EP1355848B1 - Verfahren zur herstellung eines mikrofluidbauelements - Google Patents
Verfahren zur herstellung eines mikrofluidbauelements Download PDFInfo
- Publication number
- EP1355848B1 EP1355848B1 EP01989549A EP01989549A EP1355848B1 EP 1355848 B1 EP1355848 B1 EP 1355848B1 EP 01989549 A EP01989549 A EP 01989549A EP 01989549 A EP01989549 A EP 01989549A EP 1355848 B1 EP1355848 B1 EP 1355848B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- fluid
- wafer
- intermediate layer
- fluid structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B1/00—Devices without movable or flexible elements, e.g. microcapillary devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00349—Creating layers of material on a substrate
- B81C1/00357—Creating layers of material on a substrate involving bonding one or several substrates on a non-temporary support, e.g. another substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/12—Specific details about manufacturing devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/05—Microfluidics
- B81B2201/058—Microfluidics not provided for in B81B2201/051 - B81B2201/054
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0323—Grooves
- B81B2203/0338—Channels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
- B81C2201/019—Bonding or gluing multiple substrate layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/11—Automated chemical analysis
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/25—Chemistry: analytical and immunological testing including sample preparation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/25—Chemistry: analytical and immunological testing including sample preparation
- Y10T436/2575—Volumetric liquid transfer
Definitions
- Document WO 0011477 discloses a method whereby a fluid structure in a Structural layer is generated.
- An intermediate layer lies between the structural layer and a carrier substrate.
- the thickness of the structure layer determines the active height of the Fluid structure and the structural layer becomes without impairing the intermediate layer structured.
- the carrier substrate remains part of the final structure.
- Such basic wafers can be manufactured very precisely industrially become. Because such basic wafers are industrial in large quantities their prices are comparative cheap because they are not only used in the field of analytics can be, but in the entire field of electronics or microstructure technology.
- the semiconductor layer of the base wafer in the case of an SOI wafer, the silicon layer, structured, in order to produce a fluid structure of the fluid component, wherein the fluid structure through the semiconductor layer extends through.
- the intermediate layer is designed that by structuring the structure layer is essentially not affected and - in Case of etching - acts as an etching stop.
- An advantage of the present invention is that now created a fluid component that is transparent on both sides is that is easily for transmitted light analysis suitable.
- FIG. 2 shows a sectional view through the base wafer to which, however, a glass wafer 20 is now applied, which covers the fluid structure 16.
- a glass wafer 20 any other transparent disc on the Silicon layer 14 can be applied.
- To attach the transparent disc on the silicon becomes the anodic Preferred bonding, for which glass is best suited.
- silicon etching can be used KOH can be used, which does not attack silicon oxide.
- hydrofluoric acid can be used to remove the insulator layer can be used, which does not attack silicon.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Dispersion Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Hematology (AREA)
- General Health & Medical Sciences (AREA)
- Clinical Laboratory Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Computer Hardware Design (AREA)
- Micromachines (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Sampling And Sample Adjustment (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Lubricants (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Optical Measuring Cells (AREA)
Description
- Fig. 1
- eine Schnittansicht eines Basiswafers nach dem Schritt des Strukturierens der Halbleiterschicht;
- Fig. 2
- eine Schnittansicht durch einen Basiswafer, auf dem eine erste transparente Scheibe aufgebracht ist;
- Fig. 3
- eine Schnittansicht des Basiswafers, nachdem das Trägersubstrat und die Isolatorschicht entfernt ist; und
- Fig. 4
- eine Schnittansicht eines erfindungsgemäßen Fluidbauelements, nachdem eine zweite transparente Scheibe an der Rückseite des Fluidbauelements angebracht worden ist.
Claims (9)
- Verfahren zur Herstellung eines Fluidbauelements mit einer Fluidstruktur (16), die eine aktive Höhe (d) aufweist, mit folgenden Schritten:Bereitstellen eines Basiswafers mit einem Trägersubstrat (10), einer Zwischenschicht (12) auf dem Trägersubstrat und einer Strukturschicht (14) auf der Zwischenschicht (12), wobei die Dicke der Strukturschicht (14) die aktive Höhe (d) der Fluidstruktur (16) bestimmt, wobei die Zwischenschicht (12) derart beschaffen ist, daß sie durch eine Strukturierung der Strukturschicht im wesentlichen nicht beeinträchtigt wird;Strukturieren der Strukturschicht (14), um die Fluidstruktur (16) des Fluidbauelements herzustellen, wobei sich die Fluidstruktur (16) von einer ersten Oberfläche (18a) der Strukturschicht (14) bis zu der Zwischenschicht (12) erstreckt;Anbringen einer ersten transparenten Scheibe (20), so daß die Fluidstruktur (16) abgedeckt ist;Entfernen des Trägersubstrats (10) und der Zwischenschicht (12), so daß die Fluidstruktur (16) an einer zweiten Oberfläche (18b) der Strukturschicht (14) freiliegt; undAnbringen einer zweiten transparenten Scheibe (22), so daß die Fluidstruktur abgedeckt ist.
- Verfahren nach Anspruch 1, bei dem der Basiswafer eine SOI-Struktur ist, die einen Trägerwafer (10) aus Silizium, eine Isolatorschicht (12) aus Oxid als Zwischenschicht und eine Siliziumschicht (14) als Strukturschicht auf der Oxidschicht (12) aufweist.
- Verfahren nach Anspruch 2, bei dem der Schritt des Strukturierens mittels Trockenätzen von Silizium ausgeführt wird, wobei die Oxidschicht (12) als Ätzstopp wirkt.
- Verfahren nach einem der vorhergehenden Ansprüche, bei dem die erste transparente Scheibe (20) ein Glaswafer ist, der mittels anodischem Bonden an der Strukturschicht (14) angebracht wird.
- Verfahren nach einem der Ansprüche 1 bis 3, bei dem vor dem Schritt des Anbringens der ersten transparenten Scheibe (20) die Fluidstruktur mittels einer Oxidschicht (21) passiviert wird.
- Verfahren nach einem der vorhergehenden Ansprüche, bei dem die zweite transparente Scheibe (22) ein Glaswafer ist, der mittels anodischem Bonden an der zweiten Oberfläche (18b) der Strukturschicht (14) angebracht wird.
- Verfahren nach einem der vorhergehenden Ansprüche, bei dem im Schritt des Entfernens des Trägersubstrats (10) und der Zwischenschicht (12) das Trägersubstrat durch Ätzen entfernt wird, wobei die Zwischenschicht (12) als Ätzstopp wirkt, woraufhin das Ätzverfahren verändert wird, so daß die Zwischenschicht geätzt wird und die Strukturschicht als Ätzstopp wirkt.
- Verfahren nach einem der vorhergehenden Ansprüche, bei dem das Fluidbauelement eine Kapillarstrecke ist, wobei im Schritt des Bereitstellens ein Basiswafer ausgewählt wird, dessen Strukturschicht (14) eine solche Höhe (d) aufweist, daß ein zu transportierendes Fluid in der Fluidstruktur durch Kapillarkräfte transportierbar ist.
- Verfahren zur Herstellung eines Fluidbauelements mit einer Fluidstruktur (16), die eine aktive Höhe (d) aufweist, mit folgenden Schritten:Bereitstellen eines Basiswafers mit einem Trägersubstrat (10), einer Zwischenschicht (12) auf dem Trägersubstrat und einer Strukturschicht (14) auf der Zwischenschicht (12), wobei die Zwischenschicht (12) transparent ist und derart beschaffen ist, daß sie durch eine Strukturierung der Strukturschicht im wesentlichen nicht beeinträchtigt wird, und wobei die Dicke der Strukturschicht (14) die aktive Höhe (d) der Fluidstruktur (16) bestimmt;Strukturieren der Strukturschicht (14), um die Fluidstruktur (16) des Fluidbauelements herzustellen, wobei sich die Fluidstruktur (16) von einer ersten Oberfläche (18a) der Strukturschicht (14) bis zu der Zwischenschicht (12) erstreckt;Anbringen einer ersten transparenten Scheibe (20), so daß die Fluidstruktur (16) abgedeckt ist;Entfernen des Trägersubstrats (10), so daß die transparente Zwischenschicht (12) freiliegt; undAnbringen einer zweiten transparenten Scheibe (22) auf der Zwischenschicht (12).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03019362A EP1369380B1 (de) | 2000-12-05 | 2001-11-30 | Mikrofluidisches Bauelement und Analysevorrichtung |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10060433 | 2000-12-05 | ||
DE10060433A DE10060433B4 (de) | 2000-12-05 | 2000-12-05 | Verfahren zur Herstellung eines Fluidbauelements, Fluidbauelement und Analysevorrichtung |
PCT/EP2001/014036 WO2002046091A2 (de) | 2000-12-05 | 2001-11-30 | Verfahren zur herstellung eines fluidbauelements, fluidbauelement und analysevorrichtung |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03019362A Division EP1369380B1 (de) | 2000-12-05 | 2001-11-30 | Mikrofluidisches Bauelement und Analysevorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1355848A2 EP1355848A2 (de) | 2003-10-29 |
EP1355848B1 true EP1355848B1 (de) | 2004-11-24 |
Family
ID=7665876
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03019362A Expired - Lifetime EP1369380B1 (de) | 2000-12-05 | 2001-11-30 | Mikrofluidisches Bauelement und Analysevorrichtung |
EP01989549A Expired - Lifetime EP1355848B1 (de) | 2000-12-05 | 2001-11-30 | Verfahren zur herstellung eines mikrofluidbauelements |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03019362A Expired - Lifetime EP1369380B1 (de) | 2000-12-05 | 2001-11-30 | Mikrofluidisches Bauelement und Analysevorrichtung |
Country Status (6)
Country | Link |
---|---|
US (1) | US7226862B2 (de) |
EP (2) | EP1369380B1 (de) |
AT (2) | ATE283234T1 (de) |
AU (1) | AU2002227969A1 (de) |
DE (3) | DE10060433B4 (de) |
WO (1) | WO2002046091A2 (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005340655A (ja) * | 2004-05-28 | 2005-12-08 | Shinko Electric Ind Co Ltd | 半導体装置の製造方法および半導体基板の支持構造体 |
DE102006032047A1 (de) * | 2006-07-10 | 2008-01-24 | Schott Ag | Verfahren zur Herstellung optoelektronischer Bauelemente und damit hergestellte Erzeugnisse |
DE102007018833A1 (de) | 2007-04-20 | 2008-10-23 | Febit Holding Gmbh | Verbesserte molekularbiologische Prozessanlage |
DE102006062089A1 (de) | 2006-12-29 | 2008-07-03 | Febit Holding Gmbh | Verbesserte molekularbiologische Prozessanlage |
JP5159247B2 (ja) * | 2007-10-26 | 2013-03-06 | キヤノン株式会社 | 検出方法および検出装置 |
DE102012112989A1 (de) * | 2012-12-21 | 2014-06-26 | Ev Group E. Thallner Gmbh | Verfahren zum Aufbringen einer Temporärbondschicht |
KR102423377B1 (ko) | 2013-08-05 | 2022-07-25 | 트위스트 바이오사이언스 코포레이션 | 드 노보 합성된 유전자 라이브러리 |
US9714933B2 (en) | 2014-01-28 | 2017-07-25 | International Business Machines Corporation | Micro-droplet fluidic cell for fast ionic current detection using nanopores |
WO2016126987A1 (en) | 2015-02-04 | 2016-08-11 | Twist Bioscience Corporation | Compositions and methods for synthetic gene assembly |
CA2975852A1 (en) | 2015-02-04 | 2016-08-11 | Twist Bioscience Corporation | Methods and devices for de novo oligonucleic acid assembly |
WO2016172377A1 (en) | 2015-04-21 | 2016-10-27 | Twist Bioscience Corporation | Devices and methods for oligonucleic acid library synthesis |
CN108368482A (zh) | 2015-09-18 | 2018-08-03 | 特韦斯特生物科学公司 | 寡核酸变体文库及其合成 |
KR20180058772A (ko) | 2015-09-22 | 2018-06-01 | 트위스트 바이오사이언스 코포레이션 | 핵산 합성을 위한 가요성 기판 |
CN108603307A (zh) | 2015-12-01 | 2018-09-28 | 特韦斯特生物科学公司 | 功能化表面及其制备 |
JP6854340B2 (ja) | 2016-08-22 | 2021-04-07 | ツイスト バイオサイエンス コーポレーション | デノボ合成された核酸ライブラリ |
KR102217487B1 (ko) | 2016-09-21 | 2021-02-23 | 트위스트 바이오사이언스 코포레이션 | 핵산 기반 데이터 저장 |
EA201991262A1 (ru) | 2016-12-16 | 2020-04-07 | Твист Байосайенс Корпорейшн | Библиотеки вариантов иммунологического синапса и их синтез |
EP3586255A4 (de) | 2017-02-22 | 2021-03-31 | Twist Bioscience Corporation | Nukleinsäurebasierte datenspeicherung |
WO2018170169A1 (en) | 2017-03-15 | 2018-09-20 | Twist Bioscience Corporation | Variant libraries of the immunological synapse and synthesis thereof |
WO2018231864A1 (en) | 2017-06-12 | 2018-12-20 | Twist Bioscience Corporation | Methods for seamless nucleic acid assembly |
CA3066744A1 (en) | 2017-06-12 | 2018-12-20 | Twist Bioscience Corporation | Methods for seamless nucleic acid assembly |
CA3075505A1 (en) | 2017-09-11 | 2019-03-14 | Twist Bioscience Corporation | Gpcr binding proteins and synthesis thereof |
GB2583590A (en) | 2017-10-20 | 2020-11-04 | Twist Bioscience Corp | Heated nanowells for polynucleotide synthesis |
JP7191448B2 (ja) | 2018-01-04 | 2022-12-19 | ツイスト バイオサイエンス コーポレーション | Dnaベースのデジタル情報ストレージ |
AU2019270243A1 (en) | 2018-05-18 | 2021-01-07 | Twist Bioscience Corporation | Polynucleotides, reagents, and methods for nucleic acid hybridization |
WO2020176678A1 (en) | 2019-02-26 | 2020-09-03 | Twist Bioscience Corporation | Variant nucleic acid libraries for glp1 receptor |
SG11202109283UA (en) | 2019-02-26 | 2021-09-29 | Twist Bioscience Corp | Variant nucleic acid libraries for antibody optimization |
CN114729342A (zh) | 2019-06-21 | 2022-07-08 | 特韦斯特生物科学公司 | 基于条形码的核酸序列装配 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5498392A (en) | 1992-05-01 | 1996-03-12 | Trustees Of The University Of Pennsylvania | Mesoscale polynucleotide amplification device and method |
US5744366A (en) | 1992-05-01 | 1998-04-28 | Trustees Of The University Of Pennsylvania | Mesoscale devices and methods for analysis of motile cells |
WO1996041864A1 (en) | 1995-06-13 | 1996-12-27 | The Regents Of The University Of California | Diode laser heated micro-reaction chamber with sample detection means |
US5783452A (en) * | 1996-02-02 | 1998-07-21 | University Of Washington | Covered microchannels and the microfabrication thereof |
US6153076A (en) * | 1998-01-12 | 2000-11-28 | The Regents Of The University Of California | Extended length microchannels for high density high throughput electrophoresis systems |
US6251343B1 (en) * | 1998-02-24 | 2001-06-26 | Caliper Technologies Corp. | Microfluidic devices and systems incorporating cover layers |
DE59914676D1 (de) * | 1998-08-20 | 2008-04-17 | Siemens Ag | Trennsäulen-einheit für einen gaschromatograph und verfahren zu ihrer herstellung |
EP1117478B1 (de) * | 1998-08-28 | 2005-06-01 | Febit AG | Träger für analytbestimmungsverfahren und verfahren zur herstellung des trägers |
-
2000
- 2000-12-05 DE DE10060433A patent/DE10060433B4/de not_active Expired - Fee Related
-
2001
- 2001-06-04 US US09/873,455 patent/US7226862B2/en not_active Expired - Fee Related
- 2001-11-30 AT AT01989549T patent/ATE283234T1/de not_active IP Right Cessation
- 2001-11-30 AT AT03019362T patent/ATE337265T1/de not_active IP Right Cessation
- 2001-11-30 AU AU2002227969A patent/AU2002227969A1/en not_active Abandoned
- 2001-11-30 DE DE50104638T patent/DE50104638D1/de not_active Expired - Lifetime
- 2001-11-30 WO PCT/EP2001/014036 patent/WO2002046091A2/de not_active Application Discontinuation
- 2001-11-30 EP EP03019362A patent/EP1369380B1/de not_active Expired - Lifetime
- 2001-11-30 DE DE50110834T patent/DE50110834D1/de not_active Expired - Lifetime
- 2001-11-30 EP EP01989549A patent/EP1355848B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE50110834D1 (de) | 2006-10-05 |
WO2002046091A2 (de) | 2002-06-13 |
EP1369380A3 (de) | 2004-03-24 |
AU2002227969A1 (en) | 2002-06-18 |
ATE337265T1 (de) | 2006-09-15 |
US7226862B2 (en) | 2007-06-05 |
DE10060433B4 (de) | 2006-05-11 |
EP1355848A2 (de) | 2003-10-29 |
EP1369380A2 (de) | 2003-12-10 |
WO2002046091A3 (de) | 2003-07-31 |
EP1369380B1 (de) | 2006-08-23 |
ATE283234T1 (de) | 2004-12-15 |
DE50104638D1 (de) | 2004-12-30 |
US20020068021A1 (en) | 2002-06-06 |
DE10060433A1 (de) | 2002-06-13 |
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