EP1421832B1 - Chalumeau a plasma a excitation par micro-ondes - Google Patents

Chalumeau a plasma a excitation par micro-ondes Download PDF

Info

Publication number
EP1421832B1
EP1421832B1 EP02762243A EP02762243A EP1421832B1 EP 1421832 B1 EP1421832 B1 EP 1421832B1 EP 02762243 A EP02762243 A EP 02762243A EP 02762243 A EP02762243 A EP 02762243A EP 1421832 B1 EP1421832 B1 EP 1421832B1
Authority
EP
European Patent Office
Prior art keywords
metallic tube
plasma
hollow
hollow metallic
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP02762243A
Other languages
German (de)
English (en)
Other versions
EP1421832A1 (fr
Inventor
Jeng-Ming Wu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of EP1421832A1 publication Critical patent/EP1421832A1/fr
Application granted granted Critical
Publication of EP1421832B1 publication Critical patent/EP1421832B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Definitions

  • the invention relates to a plasma torch with microwave excitation, in which a plasma is generated by acting with a gas microwaves.
  • a plasma torch with a microwave generator which has a waveguide for guiding the microwaves generated by the microwave generator and a branched from the waveguide metallic hollow tube, wherein centrally within the metallic hollow tube from the waveguide in the metallic Hollow tube extending electrically conductive elongated nozzle, which has a nozzle tip at its projecting into the metallic hollow tube end, and the metallic hollow tube in height of the flame, preferably in the nozzle tip starting an increase in diameter, extending in the longitudinal direction of the plasma torch at least over the Area of the flame extends.
  • the increase in diameter is intended to ensure that the propagation conditions for microwaves are also met in the area of the flame, so that a stable plasma is generated.
  • the plasma gas serving process gas is guided through the nozzle in the range of high microwave power density at the nozzle tip.
  • the improvement in the stability of the plasma achieved by means of this solution by improving the propagation conditions of the microwaves in the area of the flame has not proved sufficient in practical operation, in particular in the case of large pressure fluctuations of the process gas.
  • Even in practical operation made constant adjustment of the microwave impedance of the waveguide and the metallic hollow tube has not led to a sufficient stabilization of the plasma at pressure fluctuations of the process gas, in particular to a stable ignition or re-ignition of the plasma.
  • the invention is therefore based on the problem of providing a plasma torch with microwave excitation, which is sufficiently good even with large pressure fluctuations of the process gas for a stable plasma Ensures propagation conditions for the microwaves and ensures a stable ignition or re-ignition of the plasma without a constant adjustment of the microwave impedance of the waveguide and the metallic hollow tube is required.
  • microwaves in this region of the metallic hollow tube can be well forwarded even in the event of pressure fluctuations of the process gas changing line conditions, without a constant adjustment of the microwave impedance of the waveguide or the metallic hollow tube is required.
  • the invention is based on the finding that the plasma as a coaxial inner conductor with respect to its electrical properties not behave as previously assumed because of the free electrons therein as a metallic conductor, but that these electrical properties of the plasma to a considerable extent by the pressure of the supplied process gas depend.
  • the inventive electrically conductive windings are designed in the form of a single-layer cylindrical coil or as a single conductor loops.
  • the inventive electrically conductive windings are arranged floating or are in electrical contact with the metallic hollow tube.
  • the number or spacing of the turns to each other can vary, without the effect significantly decreases.
  • the turns should fill in the cavity of the hollow tube formed by the increase in diameter in its longitudinal direction, wherein the individual turns should be sufficiently spaced apart, ie spaced at least by the thickness of the line material used.
  • it makes sense to cool the turns for example, by using tubular conduit material perform.
  • the hollow conductor branches off from the branch of the metallic hollow tube, a further metallic hollow tube section and extending in the region of the diameter enlargement inner conductor extends through the waveguide in this opposite further metallic hollow tube section.
  • the volumes of both hollow tube sections should be connected by a nonconducting hollow tube element which passes through the waveguide and is arranged sealingly therewith so that process gas introduced into this opposite hollow tube section does not flow into the waveguide but into the hollow tube having the diameter enlargement.
  • the inner conductor terminating in the region of the increase in diameter is then arranged inside this nonconducting tubular element, so that the plasma is formed inside the nonconducting tubular element.
  • the process gas is introduced in such a way that the process gas flows at the end of the inner conductor in the area of the diameter increase with low turbulence intensity. This is particularly important for a safe ignition or reignition of the plasma of particular importance. This is achieved, for example, by a previously described, as far as possible from the Duchmesserveriesrung and thus the end of the coaxial inner conductor was made introducing the process gas.
  • the plasma burner according to the invention has a rectangular waveguide 1, by means of which microwaves generated by a microwave generator (not shown) are conducted to the plasma torch.
  • the rectangular waveguide 1 is provided at the end with an adjustable short circuit 2 in order to adapt its impedance to different applications.
  • a metallic hollow tube 3 connects with a diameter D1, that has a stepped diameter increase 4 to a diameter D2, which extends at least over the region of the plasma 5.
  • a likewise metallic hollow pipe section 3 'with a diameter D1 which is completed by an adjustable short circuit 6 for changing the impedance of the hollow tube 3, 3'.
  • two gas supply ports 7 are arranged at the metallic hollow pipe section 3 '.
  • the volumes of the hollow tube 3 and the hollow tube section 3 ' are connected to each other by an electrically non-conductive tube section 8, preferably made of quartz glass and delimited from the volume of the rectangular waveguide 1, so that in the hollow tube section 3' initiated process gas is not in the rectangular waveguide 1 can penetrate.
  • sealing rings 9 are provided for sealing here sealing rings 9 .
  • an electrically conductive inner conductor 10 is arranged, which ends at the beginning of the stepped diameter increase 4 of the hollow tube 3.
  • the end of the inner conductor 10 is designed as a tip 11.
  • a plurality of turns with winding spacing a having single-layer cylindrical coil 12 is arranged.
  • the cylindrical coil 12 is electrically isolated from the metallic hollow tube 3. It is dimensioned with respect to its inner diameter D3 so that it encloses the resulting plasma 5 coaxial, without coming into contact with it.
  • the diameter D1 of the hollow tube 3 or of the hollow tube section 3 ' is approximately 50 mm
  • the diameter D2 of the stepped diameter increase 4 approximately 85 mm
  • the inner diameter D3. the single-layer cylindrical coil 12 about 55 mm.
  • the cross-sectional diameter of the conductor material used for the cylindrical coil 12 is about 6 mm, the winding spacing a about 20 mm.
  • Plasma 5 As a result of the increase in the electric field strength at the tip 11 of the inner conductor 10 ignites a plasma 5, which extends with the flowing process gas in the cavity formed by the diameter increase 4.
  • Plasma 5, enlarged diameter hollow tube 4 and inventively arranged Zylinderspuie 12 form an electrical Wellenieitungssystem, which is suitable in terms of its parameters impedance and transmission bandwidth in a special way for forwarding the microwaves in this region of the plasma torch.
  • the electrical interaction between the cylindrical coil 12 and the diameter-enlarged hollow tube 4 as a coaxial outer conductor of this waveguide system on the one hand and the plasma 5 as a coaxial inner conductor on the other hand causes a sufficiently good transmission of microwaves even with changing pressure conditions of the process gas, the is called changing electrical properties of the plasma 5.
  • FIG. 2 shows a modification of the described plasma burner to the effect that inside the hollow tube 3, 3 'a nonconductive tube 13, preferably of quartz glass, is arranged and the cylindrical coil 12 has been designed to be coolable and electrically connected to the enlarged diameter hollow tube 4.
  • the nonconductive tube 13 is arranged such that it guides the process gas introduced via the gas supply connections 7 within the plasma burner. Possibly. Of course, this gas routing can extend beyond the plasma torch. This is important for applications where the process gas contains substances or where the process produces substances that must not escape into the environment.
  • the coolability of the cylindrical coil 12 is advantageous when the plasma torch operates in continuous operation.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)

Claims (5)

  1. Chalumeau à plasma à excitation par micro-ondes comportant un guide d'ondes (1) pour guider les micro-ondes générées par un générateur de micro-ondes, un tube creux métallique (3) dérivant du guide d'ondes, au centre à l'intérieur du tube creux métallique (3) un conducteur intérieur (10) s'étendant au moins à partir du guide d'ondes (1) dans le tube creux métallique (3), disposé de façon coaxiale par rapport au tube creux métallique, dimensionné plus court que le tube creux métallique (3), un agrandissement du diamètre (4) du tube creux métallique (3), commençant approximativement sur l'extrémité du conducteur intérieur (10), disposé de façon coaxiale et s'allongeant dans le sens longitudinal du chalumeau à plasma en direction du plasma (5), au moins sur la longueur de ce dernier, une séparation (8) entre la cavité du tube creux métallique (3) et la cavité du guide d'ondes (1) par un non conducteur (8), ainsi qu'un dispositif (7) pour introduire un gaz de processus dans la cavité formée par le tube creux métallique (3) et la séparation non conductrice (8) par rapport au guide d'ondes (1),
    caractérisé en ce que des spires conductrices d'électricité (12) sont disposées à l'intérieur du tube creux métallique (4), dans la zone de l'agrandissement de diamètre (4) du tube creux métallique (3), de façon à entourer le plasma (5), mais sans être en contact avec ce dernier et à distance mutuelle dans le sens longitudinal de la cavité de l'agrandissement de diamètre (4).
  2. Chalumeau à plasma selon la revendication 1,
    caractérisé en ce que les spires conductrices d'électricité (12) présentent la forme d'une bobine cylindrique monocouche (12) présentant une distance entre les spires, qui dans le sens longitudinal remplissent la cavité du tube creux métallique (3) formée par l'agrandissement de diamètre (4).
  3. Chalumeau à plasma selon la revendication 1 ou 2,
    caractérisé en ce que les spires conductrices d'électricité (12) sont disposées de façon électriquement isolée par rapport au tube creux (3).
  4. Chalumeau à plasma selon l'une quelconque des revendications 1 à 3,
    caractérisé en ce que les spires conductrices d'électricité (12) comportent un canal pour conduire un produit réfrigérant.
  5. Chalumeau à plasma selon l'une quelconque des revendications 1 à 4,
    caractérisé en ce que pour l'introduction du gaz de processus dans le tube creux métallique (3), des raccords de conduite de gaz (7) sont disposés sur le tronçon de tube creux métallique (3'), loin de l'agrandissement de diamètre (4), c'est-à-dire sur l'extrémité du conducteur intérieur coaxial (10).
EP02762243A 2001-08-28 2002-08-20 Chalumeau a plasma a excitation par micro-ondes Expired - Lifetime EP1421832B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10143114 2001-08-28
DE10143114 2001-08-28
PCT/DE2002/003102 WO2003026365A1 (fr) 2001-08-28 2002-08-20 Chalumeau a plasma a excitation par micro-ondes

Publications (2)

Publication Number Publication Date
EP1421832A1 EP1421832A1 (fr) 2004-05-26
EP1421832B1 true EP1421832B1 (fr) 2006-10-04

Family

ID=7697538

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02762243A Expired - Lifetime EP1421832B1 (fr) 2001-08-28 2002-08-20 Chalumeau a plasma a excitation par micro-ondes

Country Status (5)

Country Link
US (1) US20040262268A1 (fr)
EP (1) EP1421832B1 (fr)
DE (1) DE50208353D1 (fr)
TW (1) TWI313147B (fr)
WO (1) WO2003026365A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7164095B2 (en) * 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
US20060052883A1 (en) * 2004-09-08 2006-03-09 Lee Sang H System and method for optimizing data acquisition of plasma using a feedback control module
TW200742506A (en) * 2006-02-17 2007-11-01 Noritsu Koki Co Ltd Plasma generation apparatus and work process apparatus
DE102006019664B4 (de) * 2006-04-27 2017-01-05 Leibniz-Institut für Plasmaforschung und Technologie e.V. Kaltplasma-Handgerät zur Plasma-Behandlung von Oberflächen
US20100074810A1 (en) * 2008-09-23 2010-03-25 Sang Hun Lee Plasma generating system having tunable plasma nozzle
US7921804B2 (en) * 2008-12-08 2011-04-12 Amarante Technologies, Inc. Plasma generating nozzle having impedance control mechanism
US20100201272A1 (en) * 2009-02-09 2010-08-12 Sang Hun Lee Plasma generating system having nozzle with electrical biasing
US20100254853A1 (en) * 2009-04-06 2010-10-07 Sang Hun Lee Method of sterilization using plasma generated sterilant gas
US9653266B2 (en) * 2014-03-27 2017-05-16 Mks Instruments, Inc. Microwave plasma applicator with improved power uniformity
US20150279626A1 (en) * 2014-03-27 2015-10-01 Mks Instruments, Inc. Microwave plasma applicator with improved power uniformity
PL235377B1 (pl) 2016-04-05 2020-07-13 Edward Reszke Adapter kształtujący mikrofalowe pole elektromagnetyczne nagrzewające toroidalne wyładowanie plazmowe
RU2650197C1 (ru) * 2017-03-09 2018-04-11 Общество С Ограниченной Ответственностью "Твинн" Многоступенчатый плазмотрон

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU415625B2 (en) * 1965-11-02 1971-07-27 Commonwealth Scientific And Industrial Research Organization Production of metals from their halides
US4297615A (en) * 1979-03-19 1981-10-27 The Regents Of The University Of California High current density cathode structure
DE3905303C2 (de) * 1988-02-24 1996-07-04 Hitachi Ltd Vorrichtung zur Erzeugung eines Plasmas durch Mikrowellen
JP2805009B2 (ja) * 1988-05-11 1998-09-30 株式会社日立製作所 プラズマ発生装置及びプラズマ元素分析装置
JPH02215038A (ja) * 1989-02-15 1990-08-28 Hitachi Ltd マイクロ波プラズマ極微量元素分析装置
US5389153A (en) * 1993-02-19 1995-02-14 Texas Instruments Incorporated Plasma processing system using surface wave plasma generating apparatus and method
DE19511915C2 (de) * 1995-03-31 1997-04-30 Wu Jeng Ming Dipl Ing Plasmabrenner mit einem Mikrowellengenerator
DE19824077A1 (de) * 1998-05-29 1999-12-02 Leybold Systems Gmbh Vorrichtung zur Erzeugung von Plasma

Also Published As

Publication number Publication date
US20040262268A1 (en) 2004-12-30
DE50208353D1 (de) 2006-11-16
EP1421832A1 (fr) 2004-05-26
TWI313147B (fr) 2009-08-01
WO2003026365A1 (fr) 2003-03-27

Similar Documents

Publication Publication Date Title
DE4241927C2 (de) Zur Anordnung in einem Vakuumgefäß geeignete selbsttragende isolierte Elektrodenanordnung, insbesondere Antennenspule für einen Hochfrequenz-Plasmagenerator
EP1421832B1 (fr) Chalumeau a plasma a excitation par micro-ondes
EP0261338B1 (fr) Source d'ions fonctionnant par induction
DE68919640T2 (de) Hochfrequenzheizgerät mit einer frequenzumwandelnden Speisung.
EP0916153B1 (fr) Dispositif pour la production de plasma
DE2164270A1 (de) Plasmastrahlgenerator
EP2215895A2 (fr) Lampe haute fréquence et son procédé de fonctionnement
DE69707620T2 (de) Elektrodenlose niederdruckentladungsröhre
DE69614129T2 (de) Verfahren und vorrichtung zur plasmaerzeugung
DE3226713A1 (de) Als flachspule ausgebildete induktionsheizspule zum tiegelfreien zonenschmelzen
EP2407267A1 (fr) Torche de soudage avec un nez comprenant un flexible isolé
DE102014110679A1 (de) Blitzlampenanordnung
DE602006000042T2 (de) Radiofrequenzplasmazündkerze für gesteuerte Zündung von Verbrennungsmotoren
AT504487B1 (de) Vorrichtung zur erzeugung von plasma oder radikalen mittels mikrowellen
EP0242658A1 (fr) Laser avec un tube de décharge pour l'écoulement du gaz dans une direction axiale
DE69011814T2 (de) Plasmabrenner mit elektromagnetischer Spule zur Rotierung des Lichtbogens.
DE2527609B2 (de) Verfahren zur erzeugung eines magnetfeldes in einer eine anode und eine kathode enthaltenden ionenquelle
DE4416900C2 (de) Gasentladungsstruktur
DE102004055256B4 (de) Hochfrequenz-Elektronenquelle
DE904449C (de) Konzentrator fuer magnetische Feldlinien zur Induktionserhitzung
DE914638C (de) Kopplungselement fuer die UEbertragung einer elektrischen Schwingung sehr hoher Frequenz
DE847040C (de) Entladungsroehre zum Erzeugen von Schwingungen
DE102014215224B4 (de) Gaslaseranregungsanordnung mit einer Hochfrequenzanschlussleitung
DE10231739A1 (de) Induktions-Plasmabrennervorrichtung
DE10231738B4 (de) Anpassungsvorrichtung für eine Induktions-Plasmabrennervorrichtung und Verfahren zur elektrischen Steuerung und Regelung einer Induktions-Plasmabrennervorrichtung

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20040221

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR

17Q First examination report despatched

Effective date: 20040618

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

RBV Designated contracting states (corrected)

Designated state(s): DE FR GB

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REF Corresponds to:

Ref document number: 50208353

Country of ref document: DE

Date of ref document: 20061116

Kind code of ref document: P

GBV Gb: ep patent (uk) treated as always having been void in accordance with gb section 77(7)/1977 [no translation filed]

Effective date: 20061004

EN Fr: translation not filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20070705

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20061004

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20070525

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20061004

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20080819

Year of fee payment: 8

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 50208353

Country of ref document: DE

Effective date: 20110301

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110301