EP1378322A1 - Method and tumbling apparatus with two oscillating movements - Google Patents

Method and tumbling apparatus with two oscillating movements Download PDF

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Publication number
EP1378322A1
EP1378322A1 EP02405561A EP02405561A EP1378322A1 EP 1378322 A1 EP1378322 A1 EP 1378322A1 EP 02405561 A EP02405561 A EP 02405561A EP 02405561 A EP02405561 A EP 02405561A EP 1378322 A1 EP1378322 A1 EP 1378322A1
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EP
European Patent Office
Prior art keywords
polishing
workpiece
support
movement
product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02405561A
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German (de)
French (fr)
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EP1378322B1 (en
Inventor
Marco Von Gunten
Francis Bordonado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BestinClass SA
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BestinClass SA
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Filing date
Publication date
Application filed by BestinClass SA filed Critical BestinClass SA
Priority to AT02405561T priority Critical patent/ATE338611T1/en
Priority to PT02405561T priority patent/PT1378322E/en
Priority to EP02405561A priority patent/EP1378322B1/en
Priority to ES02405561T priority patent/ES2272657T3/en
Priority to DE60214528T priority patent/DE60214528T2/en
Publication of EP1378322A1 publication Critical patent/EP1378322A1/en
Application granted granted Critical
Publication of EP1378322B1 publication Critical patent/EP1378322B1/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/02—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels
    • B24B31/027—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels with additional oscillating movement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/06—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers
    • B24B31/064—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers the workpieces being fitted on a support

Definitions

  • the present invention relates to a method of polishing parts more particularly but not exclusively metal, and a device polishing device capable of implementing this method.
  • VSM standards 10230 and 10231 define twelve degrees of roughness ranging from N1 to N12, the degree N1 corresponding to polishing the finest while N12 corresponds to a coarse surface condition.
  • the current polishing machines allow to reach the N4 or N3 degree, the degrees N2 or N1 can only be achieved by recovery of the surface to be polished with a metal layer, for example by chromium plating.
  • Such an overlay polishing process has several disadvantages. Especially after a mechanical polishing of the piece, it is necessary to take back this part by carrying out a subsequent operation of soaking in a chrome bath. This way of proceeding increases the costs of production and, in addition, the thickness of chromium as low as it is, changes the mechanical dimensions of the piece that it is virtually impossible to retouch by machining.
  • a first object of the invention is therefore to propose a method of polishing to obtain, by mechanical means that can be automated, a high degree of polishing, for example at least the degree N1, this for a metal part of any shape, all surfaces to be polished which can be finished to the same degree of polishing and without being necessary to take back the part for a subsequent operation of covering such a chromium recovery operation.
  • Another object of the invention is to propose a polishing device which makes it possible to carry out the preceding method, said device being able to understand ways to achieve fully automated driving a polishing cycle.
  • the subject of the invention is a polishing method of minus one piece with a polishing product contained in a tank, at least one surface of the part being exposed to contact with said product of polishing.
  • the invention also relates to a device for the implementation of process.
  • the invention relates to a method of polishing at least one piece 2 with a polishing product 10 content in a tank 1, at least one surface of the part 2 being exposed to contact said polishing product 10.
  • the product of polishing 10 comprises polishing particles and a liquid in which these particles bathe.
  • polishing product is not the subject of the invention, the composition of this product will not be detailed.
  • At least one induced movement B is induced, C, of substantially circular nature.
  • a polishing product which generates a mechanical action and a chemical action.
  • a vessel 1 having a wall is selected substantially vertical lateral and a substantially plane and horizontal bottom.
  • it constitutes the part support in using the wall of the vessel 1 in an area exposed to contact with the polishing product 10 and is imposed on said tank 1 at least a first oscillatory movement A so that the workpiece 2 is moved into the polishing product 10.
  • the piece support using a member 100 separate from the vessel 1 and, it is to this organ 100 that is imposed at least said first oscillatory movement A, however, this member 100 keeps the piece 2 in contact with said product of polishing 10.
  • the part support is constituted, using a member 100 separate from the wall of the vessel 1 and is imposed on the vessel 1 at least a first oscillatory movement A.
  • the invention also relates to a polishing device 3 for carrying out the method.
  • This polishing device 3 comprises at least a first means functional 50 to impose on at least one of the two elements that are said part support 2, 100 and said polishing product 10, at least a first oscillatory motion A whose orientation, amplitude and frequency are predetermined in order to cause in said polishing product 10 to least an induced motion B, C which causes its movement in contact with room 2.
  • a polishing tank 1 from minus one piece 2 by means of a fluid polishing product The tank of polishing 1 is subjected to the action of a displacement device 3 said device 3.
  • the tank is animated movements intended to induce movements of the product of polishing 10.
  • Figure 1 to better illustrate the movements of the product of polishing 10 inside the tank 1, no mechanical polishing piece was represented.
  • the tank 1 is animated by a first oscillatory movement A realized in a substantially horizontal plane.
  • This first movement can be illustrated by the path of each of the constituent points of the vessel 1, by example the four corners, on a circle, in a direction represented by the arrows A, in a plane parallel to the plane of the drawing, a given face of the vessel remaining always parallel to itself during this movement.
  • a other position of the tank 1 during this first movement was represented in 1A.
  • This first oscillatory movement A is completed by a second movement made in a direction perpendicular to the horizontal, that is to say in a substantially vertical direction. The way are products these movements will be described later.
  • a main displacement B is distinguished substantially central, and displacements C secondary, substantially peripheral.
  • the principle of the process consists in imposing a movement oscillatory compound to vessel 1 such that displacements are created in the polishing product 10. It is understood that if we fix a metal part 2 in the tank 1, - see Figure 2 - it is covered with the polishing product 10 and we print the movement described further to the tank, it will create a plurality of displacements around the part 2, these displacements coming from the movement imposed on the vessel 1 in cooperation with the irregularities of form of the piece opposite irregularities of shape of the tank. Preferably the piece 2 will not be arranged in the center of the tank, first to create a unbalance, thereby increasing the amplitude of the translational motion by rotation, then to increase the substantially circular effect. Travel B and C shown in FIG.
  • the polishing product 10 polishing under the action of displacements described may be any known polishing product, presenting in liquid or pasty form.
  • polishing device 3 consists of a frame 30 resting with dampers 31 known to the technique on the ground, this in order to limit the transmission of vibrations to the environment.
  • a motor 32 preferably a electric motor, drives in rotation a vertical axis 33, via two pulleys and a belt according to the embodiment shown.
  • the axis vertical 33 is composed of two portions, a lower portion 33A and a upper portion 33B, the lower portion 33A rotating in the upper portion 33B, but this upper portion being slidable axially with respect to the lower portion 33A.
  • the part upper portion 33A consists of a tube, in which the lower part of the upper portion 33B is engaged so sliding, a key ensuring the transmission of the rotational movement between the two axis portions without preventing axial relative sliding of the two portions of axes.
  • the lower part of the lower portion 33A of the axis 33 is held by a first bearing 34 whose outer cage is rigidly supported by a support fixed to the frame 30.
  • the upper part of the upper portion 33B of the axis 33 protrudes out of frame 30 by an opening of its upper face and is held in a second bearing 35 whose outer cage is held on a swash plate 36.
  • the swash plate 36 is fixed to the frame 30 by means of spring means, for example a a plurality of relatively rigid coil springs 37 disposed on the periphery of the swash plate 36, so as to keep it in a plane substantially horizontal.
  • spring means for example a a plurality of relatively rigid coil springs 37 disposed on the periphery of the swash plate 36, so as to keep it in a plane substantially horizontal.
  • An imbalance weight 38 is attached to the portion upper axis 33B.
  • the tank 1 is fixed to the upper face of the tray oscillating 36 by removable fixing means 11.
  • the axis of rotation 33 pivots between the two bearings 34 and 35. Since only one of these bearings, and precisely that of the lower referenced 34 is fixed to the frame and that the other, that referenced 35 is attached to the swash plate 36, meanwhile connected only by the springs 37 to the frame 30, the axis 33 will tend to take a rotation movement oscillating around the vertical direction, the component oscillation being transmitted to said oscillating plate 36. The presence of the weight 38 near the upper end of the axis 33 tends to increase this swing movement.
  • the rotation period of the movement translation in rotation corresponds to the speed of rotation of the axis 33 then that its amplitude depends on the masses in motion and in particular the unbalance that they represent in relation to the vertical axis.
  • the springs 37 are chosen with sufficient rigidity to limit the range of motion.
  • the frequency and amplitude of this second movement Oscillatory D depend essentially on moving masses, characteristics of the springs, as well as the amplitude and frequency of the first oscillatory movement A of the tank.
  • the relative sliding of the two axis portions 33A and 33B is intended to absorb the second movement oscillation D as well as to compensate for the sagging of the springs 37 when the Swash plate 36 is loaded with the vessel 1 containing the parts to be polished as well that the polishing product 10.
  • the device 3 is advantageously completed with a part 39A, possibly programmable, controlling the motor 32, as well as a control panel 39B diagrammatically with a keyboard and two push buttons.
  • the tank 1 can be closed by a cover (not shown on the figure).
  • the member 100 consists of an arm connected to a frame.
  • the second functional means 60 for imposing at least the first oscillating motion on the arm 100 is advantageously likewise nature as the first functional means 50.
  • the device for polishing includes two independent 32 motors.
  • the polishing device 3 comprises a means 101 controlled multi-directional displacement of at least the part arm 100 which supports at least one piece 2, so as to constitute a means for handling at least one such part 2.
  • This technical feature allows the mechanical manipulation of minus one piece 2 for loading and unloading it in the tank 1, namely, at the beginning and end of the cycle.
  • This mechanization of loading and unloading can advantageously be automated.
  • the polishing device 3 comprises a frame 30 and at least one of said first and second functional means 50, 60, at least one of these functional means 50, 60 comprising drive means in rotation 32 of a substantially vertical axis 33, an end portion 33A of said axis being held by a first rolling device 34 whose cage is attached to the frame 30, the other end 33B of said axis protruding by an opening of the upper face of the frame and supporting a swash plate 36, arranged horizontally, via a second device to bearing 35 whose outer cage is fixed to said plate, said plate being on the other hand connected to the frame by spring means 37 and provided with means of fixing a support of part 2 such as the tank 1 or the support member 100.
  • a complete cycle of polishing comprising a step of preparation of the tank 1.
  • one or several pieces to be polished 2 so that they are not directly contact with each other or with the walls of the tank.
  • the pieces are fixed at the inside of the tank, by any suitable means 12, so that that they are rigidly fixed and that their fixation is not destroyed under the effect of vibrations.
  • the fasteners will support the parts to be polished by surfaces of said parts that do not require polishing; if this proves not possible, it will be necessary later, after polishing a first part of the part, dismantling the assembly, modify the attachment of this piece so that it presses on an already polished portion and resume polishing to polish surface portions before masked by the fixation.
  • the tank is filled with the polishing product 10, so as to cover the parts to be polished.
  • the tank 1 is then arranged on the swash plate 36, which is fixed thereto by the fixing means 11, and then the polishing cycle is controlled via the control panel 39B.
  • This control panel 39B can be very simple, controlling only the starting or stopping the engine and its speed and direction of rotation. Other parameters can also be introduced by this control panel or by other means for example taking into account the mass of parts to polishing and starting surface condition, one can determine the cycle time of polishing and order one or more changes of direction of rotation and engine speed during the cycle.
  • the tank 1 is removed from the plate 36, the polishing product is removed from the tank, the polished pieces are also removed from the vat and are then thoroughly washed.
  • the liquid components of the polish are removed from the mixture and are then regenerated or destroyed if they can not be recovered.
  • the particles are also washed and recovered for future use.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Spinning Or Twisting Of Yarns (AREA)

Abstract

The method for polishing the surface of a part (2) with a polishing product (10) contained in a tank (1) consists of fixing the part to a support piece which holds it in contact with the polishing product. The support part is then given an oscillatory movement (A) so as to cause in the polishing product an induced circular movement which engenders its displacement in contact with the part. An Independent claim is included for a polishing device.

Description

La présente invention concerne un procédé de polissage de pièces plus particulièrement mais non exclusivement métalliques, ainsi qu'un dispositif de polissage apte à mettre en oeuvre ce procédé.The present invention relates to a method of polishing parts more particularly but not exclusively metal, and a device polishing device capable of implementing this method.

Les normes concernant la construction mécanique, en particulier les normes VSM (Vereins Schweizerischer Maschinen-Industieller) décrivent différents degrés d'état de surface ou de rugosité, respectivement de polissage, d'une pièce métallique. Les normes VSM 10230 et 10231 définissent douze degrés de rugosité allant de N1 à N12, le degré N1 correspondant au polissage le plus fin alors que N12 correspond à un état de surface grossier. Les machines de polissage actuelles permettent d'atteindre le degré N4 ou N3, les degrés N2 ou N1 ne pouvant être obtenus actuellement que par recouvrement de la surface à polir avec une couche métallique, par exemple par chromage. Un tel procédé de polissage par recouvrement présente plusieurs inconvénients. Notamment après un polissage mécanique de la pièce, il est nécessaire de reprendre cette pièce en effectuant une opération ultérieure de trempage dans un bain de chromage. Cette manière de procéder augmente les coûts de production et, de plus, l'épaisseur de chrome aussi faible soit-elle, modifie les dimensions mécaniques de la pièce qu'il est virtuellement impossible de retoucher par usinage.Standards concerning mechanical engineering, in particular VSM standards (Vereins Schweizerischer Maschinen-Industieller) describe different degrees of surface state or roughness, respectively polishing, of a metal piece. VSM standards 10230 and 10231 define twelve degrees of roughness ranging from N1 to N12, the degree N1 corresponding to polishing the finest while N12 corresponds to a coarse surface condition. The current polishing machines allow to reach the N4 or N3 degree, the degrees N2 or N1 can only be achieved by recovery of the surface to be polished with a metal layer, for example by chromium plating. Such an overlay polishing process has several disadvantages. Especially after a mechanical polishing of the piece, it is necessary to take back this part by carrying out a subsequent operation of soaking in a chrome bath. This way of proceeding increases the costs of production and, in addition, the thickness of chromium as low as it is, changes the mechanical dimensions of the piece that it is virtually impossible to retouch by machining.

On sait que les surfaces utiles de moules destinés à l'injection de pièces en matériau synthétique, doivent avoir un état de surface aussi parfait que possible, la durée de vie du moule, et corrélativement le coût des pièces moulées, étant directement fonction de cet état de polissage.It is known that the useful surfaces of molds intended for the injection of parts made of synthetic material, must have a perfect surface condition as possible, the life of the mold, and correlatively the cost of the parts molded, being directly a function of this polishing state.

On peut aussi noter que pour certaines pièces moulées de forme complexe il est très difficile d'obtenir un état de surface uniformément satisfaisant, par exemple au niveau des portions en creux ou des faces intérieures, sur lesquelles il est par ailleurs difficile d'effectuer un chromage.It can also be noted that for certain shaped moldings complex it is very difficult to obtain a uniform surface state satisfactory, for example at the level of the recessed portions or the faces interior, on which it is otherwise difficult to chromium.

Un premier but de l'invention est donc de proposer un procédé de polissage permettant d'obtenir, par des moyens mécaniques pouvant être automatisés, un haut degré de polissage, par exemple au moins le degré N1, ceci pour une pièce métallique de forme quelconque, toutes les surfaces à polir pouvant être terminées selon le même degré de polissage et sans qu'il soit nécessaire de reprendre la pièce pour une opération ultérieure de recouvrement telle une opération de recouvrement par chromage.A first object of the invention is therefore to propose a method of polishing to obtain, by mechanical means that can be automated, a high degree of polishing, for example at least the degree N1, this for a metal part of any shape, all surfaces to be polished which can be finished to the same degree of polishing and without being necessary to take back the part for a subsequent operation of covering such a chromium recovery operation.

Un autre but de l'invention est de proposer un dispositif de polissage qui permet de réaliser le procédé précédent, ledit dispositif pouvant comprendre des moyens permettant une conduite entièrement automatisée d'un cycle de polissage.Another object of the invention is to propose a polishing device which makes it possible to carry out the preceding method, said device being able to understand ways to achieve fully automated driving a polishing cycle.

A cet effet, l'invention a pour objet un procédé de polissage d'au moins une pièce avec un produit de polissage contenu dans une cuve, au moins une surface de la pièce étant exposée au contact dudit produit de polissage.For this purpose, the subject of the invention is a polishing method of minus one piece with a polishing product contained in a tank, at least one surface of the part being exposed to contact with said product of polishing.

Ce procédé est notamment caractérisé en ce que :

  • on fixe chaque pièce destinée à être polie à un support de pièce qui maintient cette pièce au contact du produit de polissage, et
  • on impose à au moins l'un des deux éléments que sont ledit support de pièce et ledit produit de polissage, au moins un premier mouvement oscillatoire dont on choisit préalablement l'orientation, l'amplitude et la fréquence de manière à provoquer dans ledit produit de polissage au moins un mouvement induit qui engendre son déplacement au contact de la pièce.
This method is characterized in that:
  • each piece intended to be polished is fixed to a part support which holds this piece in contact with the polishing product, and
  • imposing on at least one of the two elements that are said part support and said polishing product, at least a first oscillatory movement of which the orientation, the amplitude and the frequency are previously chosen so as to cause in said product polishing at least one induced movement that causes its movement in contact with the room.

L'invention a également pour objet un dispositif pour la mise en oeuvre du procédé.The invention also relates to a device for the implementation of process.

L'invention sera mieux comprise à la lecture de la description ci-après faite à titre d'exemple non limitatif en regard du dessin ci-annexé qui représente schématiquement :

  • Figure 1 : vue de dessus, cuve de polissage d'un dispositif mettant en oeuvre le procédé de polissage de l'invention,
  • Figure 2 : une forme de réalisation préférentielle d'un dispositif de polissage selon l'invention.
  • Figure 3 : une variante de réalisation du dispositif de polissage.
    • The invention will be better understood on reading the following description given by way of non-limiting example with reference to the appended drawing, which schematically represents:
  • FIG. 1: top view, polishing tank of a device implementing the polishing method of the invention,
  • Figure 2: a preferred embodiment of a polishing device according to the invention.
  • Figure 3: an alternative embodiment of the polishing device.

    • Tel que cela été annoncé, l'invention est relative à un procédé de polissage d'au moins une pièce 2 avec un produit de polissage 10 contenu dans une cuve 1, au moins une surface de la pièce 2 étant exposée au contact dudit produit de polissage 10.As has been announced, the invention relates to a method of polishing at least one piece 2 with a polishing product 10 content in a tank 1, at least one surface of the part 2 being exposed to contact said polishing product 10.

    Bien que cela n'apparaisse pas sur les dessins, le produit de polissage 10 comprend des particules à action polissante et un liquide dans lequel ces particules baignent.Although this does not appear on the drawings, the product of polishing 10 comprises polishing particles and a liquid in which these particles bathe.

    Le produit de polissage n'étant pas l'objet de l'invention, la composition de ce produit ne sera pas détaillée.Since the polishing product is not the subject of the invention, the composition of this product will not be detailed.

    D'une manière notable :

    • on fixe chaque pièce 2 destinée à être polie à un support de pièce 1, 100 qui maintient cette pièce 2 au contact du produit de polissage 10, et
    • on impose à au moins l'un des deux éléments que sont ledit support de pièce 1, 100 et ledit produit de polissage 10, au moins un premier mouvement oscillatoire A dont on choisit préalablement l'orientation, l'amplitude et la fréquence de manière à provoquer dans ledit produit de polissage 10 au moins un mouvement induit B, C qui engendre son déplacement au contact de la pièce 2.
    Notably:
    • each piece 2 intended to be polished is fixed to a workpiece support 1, 100 which holds this workpiece 2 in contact with the polishing product 10, and
    • at least one of the two elements such as said workpiece support 1, 100 and said polishing product 10 is subjected to at least a first oscillatory movement A, the orientation, amplitude and frequency of which are previously chosen. in causing said polishing product 10 to induce at least one induced movement B, C which causes it to move in contact with the workpiece 2.

    Le respect de ces particularités techniques permet d'accentuer notablement l'action de polissage du produit de polissage 10, par rapport à une technique de polissage qui autorise un déplacement libre de la pièce 2 pendant la réalisation d'un mouvement induit de polissage quelconque qui est imposé au produit de polissage 10.The respect of these technical particularities makes it possible to accentuate noticeably the polishing action of the polishing product 10, with respect to a polishing technique which allows a free movement of the piece 2 during the realization of any induced polishing motion that is imposed to the polishing product 10.

    De manière notable, on provoque au moins un mouvement induit B, C, de nature sensiblement circulaire.Notably, at least one induced movement B is induced, C, of substantially circular nature.

    De manière également notable, lors de la fixation de la pièce 2 sur le support de pièce 1, 100, on supprime tous les degrés de liberté de la pièce 2 par rapport audit support 1, 100.Also noticeably, when fixing part 2 on the room support 1, 100, we remove all degrees of freedom from room 2 with respect to said support 1, 100.

    De manière encore notable, selon une variante, lors de la fixation de la pièce 2 sur le support de pièce 1, 100, on supprime tous les degrés de liberté de la pièce 2 par rapport audit support 1, 100, à l'exception d'un degré de liberté en rotation autour d'un axe d'orientation prédéterminée.In a still notable manner, according to a variant, during the fixing of the room 2 on the support of room 1, 100, one suppresses all the degrees of freedom of the piece 2 with respect to said support 1, 100, with the exception of a degree of freedom in rotation about a predetermined orientation axis.

    De manière remarquable, on met en oeuvre un produit de polissage qui génère une action mécanique et une action chimique.Remarkably, a polishing product is used which generates a mechanical action and a chemical action.

    De manière encore notable, on impose à au moins l'un des deux éléments que sont ledit support 1, 100 et ledit produit de polissage 10, deux mouvements oscillatoires dont :

    • un premier mouvement oscillatoire A réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal et
    • un deuxième mouvement oscillatoire D réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan.
    In a still notable manner, at least one of the two elements that are said support 1, 100 and said polishing product 10 is imposed, two oscillatory movements of which:
    • a first oscillatory movement A made in a first plane of orientation determined with respect to a horizontal plane and
    • a second oscillatory movement D made at least in a direction of orientation determined relative to said first plane.

    Ces particularités techniques accroissent l'effet de polissage par rapport à un procédé selon lequel seul un mouvement dans un plan est mis en oeuvre. These technical features increase the polishing effect by relation to a process according to which only a movement in a plane is artwork.

    De manière encore remarquable :

    • d'une part, on choisit une cuve 1 de forme telle que, lorsqu'elle est en situation d'être utilisée pour le polissage, elle présente dans différents plans horizontaux, une section transversale de forme polygonale ou sensiblement circulaire et,
    • d'autre part, on impose à au moins l'un des deux éléments que sont ledit support 1, 100 et ledit produit de polissage 10, au moins ledit premier mouvement oscillatoire A desdits premier et deuxième mouvements oscillatoires.
    In a remarkable way:
    • on the one hand, a tank 1 of a shape such that, when it is in use for polishing, it has, in different horizontal planes, a transverse section of polygonal or substantially circular shape and,
    • on the other hand, at least one of the two elements, namely said support 1, 100 and said polishing product 10, is imposed on at least said first oscillatory movement A of said first and second oscillatory movements.

    De manière notable, on choisit une cuve 1 présentant une paroi latérale sensiblement verticale et un fond sensiblement plan et horizontal.Notably, a vessel 1 having a wall is selected substantially vertical lateral and a substantially plane and horizontal bottom.

    De manière également notable, on constitue le support de pièce en utilisant la paroi de la cuve 1 dans une zone qui est exposée au contact du produit de polissage 10 et on impose à la dite cuve 1 au moins un premier mouvement oscillatoire A de manière telle que la pièce 2 soit déplacée dans le produit de polissage 10.Also noticeably, it constitutes the part support in using the wall of the vessel 1 in an area exposed to contact with the polishing product 10 and is imposed on said tank 1 at least a first oscillatory movement A so that the workpiece 2 is moved into the polishing product 10.

    Selon une variante remarquable de réalisation, on constitue le support de pièce en utilisant un organe 100 distinct de la cuve 1 et, c'est à cet organe 100 qu'on impose au moins ledit premier mouvement oscillatoire A, cependant que cet organe 100 maintient la pièce 2 au contact dudit produit de polissage 10.According to a remarkable variant embodiment, the piece support using a member 100 separate from the vessel 1 and, it is to this organ 100 that is imposed at least said first oscillatory movement A, however, this member 100 keeps the piece 2 in contact with said product of polishing 10.

    Suivant une autre variante, on constitue le support de pièce en utilisant un organe 100 distinct de la paroi de la cuve 1 et,

    • d'une part, on impose à la cuve 1 au moins un premier mouvement oscillatoire A et,
    • d'autre part, on impose également à l'organe 100 qui constitue le support de pièce au moins un autre premier mouvement oscillatoire A choisi de manière telle que ce mouvement de l'organe 100 se combine au mouvement de la cuve 1, en vue de renforcer l'action de polissage.
    According to another variant, the part support is constituted by using a member 100 distinct from the wall of the vessel 1 and,
    • on the one hand, at least one first oscillatory movement A is imposed on the vessel 1 and,
    • on the other hand, it also imposes on the member 100 which constitutes the workpiece support at least another first oscillatory movement A chosen in such a way that this movement of the member 100 is combined with the movement of the vessel 1, with a view to to strengthen the polishing action.

    Selon une variante remarquable, on constitue le support de pièce, en utilisant un organe 100 distinct de la paroi de la cuve 1 et on impose à la cuve 1 au moins un premier mouvement oscillatoire A.According to a remarkable variant, the part support is constituted, using a member 100 separate from the wall of the vessel 1 and is imposed on the vessel 1 at least a first oscillatory movement A.

    Tel que cela a été indiqué, l'invention se rapporte également à un dispositif de polissage 3 pour la mise en oeuvre du procédé.As has been indicated, the invention also relates to a polishing device 3 for carrying out the method.

    Ce dispositif de polissage 3 comprend au moins un premier moyen fonctionnel 50 pour imposer à au moins l'un des deux éléments que sont ledit support de pièce 2, 100 et ledit produit de polissage 10, au moins un premier mouvement oscillatoire A dont l'orientation, l'amplitude et la fréquence sont prédéterminées de manière à provoquer dans ledit produit de polissage 10 au moins un mouvement induit B, C qui engendre son déplacement au contact de la pièce 2.This polishing device 3 comprises at least a first means functional 50 to impose on at least one of the two elements that are said part support 2, 100 and said polishing product 10, at least a first oscillatory motion A whose orientation, amplitude and frequency are predetermined in order to cause in said polishing product 10 to least an induced motion B, C which causes its movement in contact with room 2.

    De manière préférentielle, le dispositif de polissage 3 comprend un premier moyen fonctionnel 50 pour imposer à au moins l'un des deux éléments que sont ledit support 1, 100 et ledit produit de polissage 10, deux mouvements oscillatoires dont :

    • un premier mouvement oscillatoire A réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal,
    • un deuxième mouvement oscillatoire D réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan, et
       les amplitudes et fréquences de ces premier et deuxième mouvements étant prédéterminées de manière à provoquer dans ledit produit de polissage 10 au moins un mouvement induit B, C qui engendre son déplacement au contact de la pièce 2. Preferably, the polishing device 3 comprises a first functional means 50 for imposing on at least one of the two elements that are said support 1, 100 and said polishing product 10, two oscillatory movements of which:
    • a first oscillatory movement A made in a first plane of orientation determined with respect to a horizontal plane,
    • a second oscillatory movement D made at least in a direction of orientation determined relative to said first plane, and
    the amplitudes and frequencies of these first and second movements being predetermined so as to cause in said polishing product at least one induced movement B, C which causes its movement in contact with the workpiece 2.

    Ci-après ce trouve décrit un mode avantageux de construction du dispositif de polissage 3 dont les caractéristiques techniques essentielles viennent d'être définies.Hereinafter, describes an advantageous mode of construction of the polishing device 3 whose essential technical characteristics have just been defined.

    En se reportant aux figures on voit, une cuve de polissage 1 d'au moins une pièce 2 au moyen d'un produit de polissage 10 fluide. La cuve de polissage 1 est soumise à l'action d'un dispositif de déplacement 3 dit dispositif de polissage 3. Lorsque le dispositif de polissage 3 fonctionne, la cuve est animée de mouvements destinés à induire des mouvements du produit de polissage 10. En figure 1, afin de mieux illustrer les mouvements du produit de polissage 10 à l'intérieur de la cuve 1, aucune pièce mécanique à polir n'a été représentée. La cuve 1 est animée d'un premier mouvement oscillatoire A réalisé selon un plan sensiblement horizontal. Ce premier mouvement peut être illustré par le parcours de chacun des points constitutifs de la cuve 1, par exemple les quatre coins, sur un cercle, selon une direction représentée par les flèches A, dans un plan parallèle au plan du dessin, une face donnée de la cuve restant toujours parallèle à elle-même au cours de ce mouvement. Une autre position de la cuve 1 au cours de ce premier mouvement a été représentée en 1A. Ce premier mouvement oscillatoire A est complété par un second mouvement réalisé selon une direction perpendiculaire à l'horizontale, c'est-à-dire selon une direction sensiblement verticale. La manière dont sont produits ces mouvements sera décrite plus après.Referring to the figures we see, a polishing tank 1 from minus one piece 2 by means of a fluid polishing product. The tank of polishing 1 is subjected to the action of a displacement device 3 said device 3. When the polishing device 3 is operating, the tank is animated movements intended to induce movements of the product of polishing 10. In Figure 1, to better illustrate the movements of the product of polishing 10 inside the tank 1, no mechanical polishing piece was represented. The tank 1 is animated by a first oscillatory movement A realized in a substantially horizontal plane. This first movement can be illustrated by the path of each of the constituent points of the vessel 1, by example the four corners, on a circle, in a direction represented by the arrows A, in a plane parallel to the plane of the drawing, a given face of the vessel remaining always parallel to itself during this movement. A other position of the tank 1 during this first movement was represented in 1A. This first oscillatory movement A is completed by a second movement made in a direction perpendicular to the horizontal, that is to say in a substantially vertical direction. The way are products these movements will be described later.

    Pour une amplitude donnée et pour une vitesse déterminée du premier mouvement de la cuve 1, le mélange 10 qu'elle contient est animé de mouvements induits de nature sensiblement circulaire comme cela est représenté en figure 1. On distingue un déplacement principal B, sensiblement central, et des déplacements C secondaires, sensiblement périphériques.For a given amplitude and for a determined speed of first movement of the tank 1, the mixture 10 it contains is animated by induced movements of substantially circular nature as this is represented in FIG. 1. A main displacement B is distinguished substantially central, and displacements C secondary, substantially peripheral.

    Le principe du procédé consiste donc à imposer un mouvement oscillatoire composé à la cuve 1 tel que des déplacements soient créés dans le produit de polissage 10. On comprend que si on fixe une pièce métallique 2 dans la cuve 1, - voir figure 2 -, qu'on la recouvre du produit de polissage 10 et qu'on imprime le mouvement décrit plus avant à la cuve, il se créera une pluralité de déplacements autour de la pièce 2, ces déplacements provenant du mouvement imposé à la cuve 1 en coopération avec les irrégularités de forme de la pièce en regard des irrégularités de forme de la cuve. De préférence la pièce 2 ne sera pas disposée au centre de la cuve, tout d'abord pour créer un balourd, augmentant de ce fait l'amplitude du mouvement de translation en rotation, puis pour augmenter l'effet sensiblement circulaire. Les déplacements B et C représentés sur la figure 1 correspondent à des déplacements produits lorsque la cuve ne contient pas la pièce 2 à polir ; on peut constater que lorsqu'une ou plusieurs pièces sont disposées dans la cuve, il se produit encore d'autres déplacements de même que des déplacements selon des axes différents de ceux représentés, provenant des irrégularités de forme des pièces ainsi que du mouvement d'oscillation perpendiculaire au plan de la figure mentionnée précédemment.The principle of the process consists in imposing a movement oscillatory compound to vessel 1 such that displacements are created in the polishing product 10. It is understood that if we fix a metal part 2 in the tank 1, - see Figure 2 - it is covered with the polishing product 10 and we print the movement described further to the tank, it will create a plurality of displacements around the part 2, these displacements coming from the movement imposed on the vessel 1 in cooperation with the irregularities of form of the piece opposite irregularities of shape of the tank. Preferably the piece 2 will not be arranged in the center of the tank, first to create a unbalance, thereby increasing the amplitude of the translational motion by rotation, then to increase the substantially circular effect. Travel B and C shown in FIG. 1 correspond to displacements produced when the tank does not contain the piece 2 to be polished; We can note that when one or more pieces are arranged in the tank, it occurs still other displacements as well as displacements along axes different from those shown, resulting from irregularities in the shape of as well as oscillation movement perpendicular to the plane of the figure previously mentioned.

    Le produit de polissage 10 effectuant le polissage sous l'action des déplacements décrits peut être n'importe quel produit de polissage connu, se présentant sous forme liquide ou pâteuse.The polishing product 10 polishing under the action of displacements described may be any known polishing product, presenting in liquid or pasty form.

    Un dispositif permettant la mise en mouvement de la cuve de polissage selon les mouvements induits sensiblement circulaires qui ont été mentionnés est décrit plus après et se trouve représenté à la figure 2. Le dispositif de polissage 3 est constitué d'un bâti 30 reposant par des amortisseurs 31 connus de la technique sur le sol, ceci afin de limiter la transmission des vibrations à l'environnement. Un moteur 32, de préférence un moteur électrique, entraíne en rotation un axe vertical 33, par l'intermédiaire de deux poulies et d'une courroie selon la forme d'exécution représentée. L'axe vertical 33 est composé de deux portions, une portion inférieure 33A et une portion supérieure 33B, la portion inférieure 33A entraínant en rotation la portion supérieure 33B, mais cette portion supérieure pouvant coulisser axialement par rapport à la portion inférieure 33A. Par exemple, la partie supérieure de la portion inférieure 33A est constituée d'un tube, dans lequel la partie inférieure de la portion supérieure 33B est engagée de manière coulissante, une clavette assurant la transmission du mouvement de rotation entre les deux portions d'axe sans empêcher le coulissement relatif axial des deux portions d'axes. La partie inférieure de la portion inférieure 33A de l'axe 33 est maintenue par un premier roulement 34 dont la cage extérieure est maintenue rigidement par un support fixé au bâti 30. La partie supérieure de la portion supérieure 33B de l'axe 33 fait saillie hors de bâti 30 par une ouverture de sa face supérieure et est maintenue dans un deuxième roulement 35 dont la cage extérieure est maintenue sur un plateau oscillant 36. Le plateau oscillant 36 est fixé au bâti 30 par l'intermédiaire de moyens à ressort, par exemple une pluralité de ressorts à boudin relativement rigides 37, disposés sur la périphérie du plateau oscillant 36, de manière à le conserver dans un plan sensiblement horizontal. Une masselotte de déséquilibrage 38 est fixée à la portion supérieure d'axe 33B. La cuve 1 est fixée à la face supérieure du plateau oscillant 36 par des moyens de fixation démontables 11.A device allowing the movement of the tank of polishing according to the substantially circular induced movements that have been mentioned is described later and is shown in Figure 2. polishing device 3 consists of a frame 30 resting with dampers 31 known to the technique on the ground, this in order to limit the transmission of vibrations to the environment. A motor 32, preferably a electric motor, drives in rotation a vertical axis 33, via two pulleys and a belt according to the embodiment shown. The axis vertical 33 is composed of two portions, a lower portion 33A and a upper portion 33B, the lower portion 33A rotating in the upper portion 33B, but this upper portion being slidable axially with respect to the lower portion 33A. For example, the part upper portion 33A consists of a tube, in which the lower part of the upper portion 33B is engaged so sliding, a key ensuring the transmission of the rotational movement between the two axis portions without preventing axial relative sliding of the two portions of axes. The lower part of the lower portion 33A of the axis 33 is held by a first bearing 34 whose outer cage is rigidly supported by a support fixed to the frame 30. The upper part of the upper portion 33B of the axis 33 protrudes out of frame 30 by an opening of its upper face and is held in a second bearing 35 whose outer cage is held on a swash plate 36. The swash plate 36 is fixed to the frame 30 by means of spring means, for example a a plurality of relatively rigid coil springs 37 disposed on the periphery of the swash plate 36, so as to keep it in a plane substantially horizontal. An imbalance weight 38 is attached to the portion upper axis 33B. The tank 1 is fixed to the upper face of the tray oscillating 36 by removable fixing means 11.

    L'axe de rotation 33, mis en rotation comme indiqué par le moteur 32, pivote entre les deux roulements 34 et 35. Etant donné qu'un seul de ces roulements, et précisément celui du bas référencé 34 est fixé au bâti et que l'autre, celui référencé 35 est fixé au plateau oscillant 36, quant à lui relié uniquement par les ressorts 37 au bâti 30, l'axe 33 aura tendance à prendre un mouvement de rotation oscillant autour de la direction verticale, la composante oscillation étant transmise au dit plateau oscillant 36. La présence de la masselotte 38 à proximité de l'extrémité supérieure de l'axe 33 a tendance à augmenter ce mouvement d'oscillation. La période de rotation du mouvement de translation en rotation correspond à la vitesse de rotation de l'axe 33 alors que son amplitude dépend des masses en mouvement et en particulier du balourd qu'elles représentent par rapport à l'axe vertical. Les ressorts 37 sont choisis avec une rigidité suffisante pour limiter l'amplitude du mouvement. La mise en rotation du dispositif comme décrite ci-dessus, imposant ainsi le mouvement de translation en rotation selon un plan sensiblement horizontal décrit précédemment, impose des contraintes aux ressorts 37 lesquels imposent alors, en plus du premier mouvement oscillatoire A dans un plan sensiblement horizontal, un deuxième mouvement oscillatoire D dans une direction sensiblement verticale tel un léger mouvement d'oscillation comme repéré en D. La fréquence et l'amplitude de ce deuxième mouvement oscillatoire D dépendent essentiellement des masses en mouvement, des caractéristiques des ressorts, ainsi que de l'amplitude et de la fréquence du premier mouvement oscillatoire A de la cuve. Le coulissement relatif des deux portions d'axe 33A et 33B est destiné à absorber le deuxième mouvement oscillatoire D ainsi qu'à compenser le fléchissement des ressorts 37 lorsque le plateau oscillant 36 est chargé de la cuve 1 contenant les pièces à polir ainsi que le produit de polissage 10.The axis of rotation 33, rotated as indicated by the motor 32, pivots between the two bearings 34 and 35. Since only one of these bearings, and precisely that of the lower referenced 34 is fixed to the frame and that the other, that referenced 35 is attached to the swash plate 36, meanwhile connected only by the springs 37 to the frame 30, the axis 33 will tend to take a rotation movement oscillating around the vertical direction, the component oscillation being transmitted to said oscillating plate 36. The presence of the weight 38 near the upper end of the axis 33 tends to increase this swing movement. The rotation period of the movement translation in rotation corresponds to the speed of rotation of the axis 33 then that its amplitude depends on the masses in motion and in particular the unbalance that they represent in relation to the vertical axis. The springs 37 are chosen with sufficient rigidity to limit the range of motion. The rotation of the device as described above, thus imposing the translational movement in rotation in a substantially horizontal plane previously described, imposes constraints on the springs 37 which then impose, in addition to the first oscillatory motion A in a plane substantially horizontal, a second oscillatory movement D in a substantially vertical direction such a slight swinging motion as located in D. The frequency and amplitude of this second movement Oscillatory D depend essentially on moving masses, characteristics of the springs, as well as the amplitude and frequency of the first oscillatory movement A of the tank. The relative sliding of the two axis portions 33A and 33B is intended to absorb the second movement oscillation D as well as to compensate for the sagging of the springs 37 when the Swash plate 36 is loaded with the vessel 1 containing the parts to be polished as well that the polishing product 10.

    Le dispositif 3 est avantageusement complété d'une partie électronique 39A, éventuellement programmable, commandant le moteur 32, ainsi que d'un tableau de commande 39B schématisé avec un clavier et deux boutons poussoirs.The device 3 is advantageously completed with a part 39A, possibly programmable, controlling the motor 32, as well as a control panel 39B diagrammatically with a keyboard and two push buttons.

    La cuve 1 peut être fermée par un couvercle (non représenté sur la figure).The tank 1 can be closed by a cover (not shown on the figure).

    Selon une variante, le dispositif pour la mise en oeuvre du procédé comprend :

    • un organe 100 qui, distinct de la cuve 1, constitue le support de pièce, et,
    • un premier moyen fonctionnel 50 pour imposer à la cuve 1 au moins le premier mouvement oscillatoire A.
    According to one variant, the device for carrying out the method comprises:
    • an element 100 which, distinct from the tank 1, constitutes the part support, and,
    • a first functional means 50 for imposing on the vessel 1 at least the first oscillatory movement A.

    Selon une variante remarquable le dispositif de polissage 3 pour la mise en oeuvre du procédé de l'invention comprend :

    • un organe 100 qui, distinct de la cuve 1, constitue le support de pièce, et,
    • un deuxième moyen fonctionnel 60 pour imposer à cet organe 100 au moins ledit premier mouvement oscillatoire A, cependant que ledit organe 100 maintient la pièce 2 au contact du produit de polissage 10.
    According to a remarkable variant, the polishing device 3 for implementing the method of the invention comprises:
    • an element 100 which, distinct from the tank 1, constitutes the part support, and,
    • a second functional means 60 for imposing on this member 100 at least said first oscillatory movement A, while said member 100 holds the workpiece 2 in contact with the polishing product 10.

    Par exemple, l'organe 100 consiste en un bras relié à un bâti.For example, the member 100 consists of an arm connected to a frame.

    Suivant une autre variante du dispositif de polissage, le dispositif de polissage comprend :

    • un organe 100 qui, distinct de la cuve 1, constitue le support de pièce, et,
    • un premier moyen fonctionnel 50 pour imposer à la cuve 1 au moins le premier mouvement oscillatoire A et,
    • un deuxième moyen fonctionnel 60 pour imposer à l'organe 100 qui constitue le support de pièce au moins un autre premier mouvement oscillatoire A choisi de manière telle que ce mouvement de l'organe 100 se combine au mouvement de la cuve 1, en vue de renforcer l'action de polissage.
    According to another variant of the polishing device, the polishing device comprises:
    • an element 100 which, distinct from the tank 1, constitutes the part support, and,
    • first functional means 50 for imposing on the vessel 1 at least the first oscillatory movement A and,
    • a second functional means 60 for imposing on the member 100 which constitutes the workpiece support at least one other oscillatory first movement A chosen in such a way that this movement of the member 100 is combined with the movement of the vessel 1, in order to strengthen the polishing action.

    Le deuxième moyen fonctionnel 60 pour imposer au moins le premier mouvement oscillant au bras 100 est avantageusement de même nature que le premier moyen fonctionnel 50.The second functional means 60 for imposing at least the first oscillating motion on the arm 100 is advantageously likewise nature as the first functional means 50.

    Avantageusement, mais de manière non limitative, le dispositif de polissage comprend deux moteurs 32 indépendants.Advantageously, but without limitation, the device for polishing includes two independent 32 motors.

    De manière remarquable, le dispositif de polissage 3 comprend un moyen 101 commandé de déplacement multi-directionnel d'au moins la partie du bras 100 qui supporte au moins une pièce 2, de manière à constituer un moyen de manipulation d'au moins une telle pièce 2.Remarkably, the polishing device 3 comprises a means 101 controlled multi-directional displacement of at least the part arm 100 which supports at least one piece 2, so as to constitute a means for handling at least one such part 2.

    Cette particularité technique permet la manipulation mécanique d'au moins une pièce 2 en vue de son chargement et déchargement dans la cuve 1, à savoir, en début et en fin de cycle.This technical feature allows the mechanical manipulation of minus one piece 2 for loading and unloading it in the tank 1, namely, at the beginning and end of the cycle.

    Egalement, l'existence d'un tel moyen 101 de manipulation permet de faciliter la réalisation d'un contrôle en cours de cycle de polissage.Also, the existence of such a means 101 of manipulation allows to facilitate the realization of a control during the polishing cycle.

    Cette mécanisation du chargement et du déchargement peut avantageusement être automatisée.This mechanization of loading and unloading can advantageously be automated.

    En résumé, le dispositif de polissage 3 comprend un bâti 30 et au moins l'un desdits premier et deuxième moyens fonctionnels 50, 60, au moins l'un de ces moyens fonctionnels 50, 60 comportant des moyens d'entraínement en rotation 32 d'un axe sensiblement vertical 33, une portion d'extrémité 33A dudit axe étant maintenue par un premier dispositif à roulement 34 dont la cage extérieure est fixée au bâti 30, l'autre extrémité 33B dudit axe faisant saillie par une ouverture de la face supérieure du bâti et supportant un plateau oscillant 36, disposé horizontalement, par l'intermédiaire d'un second dispositif à roulement 35 dont la cage extérieure est fixée audit plateau, ledit plateau étant d'autre part relié au bâti par des moyens à ressort 37 et pourvu de moyens de fixation d'un support de pièce 2 telle la cuve 1 ou l'organe support 100.In summary, the polishing device 3 comprises a frame 30 and at least one of said first and second functional means 50, 60, at least one of these functional means 50, 60 comprising drive means in rotation 32 of a substantially vertical axis 33, an end portion 33A of said axis being held by a first rolling device 34 whose cage is attached to the frame 30, the other end 33B of said axis protruding by an opening of the upper face of the frame and supporting a swash plate 36, arranged horizontally, via a second device to bearing 35 whose outer cage is fixed to said plate, said plate being on the other hand connected to the frame by spring means 37 and provided with means of fixing a support of part 2 such as the tank 1 or the support member 100.

    Ci-après se trouve décrit un cycle complet de polissage comportant une étape de préparation de la cuve 1. Dans une cuve 1 vide, on place une ou plusieurs pièces à polir 2 de manière à ce qu'elles ne soient pas directement en contact entre elles ni avec les parois de la cuve. Les pièces sont fixées à l'intérieur de la cuve, par tout moyen convenable 12, de telle manière à ce qu'elles soient fixées rigidement et que leur fixation ne soit pas détruite sous l'effet des vibrations. De préférence les pièces de fixation appuieront sur les pièces à polir par des surfaces desdites pièces ne nécessitant pas de polissage ; si cela ne s'avérerait pas possible, il conviendra ultérieurement, après avoir poli une première partie de la pièce, de démonter l'assemblage, de modifier la fixation de cette pièce afin qu'elle appuie sur une portion déjà polie et de reprendre le polissage afin de polir les portions de surface auparavant masquées par la fixation. Lorsqu'une ou des portions de surfaces ne doivent pas être polies, il est possible de les protéger en les recouvrant d'une cire de protection ou plus simplement encore d'un ruban adhésif. Lorsque les pièces 2 sont bien fixées dans la cuve 1, on remplit la cuve avec le produit de polissage 10, de manière à recouvrir les pièces à polir. La cuve 1 est ensuite disposée sur le plateau oscillant 36, qui y est fixée par les moyens de fixation 11, et ensuite le cycle de polissage est commandé via le tableau de commande 39B. Ce tableau de commande 39B peut être très simple, ne commandant que la mise en route ou l'arrêt du moteur ainsi que sa vitesse et son sens de rotation. D'autres paramètres peuvent aussi être introduits par ce tableau de commande ou par d'autres moyens par exemple tenant compte de la masse des pièces à polir et de l'état de surface de départ, on peut déterminer la durée du cycle de polissage et commander un ou plusieurs changements de sens de rotation et de vitesse du moteur durant le cycle.Hereinafter is described a complete cycle of polishing comprising a step of preparation of the tank 1. In an empty tank 1, one or several pieces to be polished 2 so that they are not directly contact with each other or with the walls of the tank. The pieces are fixed at the inside of the tank, by any suitable means 12, so that that they are rigidly fixed and that their fixation is not destroyed under the effect of vibrations. Preferably the fasteners will support the parts to be polished by surfaces of said parts that do not require polishing; if this proves not possible, it will be necessary later, after polishing a first part of the part, dismantling the assembly, modify the attachment of this piece so that it presses on an already polished portion and resume polishing to polish surface portions before masked by the fixation. Where one or more portions of surfaces not be polished, it is possible to protect them by covering them with a wax of protection or even more simply an adhesive tape. When the pieces 2 are well fixed in the tank 1, the tank is filled with the polishing product 10, so as to cover the parts to be polished. The tank 1 is then arranged on the swash plate 36, which is fixed thereto by the fixing means 11, and then the polishing cycle is controlled via the control panel 39B. This control panel 39B can be very simple, controlling only the starting or stopping the engine and its speed and direction of rotation. Other parameters can also be introduced by this control panel or by other means for example taking into account the mass of parts to polishing and starting surface condition, one can determine the cycle time of polishing and order one or more changes of direction of rotation and engine speed during the cycle.

    En fin de cycle de polissage, la cuve 1 est retirée du plateau 36, le produit de polissage est retiré de la cuve, les pièces polies sont aussi retirées de la cuve et sont ensuite soigneusement lavées. Les composants liquides du produit de polissage sont retirés du mélange et sont ensuite régénérés ou détruits s'ils ne peuvent pas être récupérés. Les particules sont aussi lavées et récupérées pour un prochain usage.At the end of the polishing cycle, the tank 1 is removed from the plate 36, the polishing product is removed from the tank, the polished pieces are also removed from the vat and are then thoroughly washed. The liquid components of the polish are removed from the mixture and are then regenerated or destroyed if they can not be recovered. The particles are also washed and recovered for future use.

    Avec un procédé de polissage, et un dispositif de polissage tels que décrits ci-dessus, il est possible d'obtenir un polissage correspondant à un degré de rugosité au moins égal à N1 de pièces métalliques de toutes formes, ceci par des moyens mécaniques relativement simples pouvant être automatisés.With a polishing process, and a polishing device such as described above, it is possible to obtain a polishing corresponding to a degree of roughness at least equal to N1 of metal parts of all shapes, this by relatively simple mechanical means that can be automated.

    Claims (23)

    Procédé de polissage d'au moins une pièce (2) avec un produit de polissage (10) contenu dans une cuve (1), au moins une surface de la pièce (2) étant exposée au contact dudit produit de polissage (10), ce procédé étant caractérisé en ce que : on fixe chaque pièce (2) destinée à être polie à un support de pièce (1, 100) qui maintient cette pièce (2) au contact du produit de polissage (10), et on impose à au moins l'un des deux éléments que sont ledit support de pièce (1, 100) et ledit produit de polissage (10), au moins un premier mouvement oscillatoire (A) dont on choisit préalablement l'orientation, l'amplitude et la fréquence de manière à provoquer dans ledit produit de polissage (10) au moins un mouvement induit (B, C) qui engendre son déplacement au contact de la pièce (2). A method of polishing at least one workpiece (2) with a polishing product (10) contained in a vessel (1), at least one surface of the workpiece (2) being exposed in contact with said polishing product (10), this method being characterized in that : each piece (2) to be polished is fixed to a workpiece support (1, 100) which holds the workpiece (2) in contact with the polishing product (10), and at least one of the two elements such as said work support (1, 100) and said polishing product (10) is imposed with at least a first oscillatory movement (A) whose orientation is previously selected; amplitude and frequency so as to cause in said polishing product (10) at least one induced movement (B, C) which causes its displacement in contact with the workpiece (2). Procédé de polissage selon la revendication 1, caractérisé en ce qu'on provoque au moins un mouvement induit (B, C) de nature sensiblement circulaire (B, C).Polishing method according to Claim 1, characterized in that at least one induced movement (B, C) of substantially circular nature (B, C) is caused. Procédé de polissage selon la revendication 1, caractérisé en ce que lors de la fixation de la pièce (2) sur le support de pièce (1, 100), on supprime tous les degrés de liberté de la pièce (2) par rapport audit support (1, 100).Polishing method according to claim 1, characterized in that during the fixing of the workpiece (2) on the workpiece support (1, 100), all the degrees of freedom of the workpiece (2) are eliminated with respect to said support (1, 100). Procédé de polissage selon la revendication 1, caractérisé en ce que lors de la fixation de la pièce (2) sur le support de pièce (1, 100), on supprime tous les degrés de liberté de la pièce (2) par rapport audit support (1, 100), à l'exception d'un degré de liberté en rotation autour d'un axe d'orientation prédéterminée.Polishing method according to claim 1, characterized in that during the fixing of the workpiece (2) on the workpiece support (1, 100), all the degrees of freedom of the workpiece (2) are eliminated with respect to said support (1, 100), except for a degree of freedom in rotation about a predetermined orientation axis. Procédé de polissage selon la revendication 1, caractérisé en ce qu'on met en oeuvre un produit de polissage qui génère une action mécanique et une action chimique. Polishing process according to claim 1, characterized in that a polishing product is used which generates a mechanical action and a chemical action. Procédé de polissage selon l'une quelconque des revendications 1 à 5 caractérisé en ce qu'on impose à au moins l'un des deux éléments que sont ledit support (1, 100) et ledit produit de polissage (10), deux mouvements oscillatoires dont : un premier mouvement oscillatoire (A) réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal et un deuxième mouvement oscillatoire (D) réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan. Polishing method according to any one of Claims 1 to 5, characterized in that at least one of the two elements, namely said support (1, 100) and said polishing product (10), are imposed, two oscillatory movements. whose : a first oscillatory movement (A) carried out in a first plane of orientation determined with respect to a horizontal plane and a second oscillatory movement (D) performed at least in a direction of orientation determined relative to said first plane. Procédé de polissage selon l'une quelconque des revendications 1 à 6 caractérisé en ce que : d'une part, on choisit une cuve (1) de forme telle que, lorsqu'elle est en situation d'être utilisée pour le polissage, elle présente dans différents plans horizontaux, une section transversale de forme polygonale ou sensiblement circulaire et, d'autre part, on impose à au moins l'un des deux éléments que sont ledit support (1, 100) et ledit produit de polissage (10), au moins ledit premier mouvement oscillatoire (A) desdits premier et deuxième mouvements oscillatoires. Polishing method according to any one of Claims 1 to 6, characterized in that : on the one hand, a tank (1) of a shape such that, when it is in a position to be used for polishing, it has, in different horizontal planes, a transverse section of polygonal or substantially circular shape and, on the other hand, at least one of the two elements that are said support (1, 100) and said polishing product (10), at least said first oscillatory movement (A) of said first and second oscillatory movements is imposed. Procédé de polissage selon la revendication 7 caractérisé en ce qu'on choisit une cuve (1) présentant une paroi latérale sensiblement verticale et un fond sensiblement plan et horizontal.Polishing process according to Claim 7, characterized in that a vessel (1) is chosen having a substantially vertical side wall and a substantially flat and horizontal bottom. Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce en utilisant la paroi de la cuve (1) dans une zone qui est exposée au contact du produit de polissage (10) et on impose à ladite cuve (1) au moins un premier mouvement oscillatoire (A) de manière telle que la pièce (2) soit déplacée dans le produit de polissage (10). Polishing method according to one of Claims 1 to 8, characterized in that the workpiece support is formed by using the wall of the vessel (1) in an area which is exposed in contact with the polishing product (10) and at least one first oscillatory movement (A) is imposed on said vessel (1) in such a way that the workpiece (2) is displaced in the polishing product (10). Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce en utilisant un organe (100) distinct de la cuve (1) et, c'est à cet organe (100) qu'on impose au moins ledit premier mouvement oscillatoire (A), cependant que cet organe (100) maintient la pièce (2) au contact dudit produit de polissage (10).Polishing method according to any one of Claims 1 to 8, characterized in that the workpiece support is constituted by using a member (100) separate from the vat (1) and it is to this member (100) that at least said first oscillatory movement (A) is imposed, while this member (100) keeps the workpiece (2) in contact with said polishing product (10). Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce en utilisant un organe (100) distinct de la paroi de la cuve (1) et : d'une part, on impose à la cuve (1) au moins un premier mouvement oscillatoire (A) et, d'autre part, on impose également à l'organe (100) qui constitue le support de pièce au moins un autre premier mouvement oscillatoire (A) choisi de manière telle que ce mouvement de l'organe (100) se combine au mouvement de la cuve (1), en vue de renforcer l'action de polissage. Polishing method according to any one of Claims 1 to 8, characterized in that the part support is constituted by using a member (100) separate from the wall of the vessel (1) and: on the one hand, the vessel (1) is imposed with at least a first oscillatory movement (A) and, on the other hand, it also imposes on the member (100) which constitutes the workpiece support at least one other first oscillatory movement (A) chosen in such a way that this movement of the member (100) is combined with the movement of the the tank (1), to enhance the polishing action. Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce, en utilisant un organe (100) distinct de la paroi de la cuve (1) et on impose à la cuve (1) au moins un premier mouvement oscillatoire (A).Polishing process according to any one of Claims 1 to 8, characterized in that the workpiece support is constituted by using a member (100) separate from the wall of the vessel (1) and is imposed on the vessel (1). ) at least a first oscillatory movement (A). Dispositif de polissage pour la mise en oeuvre du procédé selon l'une quelconque des revendications 1 à 12 caractérisé en ce qu'il comprend au moins un premier moyen fonctionnel (50) pour imposer à au moins l'un des deux éléments que sont ledit support de pièce (1, 100) et ledit produit de polissage (10), au moins un premier mouvement oscillatoire (A) dont l'orientation, l'amplitude et la fréquence sont prédéterminées de manière à provoquer dans ledit produit de polissage (10) au moins un mouvement induit (B, C) qui engendre son déplacement au contact de la pièce (2).Polishing device for implementing the method according to any one of Claims 1 to 12, characterized in that it comprises at least a first functional means (50) for imposing on at least one of the two elements that are said piece support (1, 100) and said polishing product (10), at least a first oscillatory movement (A) whose orientation, amplitude and frequency are predetermined so as to cause in said polishing product (10) ) at least one induced movement (B, C) which causes its movement in contact with the workpiece (2). Dispositif de polissage selon la revendication 13 pour la mise en oeuvre du procédé selon l'une quelconque des revendications 1 à 12 caractérisé en ce qu'il comprend un premier moyen fonctionnel (50) pour imposer à au moins l'un des deux éléments que sont ledit support et le produit de polissage, deux mouvements oscillatoires dont : un premier mouvement oscillatoire (A) réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal, un deuxième mouvement oscillatoire (D) réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan, et    les amplitudes et fréquences de ces premier et deuxième mouvements étant prédéterminées de manière à provoquer dans ledit produit de polissage (10) au moins un mouvement induit (B, C) qui engendre son déplacement au contact de la pièce (2).Polishing device according to Claim 13 for carrying out the method according to any one of Claims 1 to 12, characterized in that it comprises a first functional means (50) for imposing on at least one of the two elements that are said support and the polishing product, two oscillatory movements of which: a first oscillatory movement (A) produced in a first plane of orientation determined with respect to a horizontal plane, a second oscillatory movement (D) carried out at least in a direction of orientation determined with respect to said first plane, and the amplitudes and frequencies of these first and second movements being predetermined so as to cause in said polishing product (10) at least one induced movement (B, C) which causes its displacement in contact with the workpiece (2). Dispositif pour la mise en oeuvre du procédé selon l'une des revendications 10 ou 11 caractérisé en ce qu'il comprend : un organe (100) qui, distinct de la cuve (1), constitue le support de pièce, et, un deuxième moyen fonctionnel (60) pour imposer à cet organe (100) au moins ledit premier mouvement oscillatoire (A), cependant que ledit organe (100) maintient la pièce (2) au contact du produit de polissage (10). Device for implementing the method according to one of Claims 10 or 11, characterized in that it comprises: an element (100) which, distinct from the tank (1), constitutes the part support, and, a second functional means (60) for imposing on this member (100) at least said first oscillatory movement (A), while said member (100) maintains the workpiece (2) in contact with the polishing product (10). Dispositif pour la mise en oeuvre du procédé selon la revendication 11 caractérisé en ce qu'il comprend : un organe (100) qui, distinct de la cuve (1), constitue le support de pièce, et, un premier moyen fonctionnel (50) pour imposer à la cuve (1) au moins le premier mouvement oscillatoire (A) et, un deuxième moyen fonctionnel (60) pour imposer à l'organe (100) qui constitue le support de pièce au moins un autre premier mouvement oscillatoire (A) choisi de manière telle que ce mouvement de l'organe (100) se combine au mouvement de la cuve (1), en vue de renforcer l'action de polissage. Device for carrying out the process according to claim 11, characterized in that it comprises: an element (100) which, distinct from the tank (1), constitutes the part support, and, first functional means (50) for imposing on the vessel (1) at least the first oscillatory movement (A) and, a second functional means (60) for imposing on the member (100) which constitutes the workpiece support at least one other first oscillatory movement (A) chosen in such a way that this movement of the member (100) is combined with the movement of the tank (1), to enhance the polishing action. Dispositif pour la mise en oeuvre du procédé selon la revendication 12 caractérisé en ce qu'il comprend : un organe (100) qui, distinct de la cuve (1), constitue le support de pièce, et, un premier moyen fonctionnel (50) pour imposer à la cuve (1) au moins le premier mouvement oscillatoire (A). Device for implementing the method according to Claim 12, characterized in that it comprises: an element (100) which, distinct from the tank (1), constitutes the part support, and, first functional means (50) for imposing on the vessel (1) at least the first oscillatory movement (A). Dispositif de polissage selon l'une quelconque des revendications 13 à 17, caractérisé en ce qu'il comprend un bâti (30) et au moins l'un desdits premier et deuxième moyens fonctionnels (50, 60), au moins l'un de ces moyens fonctionnels (50, 60) comportant des moyens d'entraínement en rotation (32) d'un axe sensiblement vertical (33), une portion d'extrémité (33A) dudit axe étant maintenue par un premier dispositif à roulement (34) dont la cage extérieure est fixée au bâti (30), l'autre extrémité (33B) dudit axe faisant saillie par une ouverture de la face supérieure du bâti et supportant un plateau oscillant (36), disposé horizontalement, par l'intermédiaire d'un second dispositif à roulement (35) dont la cage extérieure est fixée audit plateau, ledit plateau étant d'autre part relié au bâti par des moyens à ressort (37) et pourvu de moyen de fixation d'un support de pièce (2) telle la cuve (1) ou l'organe support (100).Polishing device according to any one of claims 13 to 17, characterized in that it comprises a frame (30) and at least one of said first and second functional means (50, 60), at least one of these functional means (50, 60) comprising means for driving in rotation (32) a substantially vertical axis (33), an end portion (33A) of said axis being held by a first rolling device (34) whose outer cage is fixed to the frame (30), the other end (33B) of said axis protruding through an opening in the upper face of the frame and supporting a horizontally disposed swash plate (36), via a second rolling device (35) whose outer cage is fixed to said plate, said plate being further connected to the frame by spring means (37) and provided with means for fixing a workpiece support (2) such as the tank (1) or the support member (100). Dispositif de polissage selon la revendication 18, caractérisé en ce que l'axe sensiblement vertical (33) comprend une masse de déséquilibrage (38) disposée à proximité de son extrémité supérieure (33B).Polishing device according to claim 18, characterized in that the substantially vertical axis (33) comprises an unbalance mass (38) disposed near its upper end (33B). Dispositif de polissage selon l'une des revendications 18 ou 19 caractérisé en ce que l'axe sensiblement vertical (33) est constitué de deux portions d'axe (33A, 33B) dans le prolongement l'une de l'autre et pouvant coulisser l'une par rapport à l'autre dans la direction axiale. Polishing device according to one of claims 18 or 19 characterized in that the substantially vertical axis (33) consists of two axis portions (33A, 33B) in the extension of one another and can slide relative to each other in the axial direction. Dispositif de polissage selon l'une des revendications 17 à 20, caractérisé en ce que les moyens motorisés (32) sont aptes à entraíner l'axe (33), respectivement le plateau oscillant (36) et la cuve de polissage (1) selon deux sens de rotation.Polishing device according to one of claims 17 to 20, characterized in that the motorized means (32) are adapted to drive the axis (33), respectively the swash plate (36) and the polishing tank (1) according to two directions of rotation. Dispositif de polissage selon l'une des revendications 17 à 21, caractérisé en ce qu'il comprend en outre des moyens de commande automatique (39A, 39B) de cycles de polissage.Polishing device according to one of claims 17 to 21, characterized in that it further comprises means for automatic control (39A, 39B) of polishing cycles. Dispositif de polissage selon l'une des revendications 15 à 22, caractérisé en ce qu'il comprend un moyen (101) commandé de déplacement multi-directionnel d'au moins la partie du bras (100) qui supporte au moins une pièce (2), de manière à constituer un moyen de manipulation d'au moins une telle pièce (2) et à autoriser la manipulation mécanique d'au moins une pièce (2) en vue de son chargement et déchargement dans la cuve (1), à savoir, notamment, en début et en fin de cycle de polissage, ainsi qu'en cours de cycle en vue de la réalisation d'un contrôle en cours dudit cycle.Polishing device according to one of Claims 15 to 22, characterized in that it comprises a means (101) controlled for multi-directional displacement of at least the part of the arm (100) which supports at least one piece (2). ), so as to constitute a means for handling at least one such part (2) and to allow the mechanical manipulation of at least one part (2) for loading and unloading it in the tank (1), to to know, in particular, at the beginning and at the end of the polishing cycle, as well as during the cycle in order to carry out a control in progress of said cycle.
    EP02405561A 2002-07-04 2002-07-04 Method and tumbling apparatus with two oscillating movements Expired - Lifetime EP1378322B1 (en)

    Priority Applications (5)

    Application Number Priority Date Filing Date Title
    AT02405561T ATE338611T1 (en) 2002-07-04 2002-07-04 METHOD AND MOVING DEVICE WITH TWO VIBRATIONAL MOVEMENTS
    PT02405561T PT1378322E (en) 2002-07-04 2002-07-04 Method and tumbling apparatus with two oscillating movements
    EP02405561A EP1378322B1 (en) 2002-07-04 2002-07-04 Method and tumbling apparatus with two oscillating movements
    ES02405561T ES2272657T3 (en) 2002-07-04 2002-07-04 PROCEDURE AND POLISHING DEVICE FOR ABRASION OF SURFACES "IN DRUM" WITH TWO OSCILLATORY MOVEMENTS.
    DE60214528T DE60214528T2 (en) 2002-07-04 2002-07-04 Method and moving device with two oscillatory movements

    Applications Claiming Priority (1)

    Application Number Priority Date Filing Date Title
    EP02405561A EP1378322B1 (en) 2002-07-04 2002-07-04 Method and tumbling apparatus with two oscillating movements

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    EP1378322A1 true EP1378322A1 (en) 2004-01-07
    EP1378322B1 EP1378322B1 (en) 2006-09-06

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    EP (1) EP1378322B1 (en)
    AT (1) ATE338611T1 (en)
    DE (1) DE60214528T2 (en)
    ES (1) ES2272657T3 (en)
    PT (1) PT1378322E (en)

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    WO2011045285A1 (en) * 2009-10-12 2011-04-21 Walther Trowal Gmbh & Co. Kg Device and method for slide finishing workpieces
    ITBO20100631A1 (en) * 2010-10-19 2012-04-20 Roberto Mingot EQUIPMENT FOR THE TREATMENT OF A PRODUCT.
    CN103612192A (en) * 2013-11-06 2014-03-05 梧州学院 Surface grinding and polishing method for superhard material
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    CN115870872A (en) * 2023-01-05 2023-03-31 苏州思科赛德电子科技有限公司 Vibrating binding post burnishing machine

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    DE102019112665A1 (en) * 2019-05-15 2020-11-19 Bayerische Motoren Werke Aktiengesellschaft Method for grinding and / or polishing a component
    CN112677029B (en) * 2019-11-17 2022-03-18 东莞市卓宇五金科技有限公司 Drum-type polishing machine
    CH720230A1 (en) 2022-11-16 2024-05-31 Richemont Int Sa Hollow middle for a timepiece box and corresponding manufacturing process.

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    KR100991059B1 (en) * 2008-06-05 2010-10-29 김정수 Apparatus and Method for Polishing Surface of Die-Casting Product
    WO2011045285A1 (en) * 2009-10-12 2011-04-21 Walther Trowal Gmbh & Co. Kg Device and method for slide finishing workpieces
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    CN103612192A (en) * 2013-11-06 2014-03-05 梧州学院 Surface grinding and polishing method for superhard material
    CN108044490A (en) * 2018-01-09 2018-05-18 河南共达机械有限公司 A kind of automotive hub burnishing device
    CN115213805A (en) * 2022-07-20 2022-10-21 湖南省东海五金工具制造有限公司 Automatic machining equipment for adjustable wrench and using method of automatic machining equipment
    CN115213805B (en) * 2022-07-20 2023-12-15 邵东市鸿伟工具有限公司 Automatic processing equipment for adjustable wrench and use method thereof
    CN115870872A (en) * 2023-01-05 2023-03-31 苏州思科赛德电子科技有限公司 Vibrating binding post burnishing machine

    Also Published As

    Publication number Publication date
    ES2272657T3 (en) 2007-05-01
    DE60214528T2 (en) 2007-06-06
    EP1378322B1 (en) 2006-09-06
    ATE338611T1 (en) 2006-09-15
    DE60214528D1 (en) 2006-10-19
    PT1378322E (en) 2007-01-31

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