA or RNA, on a peptide backbone of the PNA or on analogous structures (e.g. phosphoramide, thio-phosphate or dithio-phosphate backbone).
  • An essential feature of a nucleic acid in the sense of the present invention is that it can bind naturally occurring cDNA or RNA in a sequence-specific manner.
  • Nucleic acid - Nucleic acid of unspecified base length e.g. nuc-oligomer, linseic acid octamer: a nucleic acid with any backbone in which 8 pyrimidine or purine bases are covalently bound to one another.
  • Oligomer equivalent to nucleic acid oligomer Oligonucleotide equivalent to oligomer or nucleic acid oligomer, e.g. B. a DNA, PNA or RNA fragment unspecified base length.
  • Oligo Abbreviation for oligonucleotide ss Single Strand
  • Fluorophore chemical compound that is able to emit a longer-wave (red-shifted) fluorescent light when excited with light.
  • Fluorophores fluorescent dyes
  • UV ultraviolet
  • VIS visible
  • IR infrared
  • the absorption and emission maxima are typically shifted from each other by 15 to 40 nm (Stokes shift).
  • Fluorescein Resorcinphtalein Ligand Term for molecules that are specifically bound by the ligate;
  • ligands in the sense of the present document are substrates, cofactors or coenzymes of a protein (enzyme), antibodies (as ligand of an antigen), antigens (as ligand of an antibody), receptors (as ligand of a hormone), hormones (as ligand of a receptor) ) or nucleic acid oligomers (as ligand of the complementary nucleic acid oligomer.
  • Ligate Term for (macro) molecule with specific recognition and binding sites for the formation of a complex with a ligand (template).
  • Sodiumdodecyl sulfate pc-G ⁇ r Any molecular connection between two molecules or between a surface atom, surface molecule or a surface molecule group and another molecule, usually alkyl, alkenyl, alkynyl, heteroalkyl, heteroalkenyl, heteroalkynyl chains.
  • Preferred spacers are those of chain length 1-20, in particular chain length 1-14, the chain length being the shortest continuous connection between the structures to be connected.
  • the terminal phosphate group of the oligonucleotide at the 3 'end is esterified with (HO- (CH 2 ) 2 -S) 2 to give P-0- (CH 2 ) 2 -SS- (CH 2 ) 2 -OH, the SS bond is split homolytically and each causes an Au-SR bond.
  • the probe oligonucleotide carries a covalently attached fluorophore fluorescein.
  • the Spacer-Oligo Disulfide bridge is connected to the nucleic acid oligomers via any two spacers and the two spacers can have a different chain length (shortest continuous connection between disulfide bridge and the respective nucleic acid oligomer), in particular any chain length between 1 and 14, and these spacers in turn may be bound to various reactive groups which are naturally present on the nucleic acid oligomer or which are attached to them by modification.
  • These spacers can in turn be bound to various reactive groups that are naturally present on the nucleic acid oligomer or are attached to it by modification and “n” is any integer, in particular a number between 1 and 20.
  • nx RSS nucleic acid oligomer to which n disulfide functions are connected via spacers in each case -oligo a spacer, with any radical R saturating the disulfide function.
  • the spacer for connecting the disulfide function to the nucleic acid oligomer can each have a different chain length (shortest continuous connection between disulfide function and nucleic acid oligomer), in particular any chain length between 1 and 14. These spacers can in turn be attached to different ones of course on the nucleic acid -Oligomer existing or attached to this by modification attached reactive groups.
  • the placeholder "n" is any integer, in particular a number between 1 and 20.
  • a generic substrate according to the invention comprises a carrier plate with a horizontal main surface for wetting with a liquid at predetermined wetting points, and a flat protective layer which is applied to the carrier plate and separates the main surface from the surroundings.
  • the protective layer has vertical recesses which extend to the main surface of the carrier plate and which define the predetermined wetting points on the carrier plate, and contains one or more feed channels leading to the vertical recesses with a reduced thickness of the flat protective layer, for supplying the wetting liquid to the predetermined wetting points.
  • liquid not only includes pure liquid substances, but also liquids with detergent, any type of dissolved organic. or inorganic substances, as well as emulsions, suspensions and colloidal solutions.
  • the structure of supply channels leading to the wetting points significantly reduces the analyte liquid required for an analysis in comparison to the wetting of the entire substrate.
  • the vertical cutouts are in the. Feed channel or the feed channels arranged.
  • each vertical cutout can lie in exactly one feed channel and can thus be supplied with the wetting liquid via this.
  • each vertical cutout lies at the intersection of several feed channels. While it is preferred according to the invention that each vertical recess lies at the intersection of exactly two feed channels, variants are also part of the invention in which each vertical recess lies at the intersection of, for example, three or four feed channels.
  • a group of several vertical cutouts lies at an intersection of two or more feed channels. Depending on the intended application, such a group can comprise, for example, four or sixteen individual cutouts and is used in particular to improve the measurement statistics.
  • the vertical cutouts or cutout groups are advantageously arranged in the form of an n x m matrix with n rows and m columns, n and m being greater than or equal to 2, and preferably n and m each being independently between 10 and 1000. It is preferred that the number n of rows and the number m of columns are the same and / or that the lateral distances between adjacent cutouts or cutout groups in the rows and columns are the same.
  • the m recesses or recess groups of a row are each arranged in one of n parallel row feed channels.
  • the n cutouts or cutout groups of a column can also advantageously be arranged in one of m parallel column feed channels, so that each cutout or cutout group lies at the intersection of a row and a column feed channel.
  • the row feed channels and the column feed channels advantageously have the same cross-sectional shape.
  • the inlet and outlet of the channels can be on the same side of the substrate.
  • the thickness of the protective layer in the feed channels is advantageously reduced by 10% to 99%, preferably by 20% to 95%, particularly preferably by 50% to 95%, compared to the thickness of the protective layer outside the cutouts and feed channels.
  • the protective layer has a thickness ds between 50 ⁇ m and 200 ⁇ m, preferably between 100 ⁇ m and 150 ⁇ m, outside the recesses and feed channels. In the feed channels, the protective layer has a reduced thickness d ⁇ between 5 ⁇ m and 150 ⁇ m, preferably between approximately 10 ⁇ m and approximately 50 ⁇ m.
  • the feed channels preferably run essentially parallel to the main surface of the carrier plate. However, they can also have a slight upward or downward gradient.
  • the cross section of the feed channels is advantageously rectangular or trapezoidal. This enables unproblematic production and ensures a good closure of the channels when using the substrate cover described below.
  • the feed channels advantageously have a characteristic width b K between 5 ⁇ m and 250 ⁇ m, preferably from approximately 10 ⁇ m to approximately 150 ⁇ m.
  • the characteristic width b K with a rectangular cross section is simply given by the constant width of the channels.
  • the characteristic width b K is given by the arithmetic mean of the width of the channel at the bottom and at the upper channel boundary.
  • a characteristic width b K for other cross-sectional shapes results from the condition that the product of the characteristic width and the channel depth is equal to the cross-sectional area.
  • the wetting points preferably have a characteristic extent of approximately 5 ⁇ m to approximately 200 ⁇ m, preferably of approximately 10 ⁇ m to approximately 100 ⁇ m.
  • the vertical cutouts have a substantially rectangular, elliptical or circular cross section.
  • the characteristic expansion mentioned is given by the circle radius, in the other cases by the arithmetic mean of the side lengths or the large and small ellipse axis.
  • the substrate can be covered with a cover plate which closes the feed channels at the top.
  • the invention encompasses a generic substrate with a carrier plate with a horizontal main surface for wetting with a liquid at predetermined wetting points, and a flat protective layer applied to the carrier plate that separates the main surface from the surroundings, the protective layer having one or more depressions with a reduced thickness of the planar protective layer for holding a supply volume of wetting liquids, and has in the depressions arranged vertical recesses which extend to the main surface of the carrier plate and which define the predetermined wetting points on the carrier plate and which define the wetting fluid from the respective ones record.
  • This embodiment of the invention represents a simple variant for wetting groups of wetting sites with one type of liquid in each case.
  • the vertical cutouts are preferably each arranged in the form of an nxm matrix with n rows and m columns in the depressions, n and m being greater than or equal to 2, and preferably n and m each being between 4 and 20. It is preferred if the number n of lines and the number m of columns is the same, and / or if the lateral spacings of adjacent cutouts in the rows and columns are the same.
  • the thickness of the protective layer in the depressions is reduced by 10% to 99%, preferably by 20% to 95%, particularly preferably by 50% to 95%, compared to the thickness of the protective layer outside the recesses and the depressions.
  • the protective layer advantageously has a thickness ds between 50 ⁇ m and 200 ⁇ m, preferably between 100 ⁇ m and 150 ⁇ m, outside the recesses and the depressions.
  • the protective layer has a reduced thickness d K , which is advantageously between 5 ⁇ m and 150 ⁇ m, preferably between approximately 10 ⁇ m and approximately 50 ⁇ m.
  • the depressions can have, for example, a rectangular or trapezoidal cross section.
  • Their characteristic dimension is typically between 100 ⁇ m and 2000 ⁇ m, preferably between approximately 300 ⁇ m and approximately 1000 ⁇ m.
  • the characteristic dimension is given, for example, in the case of a circular cross section by the circle radius or in the case of a rectangular cross section by the arithmetic mean of the side lengths.
  • the wetting points arranged in the depressions advantageously have a characteristic extension of approximately 5 ⁇ m to approximately 200 ⁇ m, preferably approximately 10 ⁇ m to approximately 100 ⁇ m, and, as in the first aspect, they preferably have a substantially rectangular, elliptical or circular shape Cross-section.
  • the protective layer applied to the carrier plate expediently consists of a material which physisorbs, chemisorbs or covalently, coordinatively or via complex formation on the main surface of the carrier plate to be wetted. It can be formed in particular by a positive or negative photoresist, a solder resist, an organic polymer, in particular cellulose, dextran or collagen.
  • the protective Layer is applied with any technology adapted to the protective layer material before wetting.
  • the carrier plate has a base body made of plastic, metal, semiconductor, glass, composite, a porous material or a combination of these materials.
  • the carrier plate is preferably provided with a conductive layer, for example made of silicon, platinum or gold, which then forms the main surface of the carrier plate to be wetted.
  • the predetermined wetting sites are functionalized with specific probe molecules in both aspects.
  • probe molecules are physisorbed, chemisorbed or covalently, co-organically, or bound by complex formation at the predetermined wetting points on the main surface of the carrier plate.
  • the predetermined wetting sites are functionalized with nucleic acid oligomers which are modified with one or more reactive groups or ivlar nucleus.
  • the nucleic acid oligomers can be modified with a fluorophore for visualization.
  • the main surface of the carrier plate to be wetted is formed by a gold layer and the predetermined wetting sites are functionalized with thiol (HS) or disulfide (S-S) derivatized nucleic acid oligomers.
  • HS thiol
  • S-S disulfide
  • the invention also includes a substrate cover for a substrate according to the first aspect of the invention with a cover carrier plate with a plurality of projecting barrier elements, the shape and size of which are matched to the shape and size of the feed channels of the substrate, in order to close the feed channels in partial areas.
  • the barrier elements are arranged on the cover carrier plate in such a way that they only leave one or a certain number of channel directions open after the substrate cover has been connected to the substrate.
  • the wetting points of the unclosed channels can then be functionalized with different specific probe molecules or supplied with an analyte liquid.
  • the closed row feed channels or column feed channels prevent any influence on adjacent channels.
  • the barrier elements can be produced, for example, by laser ablation from a full-surface lacquer layer on the cover carrier plate. Depending on the application, it is possible to permanently glue this substrate cover to the substrate, or else to mount the cover in a mobile manner in order to enable further wetting steps later with different or the same cover in different positions.
  • the invention further comprises a flow chamber with a substrate according to the first aspect of the invention and a described substrate cover.
  • the substrate cover can be permanently or detachably connected to the substrate.
  • the arrangement of the cutouts and the feed channels of the substrate has a multiple symmetry.
  • the barrier elements of the substrate cover are arranged on the cover carrier plate in such a way that the substrate cover can be placed on the substrate in different orientations and thereby closes different parts of the feed channels. With a single substrate cover, different wetting patterns can be generated on the substrate.
  • the flow chamber can comprise a substrate with an nxn cutout matrix, in which each cutout lies at the intersection of two feed channels and the row and column feed channels have the same cross-sectional shape.
  • the barrier elements of the substrate cover then close the row feed channels in a first orientation and the column feed channels in a second orientation rotated by 90 ° relative to the first orientation.
  • a method for producing a substrate according to the first aspect of the invention comprises the method steps: a) providing a carrier plate with a horizontal main surface, b) applying a flat protective layer on the carrier plate, which separates the main surface from the environment, c) structuring the protective layer Creation of one or more feed channels with reduced protective layer thickness, and d) creation of vertical recesses in the feed channel or feed channels, which extend to the main surface of the carrier plate and define the predetermined wetting points on the main surface of the carrier plate.
  • Also part of the invention is a method for producing a substrate according to the second aspect of the invention, which comprises the method steps a) providing a carrier plate with a horizontal main surface, b) applying a flat protective layer on the carrier plate which separates the main surface from the environment, c ) Structuring the protective layer to produce one or more depressions with a reduced protective layer thickness, and d) generating vertical recesses in the depressions which extend to the main surface of the carrier plate and define the predetermined wetting points on the main surface of the carrier plate.
  • a solder resist is applied as a protective layer using a curtain casting process.
  • the cutouts and / or the feed channels or the depressions are preferably produced by means of laser ablation, in particular by irradiating partial areas of the protective layer with continuous or pulsed laser radiation of a predetermined wavelength, preferably in the ultraviolet spectral range.
  • the laser radiation can be directed onto the protective layer to be removed directly or via an optic or a mask.
  • a surface region of the carrier plate is expediently melted in the area of the wetting points.
  • the melting of the surface results in a reduced surface roughness and an improved homogeneity of the surface of the carrier plate.
  • the predetermined wetting sites are then functionalized in a step e) with specific probe molecules.
  • the predetermined wetting sites in step e) can be functionalized using a spotting method with nucleic acid oligomers.
  • the predetermined wetting points in a substrate according to the first aspect of the invention can be functionalized in step e) by flushing a solution with nucleic acid oligomers into the feed channels.
  • the predetermined wetting sites can be functionalized by filling the depressions with a solution with nucleic acid oligomers.
  • the substrates according to the first or second aspect are provided with a protective layer.
  • This protective layer can bridge the critical period between the manufacture of the carrier plate and the wetting of its surface, since the protective layer prevents the adsorption of contaminants.
  • any material can be used for the protective layer, which forms a closed layer on a surface and thus separates the substrate surface from the environment and at a later point in time, for example by laser ablation at desired locations, either in its entire thickness without residue or in fractions the original thickness can be reduced.
  • an adapted protective layer which is optimized with regard to the adhesion between the carrier plate and the protective layer.
  • the protective layer can also be optimized with regard to the liquid to be used. In the case of aqueous solutions, a hydrophilic layer material lends itself so that the liquids wet the feed channels of the invention and air bubbles are avoided. In the case of oily liquids, however, hydrophobic material is preferred.
  • solder resist layer e.g. can be freely selected in a large range in the curtain casting process by the speed of the carrier plate under the lacquer curtain.
  • laser ablation means not only the partial or complete removal of organic or inorganic protective layers, but also the removal of impurities on a carrier plate by irradiation with laser light. In the context of the invention, laser ablation is advantageously used to remove or structure the applied
  • Protective layer used in any desired geometry on the substrate. It is thus possible to realize different, precisely defined free substrate areas or areas with a tapered protective layer in different sizes on one and the same substrate design only by changing the laser exposure.
  • Another aspect is the melting of the carrier plate surface with complete removal of the protective layer by means of laser ablation, which can be achieved by adjusting the laser intensity or the irradiation time to the conditions of the carrier plate and the protective layer.
  • this short-term, near-surface melting of the carrier plate surface also closes existing ones Pores in the material and thus improves the homogeneity of the free carrier plate surface.
  • less gold layers are removed from the surface by ablation.
  • Laser ablation can be carried out by direct irradiation of the light or by irradiation of the light via an optic or a mask.
  • the size or the shape of the individual exposed or structured wetting points and their lateral spacing are arbitrary and only depend on the respective application.
  • the wavelength of the laser light used, as well as the irradiation time and the number and duration of the pulses depend on the combination of the protective layer and the material of the carrier plate surface and are preferably optimized for each pair.
  • structures from channels or depressions and recesses extending to the carrier plate are written into a solder mask using an excimer laser over a plurality of masks in a plurality of process steps, which structures specifically wetting the free or functionalized wetting points with one or more different ones Allow liquids containing analytes.
  • the functionalization of the substrate surface is understood to mean the application of molecules to the wetting points of the substrate which can specifically bind other molecules from a sample substance.
  • these molecules are brought into contact with the main surface of the carrier plate dissolved in any organic and inorganic solvents or mixtures of liquids.
  • the probe molecules ligates
  • the probe molecules are physisorbed, chemisorbed or covalently, coordinatively or bound by complex formation with the substrate.
  • the present invention allows all types of ligates, which are applied to the wetting points on the carrier plate, to be brought into contact with various analyte liquids in a controlled manner and to be examined for the presence of their specific ligands.
  • Molecules that specifically interact with a ligand to form a complex are referred to as ligates.
  • ligates in the sense of the present document are substrates, cofactors or coenzymes as complex binding partner of a protein (enzyme), antibodies (as complex binding partner of an antigen), antigens (as complex binding partner of an antibody), receptors (as complex binding partner of a hormone), hormones (as complex binding partner a receptor), nucleic acid oligomers (as complex binding partner of the complementary nucleic acid oligomer) or metal complexes.
  • the free wetting sites are wetted with modified nucleic acid oligomers in aqueous solution.
  • the nucleic acid oligomer to be applied to the free surface is modified via a covalently attached spacer of any composition and chain length with one or more reactive groups, these reactive groups preferably being located near one end of the nucleic acid oligomer ,
  • the reactive groups are preferably groups that directly with the unmodified surface can react.
  • HS spacer thiol
  • SS disulfide
  • the molecule On the other side of the nucleic acid oligomer, the molecule is modified with a fluorophore via a further spacer of any composition and chain length in order to visualize the functionalization of the free substrate sites.
  • a fluorophore For the functionalization of the exposed areas, both flushing in via suitable supply channels and spotting techniques can be considered.
  • covers for the respective substrates with different channel structures can also be produced within the scope of the invention. These covers not only represent a closure of the channel structures for the realization of flow chambers, but can also introduce barriers for the analyte liquids into the channels at desired locations. In the case of channel arrangements with crossing channels, these barriers allow the liquids to flow from prevent a channel into the adjacent channels and thus rule out cross-reactions.
  • any cover carrier plate can be coated with solder resist, the thickness of which corresponds to the depth of the channels of the associated channel structure.
  • the lacquer is then removed by laser ablation so that only the desired ones are left Barriers remain.
  • the length of these barriers is expediently given by the width of the feed channels and the width of the barriers by the lateral spacing of the channels. A particularly good shielding of adjacent feed channels is thereby achieved.
  • a single cover can gradually act as a barrier for different subgroups of the feed channels by rotating the angle of symmetry.
  • Substrate covers are possible which either leave only one or more of the different channel directions open.
  • all wetting points of the matrix can be successively and controlledly wetted with up to k / 2 different analyte liquids without cross-reactions .
  • n 2 combinations of potential binding partners can be analyzed.
  • the covers described above are produced from glass substrates coated with solder resist.
  • Figure 1 is a schematic representation of the arrangement of supply channels and wetting points in a substrate according to an embodiment of the invention.
  • FIG. 2 shows a cross section through the substrate of FIG. 1 along the line II-II, partially with functionalized wetting points;
  • 5 shows a fluorescence image of nucleic acid oligomers modified with fluorophore, which are immobilized at exposed wetting sites of a substrate
  • FIG. 7 in (a) to (d) schematic representations of the arrangement of feed channels according to further exemplary embodiments of the invention;
  • Fig. 8 in (a) a section of a possible channel structure and in (b) the
  • Section of an associated substrate cover using the example of an uncovered, square location at the intersection of two channels with a cover that, depending on the position, can block one of the channels.
  • part of the paint layer is shown transparent to show the inside of the structure.
  • intersection of two mutually perpendicular feed channels lies in (b) an associated substrate cover which can be placed on the substrate in several orientations, in (c) the substrate with closed column feed channels and in (d) the substrate with closed row feed channels;
  • FIG. 10 shows a schematic illustration of a substrate with a depression according to another exemplary embodiment of the invention.
  • FIG. 11 shows a cross section through the substrate of FIG. 10 along the line XI-
  • FIGS. 1 and 2 show a top view of the substrate 10 and FIG. 2 shows a cross section through the substrate 10 along the line II-II of FIG. 1.
  • FIGS. 1 and 2 and some of the following figures show one Substrate shown with a matrix of only 4 x 4 at wetting points. It is understood that larger matrices are within the scope of the invention and for the parallel analysis of a large number of possible reactions are preferred.
  • the substrate 10 comprises a carrier plate 12, which in the exemplary embodiment is formed by a glass slide 14 with a vapor-deposited gold layer 16.
  • a carrier plate 12 which in the exemplary embodiment is formed by a glass slide 14 with a vapor-deposited gold layer 16.
  • a 5 nm thick CrNi contact layer is first vapor-deposited on the glass slide 14 and then a 200 nm thick gold layer 16 is deposited on this.
  • a 2-component solder resist (Elpemer GL 2467 SM-DG, from Peters) is applied to the substrate in a curtain casting process known from printed circuit board technology, in order to provide a protective layer 20 for the surface 18 of the substrate 12 form.
  • the preferred thicknesses of the protective layer 20 can be achieved in the range of approximately 10-150 ⁇ m by varying the transport speed of the carrier plate 12 under the lacquer curtain.
  • the protective layer 20 has a thickness ds of approximately 150 ⁇ m.
  • the protective layer 20 is structured with an excimer laser from Lambda-Physics by laser ablation.
  • the laser can be imaged on the substrate 10 in a reduced manner using various masks, the area intensity of the irradiation being set using the imaging device. Depending on the mask, different geometries of the ablated regions can be realized.
  • feed channels 22 are cut into the lacquer via a first mask, the depth of these channels 22 being adjustable by the number of laser pulses.
  • a channel depth of approximately 80-120 ⁇ m is achieved, for example, with approximately 540-900 pulses (a 20 ns) of the laser with an area performance of 600-1200 mJ / cm 2 .
  • the width of the channels can be set as required, depending on the application and the desired lateral distance (typically in the range of 50 - 200 ⁇ m). bar and typically ranges from 10 - 150 ⁇ m.
  • the substrate 10 contains four parallel line feed channels 22 with a rectangular cross section, which have a depth of approximately 100 ⁇ m and a width of approximately 70 ⁇ m. Within the channels, the thickness of the protective layer 20 is thus reduced from its initial value ds to a value d K of approximately 50 ⁇ m.
  • vertical recesses 24 (FIG. 2) are produced in the row channels 22 via a second mask, which extend as far as the gold surface 18 of the carrier plate 12.
  • the vertical cutouts 24 thus define the wetting points 26 on the carrier plate 12. This is shown in the left half of FIG. 2.
  • the number and intensity of the laser pulses is set during the structuring so that the surface 18 of the carrier plate 12 is melted in a surface region 28. This results in a reduced surface roughness and an improved homogeneity of the surface. In addition, ablation removes fewer layers of gold from the surface.
  • the exposed wetting areas typically have a characteristic dimension of approximately 10 to 100 ⁇ m. In the exemplary embodiment, the cutouts 24 and the wetting points 26 are circular and have a diameter of approximately 40 ⁇ m.
  • the wetting sites 26 can be wetted with a liquid via the feed channels 22, and can thereby be functionalized, for example, with specific probe molecules 30.
  • a substrate with functionalized wetting sites 26 is shown in the right half of FIG. 2.
  • FIG. 3 shows SEM images of wetting points 26 exposed by laser ablation in a stop-mask protective layer 20. Both rectangular and square cross sections as shown in FIG. 3 (a) and round ones are shown Cross sections as shown in Fig. 3 (b) possible.
  • FIG. 4 shows in (a) an AFM image of a gold surface which was melted in a circular partial area by laser bombardment, and in Figure 4 (b) an elevation profile 40 along the line B-B of Figure 4 (a). It can clearly be seen that the melting reduces the roughness of the surface and increases the homogeneity of the irradiated surface. This facilitates the later connection of specific probe molecules to the wetting sites 26.
  • the wetting sites 26 of the substrate 10 can be functionalized, for example, using a spotting method with nucleic acid oligomers.
  • the synthesis of the oligonucleotides takes place in an automatic oligonucleotide synthesizer (Expedite 8909; ABI 384 DNA / RNA synthesizer) according to the synthesis protocols recommended by the manufacturer for a 1.0 ⁇ mol synthesis.
  • an automatic oligonucleotide synthesizer (Expedite 8909; ABI 384 DNA / RNA synthesizer) according to the synthesis protocols recommended by the manufacturer for a 1.0 ⁇ mol synthesis.
  • Carriers (Glen Research 20-2933) perform the oxidation steps with a 0.02 molar iodine solution in order to avoid oxidative cleavage of the disulfide bridge. Modifications to the 5 ' position of the oligonucleotides are carried out with a coupling step that is extended to 5 min.
  • the amino modifier C2 dT (Glen Research 10-1037) is built into the sequences with the respective standard protocol. The coupling efficiencies are determined online during the synthesis via the DMT cation concentration photometrically or conductometrically.
  • the oligonucleotides are deprotected with concentrated ammonia (30%) at 37 ° C for 16 h.
  • the oligonucleotides are purified using RP-HPL Chromatography according to standard protocols (eluent: 0.1 molar triethylammonium acetate buffer, acetonitrile), characterization using MALDI-TOF MS.
  • the amine-modified oligonucleotides are coupled to the corresponding activated fluorophores (eg fluorescein isothiocyanate) in accordance with the conditions known to the person skilled in the art. The coupling can take place both before and after the oligonucleotides have been bound to the surface.
  • the free propanethiol present in the incubation solution is also co-adsorbed by forming an Au-S bond (incubation step).
  • this single strand can also be hybridized with its complementary strand.
  • split pin needles (Arraylt chipmarker pins from Tele-Chem) are used, which have a loading volume of 0.2 to 0.6 ⁇ L and volumes of about 1 nL per wetting process submit.
  • the contact area of these needles has a diameter of approximately 130 ⁇ m and is therefore significantly larger than the areas of the substrate exposed during laser ablation.
  • the needle is positioned over the substrate with an accuracy of 10 ⁇ m at a humidity of around 70-80%. The drop is released when the tip comes into contact with the protective layer and there is no direct contact with the substrate (“pseudo-contact printing”).
  • FIG. 5 shows a fluorescence image of four wetting sites which are functionalized with nucleic acid oligomers modified in this way.
  • the principle of detection is briefly illustrated with reference to FIG. 6.
  • the detection of nucleic acid-oligomer hybridization events takes place at high salt content by modulation of the fluorescence quenching on quench
  • the single-stranded probe nucleic acid oligomer 201 is in a form which is characterized by a small distance 205 from fluorophore 203 and quenching metal surface 204, for example gold.
  • the hybridization (reference numeral 202) with the complementary nucleic acid oligomer strand, the target, increases the distance 206 of the fluorophore 203 from the quenching metal surface 204, as shown in partial image ii), and the fluorescence intensity increases significantly.
  • the wetting points of the substrate 10 are preferably functionalized by flushing nucleic acid oligomers into the feed channels 22.
  • a substrate 10 as shown in FIGS. 1 and 2 with a 4 ⁇ 4 matrix of exposed wetting points 26 is used.
  • the substrate is covered with a glass substrate which is coated with a homogeneous 50 ⁇ m thick solder mask layer and then a solution with the nucleic acid oligomers described above is flushed into the channel structure. After an incubation period of 2 min - 24 h, the glass lid is removed, the substrate is rinsed and the functionalization of the free areas is visualized using a fluorescence scanner.
  • a substrate with functionalized wetting sites 26 is obtained, as illustrated in the right partial image in FIG. 2. Since four independent line channels are provided, the wetting sites can be easily functionalized with four different nucleic acid oligomers.
  • FIG. 7 shows in (a) to (d) schematic representations of the arrangement of feed channels according to further exemplary embodiments of the invention.
  • two row channels 50 and 52 are connected on each side of the substrate, so that U-shaped channels 54 are formed, the inlet and outlet of which are located on the same side of the substrate 10.
  • FIG. 7 (b) shows an exemplary embodiment in which only a single feed channel 60 is provided, which extends in a meandering manner over the entire substrate and thereby detects all wetting points 26.
  • the substrates according to FIGS. 7 (a) and 7 (b) are each covered with a coated glass substrate and a nucleic acid oligomer solution described above is flushed into the channel structure. After an incubation period of 2 min - 24 h, the glass lid is removed Rinsed substrates and visualized the functionalization of the free areas with the help of a fluorescence scanner.
  • Figure 7 (c) shows a square matrix of row feed channels 70 and column feed channels 72, at the intersection of which a wetting point 26 is arranged. Each wetting point 26 can thus be wetted with a liquid both via a row feed channel 70 and via a column feed channel 72. A preferred application of such a substrate is described in detail below.
  • wetting points 26 can also lie at the intersection of more than two channels.
  • a section of such a channel structure is shown in FIG. 7 (d), where each wetting point 26 lies at the intersection of four feed channels 74.
  • Substrates in which the wetting points lie at the intersection of a plurality of supply channels 22 are preferably used together with substrate covers which on the one hand close the supply channels 22 to form flow chambers and which on the other hand have suitably arranged barrier elements for the analyte liquids, some of which block the feed channels. By means of these barrier elements, it is possible to prevent the liquids from flowing from one channel into the adjacent channels when channels cross, and thus to avoid cross reactions.
  • a first substrate cover can be provided for blocking the column feed channels and a second substrate cover can be provided for blocking the row feed channels.
  • a single substrate cover is used both for blocking the row feed channels and, after a corresponding reorientation of the cover, for blocking the column feed channels.
  • FIG. 8 (a) shows a section of a channel structure in which a square vertical cutout 26 is arranged at the intersection of a row feed channel 70 and a column feed channel 72.
  • the row feed channel 70 and the column feed channel 72 both have the same rectangular cross section.
  • Part of the lacquer layer is shown transparently in the figure to show the inside of the structure.
  • FIG. 8 (b) shows the corresponding section of a substrate cover 80 which, depending on the orientation, can block the row feed channel 70 or the column feed channel 72.
  • the two barrier elements 84 arranged on a cover carrier plate 82 are matched in shape and size to the shape and size of the feed channels 70 and 72 of the substrate and, owing to the symmetry of the arrangement, close the row feed channel 70 in one orientation and in one in addition thereto the column feed channel 72 rotated by 90 ° in the second orientation.
  • any cover carrier plate 82 for example a glass slide, is coated with solder resist, the thickness of which corresponds at least to the depth of the channels of the substrate 10 and is, for example, 80 to 120 ⁇ m.
  • the lacquer is then removed by laser ablation to such an extent that only the desired barrier elements 84 remain.
  • the substrate coverage can be achieved, for example, by irradiating the area outside the barriers with approximately 540-900 pulses (a 20 ns) of the above-mentioned excimer laser with an area performance of 600-1200 mJ / cm 2 . Successive flushing of nucleic acid oligomers into the feed channels of a substrate using a substrate cover
  • Figure 9 shows in (a) a substrate with 4 x 4 wetting sites 26 and an arrangement of parallel row feed channels 70 and column feed channels 72 as described in Fig. 7 (c).
  • FIG. 9 (b) shows the associated substrate cover 80 with the barrier elements 84 matched to the channel arrangement.
  • the dimensions of the barrier elements 84 are expediently given by the width b
  • the height of the barrier elements 84 corresponds to the channel depth in the substrate 10.
  • the barrier elements 84 are just blocking the column feed channels 72 and leave the row feed channels 70 open (FIG. 9 (c)).
  • a solution with doubly modified nucleic acid oligomers according to the example described above is washed into the four open row supply channels 70 of the substrate with different sequences, which then functionalize the corresponding wetting sites 26 of the channel 70.
  • the line supply channels 70 are rinsed, the cover 80 is raised and the fluorescence of the spots is determined as a reference signal of the functionalization with the aid of a fluorescence scanner from Lavision Biotech. Now the substrate cover 80 is rotated through 90 ° and applied again to the substrate 10 (FIG.
  • the column feed channels 72 are then filled with an analyte liquid each containing unmodified nucleic acid oligomers from different sequences (0.500 molar phosphate buffer, pH 7, with 1 molar NaCl and 0.05 vol% SDS).
  • These oligonucleotides are also synthesized in an automatic oligonucleotide synthesizer (Expedite 8909; ABI 384 DNA / RNA synthesizer) according to the synthesis protocols recommended by the manufacturer for a 1.0 ⁇ mol synthesis.
  • the open channels are rinsed, the substrate cover 80 is removed and a second fluorescence measurement of the functionalized wetting sites 26 of the substrate is carried out using the fluorescence scanner. If a certain analyte liquid contains no oligonucleotides that are complementary to the nucleic acid oligomers of a specific wetting point 26, the fluorescence intensity of the second measurement essentially corresponds to that of the reference measurement. In the case of the hybridization of immobilized oligonucleotides of a wetting site with molecules of the respective analyte liquid, the fluorescence intensity is significantly higher compared to the reference measurement, as explained above in connection with FIG. 6.
  • nucleic acid oligomers are replaced by nucleic acid Monomers washed in for the functionalization of the wetting sites. Subsequently, further nucleic acid monomers are successively transported over the channel structures with the aid of substrate covers to the desired wetting sites, where they couple to the nucleic acid oligomers present there using phosphoramidite chemistry known from the prior art.
  • nucleic acid oligomers with different sequences can be synthesized at all wetting sites of the substrate, that is, for example, all 65536 nucleic acid octamers on a 256 x 256 matrix of wetting sites.
  • a substrate with a uniform matrix of 3 3 exposed wetting points in the intersection points of two feed channels each is produced analogously to FIG. 7 (c) together with an associated cover.
  • 3 different antibodies (Ak-i, Ak 2 , Aks) are flushed into the 3 open line feed channels of the substrate, which are each provided with thiol anchors for connection to the gold surface according to standard methods.
  • the cover rotated through 90 ° is applied again and the now open column feed channels are filled with 3 different liquid samples which contain different compositions of proteins or antigens.
  • the substrate is rinsed again. Specific antibody-protein complexes have only developed at those wetting sites that have been in contact with samples in which the appropriate proteins or antigens were contained.
  • step 3 mixtures of antibodies are used, the antibodies having been modified according to standard methods with a fluorescence label (eg fluorescein). These antibody mixtures are washed with the cover rotated again through 90 ° into the line supply channels of the spots functionalized with the same antibodies Akj.
  • the antibodies of a mixture are matched to the possible antibody-protein complexes of the spot series, so that an antibody can bind to each existing complex. After a certain incubation period, the channels are rinsed and the chip is read using a fluorescence reader (Lavision Biotech).
  • FIGS. 10 and 11 Another embodiment of the invention is shown in FIGS. 10 and 11.
  • FIG. 10 shows a substrate 100 for the controlled wetting of predetermined wetting points
  • FIG. 11 shows a cross section through the substrate 100 along the line Xl-Xl from FIG. 10.
  • the substrate 100 comprises a carrier plate 102 composed of a glass slide 104 with a vapor-deposited CrNi contact layer and a gold layer 106 vapor-deposited thereon.
  • a two-component solder resist is applied to the carrier plate 102 in order to produce a protective layer 120 with a thickness of approximately 10 to approximately 150 ⁇ m, in the exemplary embodiment approximately 120 ⁇ m.
  • the protective layer 120 is structured with an excimer laser by laser ablation.
  • a depression 122 is cut into the lacquer, which has a lateral dimension of 600 ⁇ m ⁇ 600 ⁇ m and a depth of approximately 100 ⁇ m.
  • the depression 122 is surrounded by a peripheral edge 110, so that a supply volume for receiving the loading wetting liquid is formed.
  • vertical recesses 124 with a diameter of approximately 30 ⁇ m are produced at the bottom of the depression 122, which extend to the gold surface of the carrier plate 102 and define the predetermined wetting points 126 on the carrier plate (left half of the figure in FIG. 11).
  • the depression is filled with the nucleic acid oligomers 130 of the example described above, rinsed after an incubation time of 2 to 24 hours and the functionalization of the vacant sites shown in the right half of FIG. 11 with the aid of a fluorescence scanner visualized by Lavision Biotech.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)

Abstract

L'invention concerne un substrat utilisé pour l'imprégnation contrôlée de zones prédéterminées avec de faibles volumes de liquide. Ce substrat présente une plaque de support, comportant une surface principale horizontale utilisée pour l'imprégnation de zones prédéterminées avec un liquide, ainsi qu'une couche protectrice plane, appliquée sur la plaque de support et isolant la surface principale par rapport à l'environnement. La couche protectrice présente des évidements qui s'étendent verticalement par rapport à la surface principale de la plaque de support et qui définissent, sur la plaque de support, les zones prédéterminées à imprégner. Cette couche protectrice présente également un ou plusieurs canaux d'acheminement menant aux évidements verticaux, réduisant l'épaisseur de la couche protectrice et servant à acheminer le liquide d'imprégnation aux zones prédéterminées à imprégner. En variante, la couche protectrice présente une ou plusieurs cavités, réduisant l'épaisseur de la couche protectrice et servant à recevoir un volume de réserve de liquides d'imprégnation, ainsi que des évidements qui sont ménagés dans lesdites cavités et qui s'étendent verticalement par rapport à la surface principale de la plaque de support. Ces évidements définissent, sur la plaque de support, les zones prédéterminées à imprégner et reçoivent les liquides d'imprégnation des cavités respectives.
EP04722249A 2003-03-21 2004-03-22 Procede pour impregner, de maniere controlee, des zones predeterminees avec de faibles volumes de liquide, element de recouvrement de substrat et chambre d'ecoulement Withdrawn EP1603673A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2003112670 DE10312670A1 (de) 2003-03-21 2003-03-21 Substrat zur kontrollierten Benetzung vorbestimmter Benetzungsstellen mit kleinen Flüssigkeitsvolumina, Substratabdeckung und Flusskammer
DE10312670 2003-03-21
PCT/EP2004/002978 WO2004082831A1 (fr) 2003-03-21 2004-03-22 Procede pour impregner, de maniere controlee, des zones predeterminees avec de faibles volumes de liquide, element de recouvrement de substrat et chambre d'ecoulement

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EP1603673A1 true EP1603673A1 (fr) 2005-12-14

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EP04722249A Withdrawn EP1603673A1 (fr) 2003-03-21 2004-03-22 Procede pour impregner, de maniere controlee, des zones predeterminees avec de faibles volumes de liquide, element de recouvrement de substrat et chambre d'ecoulement

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US (1) US20060246311A1 (fr)
EP (1) EP1603673A1 (fr)
DE (1) DE10312670A1 (fr)
WO (1) WO2004082831A1 (fr)

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US9340416B2 (en) * 2008-08-13 2016-05-17 California Institute Of Technology Polynucleotides and related nanoassemblies, structures, arrangements, methods and systems
FI20135868L (fi) 2013-08-28 2015-03-01 Outotec Finland Oy Menetelmä ja laite syöttövirtauksen käsittelemiseksi flotaatiolaitteeseen
CN107398953A (zh) * 2017-08-31 2017-11-28 惠州市永隆电路有限公司 一种线路板冲型模具及其冲型方法

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DE10312670A1 (de) 2004-10-07
US20060246311A1 (en) 2006-11-02
WO2004082831A1 (fr) 2004-09-30

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